Patent Application
20050062801
1. Field of the Invention
The present invention relates to an inkjet recording head and an inkjet recording device using the same, in particular, to an ink repelling treated portion at the periphery of an ink discharge portion of a head.
2. Background Art
A printer using an inkjet recording head for discharging an ink droplet from an ink discharge opening of a nozzle hole to form an image on recording paper is put into practical use and is characterized by silence and high-density printing. The printing quality of the image obtained by such an ink-jet recording head largely replies upon the position precision of dots constituting the image, which are composed of ink droplets on the recording paper. This position precision of dots is dominated by whether or not the flying direction of the ink droplet to be discharged from the ink discharge opening of the nozzle hole of the inkjet recording head is constant.
For the sake of keeping the flying direction of the ink droplet constant, it is important that the surrounding portion of the ink droplet discharge opening of the nozzle hole be in the uniform and stable surface state at the time of ink discharging, specifically it is important to realize the surface state of the surrounding portion of the ink droplet discharge opening of the nozzle hole, which is free from the matter that a part of the surrounding portion of the ink droplet discharge opening of the nozzle hole is wetted by the ink, or free from the occurrence of attachment of foreign matters such as paper powers.
In an inkjet recording head for discharging ink droplets, which are in general liquid, as small droplets from a discharge opening and attaching them to a material to be recorded such as paper to achieve recording or form an image, in order to more enhance the recording characteristic, attempts to increase the performance for smaller droplets, higher drive frequency, and the larger number of nozzles are being continued. Accordingly, a surface modification treatment for the purpose of keeping the surface state of the surrounding portion of the ink droplet discharge opening of the nozzle hole always constant becomes important more and more.
As a measure for keeping the surface state of the surrounding portion of the ink droplet discharge opening of the nozzle hole uniform and stable, there have hitherto been proposed the following two methods. That is, the first method is a method in which the nozzle plate surface including the nozzle hole and the surrounding portion of the ink droplet discharge opening of the nozzle hole is subjected to an ink repelling treatment; and the second method is a method in which in the case where an ink or foreign matters such as paper powders are attached to the surrounding portion of the ink droplet discharge opening of the nozzle hole, which has been subjected to an ink repelling treatment, the nozzle plate surface including the nozzle hole and the surrounding portion of the ink droplet discharge opening of the nozzle hole is wiped up (wiping operation) by a cleaning member made of a rubber blade, etc.
As the ink repelling treatment, there are proposed a variety of methods using water repellent materials such as fluorine-containing resins, siloxane resins, and fluorine-containing silane coupling agents. For example, there are disclosed a method of providing a plated film containing fine particles of a fluorine based resin, a method of providing a resin film containing fine particles of a fluorine based resin, a method of providing a film formed of a silicone based material, a method of providing a cured film of a fluorine based resin, and a method of providing a film made of a silane compound having a fluoroalkyl group.
In particular, as water repellent and oil repellent based resin cured films having high water repellency and oil repellency and being advantageous in film durability, there are proposed a cured film of a fluorine based resin and a heat curable epoxy resin (JP-A-11-138821 and JP-A-11-235826); a cured film formed of a fluoroolefin resin containing an active hydrogen atom-containing reactive group and an isocyanate curing agent (Japanese Patent No. 3,382,416); a cured film obtained from a self-crosslinking group-containing fluorine-containing resin and an acrylate based resin (JP-A-9-221620); and a cured film of a block copolymer constituted of a block containing a fluorine or siloxane water repellent and oil repellent component and a crosslinking group-containing non-water repellent and oil repellent block (JP-A-2001-233972).
On the other hand, in recent years, for the purpose of enhancing fixing property to paper, water resistance and the like of an ink, there is a trend to develop and use inks having enhanced wetting property. Thus, according to the conventional ink repelling treatment, in many cases, the ink repelling property is not sufficiently exhibited. This is a problem in achieving high precision and high image quality, and therefore, an improvement of the ink repelling property of the surroundings of the discharge opening is desired.
Also, as the inkjet recording becomes high in speed, not only durability against repeated cleaning by wiping of the conventional inkjet recording head but also more durability against rubbing between paper and an inkjet recording head portion at the time of high-speed traveling of the recorded paper are strongly desired.
However, it is a present state that according to the conventionally proposed technologies, these requirements are not sufficiently satisfied yet.
An object of the invention is to provide an ink-jet recording head in which a high ink repelling property is kept even against the repeated use and which is high in strength and excellent in abrasion resistance and is excellent with respect to printing quality of the resulting image.
Also, another object of the invention is to provide an inkjet recording device with an improved image quality, mounted with an inkjet recording head in which a high ink repelling property is kept even against the repeated use and which is high in strength and excellent in abrasion resistance.
The foregoing objects of the invention have been achieved by the following measures.
The invention is characterized in that the portion capable of repelling the ink (or the ink repelling treated portion) at the periphery of the nozzle hole (or the discharge opening for discharging an ink droplet) of the ink-jet recording head) comprises a cured film containing at least one block copolymer containing at least one of the following 1) and 2), and the cured film is formed from a cured film-forming composition containing the foregoing block copolymer.
It has been found that the cured film formed from a cured film-forming composition as provided on a substrate of an inkjet recording head forms a coating and reveals extremely high water repellency and oil repellency, and even when exposed to a recording ink for a long period of time, it can keep the performance. It may be considered that in the film, the block (A) of the fluorine-containing polymer component is unevenly distributed in a high concentration on the surface of the film, whereby the film itself becomes high in water repellency and oil repellency towards a bulk portion closed to the surface portion of the film.
The cured film formed by coating a cured film-forming composition containing the foregoing block copolymer and then drying and curing it is good in coating property, free from unevenness in high water repellency and high oil repellency with respect to the surface of the cured film, and excellent in durability. It may be considered that from the matters that the block copolymer itself is good in solubility in an organic solvent and exhibits extremely high water repellency and oil repellency, it is possible to form a uniform coating.
Further, in the case where the polymer main chain of the fluorine-containing polymer component is composed of a perfluoro aliphatic hydrocarbon structure, the water repellency and oil repellency are more enhanced. This is considered to largely rely upon the matter that the perfluoroalkenyl structure of the polymer main chain in the coated film is oriented in a high density in the outermost surface as an interface with air, whereby the density of the fluorine atom per unit area increases, resulting in a lowering of the surface free energy.
Also, when the cured film contains inorganic particles having a mean particle size smaller than the thickness of the cured film, the strength of the film is enhanced. Also, it is characterized in that when the inorganic particles have a specific structure, the surface of the ink repelling treated portion of the invention has an ultra-fine irregular shape and has a surface state in which the size of the irregularities, the distribution of the size, and the distribution of the irregularities themselves are preciously controlled. In this way, the ink repelling property is more enhanced while keeping an abrasion resistance.
As the inorganic particles, fine particles having a Moh's hardness of 2 or more are preferable. Further, by containing at least one kind of each of ultra-fine particles having a particle size of from 5 to 100 nm and fine particles having a particle size of from 0.15 to 10 μm, not only the film strength is enhanced, but also the foregoing irregular shape can be controlled. Moreover, for the sake of making the inorganic particles fall within the foregoing range, such can be achieved by forming the inorganic particles so as to not contain coarse particles or coagulations. Specifically, filter filtration of the cured film-forming composition and dustproof on the coated surface are effective.
In addition, it has been found that when the substrate surface on which the cured film-forming composition of the invention is to be provided by coating has a specific irregular shape, the cured film-forming composition can be uniformly coated, the adhesion becomes extremely good, and the film strength of the cured film itself becomes sufficient. This is estimated to rely upon the matter that the cured film formed from the cured film-forming composition containing the block copolymer of the invention having a low cohesive strength as the major component reveals uniform anchoring with the substrate surface.
As described in detail in the present specification, by using the foregoing cured film, it is possible to provide an inkjet recording head capable of keeping a high ink repelling property even against the repeated use and being high in strength and excellent in abrasion resistance.
Also, it is possible to provide an inkjet recording device having an enhanced image quality, which is mounted with an inkjet recording head capable of keeping a high ink repelling property even against the repeated use and being high in strength and excellent in abrasion resistance.
The sole FIGURE is an enlarged cross-sectional view showing the main portion of an inkjet recording head of the invention as prepared in the Examples.
The inkjet recording head of the invention will be described below in detail.
First of all, the block copolymer of the invention will be described below in detail.
(Block Copolymer)
The block copolymer of the invention contains the block (A) and the block (B). The block copolymer may be any of: a block copolymer in which the block (A) and the block (B) are bonded to each other in the branched form; and a block copolymer in which the block (A) and the block (B) are linearly bonded to each other.
As the block copolymer in which the block (A) and the block (B) are bonded to each other in the branched form, a block copolymer in which the block (A) and the block (B) are bonded to each other in the grafted form (graft type block copolymer) is preferable. Examples of the graft type block copolymer include an A type in which the block (A) constitutes the main chain of the polymer and a B type in which the block (B) constitutes the main chain of the polymer as schematically shown below.
Examples of the block copolymer in which the block (A) and the block (B) are linearly bonded to each other (linear block copolymer) include a block copolymer comprising the block A and the block B (an AB type) and a block copolymer comprising the block A, the block B and the block A in this order (an ABA type) as schematically shown below.
The block copolymer of the invention preferably has a weight average molecular weight of from 5×103 to 5×105, more preferably from 1×104 to 1×105, and further preferably from 2×104 to 1×105.
It is preferable that each of the block (A) and the block (B) in the block copolymer has a weight average molecular weight of at least 1×103. When the weight average molecular weight falls within this range, the solubility in the cured film-forming composition is good, and the strength of the resulting cured film is kept sufficiently.
Also, a weight ratio of the block (A) to the block (B) in the block copolymer is preferably from 1/99 to 99/1, more preferably from 5/95 to 90/10, and especially preferably from 10/90 to 80/20 in terms of (block (A))/(block (B)).
When the weight ratio of the block (A) to the block (B) in the block copolymer falls within this range, good performances such as strength of the cured film and ink repelling property of the cured film surface are revealed.
(Block (A))
The block (A) comprises a polymer segment containing a fluorine atom-containing polymer component, and the content of fluorine of the fluorine-containing polymer component is preferably 30% (by number) or more, and more preferably 35% or more in the whole of the elements in the component.
(Fluorine-Containing Polymer Component)
Specifically, examples include vinyl polymer components in which a perfluoro hydrocarbon group having 4 or more carbon atoms is substituted on a side chain represented by formula (F0), perfluorovinyl ether components (for example, —(CF2—CF2O)— and —(CF(CF3)—CF2)—), and polymer components in which a methylene group constituting the polymer main chain is constituted of a perfluoromethylene group.
In formula, X represents —COO(CH2)2— or —O—; Rf2 represents a perfluoro aliphatic group having from 4 to 12 carbon atoms; and a1 and a2 may be the same or different and each represents a hydrogen atom, a fluorine atom, —CnH2+1 (wherein n represents an integer of from 1 to 4), or —CF3.
Preferred embodiments of the fluorine-containing polymer component include polymer components represented by formulae (FI), (FII) and (FIII).
In formula, R0 represents a fluorine atom, a perfluoroalkyl group having from 1 to 8 carbon atoms, or an —ORf1 group.
In the case where R0 is a perfluoroalkyl group, a perfluoromethyl group, a perfluoroethyl group, a per-fluoropropyl group, and a perfluorobutyl group are more preferable from the viewpoint of polymerization reactivity of a corresponding monomer.
Rf1 group represents a fluorine-containing aliphatic group having from 1 to 30 carbon atoms, preferably a fluorine-containing aliphatic group having from 1 to 22 carbon atoms, and more preferably a fluorine-containing aliphatic group having from 1 to 12 carbon atoms. Specifically, it may be, for example, a perfluoroalkyl group having from 1 to 8 carbon atoms (for example, —CH2F, —CHF2, —CH2CF3, —(CH2)2C2F5, —CH2CF2CF2CFH2, —CH2 (CF2)4H, —CH2 (CF2)8CF3, and —CH2CH2 (CF2)4H); may have a branched structure (for example, CH(CF3)2, CH2CF(CF3)2, CH(CH3)CF2CF3, and CH(CH3) (CF2)5CF2H); may have an alicyclic structure (preferably a 5-membered ring or a 6-membered ring, for example, a perfluorocyclohexyl group, a perfluorocyclopentyl group, and an alkyl group substituted with such a group); or may be a fluorine-containing aliphatic ether bonding group (for example, —CH2OCH2CF2CF3, —CH2CH2OCH2C4F8H, —CH2CH2OCH2CH2C8F17, —CH2CH2OCF2CF2OCF2CF2H, —CF2CH2OCH2CF3, and —(CF2)2(CH2)2OCH(CF3)3).
In formula, R1 and R2 may be the same or different and each represents a fluorine atom or a —CvF2v+1 group; v represents an integer of from 1 to 4; a represents 0 or 1; b represents an integer of from 2 to 5; and c represents 0 or 1. In the case where a and/or c is 0, each represents a single bond.
In formula, R3 and R4 each represents a fluorine atom or a —CF3 group; a represents the same as in formula (FII); d represents 0 or 1; k represents 0 or an integer of from 1 to 5; 1 represents 0 or an integer of from 1 to 4; and m represents 0 or 1. In the case where d, k, l, and/or m is 0, each represents a single bond. Here, (k+l+m) represents an integer in the range of from 1 to 6.
Specific examples of the fluorine-containing components represented by formulae (FII) and (FIII) will be given below.
(Block (B))
The block (B) comprises a polymer segment containing a group having a siloxane structure in a repeating unit (component K).
The group having a siloxane structure is not particularly limited, and specifically, those having at least one of structures represented by formulae (SI-1) and (SI-2).
In formula (SI-1), the parenthesis represents a repeating unit.
In formulae, R11 to R15 may be the same or different and each represents an aliphatic group or an aromatic group.
R11 and R12 may be the same or different and each preferably represents an optionally substituted aliphatic group having from 1 to 12 carbon atoms or an optionally substituted aryl group having from 6 to 14 carbon atoms.
Examples of the aliphatic group include a linear or branched alkyl group having from 1 to 12 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, an octyl group, a decyl group, and a dodecyl group), a linear or branched alkenyl group having from 2 to 12 carbon atoms (for example, a vinyl group, a propenyl group, a butenyl group, a pentenyl group, a hexenyl group, an octenyl group, a decenyl group, and a dodecenyl group), a linear or branched alkynyl group having from 3 to 12 carbon atoms (for example, a propynyl group, a butynyl group, a cyclohexynyl group, and an octynyl group), an aralkyl group having from 7 to 12 carbon atoms (for example, a benzyl group, a phenethyl group, a 3-phenylpropyl group, a naphthylmethyl group, and a 2-naphthylethyl group), and an alicyclic group having from 5 to 12 carbon atoms (for example, a cyclopentyl group, a cyclohexyl group, a cyclooctyl group, a tricyclodecyl group, a bicyclooctyl group, and a tricyclododecyl group).
Examples of the aryl group include a phenyl group, a naphthyl group, and an anthranyl group. These aliphatic groups and aryl groups may have a substituent, and any residual groups constituted of a monovalent non-metal atom excluding a hydrogen atom can be employed without limitations. As the substituent, a fluorine atom and an alkoxy group (for example, a methoxy group, an ethoxy group, and a propoxy group) are preferable.
As R11 and R12, a methyl group, an ethyl group, a cyclohexyl group, a trifluoromethyl group, a 2,2,2-trifluoroethyl group, a benzyl group, and a phenyl group are especially preferable.
R13, R14, and R15 may be the same or different and each represents a monovalent organic group; preferably an alkyl group having from 1 to 10 carbon atoms (for example, a methyl group, an ethyl group, and an octyl group), an alkoxy group having from 1 to 10 carbon atoms (for example, a methoxy group, an ethoxy group, and a propyloxy group), or an aryl group having from 6 to 20 carbon atoms (for example, a phenyl group and a naphthyl group); and especially preferably an alkyl group having from 1 to 5 carbon atoms. These groups may further have a substituent.
The component K in the block (B) is preferably contained in a proportion of 50% by weight or more, and more preferably from 60 to 100% by weight based on the whole of the components of the block (B).
(Component H)
The graft type block copolymer of the invention may contain a polymer component containing at least one reactive group capable of contributing to crosslinking reaction (component H) in at least one of the block (A) and the block (B). The component H is a repeating unit containing a reactive group capable of contributing to crosslinking reaction in a substituent and corresponding to a monofunctional monomer copolymerizable with the polymer block (A) or block (B). Specifically, for example, structures represented by formula (HI) are enumerated.
In formula (HI), a11, a12, a13, X1, and L1 are synonymous with those in formula (I) as will hereinafter described. In formula (HI), as a preferred embodiment of a structure represented by formula (HI)′, there are enumerated those as in the specific embodiments of formula (I) as will hereinafter described.
Y represents at least one reactive group capable of contributing to the crosslinking reaction.
Examples of the reactive group (Y) capable of contributing to the crosslinking reaction include an active hydrogen atom-containing group (for example, a hydroxyl group, a carboxyl group, an amino group, a carbamoyl group, a mercapto group, a β-keto ester group, a hydrosilyl group, and a silanol group), a cationic polymerizable group (for example, an epoxy group, an oxetanyl group, an oxazolyl group, and a vinyloxy group), an acid anhydride, a radical polymerizable unsaturated double bond-containing group (for example, an acryloyl group and a methacryloyl group), a hydrolyzable silyl group (for example, an alkoxysilyl group and an acyloxysilyl group), a group capable of being substituted with a nucleating agent (for example, an active halogen atom and a sulfonic ester), and an isocyanate group (a protected block isocyanate group capable of generating an isocyanate group upon heating may be employed).
These reactive groups may be introduced at the monomer stage or by polymeric reaction. The polymeric reaction can be carried out by adequately choosing a combination of the conventionally known functional groups capable of reacting with each other. For example, a method described in Reactive Polymers, complied by Yoshio Iwakura and Kei Kurita and published by Kodansha Ltd. (1977) is enumerated.
Of the foregoing crosslinking reactive groups, a hydroxyl group, an epoxy group, a vinyloxy group, a (meth)acryloyl group, and a hydrolyzable silyl group are preferable.
The content of the component H is preferably in the range of from 1 to 30% by weight, more preferably from 5 to 25% by weight, and especially preferably from 5 to 20% by weight in the whole of the polymer components. This range is preferable because the strength of the cured film becomes sufficient, and the antifouling property of the surface after the film formation becomes high.
Specific examples of the polymeric unit will be given below, but it should not be construed that the invention is limited thereto.
(Other Copolymerization Component to be Contained in the Block (A))
Besides the repeating unit (polymerization component) represented by the foregoing formula (F0), the block (A) of the block copolymer according to the invention may contain, as a copolymerization component, other polymerizable monomer copolymerizable with a monomer corresponding to such a polymerization component.
For example, a repeating unit represented by formula (A-1) is enumerated.
In formula (A-1), b1, b2, and b3 may be the same or different and each represents a hydrogen atom, a fluorine atom, or an alkyl group (for example, a methyl group, an ethyl group, a propyl group, and a butyl group).
Preferred examples of b1, b2, and b3 include CF2═CF—, CF2═CH—, CFH═CF—, CH2═CF—, CH2═CH—, CH(CH3)═CH—, and CH2═C(CH3)—.
U1 represents —(CH2)dCOO—, (CH2)dOCO—, —O—, —SO2—, —CONHCOO—, —CONHCONH—, —CON(k1)-, —SO2N(k1)-, a phenylene group, or a single bond of bonding [—C(b3)-] directly to —R (wherein k1 represents a hydrogen atom or an aliphatic group having from 1 to 12 carbon atoms; and d represents 0 or an integer of from 1 to 4).
k1 preferably represents a hydrogen atom or an optionally substituted aliphatic group having from 1 to 8 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a 2-chloroethyl group, a 2-bromoethyl group, a 2-cyanoethyl group, a 2-hydroxyethyl group, a benzyl group, a chlorobenzyl group, a methylbenzyl group, a methoxybenzyl group, a phenethyl group, a 3-phenylpropyl group, a dimethylbenzyl group, a fluorobenzyl group, a 2-methoxyethyl group, and a 3-methoxypropyl group).
U1 preferably represents —O—, a phenylene group, or a direct bond.
R represents an optionally substituted linear or branched aliphatic group having from 1 to 22 carbon atoms or an optionally substituted aromatic group having from 6 to 12 carbon atoms.
Preferred examples of R include an optionally substituted linear or branched alkyl group having from 1 to 18 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, a dodecyl group, a tridecyl group, a tetradecyl group, a hexadecyl group, an octadecyl group, a 2-fluoroethyl group, a trifluoromethyl group, a 2-chloroethyl group, a 2-bromoethyl group, a 2-cyanoethyl group, a 2-methoxycarbonylethyl group, a 2-methoxyethyl group, a 3-bromopropyl group, a 2-methyl-carbonylethyl group, a 2,3-dimethoxypropyl group, and a fluorinated alkyl group {for example, a —(CH2)hCiF2i+1 group (wherein h represents an integer of from 1 to 6; and i represents an integer of from 1 to 12), a —(CH2)h—(CF2)j—R36 group (wherein j represents 0 or an integer of from 1 to 12; and the R36 group represents an alkyl group having from 1 to 12 carbon atoms, —CF2H, or —CFH2), —CH(CF3)2, —CF2Cl, —CFCl2, —CFClH, —CF(CF3) OCiF2i+1, —OCiF2i+1, and —C(CF3)2OCiF2i+1}), an optionally substituted alkenyl group having from 4 to 18 carbon atoms (for example, a 2-methyl-1-propenyl group, a 2-butenyl group, a 2-pentenyl group, a 3-methyl-2-pentenyl group, a 1-pentenyl group, a 1-hexenyl group, a 2-hexenyl group, a 4-methyl-2-hexenyl group, a decenyl group, a dodecenyl group, a tridecenyl group, a hexadecenyl group, an octadecenyl group, and a linolenyl group), an optionally substituted aralkyl group having from 7 to 12 carbon atoms (for example, a benzyl group, a phenethyl group, a 3-phenylpropyl group, a naphthylmethyl group, a 2-naphthylethyl group, a chlorobenzyl group, a fluorobenzyl group, a perfluorobenzyl group, a methylbenzyl group, an ethylbenzyl group, a methoxy-benzyl group, a dimethylbenzyl group, and a dimethoxybenzyl group), an optionally substituted alicyclic group having from 5 to 8 carbon atoms (for example, a cyclopentyl group, a cyclohexyl group, a 0.2-cyclohexylethyl group, a 2-cyclo-pentylethyl group, a perfluorohexyl group, a tetrafluorohexyl group, a methylcyclohexyl group, and a methoxycyclohexyl group), and an optionally substituted aromatic group having from 6 to 12 carbon atoms (for example, a phenyl group, a naphthyl group, a tolyl group, a xylyl group, a propylphenyl group, a butylphenyl group, an octylphenyl group, a methoxy-phenyl group, a fluorophenyl group, a chlorophenyl group, a difluorophenyl group, a perfluorophenyl group, a cyanophenyl group, an acetylphenyl group, a methoxycarbonylphenyl group, and an acetamidophenyl group).
In the case where R represents an aliphatic group, specific examples of other substituent that may be substituted on the aliphatic group include an —OR′ group, an —OCOR′ group, and a —COOR′ group, wherein R′ represents a fluorine atom-containing aliphatic group having from 1 to 12 carbon atoms. Specifically, those as in the fluorine-containing aliphatic group represented by Rf1 in the foregoing formula (FI) are enumerated.
With respect to the “Other copolymerization component to be contained in the block (A)”, its kind and compounding proportion are determined within the range where the effect of the block copolymer of the invention is neither increased nor lowered.
Such a copolymerization component can be adequately chosen from various viewpoints of hardness, adhesion to a substrate, solubility in a solvent, transparency, and others.
(Graft Type Block Copolymer)
In the block copolymer of the invention, the graft type copolymer will be described.
(Graft Type Block Copolymer A Type)
First of all, the graft type block copolymer A type in which the polymer main chain contains a fluorine-containing polymer component will be described. That is, the graft type block copolymer A type comprises the block (A) as the polymer main chain segment and the block (B) as the graft segment.
In the graft type block copolymer A type, as the fluorine-containing polymer to be contained in the block (A), those the same as enumerated in the foregoing “Fluorine-containing polymer component” item are enumerated. Specific examples thereof are also the same.
In the graft type block copolymer A type, the repeating unit (component K) to be contained in the block (B) will be described. As the component K, specific examples include structures represented by formulae (SIIa) and (SIIb).
Here, the structural portions (represented by formula (I)) in formulae (SIIa) and (SIIb) express the same contents.
In formula (I), X1 represents —O—, —OCO—, —COO—, —CONH—, or any one of the following groups. Here, q represents an integer of from 1 to 12. These groups may further have a substituent.
L1 represents a divalent connecting group of connecting —X1— to a siloxane structure-containing repeating unit or a direct bond. Specifically, L1 is constituted of an arbitrary combination of the atomic groups such as groups having the following structures, divalent alicyclic groups (examples of the hydrocarbon ring of the alicyclic structure include a cycloheptane ring, a cyclohexane ring, a cyclooctane group, a bicyclopentane ring, a tricyclohexane ring, a bicyclooctane ring, a bicyclononane ring, and a tricyclodecane ring), and divalent aryl ring groups (examples of the aryl ring include a benzene ring and a naphthalene ring).
In formulae, r1 and r2 may be the same or different and each represents a hydrogen atom, a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom), or an optionally substituted alkyl group having from 1 to 6 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a trifluoromethyl group, a methoxyethyl group, a cyanoethyl group, and a chloroethyl group); r3 represents a hydrogen atom or an optionally substituted hydrocarbon group having from 1 to 12 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, a cyclohexyl group, a cyclohexylmethyl group, a benzyl group, a phenethyl group, a phenyl group, a chlorophenyl group, a methoxyphenyl group, an acetylphenyl group, and a trifluorophenyl group); and r4 and r5 may be the same or different and each represents an optionally substituted hydrocarbon group having from 1 to 12 carbon atoms (specifically, the same as in r3).
In formula (I), the bonding group represented by —X1-L1- preferably has the total sum of atoms excluding the hydrogen atom of from 1 to 20, and more preferably from 4 to 8. In this range, not only the curing reaction rapidly proceeds, but also the strength of the formed film is kept sufficiently.
a11, a12 and a13 may be the same or different and each represents a hydrogen atom, a fluorine atom, or an optionally substituted alkyl group having from 1 to 6 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a methoxycarbonylmethyl group, an ethoxy-carbonylmethyl group, and a propoxycarbonylmethyl group).
In formula (I), examples of the structural formula (represented by formula (II)) excluding —X1-L1- include the following groups.
Preferred examples represented by formula (II) are as follows.
The cyclohexane structure represented by the foregoing formula (SIIa), i.e., a structure represented by formula (SIIa)′, will be described.
In formula, R11 to R15 are respectively synonymous with R11 to R15 in formulae (SI-1) and (SI-2).
p represents an integer of from 10 to 500, preferably from 50 to 300, and especially preferably from 100 to 250. In —Si (R11) (R12)—O— in the number of p, ones having different R11 and/or R12 may be mixed.
Specific examples of (—X1-L1-(SIIa)′) in formula (SIIa) will be given below, but it should not be construed that the invention is limited thereto.
The structure represented by formula (SIIb) will be described. This structure is characterized in that the terminal of the main chain of an ethylenic polymer segment (represented by formula (SIIb)′) containing a siloxane structure represented by formula (SIIb)″ as a subsituent of the side chain is bonded to formula (I). This ethylenic polymer segment preferably has a weight average molecular weight of from 1×103 to 2×104, and more preferably from 3×103 to 1.5×104.
In formulae (SIIb) and (SIIb)′, a21 and a22 each represents a hydrogen atom, a halogen atom (for example, a chlorine atom and a bromine atom), a cyano group, an alkyl group having from 1 to 4 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, and a butyl group), or a —CH2COOR30 group (wherein R30 represents an alkyl group having from 1 to 4 carbon atoms), and more preferably a hydrogen atom or a methyl group.
X2 represents —COO—, —OCO—, —CONH—, —O—, —(CH2)1—COO— (wherein l represents an integer of 1 or 2), or the following group.
In formula, L2 is synonymous with L1 in formula (SIIa)
R11, R12, R13., R14, and R15 are synonymous with those in formula (SIIa).
R21 and R22 may be the same or different and are each synonymous with R11 to R15 or —OSi(R13) (R14) (R15)
s represents 0 or an integer of from 1 to 8; and t represents 0 or 1.
Specific examples of formula (SIIb)′ will be given below, but it should not be construed that the invention is limited thereto.
(Synthesis of Graft Type Block Copolymer A Type)
The graft type block copolymer A type of the invention can be easily synthesized by the conventionally known reactions.
In formula (FII), in the case of c=0, a copolymer containing a perfluorocycloalkane structure can be obtained by radical polymerization reaction of a corresponding perfluorocycloalkene compound with other copolymerizable monomer.
Specifically, for example, polymerization conditions described in JP-A-2001-272504 and so on are employable.
Also, on the other hand, in formula (FII), in the case of c=1, a copolymer containing the fluorine-containing polymer component represented by formula (FIII) is synthesized by radical cyclization polymerization reaction of a non-conjugated perfluorodiene compound corresponding to the polymer component.
In this case, the copolymer is obtained by introducing a copolymerizable monomer by radical polymerization reaction and performing polymerization reaction.
Specifically, there are enumerated methods described in Zhen-Yu Yaug, et al., J. Am. Chem. Soc., 116 (No.9), pp.4135-4136 (1994), JP-A-1-131215, JP-A-2001-206864, and JP-A-2001-302725.
As a method of introducing a siloxane component constituting the graft segment into the graft type block copolymer A type of the invention, the following two methods are enumerated.
(1) There is enumerated a method in which a fluorine-containing copolymer (FP) obtained by synthesis from a fluorine-containing polymerizable compound and a monomer containing a reactive group (for example, a carboxyl group, a cyclic acid anhydride group, a hydroxyl group, a mercapto group, an amino group, an isocyanate group, an epoxy group, a formyl group, and a halogen atom (for example, chlorine, bromine, and iodine)) by at least radical copolymerization reaction is subjected to polymeric reaction with a reactive siloxane oligomer (SO) having a counter reactive group capable of reacting with the foregoing reactive group, bonded in one terminal of the main chain of the oligomer containing a siloxane structure (this method being hereinafter sometimes-abbreviated as “polymeric reaction method”).
Here, the case where the polymeric reaction is carried out using x part by weight of the reactive siloxane oligomer (SO) based on 100 parts by weight of the fluorine-containing copolymer (FP) will be described as an example.
As the copolymer (FP) to be used herein, the amount of the segment constituting the block (A) in synthesizing the graft type block copolymer A type of the invention is defined as “a′ % by weight”, and the amount of the component H is defined as “h′ % by weight”.
A in the block copolymer (BPF)={a′/(100+x)}×100(% by weight)
B in the block copolymer (BPF)={x/(100+x)}×100 (% by weight)
H in the block copolymer (BPF)=100−(a+b+{h′/(100+x)}×100) (% by weight)
As described previously, the graft type block copolymer A type of the invention is arbitrarily produced by a combination in which the reactive group of the reactive siloxane oligomer (SO) and the reactive group in the fluorine-containing copolymer (FP) are chemically bonded to each other. For example, in the case of an active hydrogen atom-containing reactive group (for example, a hydroxyl group, an amino group, a mercapto group, and a carboxyl group), a combination with an isocyanate group, an epoxy group, or a cyclic acid anhydride group is enumerated; in the case of a 3-membered ring group such as an epoxy group (for example, a group described below), a combination with the foregoing active hydrogen atom-containing reactive group or cyclic acid anhydride group is enumerated; and in the case of a carboxyl group, a combination of a hydroxyl group, an amino group, a 3-membered ring group such as an epoxy group, or an isocyanate group is enumerated. An addition reaction system such as a combination of an active hydrogen atom-containing reactive group with an isocyanate group, an epoxy group, or a cyclic acid anhydride group, or the like is preferably enumerated.
For the sake of accelerating the reaction, it is preferred to use a catalyst jointly. The catalyst to be used is adequately chosen depending upon the reaction pattern of polymeric reaction based on the conventionally known organic chemical reactions.
Though the resulting polymer may be provided for the cured film-forming composition of the invention as it is, it is preferred to re-precipitate it in a poor solvent of the polymer.
The solvent for re-precipitation is not particularly limited, and examples thereof include methanol, ethanol, isopropanol, acetonitrile, hexane, petroleum ether, and ligroin in view of easiness of drying and removal of the solvent.
(2) There is enumerated another method in which at least a fluorine-containing polymerizable compound, a monofunctional siloxane macromonomer containing a siloxane structure having a polymerizable double bond copolymerizable with the fluorine-containing polymerizable compound in one terminal of the polymer main chain, and a crosslinking reactive group-containing monomer (corresponding to the foregoing component H) are used and polymerized in the presence of a radical polymerization initiator (for example, peroxides and azobis based compounds).
The amount of the polymerization initiator to be used herein is from 0.5 to 15 parts by weight, and preferably from 1 to 10 parts by weight based on 100 parts by weight of the total sum of the whole monomers and the whole macromonomers.
Here, the foregoing siloxane macromonomer can be produced according to the conventionally known synthesis methods of macromonomers.
For example, the following methods are enumerated.
(i) A method according to the ionic polymerization method by reacting a terminal of a living polymer obtained by anionic polymerization with a variety of reagents to form a macromonomer.
(ii) A method according to the radical polymerization method by reacting a terminal reactive group-bonded oligomer obtained by using a polymerization initiator containing a reactive group (for example, a carboxyl group, a hydroxyl group, and an amino group) in the molecule thereof and/or a chain transfer agent with a variety of reagents to form a macromonomer.
Specifically, the synthesis can be carried out according to methods described in general remarks and citations of, for example, P. Dreyfuss & R. P. Quirk, Encycl. Polym. Sci. Eng., 7, 551 (1987), P. F. Rempp & E. Franta, Adv. Polym. Sci., 58, 1 (1984), V. Percec, Appl. Polym. Sci., 285, 95 (1984), R. Asami & M. Takari, Makvamol. Chem. Suppln. 12, 163 (1985), P. Rempp., et al., Makvamol. Chem. Suppln. 8, 3 (1984), and Tatsuya Yamashita, Chemistry and Industry of Macromonomers, (published by IBC, 1989).
Formula of the polymerizable group capable of connecting to the main chain of the cyclohexane macromonomer and specific examples thereof will be given below. However, it should not be construed that the invention is limited thereof.
Formula of Polymerizable Group
In the foregoing “Formula of polymerizable group”, a11, a12, a13, X1, and L1 are synonymous with those in formula (I).
The polymer chain of the graft segment of the graft type block copolymer A type of the invention preferably has a weight 5 average molecular weight of from 1×103 to 2×104, and more preferably from 3×103 to 1.5×104. When the weight average molecular weight falls within the foregoing range, peculiar effects of the invention are revealed as the graft type block copolymer which is different from the usual random copolymers, and the foregoing polymeric reaction of the oligomer (SO) or copolymerization reaction of the macromonomer sufficiently proceeds.
As the graft type block copolymer A type of the invention, those in which the foregoing component H is bonded to the terminal of the main chain of the block copolymer and/or the side chain of the copolymer are preferably enumerated.
Specific examples of the method of introducing the component H into the graft type block copolymer A type of the invention include (i) a method of polymerizing a mixture of chain transfer agents containing a specific polar group (for example, a hydroxyl group, a carboxy group, an amino group, a halogen atom, an epoxy group, and an acid halide group) by a polymerization initiator (for example, azobis based compounds and peroxides); (ii) a method in which a compound containing the foregoing polar group is used in all of the chain transfer agent and the polymerization initiator; and (iii) a method in which in the foregoing two methods, after polymerization reaction using the chain transfer agent or polymerization initiator, these functional groups are further reacted by polymeric reaction to introduce a crosslinking reactive group. In particular, in the case where the crosslinking reactive group is a radical polymerizable double bonding group, it is preferred to introduce the crosslinking reactive group into the polymer by these methods. Specifically, the production can be carried out according to methods described in general remarks and citations of, for example, P. Dreyfuss & R. P. Quirk, Encycl. Polym. Sci. Eng., 7, 551 (1987), Yoshiki Nakajo and Tatsuya Yamashita, Dyes and Chemicals, 30, 232 (1985), Akira Ueda and Susumu Nagai, Kagaku To Kogyo, 60, 57 (1986).
The block (A) of the graft type block copolymer A type may further contain the copolymerization component described in the “Other copolymerization component to be contained in the block (A)”.
In general, the amount of the copolymerization component is in the range of not more than 50% by weight, and not more than 30% by weight based on the block (A).
Also, the block (B) may further contain other copolymerization component. Specifically, those the same as described in the “Other copolymerization component to be contained in the block (A)” are similarly enumerated.
In general, the amount of the copolymerization component to be introduced into the block (B) is preferably in the range of not more than 30% by weight, more preferably not more than 20% by weight, and especially preferably from 5 to 10% by weight.
(Graft Type Block Copolymer B Type)
The graft type block copolymer B type comprises the block (B) as the polymer main chain segment and the block (A) as the graft segment.
As a specific embodiment of the copolymer component containing a fluorine-containing polymer component to be contained in the block (A) of the graft block copolymer B type, that is, to constitute the graft segment, polymer components represented by formula (B-F) are enumerated.
In formula (B-F), the respective symbols are synonymous with those in the foregoing formula (I). The term “Fluorine-containing polymer component” is the same as the foregoing fluorine-containing polymer component of the block (A).
In the graft type block copolymer B type, as the repeating unit to be contained in the block (B), a structure represented by formula (SII) is enumerated.
In formula (SII), a21, a22, R11 to R15, R21, R22, s, and t are synonymous with those in the foregoing formulae (SIIb) and (SIIb)′.
X3 and L3 are synonymous with X2 and L2 in formulae (SIIb) and (SIIb)′, respectively, or —(X3-L3)- represents a direct bond.
As specific examples, those enumerated as specific examples in the foregoing formulae (SIIb) and (SIIb)′ are enumerated.
The graft segment copolymerization component represented by formula (B-F) can be introduced into the copolymer by the polymeric reaction method the same as described in the foregoing “Graft type block copolymer A type” or the macromonomer copolymerization reaction.
The reactive group or the radical polymerizable double bonding group to be provided for the introduction can be introduced into one terminal of the main chain of the fluorine-containing alicyclic structure-containing polymer in the same method as in the foregoing method of introducing the component H into the graft type block copolymer A type.
As the copolymerization component constituting the graft segment of the invention, the copolymer component described in the foregoing “Other copolymerization component to be contained in the block (A)” may be contained. Above all, fluorine-containing monomers are preferable.
The content of the copolymerization component is preferably not more than 35% by weight, and more preferably not more than 20% by weight in the whole of the polymerization components constituting the graft segment. The graft segment copolymerization component represented by formula (B-F) into the graft type block copolymer B type can be introduced by the polymeric reaction method or the macromonomer copolymerization reaction method the same as described in the foregoing graft type block copolymer A type.
The reactive group or the radical polymerizable double bonding group to be provided for the introduction can be introduced into one terminal of the main chain of the fluorine-containing polymer component-containing polymer in the same method as in the foregoing method as in the silicon component-containing polymer.
It is preferable that the graft type block copolymer B type of the invention contains the component H in at least one of the block (A) and the block (B). The content falls within the same range as in the graft type block copolymer A type.
(Linear Block Copolymer)
Next, embodiments of an AB type and an ABA type, each of which is the linear block copolymer of the invention, will be described.
With respect to the block (A), as the fluorine-containing polymer component to be contained in the block (A), those enumerated in the foregoing “Fluorine-containing polymer component” are enumerated. Specific examples thereof are also the same.
As the component K to be contained in the block (B), a siloxane structure represented by formula (SIII) is preferably enumerated.
In formula, the respective symbols are synonymous with those in the foregoing formula (SII).
Copolymerization components the same as in the foregoing “Other copolymerization component to be contained in the block (A)” may be contained in the respective blocks. The content falls within the same range as in the graft type block copolymer A type.
Further, it is preferable that the linear block copolymer of the invention contains the component H in the block (A) and/or the block (B). The content falls within the same range as in the graft type block copolymer A type.
The linear block copolymer of the invention can be produced by the conventionally known living polymerization reaction method. The linear block copolymer AB type and ABA type can be synthesized by the conventionally known, so-called living polymerization reaction such as ionic polymerization reaction (using, for example, an organometallic compound (for example, alkyl lithiums, lithium diisopropylamide, and alkyl magnesium halides) or hydrogen iodide/iodine based compound), photopolymerization reaction using a porphyrin metal complex as a catalyst, and group transfer polymerization reaction.
These linear block copolymers can be easily synthesized according to synthesis methods described in, for example, P. Lutz, P. Masson, et al., Polym. Bull., 12, 79 (1984), B. C. Anderson, G. D. Andrews, et al., Macromolecules, 14, 1601 (1981), K. Hatada, K. Ute, et al., Polym. J., 17, 977 (1985), ibid., 18, 1037 (1986), Koichi Ute and Koichi Hatada, Polymer Processing, 36, 366 (1987), Toshinobu Higashimura and Mitsuo Sawamoto, Japanese Journal of Polymer Science and Technology, 46, 189 (1989), M. Kuroki and T. Aida, J. Am, Chem. Soc., 109, 4737 (1987), Takuzo Aida and Shohei Inoue, Journal of Synthetic Organic Chemistry, Japan, 43, 300 (1985), and D. Y. Sogah, W. R. Hertler, et al., Macromolecules, 20, 1473 (1987).
Further, the linear block copolymers can be synthesized by polymerization reaction in the presence of a dithio-carbamate group-containing compound and/or a xanthate group-containing compound as an initiator upon light irradiation. They can be synthesized by synthesis methods described in, for example, Takayuki Ohtsu, Polymer, 37, 248 (1988), Shunichi Himori and Ryuichi Ohtsu, Polym. Rep. Jap., 37, 3508 (1988), JP-A-64-111, JP-A-64-26619, Nobuyuki Higashi, et al., Polymer Preprints, Japan, 36, (6), 1511 (1987), and M. Niwa, N. Higashi, et al., J. Macromol. Sci. Chem., A24(5), 567 (1987).
(Curing Agent and Curing Accelerator)
It is preferable that the cured film-forming composition of the invention contains at least one of a curing agent and a curing accelerator. They can be adequately chosen and used among the conventionally known materials depending upon the curing reaction in the crosslinking reactive site in the foregoing block copolymer of the invention.
For example, compounds described in Crosslinking Agents Handbook, compiled by Shinzo Yamashita and Tosuke Kaneko and published by Taseisha (1981) and Polymer Data Handbook: Basic Compilation, compiled by The Society of Polymer Science, Japan and published by Baifukan Co., Ltd. (1986) can be used.
Examples include organic silane based compounds, polyisocyanate based compounds, polyol based compounds, polyamine based compounds, acid anhydride compounds, polyepoxy group-containing compounds and epoxy resins (for example, compounds described in New Epoxy Resins, compiled and written by Hiromu Horiuchi and published by Shokodo Co., Ltd. (1985) and Epoxy Resins, compiled and written by Kuniyuki Hashimoto and published by The Nikkan Kogyo Shimbun, Ltd. (1969)), melamine resins (for example, compounds described in Urea and Melamine Resins, compiled and written by Ichiro Miwa and Hideo Matsunaga and published by The Nikkan Kogyo Shimbun, Ltd. (1969)), and poly(meth)acrylate based compounds (for example, compounds described in Oligomers, compiled by Shin Ogawara, Takeo Saegusa and Toshinobu Higashimura and published by Kodansha Ltd. (1976) and Functional Acrylic Resins, written by Eizo Ohmori and published by Techno Systems (1985)).
For example, in the case where the component H contains a hydrolyzable silyl group as the curing reactive site, acid or base catalysts, or metal chelate compounds known as a catalyst in sol-gel reaction can be used as the curing accelerator.
Examples of the acid include Bronsted acids such as inorganic acids (for example, hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid) and organic acids (for example, acetic acid, formic acid, methanesulfonic acid, trifluoromethylsulfonic acid, and p-toluenesulfonic acid); and Lewis acids (for example, dibutyltin dilaurate, dibutyl-tin diacetate, dibutyltin dioctate, triisopropoxy aluminum, tetrabutoxy zirconium, and tetrabutoxy titanate).
Examples of the base include inorganic or organic compounds such as ammonia, triethylamine, pyridine, and tetramethylethylenediamine.
Examples of the metal chelate compound include chelate compounds of an active methylene compound (for example, diketones and β-keto esters) with a metal atom (for example, Al, Ti, and Zr). For example, compounds described in paragraph Nos. (0044) to (0046) of JP-A-11-106704 are enumerated.
Of these, tri-n-butoxyethyl acetoacetate zirconium, diisopropoxy bis(acetylacetonato)titanium, diisopropoxy-ethyl acetoacetate aluminum, and tris(ethylacetoacetate)-aluminum are preferable.
The amount of the curing accelerator to be used varies depending upon the kind of the compound and a difference of the curing reactive site. However, in general, it is preferably from about 0.1 to 15% by weight, and more preferably from 0.5 to 5% by weight based on the whole of the solids of the cured film-forming composition.
Also, from the viewpoint of the storage stability of the cured film-forming composition, a compound capable of generating a curing accelerator such as acids and bases by the action of light may be used. In the case where such a compound is used, curing of the coating becomes possible upon irradiation of active energy rays.
As the compound capable of generating an acid by the action of light, various examples are described in, for example, Imaging Organic Materials, compiled by The Japanese Research Association for Organic Electronics Materials (Bun-Shin Shuppan), pp.187-198 and JP-A-10-282644, and these known compounds can be used. Specific examples include various onium salts (for example, diazonium salts, ammonium salts, phosphonium salts, iodonium salts, sulfonium salts, selenonium salts, and arsonium salts) containing RSO3− (wherein R represents an alkyl group or an aryl group), AsF6—, SbF6−, PF6−, BF4−, etc. as a counter ion; organic halides such as trihalomethyl group-substituted oxadiazole derivatives or s-triazine derivatives; o-nitrobenzyl esters, benzoin esters, and imino esters of organic acids; and disulfone compounds. Of these, onium salts are preferable, and sulfonium salts and iodonium salts are especially preferable. As the compound capable of generating a base by the action of light, known compounds can be used. Specific examples include nitrobenzyl carbamates and dinitrobenzyl carbamates.
In the invention, it is especially preferred to use the foregoing compound capable of generating an acid by the action of light. A sensitizing dye can be preferably used together with the compound capable of generating an acid or a base. The addition amount of the compound capable of accelerating the curing reaction by the action of light according to the invention is preferably from 0.1 to 15% by weight, and more preferably from 0.5 to 5% by weight based on the whole of the solids of the cured film-forming composition.
Further, a dehydrating agent may be used as other curing accelerator capable of accelerating curing. Examples of the dehydrating agent include orthocarboxylic esters (for example, methyl orthoformate, ethyl orthoformate, and methyl ortho-acetate) and acid anhydrides (for example, acetic anhydride).
Also, it is preferred to use an organometallic compound as the curing agent. Examples thereof include organometallic compounds of Si, Al, Ti, Zr, etc.
Specific examples include tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetra-n-butoxy-silane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, vinyltrimethoxysilane, vinyltri-ethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, CF3CH2CH2Si (OCH3) 3, CF3 (CF2)5CH2CH2Si (OCH3) 3, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-aminopropyltrimethoxysilane, γ-trimethoxysilylpropyl isocyanate, γ-mercaptopropyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-acryloxypropyltrimethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-aminopropylmethyltriethoxysilane, γ-mercaptopropylmethyldimethoxysilane, γ-methacryloxypropylmethyldimethoxysilane, tetrabutoxytitanium, and tripropoxy aluminate. However, it should not be construed that the invention is limited thereto.
More preferably, organosilane compounds represented by formula: (R31)Si(OR41)3 or formula: (R31)(R32)Si(OR41)2, wherein at least one of the substituents R31 and R32 contains a fluorine atom are enumerated.
Here, R31 represents an organic group having from 1 to 10 carbon atoms, and examples thereof include CF3CH2—, (CF)2CH—, CF2═CF—, CF3CH2CH2CH2—, C2F5CH2CH2CH2—, C3F7CH2CH2CH2—, C2F5CH2CH2—, CF3OCH2CH2CH2—, C2F5OCH2CH2CH2—, C3F7OCH2CH2CH2—, (CF3)2CHOCH2CH2CH2—, C4F9CH2OCH2CH2CH2—, 3-(perfluorocyclohexyloxy)propyl, H(CF2)4CH2OCH2CH2CH2—, and H(CF2)4CH2CH2CH2—.
In the organosilanes, R41 represents an alkyl group having from 1 to 5 carbon atoms or an acyl group having from 1 to 4 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, and an acetyl group. Also, R32 represents an organic group having from 1 to 10 carbon atoms, and examples thereof include an alkyl group (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a cyclohexyl group, and a cyclohexylmethyl group), an organic group (for example, a γ-chloropropyl group, a vinyl group, a γ-glycidoxypropyl group, a γ-methacryloyloxypropyl group, a γ-mercaptopropyl group, a phenyl group, and a 3,4-epoxycyclohexylethyl group), or a fluorine-containing organic group the same as in R31.
The addition amount of the foregoing silane compound as the curing agent is preferably from about 0.5 to 300 parts by weight, and especially preferably from about 5.0 to 100 parts by weight based on 100 parts by weight of the block copolymer.
On the other hand, in the case where the curing reactive site of the component H represents an active hydrogen-containing group such as an amino group and a mercapto group, examples of the curing agent to be used include polyisocyanate based curing agents, aminoplasts, and polybasic acids or anhydrides thereof.
Examples of the polyisocyanate based curing agent include polyisocyanate compounds (for example, m-xylylene diisocynate, toluene-2,4-diisocynate, hexamethylene diisocyanate, and isophorone diisocyanate); silyl isocyanate compounds (for example, methylsilyl triisocyanate) and partial condensates, polymers, and adducts with a polyhydric alcohol, a low-molecular weight polyester, etc. of these isocyanate compounds; and block polyisocyanate compounds resulting from blocking the isocyanate group by a blocking agent such as phenol.
Examples of the aminoplast include melamine resins, guanamine resins, and urea resins. Of these, methylolmelamines at least partially etherified with one or two or more kinds of lower alcohols (for example, methanol, ethanol, propanol, and butanol) (for example, hexamethyl etherified methylolmelamine, hexabutyl etherified methylolmelamine, methyl/butyl mixture etherified methylolmelamine, methyl etherified methylolmelamine, and butyl etherified methylolmelamine) or condensates thereof are preferable.
Examples of the polybasic acid or its anhydride include aromatic polyhydric carboxylic acids or anhydrides thereof (for example, pyromellitic acid, pyromellitic anhydride, trimellitic acid, trimellitic anhydride, phthalic acid, and phthalic anhydride) and aliphatic polyhydric carboxylic acids or anhydrides thereof (for example, maleic acid, maleic anhydride, succinic acid, and succinic anhydride).
On the other hand, in the case where the curing reactive group of the component H is an epoxy group or an oxetanyl group, the curing can be carried out by chemical reaction with an active hydrogen-containing reactive group (for example, a hydroxyl group, a carboxyl group, and an amino group) or a cyclic acid anhydride-containing group.
In this regard, the foregoing both reactive groups may be contained as a copolymer component in the block copolymer, or block copolymers each containing at least one kind of the respective reactive groups may be used together.
In this case, likewise the foregoing case, an acid, a base, or a compound capable of generating an acid or a base by the action of light and/or heat is used as the curing accelerator.
As other preferred embodiment, curing agents comprising a polyfunctional compound containing at least two of the foregoing active hydrogen-containing reactive group or cyclic acid anhydride-containing group capable of reacting with an epoxy group or an oxetanyl group in the molecule are enumerated.
Also, in the case of a cationic polymerizable group (the cationic polymerizable group means a reactive group capable of causing polymerization reaction and/or crosslinking reaction when active energy rays are irradiated in the presence of an active energy ray-sensitive cationic polymerization initiator), cationic polymerizable group-containing compound (hereinafter referred to as “cationic polymerizable compound”) is used. Representative examples of the cationic polymerizable group include an epoxy group, an oxetanyl group, a cyclic acetal group, a cyclic lactone group, a cyclic thioether group, a spiroorthoester group, and a vinyloxy group. In the invention, these cationic polymerizable group-containing compounds may be used singly or in combinations of two or more thereof.
Specific examples of the cationic polymerizable compound are as follows.
(1) Epoxy group-containing compounds such as alicyclic epoxy resins, aliphatic epoxy resins, and aromatic epoxy resins.
(2) Oxetane compounds such as trimethylene oxide, 3,3-dimethyloxetane, 3,3-dichloromethyloxetane, 3-methyl-3-phenoxymethyloxetane, and 1,4-bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene; oxolane compounds such as tetrahydrofuran and 2,3-dimethyltetrahydrofuran; and cyclic ether or cyclic acetal compounds such as trioxane, 1,3-dioxolane, 1,3,6-trioxane, and cyclooctane.
(3) Cyclic lactone compounds such as β-propiolactone and ε-caprolactone.
(4) Thiirane compounds such as ethylene sulfide and thio-epichlorohydrin.
(5) Thiethane compounds such as 1,3-propyne sulfide and 3,3-dimethylthiethane.
(6) Vinyloxy group-containing vinyl ether compounds.
(7) Spiroorthoester compounds obtained by reaction of an epoxy compound and a lactone.
(8) Bicycloorthoester compounds.
Above all, in the invention, epoxy group-containing compounds and vinyloxy group-containing compounds (hereinafter referred to as “epoxy compounds” and “vinyloxy compounds”, respectively) are preferably used as the cationic polymerizable compound. Of these, polyepoxy compounds having two or more epoxy groups in one molecule, polyvinyloxy compounds having two or more vinyloxy groups in one molecule, and compounds having at least one of each of an epoxy group and a vinyloxy group in one molecule are more preferable. Especially, when an epoxy compound (a mixture of epoxy compounds) containing an alicyclic polyepoxy compound having two or more epoxy groups in one molecule, with the content of the alicyclic polyepoxy compound being 30% by weight or more, and more preferably 50% by weight or more based on the total weight of the epoxy compound, is used, the cationic polymerization rate, thick film curing property, resolution, ultraviolet permeability, and other properties become better. Further, the viscosity of the cured film-forming composition becomes low so that the film formation can be carried out smoothly.
Examples of the foregoing aliphatic epoxy resin include cyclohexene oxide-containing compounds and cyclopentene oxide-containing compound obtained by epoxidizing a polyglycidyl ether of a polyhydric alcohol having at least one alicyclic ring or a compound containing an unsaturated alicyclic ring (for example, cyclohexene, cyclopentene, dicyclooctene, and tricyclodecene) with an adequate oxidizing agent such as hydrogen peroxide and peracids.
Also, examples of the foregoing aliphatic epoxy resin include polyglycidyl ethers of an aliphatic polyhydric alcohol or an alkylene oxide thereof, polyglycidyl esters of an aliphatic long-chain polybasic acid, and a homopolymer or copolymers of glycidyl acrylate or glycidyl methacrylate. Further, besides the foregoing epoxy compounds, monoglycidyl ethers of an aliphatic higher alcohol, glycidyl esters of a higher fatty acid, epoxidized soybean oil, butyl epoxy-stearate, octyl epoxystearate, epoxidized linseed oil, and epoxidized polybutadiene are enumerated. Polyfunctional epoxy silicones such as K-62-722, manufactured by Shin-Etsu Silicones and UV9300, manufactured by GE Toshiba Silicones and silicone-containing epoxy compounds described in Journal of Polymer Science: Part A: Polymer Chemistry, Vol. 28, 497 (1990) can be enumerated.
Also, examples of the foregoing aromatic epoxy resin include mono- or polyglycidyl ethers of a monovalent or polyvalent phenol having at least one aromatic nucleus or an alkylene oxide adduct.
Specific examples thereof include compounds described in paragraph Nos. (0084) to (0086) of JP-A-11-242101.
Of these epoxides, taking into consideration fast curing property, aromatic epoxides and alicyclic epoxides are preferable, and alicyclic epoxides are especially preferable. In the invention, the foregoing epoxides may be used singly or in adequate combinations of two or more thereof.
With respect to the oxetanyl group-containing compound, the number of the oexcetanyl groups to be contained in the molecule is from 1 to 10, and preferably from 1 to 4. It is preferable that the oxetanyl group-containing compound is used together with the epoxy group-containing compound. Specific examples thereof include compounds described in paragraph Nos. (0024) to (0025) of JP-A-2000-239309 and silicon-containing oxetane compounds described in J. V. CRIVELLO, et al., J. M. S.—PUREAPPL. CHEM., A30, pp.173-187 (1993).
Examples of the bicycloorthoester compound include compounds described in JP-T-2000-506908, such as 1-phenyl-4-ethyl-2,6,7-trioxabicyclo[2,2,2]octane and 1-ethyl-4-hydroxymethyl-2,6,7-trioxabicyclo[2,2,2]octane.
Examples of the spiroorthoester compound include compounds such as 1,5,7,11-tetraoxaspiro[5,5]undecane, 3,9-dibenzyl-1,5,7,11-tetraoxaspiro[5,5]undecane, 1,4,6-trioxaspiro[4,4]nonane, 2-methyl-1,4,6-trioxaspiro-[4,4]nonane, and 1,4,6-trioxaspiro[4,5]decane.
Examples of the vinyloxy compound include alkenyl vinyl ether compounds such as 2-methacryloyloxyethyl vinyl ether and 2-acryloyloxyethyl vinyl ether; cationic polymerizable nitrogen-containing compounds such as N-vinylcarbazole and N-vinylpyrrolidone; polyfunctional vinyl compounds such as butanediol divinyl ether, triethylene glycol divinyl ether, cyclohexanediol divinyl ether, 1,4-benzenedimethanol divinyl ether, hydroquinone divinyl ether, and resorcinol divinyl ether; propenyl compounds described in Journal of Polymer Science: Part A: Polymer Chemistry, Vol. 32, 2895 (1994); alkoxyallene compounds described in Journal of Polymer Science: Part A: Polymer Chemistry, Vol. 33, 2493 (1995); vinyl compounds described in Journal of Polymer Science: Part A: Polymer Chemistry, Vol. 34, 1015 (1996); and isopropenyl compounds described in Journal of Polymer Science: Part A: Polymer Chemistry, Vol. 34, 2051 (1996). Specific examples thereof include compounds described in paragraph Nos. (0022) to (0029) of JP-A-2002-29162.
Of these vinyloxy compounds, taking into consideration the curing property, adhesion and surface hardness, di- or trivinyl ether compounds are preferable. In the invention, the foregoing vinyl ether compounds may be used singly or in adequate combinations of two or more thereof.
In the case where these curing agents are added, the addition amount is preferably from about 0.5 to 300 parts by weight, and especially preferably from about 5.0 to 100 parts by weight based on 100 parts by weight of the foregoing block copolymer. Also, a curable compound comprising such a cationic polymerizable reactive group, an acid, or a photo acid-generating compound is used as the curing accelerator.
There are enumerated known compounds and mixtures thereof such as photo initiators of photo cationic polymerization, photo color fading agents of dyes, photo discoloring agents, or known acid generators to be used in micro resists. Also, examples of the acid generator include organic halides and disulfone compounds. Specific examples of the organic halides and disulfone compounds include those the same as in the foregoing compounds capable of generating a radical.
Examples of the onium compound include diazonium salts, ammonium salts, iminium salts, phosphonium salts, iodonium salts, sulfonium salts, arsonium salts, and selenonium salts. For example, compounds described in paragraph Nos. (0058) to (0059) of JP-A-2002-29162 are enumerated.
In the invention, onium salts are enumerated as the acid generator to be especially preferably used. Above all, diazonium salts, iodonium salts, sulfonium salts, and iminium salts are preferable from the standpoints of photosensitivity to photopolymerization initiation and material stability of compound. Specific examples of the onium salt that can be suitably used in the invention include amylated sulfonium salts described in paragraph No. (0035) of JP-A-9-268205, diaryl iodonium salts or triaryl sulfonium salts described in paragraph Nos. (0010) to (0011) of JP-A-2000-71366, sulfonium salts of thiobenzoic acid S-phenyl ester described in paragraph No. (0017) of JP-A-2001-288205, and onium salts described in paragraph Nos. (0030) to (0033) of JP-A-2001-133696.
Other examples of the acid generator include compounds such as organometallic/organic halogenated compounds described in paragraph Nos. (0059) to (0062) of JP-A-2002-29162, photo acid generators having an o-nitrobenzyl type protective group, and compounds that are photodecomposed to generate sulfonic acid (for example, iminosulfonates).
On the other hand, in the case where the crosslinking reactive site of the component H has a radical polymerizable unsaturated double bond (for example, an acryloyl group, a methacryloyl group, and a styryl group), it is preferable that a radical polymerizable compound is used as the curing agent and that a compound capable of generating a radical by the action of light and/or heat is used as the curing accelerator. The radical polymerizable compound is preferably a polyfunctional compound containing from 2 to 10 polymerizable groups, and more preferably a polyfunctional compound containing from 2 to 6 polymerizable groups.
It is preferable that a polymerizable compound containing a polymerizable group capable of undergoing well copolymerization with a radical polymerizable group to be contained in the component H is adequately chosen as a curing agent and combined.
Examples of the copolymer include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, and maleic acid) and esters and amides thereof. Above all, esters of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol and amides of an unsaturated carboxylic acid and an aliphatic polyhydric amine compound are preferably used. Also, addition reaction products of an unsaturated carboxylic acid ester or amide having a nucleating substituent (for example, a hydroxyl group, an amino group, and a mercapto group) with a monofunctional or polyfunctional isocyanate or an epoxy compound, or dehydration condensation reaction products thereof with a polyfunctional carboxylic acid are suitably used. Also, addition reaction products of an unsaturated carboxylic acid ester or amide having an electrophilic substituent (for example, an isocyanate group and an epoxy group) with a monofunctional or polyfunctional alcohol, an amine and a thiol, and substitution reaction products of an unsaturated carboxylic acid ester or amide having an eliminating substituent (for example, a halogen group and a tosyloxy group) with a monofunctional or polyfunctional alcohol, an amine and a thiol are suitable. Also, as other examples, a group of compounds in which the forgoing unsaturated carboxylic acids are substituted with an unsaturated phosphonic acid, styrene, or the like can be used.
As the ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, polymeric compounds obtained by using ethylene glycol, propylene glycol, 1,4-butanedil, neopentyl glycol, trimethylolpropane, hexanediol, cyclohexyl diol, cyclohexanedimethanol, pentaerythritol, dipentaerythritol, digylcerol, sorbitol, etc. as the aliphatic polyhydric alcohol compound and subjecting the aliphatic polyhydric alcohol compound to mono-substitution or poly-substitution with an unsaturated carboxylic acid (for example, crotonic acid, acrylic acid, methacrylic acid, itaconic acid, and maleic acid) are enumerated.
As other examples of the ester, vinyl methacrylate, allyl methacrylate, allyl acrylate, aliphatic alcohol based esters described in JP-B-46-27926, JP-B-51-47334, and JP-A-57-196231, esters having an aromatic based skeleton described in JP-A-59-5240, JP-A-59-5241, and JP-A-2-226149, and esters having an amino group described in JP-A-1-165613 are suitably used.
Also, specific examples of amide monomers between an aliphatic polyhydric amine compound and an unsaturated carboxylic acid include methylene bis(meth)acrylamide, 1,4-tetramethylene bis(meth)acrylamide, 1,6-hexamethylene bis(meth)acrylamide, diethylenetriamine tris(meth)acryl-amide, and xylylene bis(meth)acrylamide.
As other preferred examples of the amide based monomer, those having a cyclohexylene structure described in JP-B-54-21726 can be enumerated.
Also, urethane based addition polymerizable compounds produced using addition reaction between an isocyanate and a hydroxyl group are suitable. Specific examples thereof include vinyl urethane compounds containing two or more polymerizable vinyl groups in one molecule resulting from addition of a hydroxyl group-containing vinyl monomer having two or more isocyanate groups in one molecule as described in JP-B-48-41708.
Also, urethane acrylates described in JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765 and compounds having an ethylene oxide based skeleton described in JP-B-58-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418 are enumerated.
Further, radical polymerizable compounds having an amino structure or a sulfide structure in the molecule, as described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238 may be used.
As other examples, polyfunctional acrylates or meth-acrylates such as polyester acrylates and epoxy acrylates resulting from reaction of an epoxy resin and (meth)acrylic acid, as described in JP-A-48-64183, JP-B-49-43191, and JP-B-52-30490, can be enumerated. Also, specific unsaturated compounds described in JP-B-46-43946, JP-B-1-40337, and JP-B-1-40336 and vinylsulfonic acid based compounds described in JP-A-2-25493 can be enumerated. Also, in some case, per-fluoroalkyl group-containing structures described in JP-A-61-22048 are suitably used. Further, compounds introduced as a photo-curable monomer or oligomer in Nippon Setchaku Kyoukaishi, Vol. 20, No. 7, pp.300-308 (1984) can be used.
Further, fluorine atom-containing monofunctional or polyfunctional compounds are also preferable, and examples include compounds described in paragraph Nos. [0059] to [0066] of JP-A-2000-275403.
The compound capable of generating a radical, which is suitably used in the invention, means a compound that generates a radical upon irradiation with light and/or heat to initiate and accelerate the polymerization of a polymerizable unsaturated group-containing compound.
Known polymerization initiators and compounds having a bond with small bond dissociation energy can be adequately chosen and used. Also, the compound capable of generating a radical can be used singly or in combinations of two or more thereof.
Examples of the compound capable of generating a radical include conventionally known heat radical polymerization initiators such as organic peroxides and azo based polymerization initiators, amine compounds (for example, those described in JP-B-44-20189); and photo radical polymerization initiators such as organic halides, carbonyl compounds, metallocene compounds, hexaaryl biimidazole compounds, organic boric acid salt compounds, sulfone compounds, and disulfone compounds.
Specific examples of the foregoing organic halide include compounds described in Wakabayashi, et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), U.S. Pat. No. 3,905,815, JP-A-63-298339, and M. O. Hutt, Journal of Heterocyclic Chemistry, 1 (No. 3), (1970), especially, trihalomethyl group-substituted oxazole compounds and s-triazine compounds.
More suitably, s-triazine derivatives having at least one mono-, di- or trihalogen-substituted methyl group bonded on the s-triazine ring are enumerated.
Other examples of the organic halide include ketones, sulfides, sulfones, and nitrogen atom-containing heterocyclic compounds described in paragraph Nos. (0039) to (0048) of JP-A-5-27830.
Examples of the foregoing carbonyl compound include compounds described in Latest UV Curing Technologies, pages 60 to 62 (published by Technical Information Institute Co., Ltd., 1991), paragraph Nos. (0015) to (0016) of JP-A-8-134404, and paragraph Nos. (0029) to (0031) of JP-A-11-217518, and specific examples include acetophenone based compounds, hydroxyacetophenone based compounds, benzophenone based compounds, thioxathane based compounds, benzoin compounds (for example, benzoin ethyl ether and benzoin isobutyl ether), benzoic ester derivatives (for example, ethyl p-dimethyl-aminobenzoate and ethyl p-diethylaminobenzoate), benzyl dimethyl ketal, and acyl phosphine oxide.
Examples of the foregoing organic peroxide include compounds described in paragraph No. (0019) of JP-A-2001-139663.
Examples of the foregoing metallocene compound include various titanocene compounds described in JP-A-2-4705 and JP-A-5-83588 and iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109.
Examples of the foregoing hexaaryl biimidazole compound include various compounds described in JP-B-6-29285 and U.S. Pat. Nos. 3,479,185, 4,311,783 and 4,622,286.
Examples of the foregoing organic boric acid salt compound include organic boric acid salt compounds described in Japanese Patent No. 2,764,769, JP-A-2002-116539, and Kunz, Martin, Rad Tech '98: Proceeding April, pp.19-22, 1998, Chicago. Specific examples include compounds described in paragraph Nos. (0022) to (0027) of the above-cited JP-A-2002-116539.
As other organoboron compounds, specific examples include organoboron transition metal coordinated complexes described in JP-A-6-348011, JP-A-7-128785, JP-A-7-140589, JP-A-7-306527, and JP-A-7-292014.
Examples of the foregoing sulfone compound include compounds described in JP-A-5-239015; and examples of the foregoing disulfone compound include compounds represented by formulae (II) and (III) described in JP-A-61-166544.
These radical generating compounds may be added singly or in combinations of two or more thereof. The addition amount is from 0.1 to 30% by weight, preferably from 0.5 to 25% by weight, and especially preferably from 1 to 20% by weight based on the total amount of the radical polymerizable monomers. When the addition amount falls within this range, the cured film-forming composition becomes highly polymerizable so that there is no problem in elapsing stability of the cured film.
A sensitizing dye can also be preferably used in combination with the photo radical polymerization initiator.
The addition amount of the compound capable of initiating the radical polymerization by the action of heat or light may be an amount in which polymerization of the carbon-carbon double bond initiates. In general, it is preferably from 0.1 to 15% by weight, and more preferably from 0.5 to 5% by weight based on the whole of the solids in the cured film-forming composition.
In the case where such a curing agent is added, likewise other curing agents, the addition amount is preferably from about 0.5 to 300 parts by weight, and especially preferably from about 5.0 to 100 parts by weight based on 100 parts by weight of the foregoing block copolymer.
Also, it is preferred to use a compound containing at least one of the respective groups selected from the foregoing radical polymerizable group and cationic polymerizable group in the molecule as the curing agent. Examples include compounds described in paragraph Nos. (0031) to (0052) of JP-A-8-277320 and compounds described in paragraph No. (0015) of JP-A-2000-191737, but it should not be construed that the invention is limited thereto.
The foregoing radical polymerizable compound and cationic polymerizable compound are preferably contained in a proportion of from 90/10 to 20/80, and more preferably from 80/20 to 30/70 in terms of a weight ratio of the radical polymerizable compound to the cationic polymerizable compound.
It is preferable that the cured film-forming composition of the invention contains from 0.5 to 10% by weight of the radical polymerization initiator and from 1 to 10% by weight of the cationic polymerization initiator based on the total weight of the radical polymerizable compound and the cationic polymerizable compound. It is more preferable that the cured film-forming composition of the invention contains from 1 to 5% by weight of the radical polymerization initiator and from 2 to 6% by weight of the cationic polymerization initiator.
In the case where the polymerization reaction is carried out upon irradiation with ultraviolet rays, the conventionally known ultraviolet spectral sensitizer and chemical sensitizer may be used jointly in the cured film-forming composition of the invention. Examples include Michler's ketone, amino acids (for example, glycine), and organic amines (for example, butylamine and dibutylamine).
Also, in the case where the polymerization reaction is carried out upon irradiation with near infrared rays, it is preferred to use jointly a near infrared spectral sensitizer as the curing accelerator.
Any light absorbing substance having an absorption band in at least a part of the wavelength region of 700 nm or longer may be used as the near infrared spectral sensitizer to be used jointly, and compounds having a spectral absorptivity coefficient of 10,000 or more are preferable. Further, compounds having absorption in the region of from 750 to 1,400 nm and having a spectral absorptivity coefficient of 20,000 or more are preferable. Also, compounds that have a valley in the visible light wavelength region of from 420 nm to 700 nm and are optically transparent are more preferable. As the near infrared spectral sensitizer, various pigments and dyes known as near infrared absorbing pigments and near infrared absorbing dyes can be used. Above all, the conventionally known near infrared absorbers are preferably used.
Commercially available dyes and known dyes described in documents (for example, “Near Infrared Absorbing Dyes” of Kagaku Kogyo, May 1986, pages 45 to 51, Development and Market Trend of Functional Dyes in the 1990's, Chapter 2, Paragraph 2.3 (1990), CMC Publishing Co., Ltd., Special Functional Dyes (compiled by Ikemori and Hashiradani, 1986, CMC Publishing Co., Ltd.), J. FABRIAN, Chem. Rev., 92, pp.1197-1226 (1992), the Catalog published by Nippon Kanko Shikiso Kenkyusho K.K. (1995), and the Laser Dye Catalog published by Exciton Inc. (1989)) or patents can be applied.
(Coating Solvent)
It is preferable that the cured film-forming composition of the invention is provided as a coating solution having the foregoing block copolymer dissolved therein. The compound capable of dissolving the block copolymer therein may be the foregoing polyfunctional compound or an organic solvent. The organic solvent to be used is not limited so far as it is inert against the respective compounds of the cured film-forming composition.
Specifically, examples of the organic solvent include alcohols, ketones, esters, amides, ethers, ether esters, hydrocarbons, and halogenated hydrocarbons. Specific examples include alcohols (for example, methanol, ethanol, propanol, butanol, benzyl alcohol, ethylene glycol, propylene glycol, and ethylene glycol monoacetate), ketones (for example, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and methylcyclohexanone), esters (for example, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl formate, propyl formate, butyl formate, and ethyl lactate), aliphatic hydrocarbons (for example, hexane and cyclohexane), halogenated hydrocarbons (for example, methylchloroform), aromatic hydrocarbons (for example, benzene, toluene, and xylene), amides (for example, dimethylformamide, dimethylacetatamide, and n-methylpyrrolidone), ethers (for example, dioxane, tetrahydrofuran, ethylene glycol dimethyl ether, and propylene glycol dimethyl ether), and ether alcohols (for example, 1-methoxy-2-propanol, ethyl cellosolve, and methyl carbinol). These solvents may be used singly or in admixture of two or more thereof.
(Fine Particle)
In order to enhance the strength of the cured film of the invention, it is preferable that fine particles having a mean particle size smaller than the thickness of the cured film are contained. The fine particles may be any of inorganic particles or organic particles. In particular, inorganic particles having a Moh's hardness of 2 or more are preferable. The size of the fine particles is preferably from 0.003 to 5 μm, more preferably from 0.005 to 1 μm, especially preferably from 0.05 to 0.1 μm. The size as referred to herein means a mean primary particle size.
The addition amount of these fine particles is preferably from 1 to 90% by weight, more preferably from 3 to 80% by weight, and further preferably from 5 to 60% by weight in terms of the whole of the solids of the cured film-forming composition.
When the addition amount of the fine particles falls within this range, mechanical strengths of the film such as strength, hardness and abrasion resistance of the cured film are enhanced.
Also, an embodiment in which at least one kind of each of ultra-fine particles having a mean primary particle size of from 5 to 100 nm and fine particles having a mean primary particle size of from 0.15 to 5 μm are contained. It is more preferable that ultra-fine particles having a mean primary particle size of from 5 to 80 nm and fine particles having a mean primary particle size of from 0.15 to 3 μm are used jointly.
In the case where ultra-fine particles and fine particles are used jointly, the amount of the ultra-fine particles to be used is preferably from 0.05 to 85% by weight, more preferably from 1 to 75% by weight, and further preferably from 3 to 65% by weight.
When the amount of the ultra-fine particles to be used falls within this range, it is possible to enhance the strength of the cured film and to control the surface shape of the cured film in the irregular state.
The shape of the inorganic fine particle to be used in the invention is not particularly limited but is preferably in the rice grain shape, spherical shape, cubic shape, spindle shape, or amorphous shape. The inorganic fine particles of the invention can be used singly or in admixture of two or more thereof.
Examples of the inorganic particle to be used as the fine particle of the invention (hereinafter sometimes referred to as “inorganic fine particle”) include metal grains (for example, iron, copper, nickel, stainless steel, tin, gold, and silver), metal nitrides (for example, silicon nitride, boron nitride, and titanium nitride), metal oxides (for example, oxides of Mg, Ca, Si, Al, Ti, Zr, V, Nb, La, In, Ce, La, Ta, Y, Zn, Sb, B, Sn, Fe, W, Ir, Cr, Mo, Sr, and Pt), composite metal oxides (for example, composite oxides of the foregoing metals), metal carbonates (for example, carbonates of Ca, Ba, and Mg), metal sulfides (for example, zinc sulfide), metal sulfates (for example, sulfates of Ba, Ca, and Sr), metal halides (for example, magnesium fluoride and calcium fluoride), metal carbides (for example, tungsten carbide, molybdenum carbide, and silicon carbide), and carbon allotropes (for example, graphite and diamond).
Of these fine particles, metal nitrides, metal oxides, and composite metal oxides are preferable in view of durability to an ink solution, etc. Metal oxides and composite metal oxides are more preferable; and silicon oxide, titanium oxide, aluminum oxide, and zirconium oxide are further preferable.
In general, since the inorganic fine particle is poor in affinity with a binder polymer, when the both are merely mixed with each other, the interface is liable to break, and the resulting film is liable to break so that it is difficult to improve the strength and scratch resistance of the film. Now, for the sake of improving the affinity between the inorganic particle and the binder polymer, it is possible to treat the surface of the inorganic fine particle with a surface modifier containing an organic segment. It is preferable that the surface modifier not only forms a bond with the inorganic fine particle but also has high affinity with the binder polymer. As organic compounds to be used for the surface treatment, surface modifiers for inorganic fillers such as the conventionally known metal oxides and inorganic pigments can be used. For example, they are described in Stabilization of Pigment Dispersion and Surface Treatment Technologies and Evaluation, Chapter 1 (published by Technical Information Institute Co., Ltd. (2001)).
Specific examples include organic compounds having a polar group having affinity with the surface of the inorganic particle and coupling compounds. Examples of the polar group having affinity with the surface of the inorganic particle include a carboxy group, a phosphono group, a hydroxyl group, a mercapto group, a cyclic acid anhydride group, and an amino group, and compounds having at least one of these groups in the molecule are preferable. For example, there are enumerated long chain aliphatic carboxylic acids (for example, stearic acid, lauric acid, oleic acid, linolic acid, and linoleic acid), polyol compounds (for example, penta-erythritol triacrylate, dipentaerythritol pentaacrylate, and ECH-modified glycerol triacrylate), phosphono group-contain-ing compounds (for example, EO (ethylene oxide) modified phosphoric acid triacrylate), and alkanolamines (for example, ethylenediamine EO adduct (5 moles)).
As the coupling compound, the conventionally known organometallic compounds are enumerated, and examples thereof include silane coupling agents, titanate coupling agents, aluminate coupling agents, and zirconate coupling agents. Specific examples include compounds described in JP-A-2002-9908 and paragraph Nos. (0011) to (0015) of JP-A-2001-310423.
These surface treating agents can be used in combinations of two or more thereof.
Examples of the organic particle to be used as the fine particle of the invention (hereinafter sometimes referred to as “organic fine particle”) include resin fine particles of higher fatty acid metal salts (for example, zinc stearate), (meth)acrylate resins, (meth)acrylamide resins, polystyrene based resins, polysiloxanes, melamine resins, benzoguanamine resins, fluorine resins such as polytetrafluoroethylene, vinylidene fluoride resins, epoxy resins, phenol resins, polyurethane resins, cellulose acetate, polycarbonates, nylon resins, crosslinked rubber fine particles of SBR and NBR, and the like. Also, fine particles composed of a composite of these organic particles are preferable. Polymer resin fine particles resulting from internal crosslinking by copolymerization with a monomer having a bifunctional or polyfunctional polymerizable group are also preferable.
The organic crosslinked particles to be used as the fine particle of the invention (hereinafter sometimes referred to as “organic crosslinked fine particle”) can be arbitrarily chosen from soft rubber fine particles until hard fine particles. For example, with respect to the foregoing inorganic crosslinked fine particles having a high hardness, when the addition amount is increased in the curing resin layer, the curing shrinkage amount and hardness are enhanced, but there is some possibility that the resulting film is brittle and tends to break. In such case, by simultaneously adding organic crosslinked fine particles whose hardness has been arbitrarily adjusted, it is possible to make the resulting film hardly break, and hence, such is preferable. Also, core-shell particles comprising a core having a high hardness and a shell having a low hardness, or a core having a low hardness and a shell having a high hardness can be employed. Also, for the purpose of ensuring dispersion stability in the curing resin layer or coating solvent, it is also preferred to employ core-shell particles whose hydrophilicity or hydrophobicity has been changed. Also, it is possible to employ organic-inorganic composite fine particles using fine particles composed of inorganic crosslinked particles in the core. In the case where such crosslinked fine particles are employed as core-shell particles, both or either one of the core portion and the shell portion may be crosslinked.
(Conductive Fine Particle)
It is preferable that the fine particles contained in the cured film of the ink repelling treated portion further contains conductive ultra-fine particles. In this way, easiness of electrification of the surface of the film caused by the fluorine-containing polymer is suppressed, and in the case where the head portion does not come into contact with the ink solution, attachment of dusts such as paper powders is suppressed.
As the conductive particles, inorganic compounds described in The State and Prospect of Transparent Conductive Films, Chapters 3 to 4, compiled by the Search Department of Toray Research Center, Inc. (published by Toray Research Center, Inc., 1997) and Development and Application of Conductive Fillers, compiled by Technical Information Institute Co., Ltd. (published by Technical Information Institute Co., Ltd., 1997) are enumerated. Specific examples thereof include conductive metal oxide fine particles such as ITO (SnO2-doped In2O3), ATO (Sb-doped SnO2), Sb2O3, SbO2, In2O3, SnO2, conductive ZnO, AZO (Al-doped zinc oxide), and antimony pentoxide zinc; conductive nitrides such as titanium nitride, zirconium nitride, and hafnium nitride; and metal particles such as gold, silver, and copper.
Of these, conductive oxide particles such as ITO and ATO are preferable.
(Dispersion Medium)
In the invention, a dispersion medium that is provided for wet dispersion of the inorganic fine particles can be used by adequately choosing from water and organic solvents. Liquids having a boiling point of 50° C. or higher are preferable, and organic solvents having a boiling point ranging from 60° C. to 180° C. are more preferable.
The dispersion medium is preferably used in a proportion of from 5 to 50% by weight, and more preferably from 10 to 30% by weight in terms of the whole of the dispersing composition containing the inorganic fine particles and a dispersant. When the proportion of the dispersion medium falls within this range, dispersion easily proceeds, whereby the resulting dispersion has a viscosity range where the workability is good.
Examples of the dispersion medium include alcohols, ketones, esters, amides, ethers, ether esters, hydrocarbons, and halogenated hydrocarbons. Specific examples include alcohols (for example, methanol, ethanol, propanol, butanol, benzyl alcohol, ethylene glycol, propylene glycol, and ethylene glycol monoacetate), ketones (for example, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and methylcyclohexanone), esters (for example, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl formate, propyl formate, butyl formate, and ethyl lactate), aliphatic hydrocarbons (for example, hexane and cyclohexane), halogenated hydrocarbons (for example, methylchloroform), aromatic hydrocarbons (for example, benzene, toluene, and xylene), amides (for example, dimethylformamide, dimethylacetatamide, and n-methylpyrrolidone), ethers (for example, dioxane, tetrahydrofuran, ethylene glycol dimethyl ether, and propylene glycol dimethyl ether), and ether alcohols (for example, 1-methoxy-2-propanol, ethyl cellosolve, and methyl carbinol). These solvents may be used singly or in admixture of two or more thereof. Of these dispersion media, toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and butanol are preferable. Also, coating solvents composed mainly of a ketone solvent (for example, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone) are preferably used. The content of the ketone based solvent is preferably 10% by weight or more, more preferably 30% by weight or more, and further preferably 60% by weight or more based on the whole of the solvents contained in the coating composition.
(Conversion of Inorganic Particle Into Ultra-Fine Particle)
When the ultra-fine fine particles having a mean primary particle size of not larger than 100 nm of the invention are formed into a dispersion by the wet dispersion method, the stability of a liquid of the composition is enhanced. In a cured film formed from the cured film-forming composition, the ultra-fine particles are uniformly dispersed and exist in a matrix of the cured film, whereby the strength of the film can be uniformly enhanced.
The size of the ultra-fine particles present in the matrix of the cured film is preferably in the range of from 5 to 150 nm, more preferably from 10 to 100 nm, and specially preferably from 10 to 80 nm in terms of mean particle size.
Further, it is preferable that large particles having a mean particle size of 500 nm or more be not present in the ultra-fine particle dispersion, and it is especially preferable that large particles having a mean particle size of 300 nm or more be not present in the cured film. In this way, monodispersibility of the particle size distribution of the dispersed particles is enhanced. As a result, the foregoing film strength becomes good. Also, it is possible to form the surface of the cured film in the specific irregular shape.
For the sake of dispersing the inorganic particles into a size of ultra-fine particles free from coarse particles having the foregoing range, such is first achieved by dispersing the inorganic particles together with the foregoing disperssant using media having a mean particle size of smaller than 0.8 mm by the wet dispersion method.
Examples of wet dispersion machines include the conventionally known devices such as a sand grinder mill (for example, a bead mill with pin), a Dyno mill, a high-speed impeller mill, a pebble mill, a roll mill, an attritor, and a colloid mill. In particular, for the purpose of dispersing the oxide fine particles of the invention into ultra-fine particles, a sand grinder mill, a Dyno mill, and a high-speed impeller mill are preferable.
As the media to be used in combination with the foregoing dispersion machine, media having a mean particle size of smaller than 0.8 mm are preferable. By using the media whose mean particle size falls within this range, the mean particle size of the inorganic fine particles becomes not larger than 100 nm, and ultra-fine particles having a uniform particle size can be obtained. The mean particle size of the media is preferably not larger than 0.5 mm, and more preferably from 0.05 to 0.3 mm.
As the media to be used in the wet dispersion, beads are preferable. Specific examples thereof include zirconia beads, glass beads, ceramics beads, and steel beads. Of these, zirconia beads having a mean particle size of from 0.05 to 0.2 mm are especially preferable from the standpoints of durability such that breakage of beads in the dispersion hardly occurs and conversion into ultra-fine particles.
In the dispersion step, the dispersion temperature is preferably from 20 to 60° C., and more preferably from 25 to 45° C. When the inorganic fine particles are dispersed into ultra-fine particles at a temperature of this range, recoagulation and precipitation of the dispersed particles are not caused. It may be considered that this is caused by the matter that adsorption of the dispersant onto the inorganic compound particles is adequately carried out, whereby dispersion stability failure caused by desorption of the dispersant from the particles at the ambient temperature does not occur.
In such range, it is possible to form a cured film that is excellent in film strength and adhesion onto the coating surface.
Also, a preliminary dispersion treatment may be carried out prior to the foregoing wet dispersion step. Examples of dispersion machines to be used for the preliminary dispersion treatment include a ball mill, a three-roll mill, a kneader, and an extruder.
Further, from the standpoint that the dispersed particles in the dispersion are satisfied with the foregoing ranges with respect to the mean particle size and monodispersibility of the particle size, it is preferred to align a filter medium such that precise filtration be carried out in the separation treatment from the beads for the purpose of removing coarse coagulated materials in the dispersion. It is preferable that the filter medium for carrying out precise filtration has a filtered particle size of not larger than 25 μm. The type of the filter medium for carrying out precise filtration is not particularly limited so far as it has the foregoing performance, and examples thereof include a filament type, a felt type, and a mesh type. The material quality of the filter medium for carrying out precise filtration of the dispersion is not particularly limited so far as it has the foregoing performance and does not adversely affect a coating solution, and examples thereof include stainless steel, polyethylene, polypropylene, and nylons.
(Other Components of the Cured Film)
Other compounds can be adequately added to the cured film of the invention according to the utility and purpose. For example, besides the foregoing components (such as inorganic fine particles, polymerization initiators, and sensitizers), resins, surfactants, antistatic agents, coupling agents, thickening agents, antifoaming agents, leveling agents, flame retardants, tackifiers, polymerization inhibitors, antioxidants, and surface modifiers, and the like can be added.
(Formation of Ink Repelling Treated Portion (Cured Film))
It is preferable that the ink repelling treated portion of the invention is constructed by coating a coating solution made of the foregoing cured film-forming composition on a substrate as described later directly or via other layer.
The coating solution is prepared by mixing and diluting a matrix binder solution containing the block copolymer, the ultra-fine particle dispersion of the specific inorganic compound, and additives to be used as needed in prescribed concentrations, respectively in a coating dispersion medium.
It is preferable that the coating solution is subjected to filtration before coating. It is preferred to use a filter for filtration having a pore size as small as possible within the range where the components in the coating solution are not removed. A filter having an absolute filtration accuracy of from 0.1 to 100 μm is used for the filtration. Further, a filter having an absolute filtration accuracy of from 0.1 to 25 μm is preferably used. The thickness of the filter is preferably from 0.1 to 10 mm, and more preferably from 0.2 to 2 mm. In that case, the filtration is preferably carried out under a filtration pressure of not more than 15 kgf/cm2, more preferably not more than 10 kgf/cm2, and further preferably not more than 2 kgf/cm2.
The filtration filter member is not particularly limited so far as the coating solution is not adversely affected. Specifically, those the same as in the foregoing filter member for the wet dispersion of inorganic compounds are enumerated.
Also, it is preferable that the filtered coating solution is subjected to ultrasonic dispersion immediately before coating to assist defoaming and keeping dispersibility of the dispersion.
In the invention, the cured film can be prepared by coating the cured film-forming composition of the invention on a substrate as described later by the known thin film formation method such as dip coating, air knife coating, curtain coating, roller coating, wire bar coating, gravure coating, micro-gravure coating, and extrusion coating, followed by drying and irradiation with light and/or heat. Preferably, curing upon irradiation with light is advantageous in view of rapid curing. Further, it is preferred to perform a heat treatment in the latter half of the light curing treatment.
The thickness of the ink repelling treated portion (cured film) of the invention is not particularly limited and is preferably from 0.01 to 100 μm, more preferably from 0.1 to 10 μm, and especially preferably from 0.5 to 5 μm.
As a light source of the light irradiation, any of ultraviolet rays or near infrared rays are employable. Examples of the light source of ultraviolet rays include ultra-high pressure, high pressure, medium pressure, and low pressure mercury vapor lamps, chemical lamps, carbon arc lamps, metal halide lamps, xenon lamps, and sunlight. Commercially available various laser light sources having a wavelength of from 350 to 420 nm may be irradiated upon conversion into multi-beams. Also, examples of the light source of near infrared rays include halogen lamps, xenon lamps, and high pressure sodium vapor lamps. Commercially available various laser light sources having a wavelength of from 750 to 1,400 nm may be irradiated upon conversion into multi-beams.
In the case where the near infrared light source is used, the ultraviolet light source may be used in combination, or the light irradiation may be carried out from the substrate surface side opposite to the side at which the cured film is provided. Film curing proceeds in the depth direction in the coating layer without any delay similarly in the vicinity of the surface, whereby a cured film in the uniform cured state is obtained.
In the case of radical polymerization, the radical polymerization can be carried out in air or an inert gas. However, for the purpose of shortening the introduction period of polymerization of a radical polymerizable monomer or sufficiently enhancing the polymerization rate, an atmosphere where the oxygen concentration is made low as far as possible is preferable. In the case of photopolymerization, the irradiation intensity of ultraviolet rays to be irradiated is preferably from about 0.1 to 100 mW/cm2, and the light irradiation dose on the surface of the coating is preferably from 100 to 1,000 mJ/cm2. Also, it is preferable that the temperature distribution of the coating in the light irradiation step is uniform as far as possible, and the temperature distribution is preferably controlled within ±3° C., and more preferably within ±1.5° C. In this range, the polymerization reaction uniformly proceeds in the surface of the coating and in the depth direction within the layer, and therefore, such is preferable.
(Ink Repelling Treated Portion of Inkjet Recording Head)
As the inkjet recording head of the invention, any conventionally known liquid discharge heads capable of injecting fine droplets are employable. Examples include heads of various recording systems described in Pond Stephen F., Inkjet Technology and Product Development Strategies (published by Torrey Pines (2000)), Inkjet Printer Technologies and Materials, supervised by Takeshi Amari (published by CMC Publishing Co., Ltd. (1998)), and Inkjet Recording and Printer Recording System, and Development of Print Head (published by CMC Publishing Co., Ltd. (2000)). Specific examples include on-demand systems such as continuous systems (for example, an electrostatic control type and a pressure vibration type), electromechanical transduction systems (for example, a piezo type), electro-thermal transduction systems (for example, a bubble jet type), electrostatic suction systems, and ultrasonic systems.
It is preferable that the ink repelling treatment of the invention is carried out at least at the periphery of discharge openings of the ink droplet in various recording heads as described previously. For example, in an inkjet recording head provided with a recording head unit having: an ink-jet recording head having a discharge opening from which an ink is discharged; and an ink passage connected to this discharge opening, and an ink feed member for feeding an ink into the foregoing ink passage, and an ink tank portion for storing an ink to be fed into the foregoing ink passage by the foregoing ink feed member, it is preferable that the periphery of the ink droplet discharge opening of a nozzle hole of a nozzle forming member as shown in the FIGURE is subjected to an ink repelling treatment as one embodiment. Specifically, as shown in the FIGURE, the inkjet recording head of one embodiment in the invention comprises a nozzle having a nozzle plate 1 and a nozzle hole 2 (or an discharge opening) in the nozzle plate 1. A cured film is formed on the outer surface of the nozzle plate 1, thereby forming an ink repelling treated portion 3.
However, it should not be construed that the recording system and the head structure are limited thereto.
(Method of Forming the Ink Repelling Treated Portion)
The ink repelling treatment may be carried out any time before or after boring a nozzle in the nozzle plate.
With respect to the size of the nozzle to be bored in the nozzle plate, the size of the ink droplet discharge opening is preferably from 15 to 100 μm, and more preferably from 20 to 60 μm.
Examples of boring of the nozzle include press processing, electrocasting processing, excimer laser processing, and photo-fabrication.
Also, in the case where the ink repelling treatment is carried out after boring the nozzle, a method in which the inside of the nozzle hole is plugged with a resist, and after the treatment, the resist is removed; and a method in which the treatment is carried out while flowing a gas flow through the nozzle are preferably employed. Also, a masking method is preferable as a method of precisely controlling the position where the cured film-forming composition for the ink repelling treatment is incorporated into the inside of the nozzle hole from the ink droplet discharge opening and the amount thereof.
Also, in the case where the nozzle plate is adhered to the head portion after the ink repelling treatment, it is preferable that the back surface of the plate is not subjected to a liquid repelling treatment.
As the nozzle plate to be provided in the invention, the conventionally known substrates are used. For example, the nozzle plate is formed of a metal, a ceramic, silicon, glass, a plastic, etc. Examples include single metals (for example, titanium, chromium, iron, cobalt, nickel, copper, zinc, tin, and gold), alloys (for example, nickel-phosphorous alloys, tin-copper-phosphorous alloys (phosphor bronze), copper-zinc alloys, and stainless steel 40), and organic resin materials having heat curability, solvent resistance, chemical resistance, or heat resistance (for example, heat curable polyimides, polyether sulfones, polyphenylenes, poly-carbonates, polysulfones, ABS resins (acrylonitrile-butadiene-styrene copolymers), polyethylene terephthalate, polyethylene naphthalate, polyacetals, and sulfides).
Also, these materials can be laminated and then used. For example, by bonding an organic resin material to an inorganic material having high stiffness, such as metals and ceramics, the stiffness of the whole of nozzle plate can be enhanced. That is, the Young's modulus of organic resin materials is from about 100 to 300 kg/mm2, a value of which is far small in comparison with that of metals (from 8,000 to 15,000 kg/mm2) or ceramics (from 10,000 to 20,000 kg/mm2). Accordingly, when the plate is made of only an organic resin material, there is some possibility that it follows a drive pressure of the ink-jet to cause deformation and that it generates a pressure loss, resulting in a lowering of the ink droplet rate Vj. By laminating a high-rigidity material beneath the resin material with a thin film adhesive (adhesive layer), the stiffness of the whole is enhanced.
The thickness of the plate is preferably from about 30 to 50 μm in view of processing strength, energy load required for the processing, light weight as a head, etc.
It is preferable that irregularities are formed on the surface of the substrate on which the cured film of the ink repelling treated portion of the invention is formed.
The adhesion to the cured film is kept by an anchor effect with the cured film of the ink repelling treated portion, whereby the strength of the cured film is enhanced.
It is preferable that the surface of the substrate on which the cured film of the ink repelling treated portion has a surface shape such that an arithmetical mean roughness (Ra) of surface irregularities, based on JIS B0601-1994, is not more than 0.5 μm, that a ratio (Ra/Rz) of an arithmetical mean roughness (Ra) to a ten-point mean roughness (Rz) is 0.1 or more, that a maximum height (Ry) is not more than 0.5 μm, and that a mean space of surface irregularities (Sm) is in the range of from 0.005 to 1 μm. It is more preferable that Ra is from 0.01 to 0.3 μm, that the ratio (Ra/Rz) of Ra to the ten-point mean roughness (Rz) is 0.15 or more, that the maximum height (Ry) is not more than 0.3 μm, and that the mean space of surface irregularities (Sm) is from 0.001 to 0.5 μm.
When the surface shape falls within the foregoing range, the cured film of the ink repelling portion can be kept uniform in coating property and good in adhesion, and hence, such is preferable.
Further, instead the formation of the cured film of the ink repelling treated portion directly on the substrate, when an interlayer as described later is provided, it is preferable that after imparting an irregular shape to the surface of an interlayer on which the cured film of the ink repelling treated portion is formed, the cured film-forming composition is coated thereon. The preferred surface irregular state is the same as in the foregoing range.
(Interlayer)
In the inkjet recording head of the invention, at least one interlayer may be provided between the foregoing nozzle plate (substrate) and the ink repelling treated portion (cured film). It is preferred to make the interlayer have functions such as adhesion, hard coating property, primer property, and conductivity.
The interlayer preferably has adhesion and may be made of any of an inorganic layer, an organic layer, or an inorganic-organic hybrid layer. The interlayer is adequately chosen according to a combination of the substrate and the ink repelling treated portion from the viewpoint of adhesion. It is preferable that the interlayer also has hard coating property (a layer having a pencil hardness of 2 or more, and preferably 3 or more). Further, it is preferred to impart conductivity to the interlayer.
In the case where the interlayer is made of an organic layer or an inorganic-organic hybrid layer, it is preferable that the interlayer is formed by crosslinking reaction or polymerization reaction of a light and/or heat curable compound. For example, the interlayer can be formed by coating a coating composition containing a polyester (meth) acrylate, a polyurethane (meth)acrylate, a polyfunctional monomer or polyfunctional oligomer, or a hydrolyzable functional group-containing organometallic compound on a transparent support and subjecting to crosslinking reaction or polymerization reaction.
Photopolymerizable functional groups are preferable as the curable functional group. Also, organic alkoxysilyl compounds are preferable as the hydrolyzable functional group-containing organometallic compound. Further, by adequately jointly using the foregoing fine particles of the cured film-forming composition of the ink repelling treated portion, the hard coating property is enhanced. Further, it is possible to impart conductivity by containing the foregoing conductive fine particles.
In the case where the interlayer is a layer to be provided directly under the ink repelling ink treated portion of the invention, it is preferable that irregularities are formed on the surface of the foregoing layer.
The adhesion to the cured film is kept by an anchor effect with the cured film of the ink repelling treated portion, whereby the strength of the cured film is enhanced.
The preferred surface shape of the interlayer is the same range as in the values of the surface shape of the surface of the substrate on which the foregoing cured film of the ink repelling treated portion is formed.
(Method of Imparting Irregular Shape)
As a method of forming the foregoing fine irregular shape on the surface of the substrate or interlayer on which the cured film of the ink repelling portion is formed, a method of modifying the shape of the surface of the conventionally known substrate, a method in which the interlayer itself has the surface state of a fine irregular shape when formed, or a combination thereof can be employed.
Examples of the shape modification method of the substrate surface include a dry etching method and an embossing method in which in the case where the substrate is an organic layer, irregularities are transferred onto the film surface from an embossing plate or sticking sheet.
Examples of the dry etching method include glow discharge etching, flame plasma etching, corona discharge etching, and electron beams energy irradiation etching described in Surface Treatment Technology Handbook—From Adhesion and Coating Until Electronic Materials—, Second Edition, Third Section, supervised by Hiroshi Mizumachi and Mitsuru Tobayama (published by NTS Inc. (2000)), Beam Processing of Polymers—Utilization of Light, Plasma and Radiation—, compiled by Shigeo Tadzuki (published by CMC Publishing Co., Ltd. (1986)), and Application of Plasma Ion Beam and Nanotechnology, Chapters 1 to 4, compiled by Eiji Kamijo (published by CMC Publishing Co., Ltd. (2002)).
Also, as the embossing method, all of flat plate press, continuous belt plate press, and roll plate press can be employed. Of these, continuous belt plate press and roll plate press are preferable as continuous processing of stripe materials, and roll plate press is most preferable from the viewpoint of degree of freedom of press pressure and press temperature.
Examples of the interlayer having surface irregularities include metal oxide films obtained by coating a sol-gel reaction product obtained from a hydrolyzate of a hydrolyzable group-containing organometallic compound, followed by heating or plasma irradiation; and cured films obtained by coating a composition containing a light and/or heat curable compound and fine particles.
(Characteristic of Ink Repelling Treated Portion)
(Shape of Surface)
It is preferable that the surface of the ink repelling treated portion, namely, the surface on which a discharge opening of the nozzle hole is provided, has a shape such that an arithmetical mean roughness (Ra) of surface irregularities is not more than 1 μm, that a maximum height (Ry) is not more than 3 μm, and that a mean space of surface irregularities (Sm) is not more than 15 μm. It is more preferable that (Ra) is in the range of from 0.01 to 0.5 μm, that a maximum height (Ry) is not more than 2 μm, and that a mean space of surface irregularities (Sm) is in the range of from 0.02 to 10 μm.
When the surface has the foregoing surface state, the ink repelling property of the ink repelling treated portion is kept satisfactorily against wiping of the surface of a nozzle opening using a wiper made of a rubber or cloth.
(Antistatic Property)
It is preferable that when a charge voltage is given to the surface of the ink repelling treated portion to measure its decay, a time required such that the charge amount becomes ½ of the initial value (hereinafter referred to as “charge voltage half life”) is not longer than 60 seconds. In the case where the charge voltage half life is not longer than 30 seconds, the effect is high, and hence, such is preferable. When the charge voltage half life is not longer than 60 seconds, the antistatic effect after providing the ink repelling treated portion is satisfactory, and the effect of preventing the attachment of dusts by wiping operation or the like is reduced. Thus, such is preferable.
A specific method of measuring the charge voltage half life will be described below. First of all, the surface is electrified by direct current corona discharge while monitoring the charge voltage of the surface of an article using an electrostatic potentiometer. The charge voltage increases with the progress of discharge and becomes saturated at a certain potential. At this moment, the potential is defined as a saturated voltage. Then, the discharge is stopped, and a time from this moment until the charge voltage becomes ½ of the saturated voltage is measured.
(Inkjet Recording Device)
The cured film of the invention can be provided in the ink repelling treated portion of the inkjet recording head capable of injecting fine droplets. Such an inkjet recording head having the ink repelling treated portion can be used in all of inkjet recording systems. Specifically, the contents described in the publications in the preceding section of recording head are enumerated.
Further, the invention can be applied adequately to instruments other than the inkjet recording device, which are a device suitable for injecting fine droplets through a small nozzle and require liquid repelling property on the nozzle plate. Examples of the liquid include paints (varnishes), solvents, and drug fluids.
The invention will be described below with reference to the Examples, but it should not be construed that the invention is limited to these Examples. Incidentally, the ink repelling treated portion of the invention and the cured film-forming composition of the invention will be hereinafter sometimes referred to “ink repelling layer” and “coating solution for ink repelling layer”, respectively.
(Synthesis of Block Copolymer)
Synthesis Example 1 of Graft Type Block Copolymer A Type: Block Copolymer (GA-1)
A mixture of 50 g of a fluorine-containing copolymer (FP-1) having the following structure, 7.5 g of a reactive siloxane oligomer (SO-1) having the following structure, and 93 g of xylene was heated at a temperature of 120° C., to which was then added 0.01 g of dodecyl dimethylamine, followed by stirring for 6 hours. After cooling to room temperature, the reaction mixture was re-precipitated in 500 mL of petroleum ether, and a precipitate was collected and dried in vacuo to obtain a block copolymer (GA-1) in a yield of 49 g. The resulting polymer had a weight average molecular weight of 5×104 (as reduced into polystyrene by GPC).
Also, according to the GPC histogram, no peak corresponding to the reactive siloxane oligomer (SO-1) was observed.
Synthesis Example 2 of Graft Type Block copolymer A Type: Block Copolymer (GA-2)
A mixture of 8.5 parts by weight of a reactive siloxane oligomer (SO-2) having the following structure, 0.15 parts by weight of methanesulfonic acid, and 135 parts by weight of toluene was stirred at room temperature (25° C.) for one hour. Next, 50 parts by weight of a fluorine-containing copolymer (FP-2) having the following structure, which was synthesized in the same manner as in the experimental examples described in the foregoing J. Am. Chem. Soc., 116 (No.9), 4135 (1994), was added to the resulting mixture, followed by further stirring for 10 hours.
The reaction product was re-precipitated in 750 mL of ligroin, and a sediment was collected and dried in vacuo to obtain a block copolymer (GA-2) in a yield of 50 parts by weight.
The resulting polymer had a weight average molecular weight of 7×104 (as reduced into polystyrene by GPC). Also, according to the GPC histogram, no peak corresponding to the reactive siloxane oligomer (SO-2) was observed.
Synthesis Example 3 of Graft Type Block Copolymer A Type: Block Copolymer (GA-3)
A mixture of 50 parts by weight of a fluorine-containing copolymer (FP-3) having the following structure, 12.5 parts by weight of a reactive siloxane oligomer (SO-3) having the following structure, and 140 parts by weight of a fluorine based solvent Fluorinert FC-75 (manufactured by Sumitomo 3M Ltd.) was stirred. Next, a mixed solution of 2 parts by weight of N,N-dicyclohexyl carbodiimide (abbreviated as D.C.C.), 0.05 parts by weight of 4-(N,N-dimethylamino)pyridine, and 5 parts by weight of methylene chloride was dropped over 10 minutes, and the mixture was stirred for one hour as it was, and then heated at a temperature of 40° C. and stirred for 4 hours.
One part by weight of formic acid was added, and the mixture was stirred for 2 hours. A deposit was filtered out by filtration using cerite and re-precipitated in 800 mL of n-hexane. A sediment was collected and dried in vacuo to obtain a block copolymer (GA-3) in a yield of 51 parts by weight. The Mw was 7×104.
According to the GPC histogram, no peak corresponding to the reactive siloxane oligomer (SO-3) was observed.
Synthesis Example 4 of Graft Type Block Copolymer A Type: Block Copolymer (GA-4)
A mixture of 50 g of a fluorine-containing copolymer (FP-4) having the following structure, 10 g of a reactive siloxane oligomer (SO-4) having the following structure, and 140 g of toluene was stirred at a temperature of 80° C. for 4 hours. The reaction mixture was concentrated in vacuo (from 20 to 30 mmHg) by discharging about 80 g of the toluene as the solvent.
The resulting reaction mixture was re-precipitated in 500 mL of n-hexane, and a sediment was collected and dried in vacuo to obtain a block copolymer (GA-4) in a yield of 50 g. The Mw was 6.5×104.
According to the GPC histogram of the resulting product, no peak corresponding to the reactive siloxane oligomer (SO-4) was observed.
Synthesis Example 5 of Graft Type Block Copolymer A Type: Block Copolymer (GA-5)
A mixture of 50 parts by weight of a fluorine-containing copolymer (FP-5) having the following structure, 7.5 parts by weight of a reactive siloxane oligomer (SO-5) having the following structure, and 135 parts by weight of xylene was heated at a temperature of 120° C., to which was then added 0.01 parts by weight of dodecyl dimethylamine, followed by stirring for 8 hours. After cooling to room temperature, the reaction mixture was re-precipitated in 800 mL of petroleum ether, and a sediment was collected and dried in vacuo to obtain a block copolymer (GA-5) in a yield of 48 parts by weight. The resulting polymer had an Mw of 5×104.
Also, according to the GPC histogram, no peak corresponding to the reactive siloxane oligomer (SO-5) was observed.
Synthesis Example 6 of Graft Type Block Copolymer A Type: Block Copolymer (GA-6)
A mixture of 20 parts by weight of the block copolymer (GA-2) obtained in the foregoing Synthesis Example 2 of graft type block copolymer A type, 2.5 parts by weight of 2-[2-(carboxyethylcarbonyloxo)]ethyl methacrylate, and 37 parts by weight of tetrahydrofuran was dissolved under stirring at room temperature. To this solution, a mixed solution of 1.0 part by weight of D.C.C., 0.01 parts by weight of 4-(N,N-dimethylamino)pyridine, and 3 parts by weight of tetrahydrofuran was dropped over 5 minutes, and the mixture was stirred for 2 hours as it was. The resulting mixture was further heated at a temperature of 35° C. and stirred for 3 hours.
One part by weight of formic acid was added, and the mixture was stirred for 3 hours. A deposit was filtered out by filtration using cerite and re-precipitated in 150 mL of n-hexane. A sediment was collected and dried in vacuo to obtain a block copolymer (GA-6) having an Mw of 7×104 in a yield of 15 parts by weight.
Synthesis Example 7 of Graft Type Block Copolymer A Type: Block Copolymer (GA-7)
An autoclave was charged with 26.0 parts by weight of perfluorodiallyl ether, 10.0 parts by weight of a cyclohexane macromonomer (SM-1) having the following structure, 4.0 parts by weight of 2-hydroxyethyl perfluorovinyl ether, and 75 parts by weight of toluene and sufficiently deaerated. 0.8 parts by weight of a polymerization initiator diisopropyl peroxydicarbonate (hereinafter abbreviated as “IPP”) was thrown, and the mixture was stirred at 40° C. for 8 hours. Further, 0.5 parts by weight of IPP was thrown, and after sufficient deaeration, the mixture was stirred at a temperature of 55° C. for 8 hours. After stopping the heating and standing for cooling, the reaction solution was taken out from the autoclave and re-precipitated in 1.0 L of n-hexane. A precipitate was collected and dried in vacuo to obtain 34 parts by weight of a block copolymer (GA-7) having an Mw of 5×104.
Synthesis Examples 8 to 10 of Graft Type Copolymer A Type: Block Copolymers (GA-8 to GA-10)
Respective polymers shown in the following Table 1 were synthesized in the same manner as in the synthesis example of the block copolymer (GA-5). The yield of the respective polymers was from 35 to 38 parts by weight, and the Mw was in the range of from 4×104 to 7×104.
Synthesis Example 1 of Graft Type Block Copolymer B Type: Block Copolymer (GB-1)
(Synthesis of Fluorine-Containing Macromonomer (FM-1))
An autoclave was charged with a mixture of 40 parts by weight of perfluoroallyl vinyl ether, 10 parts by weight of a monomer (F-1) having the following structure, 0.5 parts by weight of 3-mercaptopropionic acid, and 100 parts by weight of Fluorinert FC-75 and sufficiently deaerated. The temperature was set up at 45° C., 0.75 parts by weight of IPP as a polymerization initiator was added, and the mixture was stirred for 8 hours. 0.5 parts by weight of IPP was further added, and the mixture was stirred at a temperature of 50° C. for 8 hours. After standing for cooling to room temperature, the reaction mixture was re-precipitated in 800 mL of methanol, and a sediment was collected and dried in vacuo. The yield was 42 parts by weight, and the Mw was 8×103.
A mixture of 40 parts by weight of this mixture, 2.5 parts by weight of glycidyl methacrylate, 0.05 parts by weight of dodecyl dimethylamine, 0.01 parts by weight of 2,4-di-t-butylhydroquinone, and 80 parts by weight of toluene was stirred at a temperature of 110° C. for 6 hours. After cooling to room temperature, the reaction mixture was re-precipitated in 700 mL of methanol, and a sediment was collected and dried in vacuo to obtain a fluorine-containing macromonomer (FM-1) having an Mw of 8.5×103 in a yield of 34 parts by weight.
(Synthesis of Block Copolymer (GB-1))
A mixture of 55 parts by weight of a monomer (S-1) having the following structure, 30 parts by weight of the foregoing fluorine-containing macromonomer (FM-1), 15 parts by weight of glycidyl methacrylate, and 185 parts by weight of toluene was heated at a temperature of 70° C. under a nitrogen gas stream while stirring. 1.2 parts by weight of 2,2′-azobisisobutyro-nitrile (abbreviated as A.I.B.N.) was added to the reaction mixture, followed by stirring for 6 hours. Further, 1.0 part by weight of A.I.B.N. was added, and the mixture was stirred at a temperature of 75° C. for 4 hours. After cooling to room temperature, the reaction mixture was re-precipitated in 1.0 L of methanol, and a sediment was collected and dried in vacuo to obtain a block copolymer (GB-1) having an Mw of 7×104 in a yield of 84 parts by weight.
Synthesis Example 2 of Graft Type Block Copolymer B Type: Block Copolymer (GB-2)
(Synthesis of Fluorine-Containing Macromonomer (FM-2))
A stainless steel-made stirrer-equipped autoclave having an inner volume of 100 mL was charged with 40 mL of tetrahydrofuran, 27.5 g of a monomer (F-2) having the following structure, and 2.5 g of 2,2′-azobis(2-cyano-heptanol) (abbreviated as A.B.C.H.), and the inside of the system was deaerated and purged with a nitrogen gas. Further, 22.5 g of hexafluoropropylene (HFP) was introduced into the autoclave, and the temperature was raised to 65° C. A pressure at the point of time when the temperature in the autoclave reached 65° C. was 5.4 kg/cm2 (529 kPa). The reaction was continued for 4 hours as it was, and a solution of 1.5 g of A.B.C.H. dissolved in 5 mL of tetrahydrofuran was then added thereto by utilizing a nitrogen gas pressure.
After continuing the reaction for an additional 6 hours, heating was then stopped, and the reaction mixture was allowed to stand for cooling. At the point of time when the internal temperature lowered to room temperature, the autoclave was opened, and the reaction solution was taken out and thrown into a 200-mL three-necked flask.
4.0 g of 2-(methacryloyloxy)ethyl isocyanate, 0.05 g of dibutyltin dilaurate, and 0.1 g of t-butylhydroquinone were added thereto, and the mixture was stirred at 50° C. for 6 hours. After standing for cooling, the reaction mixture was re-precipitated in one liter of methanol. A sediment was collected and dried in vacuo to obtain a macromonomer (FM-2) having a weight average molecular weight of 7.5×1 03 in a yield of 40 g.
(Synthesis of Block Copolymer (GB-2))
A mixed solution of 27.5 g of a monomer (S-2) having the following structure, 15 g of a fluorine-containing macro-monomer (FM-2), 7.5 g of a monomer (A-1) having the following structure, and 100 g of toluene was heated to a temperature of 85° C. under a nitrogen gas stream while stirring. 0.6 g of 2,2′-azobis(isobutyronitrile) (abbreviated as “A.I.B.N.”) was added, and the mixture was reacted for 4 hours. 0.3 g of A.I.B.N. was further added, and the mixture was reacted for 2 hours. 0.2 g of A.I.B.N. was additionally added, and the mixture was reacted for 2 hours. After cooling, this mixed solution was re-precipitated in one liter of methanol, and a powder was collected by filtration and dried to obtain 41 g of a white powder. A block copolymer (GB-2) thus obtained had an Mw of 6×104.
Synthesis Example 3 of Graft Type Block Copolymer B Type: Block Copolymer (GB-3)
(Synthesis of Fluorine-Containing Macromonomer (FM-3))
A round window made of quartz was inserted into the side wall of a 2-liter AISI 316 autoclave equipped with a stirrer capable of actuating at 400 rpm, and a Hanau (a registered trademark) TQ-150 UV lamp was aligned coincident with the quartz round window. This lamp is a high pressure mercury vapor lamp, emits light having a wavelength of from 240 to 600 nm, and has energy of 13.2 W in light having a wavelength of from 240 to 330 nm.
This device was charged with 45 g of a monomer (F-3) having the following structure, 2.0 g of a photopolymerization initiator having the following structure, and 100 g of tetrahydrofuran, and the inside of the system was deaerated and purged with a nitrogen gas. Further, 55 g of octafluorobutene was introduced into the autoclave, and the temperature was raised to 45° C. After continuing the reaction for 10 hours, heating was stopped, and the reaction mixture was allowed to stand for cooling. At the point of time when the internal temperature lowered to room temperature, the autoclave was opened, and the reaction solution was taken out. The tetrahydrofuran was concentrated to prepare a 30% by weight solution of toluene.
Next, 8 g of glycidyl methacrylate, 0.1 g of N,N-di-methyldodecylamine, and 0.05 g of t-butylhydroquinone was added to this reaction solution, and the mixture was stirred at a temperature of 100° C. for 8 hours. After cooling, the reaction solution was re-precipitated in 1.5 liters of methanol, and a sediment was collected and dried in vacuo. The yield of a fluorine-containing macromonomer (FM-3) thus obtained was 82 g, and the Mw was 5×103.
(Synthesis of Block Copolymer (GB-3))
A mixed solution of 22.5 g of a monomer (S-3) having the following structure, 17.5 g of the fluorine-containing macromonomer (FM-3), 5 g of 2-hydroxyethyl methacrylate, and 100 g of toluene was heated at a temperature of 85° C. under a nitrogen gas stream while stirring. 0.6 g of A.I.B.N. was added, and the mixture was reacted for 4 hours. 0.3 g of A.I.B.N. was further added, and the mixture was reacted for 2 hours. 0.2 g of A.I.B.N. was additionally added, and the mixture was reacted for 2 hours. After cooling to room temperature, 10.5 g of 2-(2-carboxyethylcarbonyloxy)ethyl methacrylate, 0.1 g of t-butylhydroquinone, and 16 g of toluene were added to this reaction solution, followed by stirring. To the resulting mixture, a mixed solution of 8.5 g of D.C.C., 0.05 g of N,N-dimethylaminopyridine, and 15 g of methylene chloride was dropped over 20 minutes, and the mixture was stirred for one hour as it was. The temperature was raised to 40° C., and the mixture was further stirred for 3 hours. A deposited crystal was filtered out, and the resulting filtrate was re-precipitated in one liter of methanol. A precipitate was collected and dissolved in 100 mL of methylene chloride, and the solution was again re-precipitated in one liter of methanol. A sediment was collected and dried in vacuo to obtain a block copolymer (GB-3) having an Mw of 7×104 in a yield of 33 g.
Synthesis Examples 4 to 6 of Graft Block Copolymer B Type: Block Copolymers (GB-4 to GB-6)
Respective copolymers shown in the following Table 2 were synthesized in the same manner as in the synthesis example of the block copolymer (GB-1). The yield of the respective polymers was from 85 to 88 parts by weight, and the Mw was in the range of from 6×10 to 8×104.
Synthesis Example 1 of Linear Block Copolymer: Synthesis of Block Copolymer (L-1)
A round window made of quartz was inserted into the side wall of a 2-liter AISI 316 autoclave equipped with a stirrer capable of actuating at 400 rpm, and a Hanau (a registered trademark) TQ-150 UV lamp was aligned coincident with the quartz round window. This lamp is a high pressure mercury vapor lamp, emits light having a wavelength of from 240 to 600 nm, and has energy of 13.2 W in light having a wavelength of from 240 to 330 nm.
This device was charged with 45 g of a monomer (F-4) having the following structure, 2.0 g of a photopolymerization initiator having the following structure, and 100 g of tetrahydrofuran, and the inside of the system was deaerated and purged with a nitrogen gas. Further, 55 g of octafluorobutene was introduced into the autoclave, and the temperature was raised to 45° C. After continuing the reaction for 10 hours, heating was stopped, and the reaction mixture was allowed to stand for cooling. At the point of time when the internal temperature lowered to room temperature, the autoclave was opened, and the reaction solution was taken out.
A mixture of 50 g (as solids content) of the foregoing reaction solution, 40 g of a monomer (S-4) having the following structure, 10 g of glycidyl methacrylate, and 50 g of tetrahydrofuran was heated to a temperature of 50° C. under a nitrogen gas stream. This solution was photopolymerized upon irradiation with light using a 400-W high pressure mercury vapor lamp from a distance of 10 cm through a glass filter for 6 hours. The resulting polymer was re-precipitated in 800 mL of methanol, and a precipitate was collected and dried to obtain a block copolymer (L-1) in a yield of 40 g.
The polymer had a weight average molecular weight (Mw) of 6×104 (the weight average molecular weight (Mw) being expressed in terms of a value as reduced into polystyrene by the G.P.C. method, hereinafter the same).
Synthesis Example 2 of Linear Block Copolymer: Synthesis of Block Copolymer (L-2)
(Synthesis of Prepolymer)
A stainless steel-made stirrer-equipped autoclave having an inner volume of 100 mL was charged with 40 mL of tetrahydrofuran, 20 g of a monomer (F-5) having the following structure, 1.2 g of 3-mercaptopropionic acid, and 1.0 g of 2,2′-azobis(isovaleronitrile) (abbreviated as A.I.V.N.), and the inside of the system was deaerated and purged with a nitrogen gas. Further, 30.0 g of hexafluoropropylene (HFP) was introduced into the autoclave, and the temperature was raised to 65° C. The reaction was continued for 4 hours as it was, and a solution of 0.3 g of A.I.V.N. dissolved in 5 mL of tetrahydrofuran was then added thereto by utilizing a nitrogen gas pressure.
After continuing the reaction for an additional 6 hours, heating was then stopped, and the reaction mixture was allowed to stand for cooling. At the point of time when the internal temperature lowered to room temperature, the autoclave was opened, and the reaction solution was taken out and thrown into a 200-mL three-necked flask.
To this reaction solution, a mixed solution of 2.5 g of a dithiocarbamate compound having the following structure, 5.7 g of dicyclohexyl carbodiimide (abbreviated as “D.C.C.”), 0.02 g of 4-(N,N-dimethylamino) pyridine, and 10 g of methylene chloride was dropped over 30 minutes. 1.0 g of t-butyl-hydroquinone was add thereto, and the mixture was stirred for 4 hours as it was. A deposited crystal was filtered out, and the resulting filtrate was re-precipitated in 800 mL of methanol. A sediment was collected by decantation and dissolved in 80 mL of tetrahydrofuran, and the solution was again re-precipitated in 500 mL of methanol. A sediment was collected and dried in vacuo to obtain a prepolymer having a weight average molecular weight of 1.5×104 in a yield of 44 g.
(Synthesis of Block Copolymer (L-2))
A mixture of 30 g of the foregoing prepolymer, 15 of a monomer (S-5) having the following structure, 5 g of 2-(meth-acryloyloxy) ethyl isocyanate, and 50 g of tetrahydrofuran was heated at a temperature of 55° C. under a nitrogen gas stream. This solution was irradiated with light using a 400-W high pressure mercury vapor lamp from a distance of 10 cm through a glass filter for 6 hours. The resulting polymer was re-precipitated in 500 mL of acetonitrile, and a precipitate was collected and dried to obtain a block copolymer (L-2) in a yield of 41 g.
The polymer had an Mw of 3×104.
Synthesis Example 3 of Linear Block Copolymer: Block Copolymer (L-3)
(Synthesis of Prepolymer)
A mixture of 35 g of a monomer (S-6) having the following structure, 15 g of 2-hydroxyethyl methacrylate, 0.85 g of a photopolymerization initiator having the following structure, and 50 g of tetrahydrofuran was heated at a temperature of 50° C. under a nitrogen gas stream. This solution was irradiated with light using a 400-W high pressure mercury vapor lamp from a distance of 10 cm through a glass filter for 6 hours. The reaction product was re-precipitated in 600 mL of methanol, and a precipitate was collected and dried to obtain a prepolymer having an Mw of 4.5×104 in a yield of 45 g.
(Synthesis of Block Copolymer)
20 g of the foregoing prepolymer, 7.5 g of a monomer (F-6) having the following structure, and 50 g of tetrahydrofuran were thrown into the same light irradiation unit-equipped autoclave as used in Synthesis Example 1, and the inside of the system was deaerated and purged with a nitrogen gas. Further, 22.5 g of hexafluoropropylene (HFP) was introduced into the autoclave, and the temperature was raised to 65° C.
After continuing the reaction for 8 hours as it was, heating was stopped, and the reaction mixture was allowed to stand for cooling. At the point of time when the internal temperature lowered to room temperature, the autoclave was opened, and the reaction solution was taken out and re-precipitated in 600 mL of methanol.
A precipitate was collected and dried in vacuo to obtain a block copolymer (L-3) in a yield of 42 g. The polymer had an Mw of 7.5×104.
Synthesis Examples 4 to 7 of Linear Block Copolymer: Block Copolymers (L-4) to (L-7)
Block copolymers (L-4) to (L-7) shown in the following Table 3 were synthesized in the same manner as in the synthesis example of the block copolymer (L-1).
The yield of the respective polymers was from 42 to 45 g, and the Mw was in the range of from 5×104 to 7×104.
Coating Solution (HL-1) for Ink Repelling Layer
A mixture of 5.4 parts by weight of the block copolymer (GA-4), 1.1 parts by weight (as solids content) of an epoxy based curing agent DEX314 (manufactured by Nagase Kasei Kogyo K.K.), 0.35 parts by weight of p-toluenesulfonic acid, and 38.8 parts by weight of methyl ethyl ketone was stirred to prepare a coating solution (HL-1) for ink repelling layer.
(Preparation of Ink Repelling Treated Plate)
A polyimide sheet (manufactured by Ube Industries, Ltd.) having a thickness of 125 μm was used as a nozzle plate. The coating solution (HL-1) for ink repelling layer was coated in a film thickness after curing of 1 μm on the surface of the nozzle plate in which a nozzle hole portion thereof had been previously protected by a positive resist from the back surface side of the plate using a bar coater. After coating, the nozzle plate was air dried for one minute, heated at 120° C. for 30 minutes, and then allowed to stand for cooling to room temperature to form an ink repelling layer. Thereafter, the resist was removed to prepare an ink repelling treated nozzle plate (HP-1).
The FIGURE is a cross-sectional view to show an embodiment of the invention in which an ink repelling layer 3 is placed on the outer surface of a nozzle plate 1 having a nozzle hole 2 aligned therein, the cross-section view cutting the nozzle hole and the vicinity of the nozzle hole.
An ink repelling treated nozzle plate (HR-1) was prepared in the same manner as in Example 1, except for using the following comparative coating solution (HL-R1) in place of the coating solution (HL-1) for ink repelling layer used in Example 1.
(Preparation of Comparative Coating Solution (HL-R1) for Ink Repelling Layer)
A mixture of 4.6 parts by weight of the fluorine-containing copolymer (FP-4) used in the foregoing Synthesis Example 4 of graft copolymer (GA-4), 0.8 parts by weight of the reactive siloxane oligomer (SO-3) used in the foregoing Synthesis Example 3 of block copolymer (GA), 1.1 parts by weight (as solids content) of an epoxy based curing agent DEX314, 0.35 parts by weight of p-toluenesulfonic acid, 35 parts by weight of Fluorinert FC-75, and 3.8 parts by weight of cyclohexanone was stirred using an ultrasonic dispersion machine, to prepare a coating solution (HL-R1) for ink repelling layer.
An ink repelling treated nozzle plate (HR-2) was prepared in the same manner as in Example 1, except for using the following comparative coating solution (HL-R2) in place of the coating solution (HL-1) for ink repelling layer used in Example 1.
(Preparation of Coating Solution (HL-R2) for Ink Repelling Layer)
A mixture of 5.4 parts by weight of the fluorine-containing copolymer (FP-2), 1.1 parts by weight (as solids content) of an epoxy based curing agent DEX314, 0.35 parts by weight of p-toluenesulfonic acid, 35 parts by weight of Fluorinert FC-75, and 3.8 parts by weight of cyclohexanone was stirred using an ultrasonic dispersion machine, to prepare a coating solution (HL-R2) for ink repelling layer.
An ink repelling treated nozzle plate (HR-3) was prepared in the same manner as in Example 1, except for using the following comparative coating solution (HL-R3) in place of the coating solution (HL-1) for ink repelling layer used in Example 1.
(Preparation of Comparative Coating Solution (HL-R3) for Ink Repelling Layer)
A coating solution (HL-R3) was prepared in the same manner as in the preparation method of the coating solution (HL-1) for ink repelling layer, except for using 5.4 parts by weight of a comparative fluorine-containing copolymer (random copolymer) (PR-1) having the following structure in place of 5.4 parts by weight of the graft copolymer (GA-4) in the coating solution HL-1).
(Evaluation of Ink Repelling Layer)
With respect to the resulting respective ink repelling layers (Example 1 and Comparative Examples 1 to 3), the following performances were evaluated. The results obtained are shown in Table 4.
(1) Coating Surface Property:
The surface of the ink repelling layer was visually observed, and the degree of the coating surface property such coating stripe and unevenness was evaluated according to the following criteria.
One hundred crosshatches of 1 mm×1 mm were provided on the surface of the cured resin layer of each of the curing treated film and curing treated glass samples using a cutter. After standing under conditions at a temperature of 25° C. and a relative humidity of 60% for 2 hours, Cellotape (a registered trademark, manufactured by Nichiban Co., Ltd.) was stuck thereon and then peeled apart. The number of crosshatches of the cured coating peeled apart from the film substrate was measured and evaluated according to the following criteria.
The film surface was rubbed 10 times under a load of 200 g using steel wool #0000, and the level of the presence of scratches was then confirmed. The judgment was carried out according to the following criteria.
The ink repelling film was dipped in distilled water, washed in a ultra-high speed washing machine for one minute, and then air dried. 10 μL of a drop of distilled water was dropped on the sample surface under conditions at 25° C. and 65% RH using an inclination friction meter HEIDON 47L-388 (manufactured by Shinto Scientific Co., Ltd.), and a rolling angle of the waterdrop was measured. The evaluation was carried out according to the following criteria.
The sample was dipped in an ink having formulation in an atmosphere at 50° C. for 3 days, to examine the ink repelling property. The ink repelling property was evaluated according to the following criteria.
Further, as the degree of change of the ink repelling property, the case where a change in the ink repelling property was not substantially observed as compared with that before dipping is designated as “AA”, and the case where the ink repelling property was deteriorated is designated as “BB”.
(6) Durability:
The ink repelling film surface of the ink repelling treated nozzle plate was subjected to a wiping operation (cleaning operation) under the following conditions. Thereafter, the nozzle plate was mounted on an actual ink-jet head, and an image was printed on recording paper. The presence or absence of a difference from a printed sample by a nozzle plate at the initial stage when no wiping operation was carried out was evaluated according to the following criteria.
Wiping Operation:
The ink repelling film surface of the nozzle plate was subjected to an wiping operation 10,000 times in the ink-wetted state using a wiper made of a polyurethane rubber having a thickness of 1 mm under conditions of a wiping speed of 100 mm/sec and a biting amount of the wiper into the nozzle surface of 0.6 mm.
Printing Quality:
C: Dot deletion and divergence of impact position are remarkably observed, and the characters cannot be discriminated.
The ink repelling treated nozzle plate (HP-1) of the invention exhibited good coating property of the ink repelling layer and uniform and good film surface property. Also, it exhibited satisfactory performances in adhesion and abrasion resistance of the film from the standpoint of practical use. Further, as to the slip angle, the fine waterdrop slipped off only at an angle of inclination of 5°. This demonstrates that the repellency of droplet is extremely good. Also, the durability of ink repelling property was good. Further, the durability of the inkjet recording device was evaluated with respect to the actual printing quality. As a result, the printing quality before the durability test was sufficiently kept.
On the other hand, in Comparative Example 1 (HR-1) prepared by blending the fluorine-containing copolymer (FP-4) and the reactive siloxane oligomer (SO-3) as the starting raw materials of the graft type block copolymer of the invention and curing the blend to form a film, the surface property of the film was not good, the strength of the film lowered, and the results of the durability test were poor. Since the fluorine-containing copolymer (FP-4) itself was poor in solubility in organic solvents, a coating solution of a specific fluorine based solvent system was used. However, the coating surface property became worse. Also, bleed-out of the polysiloxane onto the film surface occurred, and the characteristics of the film changed with a lapse of time.
In the ink repelling treated nozzle plate (HR-2) of Comparative Example 2 prepared by curing the fluorine-containing copolymer (FP-2) to form a film, though the adhesion of the film was good, the waterdrop slip property was insufficient, and the printing durability lowered.
Further, in the ink repelling treated nozzle plate (HR-3) of Comparative Example 3 prepared by curing the comparative fluorine-containing copolymer (random copolymer) (PR-1) to form a film, though the film strength was sufficient, the waterdrop slip property was large as 500 or more, the ink repelling property was insufficient, and the prints after the durability test were remarkably deteriorated.
In the light of the above, only Example 1 can easily form a uniform thin film and that the resulting inkjet recording device of an ink repelling treated nozzle plate exhibits excellent performances in ink repelling property and durability against wiping.
Also, these results were exactly equal to those obtained by replacing the plate material with a polysulfone sheet or stainless a steel sheet.
(Coating Solution (HL-2) for Ink Repelling Layer)
100 parts by weight of the following inorganic fine particle dispersion, 33 parts by weight of methyl ethyl ketone, 517 parts by weight of cyclohexanone, 3.0 parts by weight of a polymerization initiator Irgacure 907 (manufactured by Ciba-Geigy Japan Limited), and 2.1 parts by weight of a photosensitizer Kayacure DETX (manufactured by Nippon Kayaku Co., Ltd.) were added to 80 parts by weight of the block copolymer (GA-6) of the invention and 20 parts by weight of a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (DPHA, manufactured by Nippon Kayaku Co., Ltd.), and stirred. The reaction mixture was filtered using a polypropylene-made filter having a pore size of 0.4 μm to prepare a coating solution (HL-2) for ink repelling layer.
(Inorganic Fine Particle Dispersion)
20 parts by weight of the following dispersant and 360 parts by weight of cyclohexanone were added to 100 parts by weight of zirconium oxide particles and dispersed by a Dyno mill using zirconia beads having a particle size of 0.2 mm. The beads were separated by filtration using a 200-mesh nylon cloth to prepare a fine particle dispersion. The dispersed particle size of the resulting dispersion was measured using a scanning electron microscope. As a result, the dispersion had good monodispersibility and a mean particle size of 55 nm.
Also, the particle size distribution of the dispersion was measured (laser scattering particle size distribution analyzer LA-920, manufactured by Horiba, Ltd.). As a result, the rate of particles having a particle size of 300 nm or moe was 0%.
(Preparation of Ink Repelling Treated Plate (HP-2))
The coating solution (HL-2) for ink repelling layer was used in place of the coating solution (HL-1) for ink repelling layer used in Example 1 and coated in a film thickness after curing of 1 μm using a bar coater in the same manner as in Example 1. After drying at 100° C., ultraviolet rays were irradiated at an illuminance of 400 W/cm2 and an irradiation dose of 500 mJ/cm2 using an air-cooled metal halide lamp (manufactured by Eyegraphics Co., Ltd.) of 160 W/cm while purging with nitrogen in an atmosphere having an oxygen concentration of not more than 1.0% by volume. Further, after heating at 100° C. for 20 minutes, the nozzle plate was allowed to stand for cooling to form an ink repelling layer having a thickness of 2 μm. Thereafter, the resist was removed to prepare an ink repelling treated nozzle plate (HP-2).
(Evaluation of Ink Repelling Film)
The foregoing ink repelling treated nozzle plate was evaluated in the same manner as in Example 1. The results obtained are shown in Table 5.
(Hard Coat Layer)
(Preparation of Hard Coat Layer Dispersion)
75 parts by weight of trimethylolpropane triacrylate and 47 parts by weight of a 53.2% by weight methyl ethyl ketone solution of polyglycidyl methacrylate (weight average molecular weight: 1.5×104) were dissolved in a mixed solution of 226 parts by weight of methyl ethyl ketone and 265 parts by weight of cyclohexanone, to which were then added 133 parts by weight of a methyl ethyl ketone dispersion of silica fine particles (MEK-ST, solids content: 30% by weight, manufactured by Nissan Chemical Industries, Ltd.), 3.8 parts by weight of Irgacure, and 2.5 parts by weight di-(t-butylphenyl) iodonium hexafluorophosphate while stirring, followed by stirring for 10 minutes. This mixture was filtered using a polypropylene-made filter having a pore size of 1 μm to prepare a hard coat layer forming composition.
(Hard Coat Layer-Provided Plate)
The foregoing coating solution for hard coat layer was coated on the same nozzle plate as used in Example 1 using a gravure coater. After drying at 100° C., the coating was further dried at 120° C. Next, the coated layer was cured upon irradiation with ultraviolet rays at an illuminance of 400 W/cm2 and an irradiation dose of 600 mJ/cm2 using an air-cooled metal halide lamp (manufactured by Eyegraphics Co., Ltd.) of 160 W/cm while purging with nitrogen in an atmosphere having an oxygen concentration of not more than 1.0% by volume, to form a hard coat (interlayer) having a thickness of 8 μm.
(Evaluation of Surface Shape)
With respect to the surface shape of the hard coat layer, an arithmetical mean roughness (Ra) of surface irregularities based on JIS B0601-1994, a ten-point mean roughness (Rz), a maximum height (Ry), and a mean space of surface irregularities (Sm) were measured using an atomic force microscope (AFM). However, Ra, Rz and Ry were measured at a measurement length of 4 μm, and Sm was measured at a measurement length of 20 μm. A uniformity of the surface irregularities was calculated from a ratio (Ra/Rz).
The shape of the resulting surface was as follows.
(Preparation of Ink Repelling Treated Nozzle Plate (HP-3))
Next, an ink repelling layer having a thickness of 2 μm was coated and provided thereon to prepare an ink repelling treated nozzle plate (HP-3) in the same manner as in Example 2.
(Evaluation of Ink Repelling Treated Nozzle Plate (HP-3))
The foregoing ink repelling treated nozzle plate was evaluated in the same manner as in Example 1. The results obtained are shown in Table 5.
*With respect to the durability test of the printing quality, the number of wiping was changed from 10,000 times to 15,000 times in the evaluation method described in Example 1.
In both of Examples 2 and 3, the surface property after coating an ink repelling layer was uniform and good, the ink repelling property was extremely good in terms of the waterdrop slip property as an index, and when actually mounted on the recording device, the ink repelling property was good. In Example 2, the abrasion resistance was enhanced, and in Example 3, the adhesion and the abrasion resistance were further enhanced and good. Further, both of Examples 2 and 3 exhibited good performances such that even after wiping 15, 000 times, the printing quality in the durability test did not change as compared with that at the initial stage.
Ink repelling treated nozzle plates were prepared in the same manner as in Example 2, except for using respective compounds shown in Table 6 in place of the block copolymer (GA-6), the polyfunctional acrylate: DPHA, the polymerization initiator Irgacure 907, and the photosensitizer Kayacure DETX in the coating solution (HL-2) for ink repelling layer used in Example 2.
With respect to each of the resulting plates, the respective performances were evaluated in the same manner as in Example 2. As a result, all of the respective plates of Examples 4 to 15 exhibited performances equivalent to or more than those of Example 2 and were good.
Ink repelling treated nozzle plates were prepared in the same manner as in Example 5, except for using respective block copolymers shown in the following Table 7 in place of the block copolymer (GA-1) in Example 1.
With respect to each of the ink repelling treated nozzle plates (HP-16) to (HP-20), the respective performances were evaluated in the same manner as in Example 2. As a result, all of the respective ink repelling treated nozzle plates exhibited performances equivalent to or more than those of Example 2 and were good.
(Preparation of Dispersion for Conductive Hard Coat Layer)
125 parts by weight of a polyfunctional acrylate monomer DPHA, 125 parts by weight of an urethane acrylate oligomer UV-6300B (manufactured The Nippon Synthetic Chemical Industry Co., Ltd.), 7.5 parts by weight of Irgacure 907, and 5.0 parts by weight of Kayacure DETX were dissolved in a mixed solution of 192 parts by weight of methyl ethyl ketone and 128 parts by weight of cyclohexanone. 417 parts by weight of an antimony pentoxide-zinc fine particle dispersion “Celnax CX-Z200M (modified 2)” (30% by weight methanol dispersion, manufactured by Nissan Chemical Industries, Ltd.) was added to the solution under stirring, and after further stirring the mixture, the reaction mixture was filtered using a polypropylene-made filter having a pore size of 0.4 μm, to prepare a coating solution for conductive hard coat layer.
(Conductive Hard Coat Layer-Provided Plate)
The foregoing coating solution for hard coat layer was coated on a nozzle plate the same as used in Example 1 using a gravure coater. After drying at 100° C., the resulting coating was further dried at 120° C. Next, the coated layer was cured upon irradiation with ultraviolet rays at an illuminance of 500 W/cm2 and an irradiation dose of 600 mJ/cm2 using an air-cooled metal halide lamp (manufactured by Eyegraphics Co., Ltd.) of 160 W/cm while purging with nitrogen in an atmosphere having an oxygen concentration of not more than 1.0% by volume, to form a hard coat layer (interlayer) having a thickness of 5 μm. The shape of the surface of the resulting hard coat layer was as follows.
(Preparation of Ink Repelling Treated Nozzle Plate (HP-21))
Next, the following coating solution (HL-21) for ink repelling layer was coated on the resulting hard coat layer in the same manner as in Example 2, to form an ink repelling layer having a thickness of 1.2 μm. There was thus prepared an ink repelling treated nozzle plate.
(Coating Solution (HL-21) for Ink Repelling Layer)
2.2 parts by weight (as solids content) of methyl group-modified colloidal silica MEK-ST (manufactured by Nissan Chemical Industries, Ltd.), 15.0 parts by weight of methyl ethyl ketone, 220.0 parts by weight of cyclohexanone, and 8 parts by weight of a polymerization initiator Irgacure 907 (Ciba-Geigy Japan Limited) were added to 70 parts by weight of the block copolymer (GA-8) of the invention and 30 parts by weight of a curable compound having the following structure, and the mixture was stirred. The reaction mixture was filtered using a polypropylene-made filter having a pore size of 0.4 μm to prepare a coating solution (HL-21) for ink repelling layer.
(Evaluation of Ink Repelling Treated Nozzle Plate (HP-21))
The characteristics were evaluated in the same manner as in Example 1. As a result, the ink repelling treated nozzle plate (HP-21) exhibited good performances equal to or more than those in Example 2.
Further, the antistatic property and dust-attachment preventing property (dust-proof property) were evaluated.
With respect to the antistatic property, an electric field was applied under the electrostatic field; at the time of reaching a saturated potential, the charge was stopped; and a time from this moment until the charge voltage became ½ of the saturated voltage was measured. As a result, it was found to be 25 seconds.
Here, the behavior of the charge property was examined by allowing the sample to stand for 2 hours in an ambient at 25° C. and 65% RH and measuring it in the same ambient using Static Honestmeter Type-H0110 (manufactured by Shishido Electrostatic, Ltd.).
Also, the dust-attachment preventing property (dust-proof property) of the plate surface was examined in the following manner. As a result, the degree of dropping of artificial dusts was a level of “B”.
Here, with respect to the dust-attachment preventing property (dust-proof property), the film to be measured was stuck onto a glass plate; after destaticization, the film was rubbed in the number of reciprocation of 5 times with Toraysee (manufactured by Toray Industries, Inc.); thereafter, fine expanded styrol powders were applied as artificial dusts onto the whole of the film; the film was made to stand; and the state of dropping of the artificial dusts was observed and evaluated according to the following standard of four grades.
In all of the evaluation methods, the antistatic property is good so that it is possible to reduce the attachment of dusts and paper powders within an actual recording device.
One side of the polyimide sheet of the nozzle plate substrate used in Example 1 was subjected to a plasma treatment to form the following surface irregularities.
An ink repelling treated nozzle plate was obtained in the same manner as in Example 1, except for using the resulting plate. With respect to the resulting plate, performances were evaluated in the same manner as in Example 1. As a result, good results that are substantially the same as in Example 1 were obtained.
The present application claims foreign priority based on Japanese Patent Application No. JP-2003-332240 filed Sep. 24, 2003, the contents of which is incorporated herein by reference.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2003-332240 | Sep 2003 | JP | national |
