Number | Date | Country | Kind |
---|---|---|---|
2000-376561 | Dec 2000 | JP |
This application is a continuation of pending U.S. application Ser. No. 09/910,314 filed Jul 19, 2001.
Number | Name | Date | Kind |
---|---|---|---|
6150203 | Yamazaki et al. | Nov 2000 | A |
6294441 | Yamazaki | Sep 2001 | B1 |
6331496 | Nakayasu | Dec 2001 | B2 |
6444506 | Kusumoto et al. | Sep 2002 | B1 |
Number | Date | Country |
---|---|---|
7-321339 | Dec 1995 | JP |
8-242006 | Sep 1996 | JP |
9-289165 | Nov 1997 | JP |
10-074697 | Mar 1998 | JP |
11-354801 | Dec 1999 | JP |
Entry |
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Hiroyuki Kuriyama, et al., “Comprehensive Study of Lateral Grain Growth in Poly-Si Films by Excimer Laser Annealing and Its Application to Thin Film Transistors,” Jpn. J. Appl. Phys. (Oct. 1994), 33(10):5657-62. |
Katsuyuki Suga, et al., “P-3: The Effect of a Laser Annealing Ambient on the Morphology and TFT Performance of Poly-Si Films,” SID 00 Digest , pp. 534-37. |
Nikkei, B.P. (1999). “Recent Liquid Crystal Process Technology in 1999 Monthly FDP Intelligence,” pp. 53-59 (partial translation). |
Number | Date | Country | |
---|---|---|---|
Parent | 09/910314 | Jul 2001 | US |
Child | 10/299218 | US |