FIELD OF THE INVENTION
The present invention relates to improvement of a preventive maintenance operation that requires equipment shut down to remove particle deposition on a chamber wall.
BACKGROUND
A known manufacturing equipment for fabricating a spin-on dielectric has a polymer deposition chamber. In the chamber, a polymer is deposited on a thin semiconductor wafer while the wafer spins edgewise to uniformly distribute the polymer as an interlayer dielectric on the wafer surface. The chamber has a narrow slit-like passage or passageway. A robot blade transports the wafer along the slit-like passage to project the wafer at least partially in the deposition chamber. During the spin-on dielectric operation, some of the polymer is scattered and deposits or accumulates against the passage interior wall. There, particles of polymer tend to build-up or accumulate, which would require preventative maintenance to remove the deposited or accumulated particles.
Preventive maintenance would be required to remove a build-up of polymer particles from the slit-like passage. Inspection of the narrow slit-like passage for cleanliness of the build-up of particles is difficult. Removing the polymer particles from the narrow slit-like passage is time consuming, and requires equipment shut down during a preventive maintenance.
An improved preventative maintenance would simplify the removal of particles from the slit-like passage. Cleaning the particles from the slit-like passage would be performed quickly to shorten the equipment shut-down time.
SUMMARY OF THE INVENTION
The invention improves preventative maintenance by simplifying the removal of particles from a passage, for example, a slit-like passage for a robot blade at the end of a robot arm transporting a semiconductor wafer to a polymer deposition chamber. The invention is a hollow shield that shields the passage from deposition of particles that accumulate during a manufacturing operation, for example, a manufacturing operation for depositing a polymer layer on a semiconductor wafer.
The invention includes an insert liner that has a nonporous surface, and the surface is also impermeable to the flow of air. The insert liner is inserted into a passage to line the passage and shield the passage interior wall from particles that would tend to deposit or accumulate on the passage interior wall. The particles accumulate on the nonporous surface of the insert liner instead of on the passage interior wall.
The insert liner secures to the interior wall without fasteners, and is easily installed. Further the insert liner is easily removed together with the deposited or accumulated particles on the liner. Removing the insert liner removes the particles that have accumulated on the nonporous surface of the insert liner, which eliminates inspection of the passage for cleanliness. The shut-down time for preventive maintenance is substantially reduced by quickly removing the insert liner as compared with the shut-down time required to clean the particles from the passage interior wall, and inspecting the passage interior wall for cleanliness.
According to an embodiment of the invention, the insert liner is inserted into the passage and quickly secures in the passage without fasteners. The insert liner clips to the interior wall, which secures the insert liner in the passage.
According to an embodiment of the present invention, the insert liner has a hollow slotted sleeve. One end of the slotted sleeve has a narrow slit-like entrance. The slotted sleeve widens to a wide end. The wide end of the sleeve collapses resiliently to a smaller circumference to enter the passage during insertion of the insert liner along the passage. The wide end resiliently expands inside the passage. When the insert liner is fully inserted, the wide end of the slotted sleeve resiliently biases frictionally against the surrounding passage interior wall to form a barrier seal between the insert liner and the surrounding passage. The barrier seal eliminates spacing between the insert liner and the surrounding passage. The barrier seal repels particles that would attempt to force their way between the insert liner and the surrounding passage. The resilient bias against the surrounding passage interior wall frictionally secures the insert liner within the passage in a clip-like manner. The insert liner is easily and quickly removed to remove the deposited or accumulated particles.
An embodiment of the invention will now be described by way of example, with reference to the accompanying drawings.
DESCRIPTION OF THE DRAWINGS
FIG. 1 is a side view of a portion of a known polymer deposition chamber having a slit-like passage for a robot blade at the end of a robot arm transporting a semiconductor wafer to project the wafer at least partially into the chamber while a polymer is deposited on the wafer.
FIG. 2 is a perspective view of a chamber liner for lining a polymer deposition chamber.
FIG. 3 is a perspective view of an insert liner for installation in the slit-like passage of a polymer deposition chamber.
FIG. 4 is another perspective view of the insert liner.
FIG. 5 is a diagrammatic view disclosing the chamber and the passage in section, and further disclosing the insert liner in section and being resiliently deformed for entry in the passage.
FIG. 6 is a view similar to FIG. 5, and further disclosing installation of the insert liner in the passage.
FIG. 7 is a diagrammatic view of a clearance space between blade screws and the passage interior wall.
DETAILED DESCRIPTION
FIG. 5 discloses a portion of a known manufacturing equipment (100) having a deposition chamber (102) and a narrow slit-like passage (104) or passageway (104) opening into the chamber (102). For example, the chamber (102) comprises a polymer deposition chamber (102) of a known polymer deposition equipment (100).
FIG. 1 discloses, that during a manufacturing operation a robot blade (106) at the end of a robot arm transports a suitable workpiece (108) along the slit-like passage (104) to project the workpiece (108) at least partially in the chamber (102) of the manufacturing equipment (100). For example, the robot blade (106) transports a semiconductor wafer (108) along the slit-like passage (104) to project the wafer (108) at least partially in the deposition chamber (102). During a wafer coating operation, a fluid polymer is deposited on a thin semiconductor wafer (108) while the robot blade (106) holds the wafer (108) as the wafer (108) spins edgewise to uniformly distribute the polymer as an interlayer dielectric on the wafer surface. Some of the polymer is scattered and deposits or accumulates against the passage interior wall (110). The particles of polymer tend to build-up or accumulate, which would require preventative maintenance to remove the deposited or accumulated particles.
FIG. 2 discloses a thin chamber liner (112) that conforms to the shape of the deposition chamber (102), for example, a polymer deposition chamber of a known polymer deposition equipment (100). A deposition chamber (102) means any manufacturing equipment chamber, including an etching chamber or a deposition chamber, for example, in which particles will result from performance of a manufacturing operation in the chamber (102), and in which particles become deposited in the slit like passage (104 disclosed by FIG. 1. The chamber liner (112) has a barrel shaped side wall (114) that conforms to a barrel shaped side wall (116) of the manufacturing equipment chamber (102). The side wall (114) has an entrance opening (118) to fit over the slit like passage (104) disclosed by FIG. 1.
FIG. 3 discloses an insert liner (120) for the passage (104) disclosed by FIG. 1. The insert liner (120) is inserted into the passage (104) to line the passage (104) and shield the passage interior wall (110) from particles that would tend to deposit or accumulate on the passage interior wall (110). The particles accumulate on a nonporous surface of the insert liner (120) instead of on the passage interior wall (110).
The invention improves preventative maintenance by simplifying the removal of particles from a slit-like passage (104), for example, a slit-like passage (104) for a robot arm transporting a semiconductor wafer (108) to a polymer deposition chamber (102). The invention shields the passage (104) from deposition of particles that accumulate during a manufacturing operation, for example, a manufacturing operation for depositing a polymer layer on a semiconductor wafer (108).
According to an embodiment of the invention, the insert liner (120) is inserted into the passage (104) and quickly secures in the passage (104) without fasteners. The insert liner (120) clips to the passage interior wall (110), which secures the insert liner (120) in the passage (104).
According to an embodiment of the present invention, the insert liner (120) has a hollow slotted sleeve (122). One open end (124) of the slotted sleeve (122) has a narrow slit-like entrance that is encircled by a wide lip flange (126). The lip flange (126) and the entrance of the sleeve (122) are curved to conform to the curved interior of the barrel shaped chamber side wall(112). When the side wall (112) of the chamber (102) is lined with the chamber liner (112) disclosed by FIG. 2, the sleeve (122) is inserted through the entrance opening (118) through the chamber liner (112). The curved lip flange (126) and the curved open end (124) of the sleeve (122) conform against the curved interior of the chamber liner side wall (114). The lip flange (126) overlaps the entrance opening (118) through the chamber liner (112).
With reference to FIGS. 3 and 4, the sleeve (122) extends from the lip flange (126), and has a narrow slit-like shape. For example, the insert liner (120) is a continuous thin wall molded body of about 0.6 mm, millimeters, thickness. The insert liner has an interior surface that faces away from the side wall (112) of the chamber (102). The surface is nonporous, which accumulates particles and airborne contaminants, and prevents them from permeating the insert liner. The surface is also impermeable to air, which prevents even the smallest particles from penetrating through the insert liner. Inexpensive material, for example, polyethylene or polypropylene is suitable for the insert liner (120). Slots (128) are molded through the sleeve (122) The slots (128) extend from the rear of the lip flange (126) and lengthwise of the sleeve (122) and through a slotted wide end (130) of the sleeve (122). The slots (128) reduce the difficulty in molding a narrow slit-like shape for the sleeve (122). Further, the slots (128) bifurcate the sleeve (122) to form opposing sleeve sections (132). The sleeve (122) is molded with a tapered shape, such that the sleeve (122) widens at the wide end (130). The opposing sleeve sections (132), as made, diverge from the rear of the lip flange (126) to the wide end (130). The wide end (130) of the sleeve (122), as made, is wider than the passage interior wall (110).
FIG. 5 is a diagrammatic view of the sleeve (122) in section to disclose the sleeve sections (132) diverging, as made, such that the slotted sleeve (122) widens from the rear of the lip flange (126) to the wide end (130). FIG. 5 further discloses the chamber (102) in section and the passage (104) in section. At first, the wide end (130) of the sleeve (122) is unable to enter the passage (104). The wide end (130) of the sleeve (122) is resiliently collapsed to a smaller circumference to enter the passage (104). For example, the wide end (130) of the sleeve (122) is resiliently collapsed by resiliently deforming the material of the sleeve (122). The continuous lip flange (126) resists deformation of the sleeve (122) at that end (124). The slots (128) narrow in width when the opposed sleeve sections (132) pivot resiliently toward each other.
FIG. 6 discloses that the sleeve (122) wide end (130) resiliently expands to a larger circumference when the sleeve (122) is inside the passage (104). The slots (128) widen in width as the opposed sleeve sections (132) resiliently pivot away from each other. FIG. 7 discloses the sleeve (122) fully inserted in the passage (104). When the insert liner (120) is filly installed with the sleeve (122) being fully inserted in the passage (104), the wide end (130) of the slotted sleeve (122) resiliently biases against the surrounding passage interior wall (110) creating friction to secure the insert liner (120) within the passage (104) with a clip-like retention. The insert liner (120) is fully inserted when the rear of the lip flange (126) registers against the interior of the chamber (102) or the interior of the chamber liner (112) covering the chamber interior. The insert liner (120) is quickly installed without fasteners, and the clip-like retention holds the insert liner (120) stationary during a manufacturing operation, such as, a polymer coating operation. When the insert liner is fully inserted, the wide end of the slotted sleeve resiliently biases frictionally against the surrounding passage interior wall to form a barrier seal between the insert liner and the surrounding passage. The barrier seal eliminates spacing between the insert liner and the surrounding passage. The barrier seal repels particles that would attempt to force their way between the insert liner and the surrounding passage. The resilient bias against the surrounding passage interior wall frictionally secures the insert liner within the passage in a clip-like manner. The insert liner is easily and quickly removed to remove the deposited or accumulated particles.
During preventative maintenance, the insert liner (120) is easily and quickly removed to remove the deposited or accumulated particles. The removed insert liner (120) is replaced with a duplicate insert liner (120). The insert liner (120) is easily removed together with the deposited or accumulated particles on the liner. Removing the insert liner (120) removes the particles that have accumulated on the insert liner (120), which eliminates inspection of the passage (104) for cleanliness. The shut-down time for preventive maintenance is substantially reduced by quickly removing the insert liner (120) as compared with the shut-down time required to clean the particles from the passage interior wall (110), and inspecting the passage interior wall (110) for cleanliness.
FIG. 7 discloses the robot blade (106) having blade screws (134) with 0.5 mm screw head height. The screw heads (136) would have a clearance gap of 1.5 mm from the passage interior wall (110). However, with the insert liner (120) installed in the passage (104), the 0.6 mm thickness of the insert liner (120) reduces the clearance gap between it and the blade screws (134). Thus, to restore a safe gap, the screw heads (136) are reduced in height to 0.2 mm, for example, by a grinding operation to widen the gap to a safe gap of about 1.2 mm between the blade screws (134) and the insert liner (120).
A preferred embodiment has been disclosed. Other embodiments and modifications are intended to be covered by the spirit and scope of the appended claims.
Patent Application
20050095187
