Claims
- 1. Fatigue resistant electrophotographic recording material having a high photosensitivity which extends into the infrared range containing a dual photoconductive layer applied to an electrically conductive substrate, with each of the two photoconductive layers of the dual layer containing selenium, the dual layer consisting of a lower photoconductive layer disposed of the substrate, said lower layer consisting of an amorphous system of arsenic and selenium, and an upper photoconductive layer made of As.sub.2-x Bi.sub.x Se.sub.3 or of As.sub.2 Se.sub.3-y Te.sub.y, where 0<x<2 or 0<y<3, and wherein the lower photoconductive layer disposed on the substrate is made of selenium containing arsenic in the less than stoichiometric amount of from 18 to 37 precent by weight, whereby increasing dark discharges and decreasing charging potential caused by cyclic stress fatigue are avoided.
- 2. Electrophotographic recording material as defined in claim 1, wherein the thickness of the lower layer disposed on the substrate is 20 to 100.mu..
- 3. Electrophotographic recording material as defined in claim 1, wherein the thickness of the lower layer disposed on the substrate is 50 to 70.mu..
- 4. Electrophotographic recording material as defined in claim 1, wherein the thickness of the upper layer is 0.3 to 10.mu..
- 5. Electrophotographic recording material as defined in claim 1, wherein the thickness of the upper layer is 1 to 5.mu..
- 6. Electrophotographic recording material as defined in claim 1, wherein As.sub.2-x Bi.sub.x Se.sub.3 is employed as the upper layer, and the x value is in a range of 0.01.ltoreq.x.ltoreq.0.5.
- 7. Electrophographic recording material as defined in claim 6, wherein the x value is in a range of 0.05.ltoreq.x.ltoreq.0.2.
- 8. Electrophographic recording material as defined in claim 1, wherein As.sub.2 Se.sub.3-y Te.sub.y is employed as the upper layer, and the y values is in a range of 0.05.ltoreq.y.ltoreq.2.5.
- 9. Electrophotographic recording material as defined in claim 8, wherein the y value is in a range of 0.1.ltoreq.y.ltoreq.0.5.
- 10. Electorphotographic recording material as defined in claim 1, wherein an intermediate layer is disposed between the conductive substrate and the dual photoconductive layer, said intermediate layer absorbing the portion of the incident light not absorbed in the beam path before said light impinges on the substrate.
- 11. Electrophotographic recording material as defined in claim 1, wherein the surface of the conductive substrate, on which there is disposed the dual photoconductive layer, is roughened.
- 12. Electrophotographic recording material as defined in claim 10, wherein the surface of the conductive substrate, on which there is disposed the intermediate layer and dual photoconductive layer, is roughened.
- 13. A method of recording with solid state laser diode radiation in a spectrum range up to about 950 nm, by directing the radiation onto an electrophotographic recording material as defined in claim 1.
- 14. Fatigue resistant electrophotographic recording material having a high photosensitivity which extends into the infrared range containing a dual photoconductive layer applied to an electrically conductive substrate, with each of the two photoconductive layers of the dual layer containing selenium, the dual layer consisting of a lower photoconductive layer disposed on the substrate, said lower layer consisting of an amorphous system of arsenic and selenium, and an upper photoconductive layer made of As.sub.2-x Bi.sub.x Se.sub.3 or of As.sub.2 Se.sub.3-y Te.sub.y, where 0<x<2 or 0<y<3, and wherein the lower photoconductive layer disposed on the substrate is made of selenium containing arsenic in the less than stoichiometric amount of from 30 to 35 precent by weight, whereby increasing dark discharges and decreasing charging potential caused by cyclic stress fatigue are avoided.
Priority Claims (1)
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3210293 |
Mar 1982 |
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CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation of U.S. application Ser. No. 06/476,601, filed Mar. 18, 1983, now abondoned, which is a continuation-in-part of U.S. application Ser. No. 203,676 filed Nov. 3, 1980now U.S. Pat. No. 4,385,105, and is also a continuation-in-part of U.S. appplication Ser. No. 269,941, filed June 3, 1981now U.S. Pat. No. 4,379,821.
US Referenced Citations (7)
Foreign Referenced Citations (7)
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2248054 |
Dec 1974 |
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JPX |
Continuations (1)
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476601 |
Mar 1983 |
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Continuation in Parts (2)
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203676 |
Nov 1980 |
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269941 |
Jun 1981 |
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