Laser irradiation apparatus, method of laser irradiation, and method for manufacturing semiconductor device

Abstract

A laser irradiation apparatus and a method of laser irradiation which can improve use efficiency of a laser beam, eliminate an influence of stray light at a DMD, and form an irradiation pattern with a homogeneous beam spot are provided. The laser irradiation apparatus includes at least a laser oscillator, a diffractive optical element, and an optical element having many minute mirrors arranged two-dimensionally. A laser beam emitted from the laser oscillator is divided into plural laser beams by a diffractive optical element and the laser beams are deflected by plural micromirrors. The divided laser beams have equal energy to each other.

Description

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a diagram showing a structure of a laser irradiation apparatus.

FIG. 2 is a diagram showing a laser irradiation pattern.

FIG. 3 is a diagram showing a structure of a laser irradiation apparatus.

FIG. 4 is a diagram showing a structure of a laser irradiation apparatus.

FIGS. 5A and 5B are diagrams showing structures of a laser irradiation apparatus.

FIG. 6 is a diagram showing a laser irradiation pattern.

FIG. 7 is a diagram showing a cross section of a semiconductor device.

FIG. 8 is a diagram showing the flow of a manufacturing method of a semiconductor device.

FIG. 9 is a diagram showing the flow of a manufacturing method of a semiconductor device.

FIGS. 10A and 10B are diagrams showing a manufacturing process of a semiconductor device.

FIGS. 11A and 11B are diagrams showing a manufacturing process of a semiconductor device.

FIG. 12 is a diagram showing a structure of a non-volatile memory circuit.

FIGS. 13A to 13E are diagrams showing an embodiment of an antenna.

FIGS. 14A to 14C are diagrams showing an embodiment of the antenna.

FIGS. 15A to 15E are diagrams showing a manufacturing process of a semiconductor device.

FIGS. 16A to 16D are diagrams showing a manufacturing process of a semiconductor device.

FIGS. 17A and 17B are diagrams showing a manufacturing process of a semiconductor device.

FIGS. 18A to 18H are diagrams showing applications of a semiconductor device manufactured by the invention.

FIG. 19 is a diagram showing a bag using a semiconductor device manufactured by the invention.

FIGS. 20A and 20B are diagrams showing certificates each using a semiconductor device manufactured by the invention.

FIG. 21 is a diagram showing food management using a semiconductor device manufactured by the invention.

FIGS. 22A and 22B are diagrams showing logistics using a semiconductor device manufactured by the invention.

FIG. 23 is a diagram showing IC card settlement using a semiconductor device manufactured by the invention.

Claims

1. A laser irradiation apparatus comprising: a laser oscillator which emits a laser beam;a diffractive optical element which divides the laser beam into a plurality of laser beams;a plurality of micromirrors, wherein each of the plurality of micromirrors deflects each of the plurality of laser beams; anda transfer stage provided with an object which is irradiated with each of the plurality of laser beams deflected by each of the plurality of micromirrors,wherein each of the plurality of laser beams is converged in a central portion of each of the plurality of micromirrors.

2. The laser irradiation apparatus according to claim 1 wherein, a spot size of each of the plurality of laser beams on each of the plurality of micromirrors is smaller than a size of a surface area of each of the plurality of micromirrors.

3. The laser irradiation apparatus according to claim 1 wherein, the diffractive optical element is a transmission type diffractive optical element or a reflection type diffractive optical element.

4. The laser irradiation apparatus according to claim 1 wherein, each of the plurality of laser beams has an equal energy to each other.

5. A laser irradiation apparatus comprising: a laser oscillator which emits a laser beam;a diffractive optical element which divides the laser beam into a plurality of laser beams;a plurality of micromirrors, wherein each of the plurality of micromirrors deflects each of the plurality of laser beams; anda transfer stage provided with an object which is irradiated with each of the plurality of laser beams deflected by each of the plurality of micromirrors,wherein each of the plurality of laser beams is converged between a central portion and a corner portion of each of the plurality of micromirrors.

6. The laser irradiation apparatus according to claim 5 wherein, a spot size of each of the plurality of laser beams on each of the plurality of micromirrors is smaller than a size of a surface area of each of the plurality of micromirrors.

7. The laser irradiation apparatus according to claim 5 wherein, the diffractive optical element is a transmission type diffractive optical element or a reflection type diffractive optical element.

8. The laser irradiation apparatus according to claim 5 wherein, each of the plurality of laser beams has an equal energy to each other.

9. A method of laser irradiation comprising: dividing a laser beam into a plurality of laser beams by a diffractive optical element; anddeflecting each of the plurality of laser beams by each of a plurality of micromirrors and irradiating an object on a transfer stage with each of the plurality of laser beams,wherein each of the plurality of laser beams is converged in a central portion of each of the plurality of micromirrors.

10. The laser irradiation apparatus according to claim 9 wherein, a spot size of each of the plurality of laser beams on each of the plurality of micromirrors is smaller than a size of a surface area of each of the plurality of micromirrors.

11. The method of laser irradiation according to claim 9 wherein, the diffractive optical element is a transmission type diffractive optical element or a reflection type diffractive optical element.

12. The method of laser irradiation according to claim 9 wherein, each of the plurality of laser beams has an equal energy to each other.

13. A method of laser irradiation comprising: dividing a laser beam into a plurality of laser beams by a diffractive optical element; anddeflecting each of the plurality of laser beams by each of a plurality of micromirrors and irradiating an object on a transfer stage with each of the plurality of laser beams,wherein each of the plurality of laser beams is converged between a central portion and a corner portion of each of the plurality of micromirrors.

14. The laser irradiation apparatus according to claim 13 wherein, a spot size of each of the plurality of laser beams on each of the plurality of micromirrors is smaller than a size of a surface area of each of the plurality of micromirrors.

15. The method of laser irradiation according to claim 13 wherein, the diffractive optical element is a transmission type diffractive optical element or a reflection type diffractive optical element.

16. The method of laser irradiation according to claim 13 wherein, each of the plurality of laser beams has an equal energy to each other.

17. A method of laser irradiation comprising: dividing a laser beam into at least a first laser beam and a second laser beam by a diffractive optical element;delivering the first laser beam to a first micromirror and delivering the second laser beam to a second micromirror; andirradiating an object with the first laser beam and the second laser beam,wherein the first laser beam is converged in a central portion of the first micromirror and the second laser beam is converged in a central portion of the second micromirror.

18. The laser irradiation apparatus according to claim 17 wherein, a spot size of the first laser beam on the first micromirror is smaller than a size of a surface area of the first micromirror and a spot size of the second laser beam on the second micromirror is smaller than a size of a surface area of the second micromirror.

19. The method of laser irradiation according to claim 17 wherein, the diffractive optical element is a transmission type diffractive optical element or a reflection type diffractive optical element.

20. The method of laser irradiation according to claim 17 wherein, the first laser beam has an equal energy to the second laser beam.

21. A method of laser irradiation comprising: dividing a laser beam into at least a first laser beam and a second laser beam by a diffractive optical element;delivering the first laser beam to a first micromirror and delivering the second laser beam to a second micromirror; andirradiating an object with the first laser beam and the second laser beam,wherein the first laser beam is converged between a central portion and a corner portion of the first micromirror and the second laser beam is converged between a central portion and a corner portion of the second micromirror.

22. The laser irradiation apparatus according to claim 21 wherein, a spot size of the first laser beam on the first micromirror is smaller than a size of a surface area of the first micromirror and a spot size of the second laser beam on the second micromirror is smaller than a size of a surface area of the second micromirror.

23. The method of laser irradiation according to claim 21 wherein, the diffractive optical element is a transmission type diffractive optical element or a reflection type diffractive optical element.

24. The method of laser irradiation according to claim 21 wherein, the first laser beam has an equal energy to the second laser beam.

25. A method for manufacturing a semiconductor device, comprising: forming a plurality of island shape semiconductor layers each electrically connected to a source electrode and a drain electrode over a substrate,forming a first interlayer insulating film over the plurality of island shape semiconductor layers;forming a plurality of gate electrodes over each of the plurality of island shape semiconductor layers with the first interlayer insulating film interposed therebetween;forming a second interlayer insulating film over the plurality of gate electrodes;providing a resist over the second interlayer insulating film;deflecting each of a plurality of laser beams divided by a diffractive optical element, by each of a plurality of micromirrors;irradiating the resist with each of the plurality of laser beams;developing the resist; andetching the first interlayer insulating film and the second interlayer insulating film to form a contact hole selectively,wherein each of the plurality of laser beams is converged in a central portion of each of the plurality of micromirrors.

26. The laser irradiation apparatus according to claim 25 wherein, a spot size of each of the plurality of laser beams on each of the plurality of micromirrors is smaller than a size of a surface area of each of the plurality of micromirrors.

27. A method for manufacturing a semiconductor device, comprising: forming a plurality of island shape semiconductor layers each electrically connected to a source electrode and a drain electrode over a substrate,forming a first interlayer insulating film over the plurality of island shape semiconductor layers;forming a plurality of gate electrodes over each of the plurality of island shape semiconductor layers with the first interlayer insulating film interposed therebetween;forming a second interlayer insulating film over the plurality of gate electrodes;providing a resist over the second interlayer insulating film;deflecting each of a plurality of laser beams divided by a diffractive optical element, by each of a plurality of micromirrors;irradiating the resist with each of the plurality of laser beams;developing the resist; andetching the first interlayer insulating film and the second interlayer insulating film to form a contact hole selectively,wherein each of the plurality of laser beams is converged between a central portion and a corner portion of each of the plurality of micromirrors.

28. The laser irradiation apparatus according to claim 27 wherein, a spot size of each of the plurality of laser beams on each of the plurality of micromirrors is smaller than a size of a surface area of each of the plurality of micromirrors.