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5396034 | Fujita et al. | Mar 1995 | |
5432677 | Mowatt et al. | Sep 1995 | |
5494859 | Kapoor | Feb 1996 | |
5524339 | Gorowitz et al. | Jun 1996 | |
5578796 | Bhatt et al. | Nov 1996 | |
5684312 | Yonemoto | Nov 1997 |
Number | Date | Country |
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6-53328 | Feb 1994 | JPX |
Entry |
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"Techniques for Planarizing Device Topolography," Kathy Sidmore, Associate Editor, Apr. 1988 Semiconductor International, pp. 5, 115-119. |
"Silicon Processing for the VLSI Era, vol. 1: Process Technology,"Stanley wolf and Richard N. Tauber, Chapter 6: Chemical Vapor Deposition of Amorphous and Polycrystalline Thin Filmes, pp. 161, 182-197, Lattice Press, SunsetBeach, California, 1986. |