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G03F7/70941

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/70941Stray fields and charges

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Patents Grantslast 30 patents

Information Patent Grant
Method for detecting flare degree of lens of exposure machine
- Patent number 11,604,417
- Issue date Mar 14, 2023
- Shanghai Huali Microelectronics Corporation
- Haisheng Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, and article manufa...
- Patent number 11,448,969
- Issue date Sep 20, 2022
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflection coating
- Patent number 11,422,289
- Issue date Aug 23, 2022
- ASML Holding N.V.
- Parag Vinayak Kelkar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for deriving corrections, method and apparatus...
- Patent number 11,243,470
- Issue date Feb 8, 2022
- ASML Netherlands B.V.
- Nitish Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for positioning a component of an optical system
- Patent number 11,169,359
- Issue date Nov 9, 2021
- Carl Zeiss SMT GmbH
- Pascal Marsollek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement for EUV radiation with a shield for protection...
- Patent number 11,137,687
- Issue date Oct 5, 2021
- Carl Zeiss SMT GmbH
- Bjoern Liebaug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a characteristic of a structure, and metrolog...
- Patent number 11,119,415
- Issue date Sep 14, 2021
- ASML Netherlands B.V.
- Johannes Fitzgerald De Boer
- G01 - MEASURING TESTING
Information Patent Grant
Extreme ultraviolet (EUV) exposure apparatus and method of manufact...
- Patent number 10,754,254
- Issue date Aug 25, 2020
- Samsung Electronics Co., Ltd.
- Keunhee Bai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography model for 3D features
- Patent number 10,685,158
- Issue date Jun 16, 2020
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of inspecting a substrate, metrology apparatus, and lithogra...
- Patent number 10,534,274
- Issue date Jan 14, 2020
- ASML Netherlands B.V.
- Teunis Willem Tukker
- G01 - MEASURING TESTING
Information Patent Grant
Device for transmitting electrical signals, and lithography apparatus
- Patent number 10,459,351
- Issue date Oct 29, 2019
- Carl Zeiss SMT GmbH
- Jan Horn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction for flare effects in lithography system
- Patent number 10,423,745
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compensating for a physical effect in an optical system
- Patent number 10,401,704
- Issue date Sep 3, 2019
- ASML Netherlands B.V.
- Robert Jay Rafac
- G02 - OPTICS
Information Patent Grant
Illumination optic for EUV projection lithography
- Patent number 10,379,444
- Issue date Aug 13, 2019
- Carl Zeiss SMT GmbH
- Matthias Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Mask for EUV lithography, EUV lithography apparatus and method for...
- Patent number 10,156,782
- Issue date Dec 18, 2018
- Carl Zeiss SMT GmbH
- Peter Huber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for compensating for an exposure error, a device manufacturi...
- Patent number 9,983,489
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Christianus Wilhelmus Johannes Berendsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Movable body apparatus, exposure apparatus, exposure method, and de...
- Patent number 9,946,171
- Issue date Apr 17, 2018
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,933,706
- Issue date Apr 3, 2018
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuation mechanism, optical apparatus and lithography apparatus
- Patent number 9,927,711
- Issue date Mar 27, 2018
- ASML Netherlands B.V.
- Sven Antoin Johan Hol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for improving measurement accuracy
- Patent number 9,909,983
- Issue date Mar 6, 2018
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle transmittance measurement method, projection exposure metho...
- Patent number 9,904,170
- Issue date Feb 27, 2018
- SII Semiconductor Corporation
- Michihiro Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring asymmetry, inspection apparatus, lithographic s...
- Patent number 9,786,044
- Issue date Oct 10, 2017
- ASML Netherlands B.V.
- Andreas Fuchs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography process and mask
- Patent number 9,733,562
- Issue date Aug 15, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle transmittance measurement method, and projection exposure m...
- Patent number 9,733,567
- Issue date Aug 15, 2017
- SII Semiconductor Corporation
- Michihiro Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element with an antireflection coating, projection objectiv...
- Patent number 9,684,252
- Issue date Jun 20, 2017
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus and exposure apparatus
- Patent number 9,557,656
- Issue date Jan 31, 2017
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source, lithographic apparatus, and device manufacturing...
- Patent number 9,529,283
- Issue date Dec 27, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Flare-measuring mask, flare-measuring method, and exposure method
- Patent number 9,529,251
- Issue date Dec 27, 2016
- Nikon Corporation
- Masayuki Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,454,085
- Issue date Sep 27, 2016
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
IMPROVED ALIGNMENT OF SCATTEROMETER BASED PARTICLE INSPECTION SYSTEM
- Publication number 20230089666
- Publication date Mar 23, 2023
- ASML Holding N.V.
- Christopher Michael DOHAN
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS, METHOD FOR MANIPULATING...
- Publication number 20220390850
- Publication date Dec 8, 2022
- ASML NETHERLANDS B.V.
- Ruud Antonius Catharina Maria BEERENS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFA...
- Publication number 20220390853
- Publication date Dec 8, 2022
- Canon Kabushiki Kaisha
- Michio Kono
- G02 - OPTICS
Information Patent Application
Method of Determining a Characteristic of a Structure, and Metrolog...
- Publication number 20210349403
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Johannes Fitzgerald De Boer
- G01 - MEASURING TESTING
Information Patent Application
Anti-Reflection Coating
- Publication number 20200103558
- Publication date Apr 2, 2020
- Parag Vinayak KELKAR
- G02 - OPTICS
Information Patent Application
Method of Determining a Characteristic of a Structure, and Metrolog...
- Publication number 20190310559
- Publication date Oct 10, 2019
- Stichting VU
- Johannes Fitzgerald DE BOER
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR POSITIONING A COMPONENT OF AN OPTICAL SYSTEM
- Publication number 20190302402
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Pascal Marsollek
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20180314165
- Publication date Nov 1, 2018
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTIC FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20180074410
- Publication date Mar 15, 2018
- Carl Zeiss SMT GMBH
- Matthias Mueller
- G02 - OPTICS
Information Patent Application
RETICLE TRANSMITTANCE MEASUREMENT METHOD, PROJECTION EXPOSURE METHO...
- Publication number 20170351180
- Publication date Dec 7, 2017
- SII Semiconductor Corporation
- Michihiro MURATA
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20170261861
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140333913
- Publication date Nov 13, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140293256
- Publication date Oct 2, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
Lithography Method and Structure for Resolution Enhancement with a...
- Publication number 20140285789
- Publication date Sep 25, 2014
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLARE EFFECT INDUCED ERROR CORRECTION
- Publication number 20140019919
- Publication date Jan 16, 2014
- Macronix International Co., Ltd.
- Yi-Yien TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20130271636
- Publication date Oct 17, 2013
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus Baselmans
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MAKING CORRECTION MAP OF DOSE AMOUNT, EXPOSURE METHOD, A...
- Publication number 20130252176
- Publication date Sep 26, 2013
- Kabushiki Kaisha Toshiba
- Takashi KOIKE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS
- Publication number 20130240762
- Publication date Sep 19, 2013
- GIGAPHOTON INC.
- Masato MORIYA
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FLARE MEASURING METHOD, REFLECTIVE MASK, AND EXPOSURE APPARATUS
- Publication number 20130208252
- Publication date Aug 15, 2013
- Kabushiki Kaisha Toshiba
- Masaru SUZUKI
- G02 - OPTICS
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20130185681
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FLARE MAP CALCULATING METHOD AND RECORDING MEDIUM
- Publication number 20130159944
- Publication date Jun 20, 2013
- Taiga UNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR QUALIFYING OPTICS OF A PROJECTION EXPOSURE...
- Publication number 20130148105
- Publication date Jun 13, 2013
- Carl Zeiss SMT GMBH
- Markus GOEPPERT
- G01 - MEASURING TESTING
Information Patent Application
Tolerable Flare Difference Determination
- Publication number 20130104091
- Publication date Apr 25, 2013
- Mentor Graphics Corporation
- SERGIY KOMIRENKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Light Source Components and Methods for Producing, Using and Re...
- Publication number 20130070332
- Publication date Mar 21, 2013
- Cymer, Inc.
- Norbert R. Bowering
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN GENERATING METHOD, PATTERN FORMING METHOD, AND PATTERN GENE...
- Publication number 20130063707
- Publication date Mar 14, 2013
- Ryota ABURADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20130021591
- Publication date Jan 24, 2013
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, MEASUREMENT METHOD, AND DEVICE...
- Publication number 20130016329
- Publication date Jan 17, 2013
- Nikon Corporation
- Akikazu Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Linear Motor Magnetic Shield Apparatus
- Publication number 20130010273
- Publication date Jan 10, 2013
- ASML Holding N.V.
- Kalyan Kumar MANKALA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD FOR PRODUCTION OF SUCH AN OPT...
- Publication number 20120314281
- Publication date Dec 13, 2012
- Carl Zeiss SMT GMBH
- Gisela VON BLANCKENHAGEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20120281196
- Publication date Nov 8, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G02 - OPTICS

Stray fields and charges

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for detecting flare degree of lens of exposure machine

Illumination optical system, exposure apparatus, and article manufa...

Anti-reflection coating

Method and apparatus for deriving corrections, method and apparatus...

Method for positioning a component of an optical system

Optical arrangement for EUV radiation with a shield for protection...

Method of determining a characteristic of a structure, and metrolog...

Extreme ultraviolet (EUV) exposure apparatus and method of manufact...

Lithography model for 3D features

Method of inspecting a substrate, metrology apparatus, and lithogra...

Device for transmitting electrical signals, and lithography apparatus

Correction for flare effects in lithography system

Compensating for a physical effect in an optical system

Illumination optic for EUV projection lithography

Microlithography projection objective

Mask for EUV lithography, EUV lithography apparatus and method for...

Method for compensating for an exposure error, a device manufacturi...

Movable body apparatus, exposure apparatus, exposure method, and de...

Illumination system of a microlithographic projection exposure appa...

Actuation mechanism, optical apparatus and lithography apparatus

Method and apparatus for improving measurement accuracy

Reticle transmittance measurement method, projection exposure metho...

Method of measuring asymmetry, inspection apparatus, lithographic s...

Extreme ultraviolet lithography process and mask

Reticle transmittance measurement method, and projection exposure m...

Optical element with an antireflection coating, projection objectiv...

Stage apparatus and exposure apparatus

Radiation source, lithographic apparatus, and device manufacturing...

Flare-measuring mask, flare-measuring method, and exposure method

Illumination system of a microlithographic projection exposure appa...

Patents Applicationslast 30 patents

IMPROVED ALIGNMENT OF SCATTEROMETER BASED PARTICLE INSPECTION SYSTEM

SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS, METHOD FOR MANIPULATING...

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFA...

Method of Determining a Characteristic of a Structure, and Metrolog...

Anti-Reflection Coating

Method of Determining a Characteristic of a Structure, and Metrolog...

METHOD FOR POSITIONING A COMPONENT OF AN OPTICAL SYSTEM

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

ILLUMINATION OPTIC FOR EUV PROJECTION LITHOGRAPHY

RETICLE TRANSMITTANCE MEASUREMENT METHOD, PROJECTION EXPOSURE METHO...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

MICROLITHOGRAPHY PROJECTION OBJECTIVE

MICROLITHOGRAPHY PROJECTION OBJECTIVE

Lithography Method and Structure for Resolution Enhancement with a...

FLARE EFFECT INDUCED ERROR CORRECTION

Lithographic Method and Apparatus

METHOD FOR MAKING CORRECTION MAP OF DOSE AMOUNT, EXPOSURE METHOD, A...

EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS

FLARE MEASURING METHOD, REFLECTIVE MASK, AND EXPOSURE APPARATUS

CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM

FLARE MAP CALCULATING METHOD AND RECORDING MEDIUM

METHOD AND APPARATUS FOR QUALIFYING OPTICS OF A PROJECTION EXPOSURE...

Tolerable Flare Difference Determination

EUV Light Source Components and Methods for Producing, Using and Re...

PATTERN GENERATING METHOD, PATTERN FORMING METHOD, AND PATTERN GENE...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

EXPOSURE APPARATUS, EXPOSURE METHOD, MEASUREMENT METHOD, AND DEVICE...

Linear Motor Magnetic Shield Apparatus

REFLECTIVE OPTICAL ELEMENT AND METHOD FOR PRODUCTION OF SUCH AN OPT...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...