Embodiments described herein relate generally to a light detector, a light detection system, a lidar device, and a mobile body.
There is a light detector that detects light incident on a semiconductor region. It is desirable to increase the light detection efficiency of the light detector.
According to one embodiment, a light detector includes a first region, a second region, and a lens group. The first region includes a plurality of elements arranged along a first direction and a second direction. The first direction and the second direction cross each other. Each of the elements includes a first semiconductor region of a first conductivity type, and a second semiconductor region located on the first semiconductor region. The second semiconductor region is of a second conductivity type. The second region is adjacent to the first region in the second direction. The second region has a different structure from the first region. The lens group is positioned on the first and second regions. The lens group includes a plurality of lenses located to correspond respectively to the elements. The first region, the second region, and the lens group are repeatedly provided in the second direction.
Various embodiments are described below with reference to the accompanying drawings.
The drawings are schematic and conceptual; and the relationships between the thickness and width of portions, the proportions of sizes among portions, etc., are not necessarily the same as the actual values. The dimensions and proportions may be illustrated differently among drawings, even for identical portions.
In the specification and drawings, components similar to those described previously or illustrated in an antecedent drawing are marked with like reference numerals, and a detailed description is omitted as appropriate.
In the following description and drawings, the notations of n+, n-, p+, and p indicate relative levels of the impurity concentrations. In other words, a notation marked with “+” indicates that the impurity concentration is relatively greater than that of a notation not marked with either “+” or “-”; and a notation marked with “-” indicates that the impurity concentration is relatively less than that of a notation without any mark. When both a p-type impurity and an n-type impurity are included in each region, these notations indicate relative levels of the net impurity concentrations after the impurities are compensated.
In embodiments described below, each embodiment may be implemented by inverting the p-type and the n-type of the semiconductor regions.
As shown in
As shown in
The second region 2 has a different structure from the first region 1, and is adjacent to the first region 1. The first region 1 and the second region 2 are repeatedly provided in the Y-direction. For example, one second region 2 is located between two mutually-adjacent first regions 1. One first region 1 is located between two mutually-adjacent second regions 2.
The first region 1 functions as a cell region in which the element 10 for detecting light is located. The second region 2 does not include the element 10. The second region 2 functions as a peripheral region in which components of the light detector 100 other than the element 10 are located.
As shown in
The first region 1 and the second region 2 are located on the p--type semiconductor layer 72. The p--type semiconductor layer 72 is located on the p+-type semiconductor layer 71. The n+-type semiconductor region 12 is located on the p-type semiconductor region 11. A p-n junction surface is formed between the p-type semiconductor region 11 and the n+-type semiconductor region 12. For example, the p-n junction surface is parallel to the X-Y plane. The n-type impurity concentration in the n+-type semiconductor region 12 is greater than the p-type impurity concentration in the p-type semiconductor region 11. The p-type impurity concentration in the p-type semiconductor region 11 is greater than the p-type impurity concentration in the p--type semiconductor layer 72. The p-type impurity concentration in the p--type semiconductor layer 72 is less than the p-type impurity concentration in the p+-type semiconductor layer 71. The p-type semiconductor region 11 is electrically connected to the p+-type semiconductor layer 71 via the p--type semiconductor layer 72.
The first region 1 further includes an insulating part 15. The insulating part 15 is located around the elements 10 in the X-direction and the Y-direction. For example, the insulating part 15 includes multiple first insulating regions 15a and a second insulating region 15b. The multiple first insulating regions 15a are located respectively around the multiple elements 10. The lower end of the first insulating region 15a is positioned lower than the p-type semiconductor region 11. The first insulating region 15a may contact the p+-type semiconductor layer 71. The second insulating region 15b is located on the multiple first insulating regions 15a and is positioned around the n+-type semiconductor regions 12. By providing the insulating part 15, the secondary photons that are generated in the element 10 can be prevented from being incident on the adjacent elements 10.
As shown in
The second region 2 includes an n-type semiconductor region 23 (a third semiconductor region), a p+-type semiconductor region 24 (a fourth semiconductor region), an n+-type semiconductor region 25, and an n+-type semiconductor region 26. The p+-type semiconductor region 24, the n+-type semiconductor region 25, and the n+-type semiconductor region 26 are located on the n-type semiconductor region 23 and arranged along the Y-direction. The n-type impurity concentration in the n-type semiconductor region 23 is greater than the p-type impurity concentration in the p--type semiconductor layer 72. The p-type impurity concentration in the p+-type semiconductor region 24, the n-type impurity concentration in the n+-type semiconductor region 25, and the n-type impurity concentration in the n+-type semiconductor region 26 each are greater than the n-type impurity concentration in the n-type semiconductor region 23.
A reverse voltage is applied between the p--type semiconductor layer 72 and the n-type semiconductor region 23. A depletion layer that spreads from the interface between the p--type semiconductor layer 72 and the n-type semiconductor region 23 does not reach the p+-type semiconductor region 24, the n+-type semiconductor region 25, or the n+-type semiconductor region 26. Thereby, the p+-type semiconductor region 24, the n+-type semiconductor region 25, and the n+-type semiconductor region 26 are electrically isolated from the p--type semiconductor layer 72.
Circuit elements are located in the second region 2. In other words, in the light detector 100, the second region 2 functions as a circuit region in which circuit elements are provided. The circuit elements include passive elements such as capacitors, resistances and the like, active elements such as diodes, transistors, etc. For example, the p+-type semiconductor region 24, the n+-type semiconductor region 25, and the n+-type semiconductor region 26 each are included in a portion of a circuit element.
The p+-type semiconductor region 24 is electrically connected to an interconnect 24a via a contact plug. The n+-type semiconductor region 25 is electrically connected to an interconnect 25a via a contact plug. The n+-type semiconductor region 26 is electrically connected to an interconnect 26a via a contact plug. At least one of the interconnects 24a to 26a may be electrically connected to the common line 51.
The insulating layer 31 is light-transmissive and is located on the multiple first regions 1 and the multiple second regions 2. The interconnects 24a to 26a, the quenching part 40, the interconnect 50, the common line 51, etc., are located in the insulating layer 31. The insulating layer 32 is light-transmissive and is located on the insulating layer 31 for planarization.
As shown in
The shape of the upper surface of the lens 61 is convex upward. The lens 61 is a plano-convex lens that concentrates light on the element 10. For example, the shape of the multiple lenses 61 included in the lens group 60 is symmetric in the Y-direction. Specifically, the shape of the multiple lenses 61 has planar symmetry with respect to an X-Z plane passing through the center in the Y-direction of the lens group 60. The shape of each lens 61 is asymmetric in the Y-direction.
As shown in
For example, as shown in
A portion of the first lens 61a is positioned on the first element 10a. Another portion of the first lens 61a is positioned on the second element 10b. A portion of the second lens 61b is positioned on the second element 10b. Another portion of the second lens 61b is positioned on the second region 2.
The shift amount in the Y-direction of the lens 61 with respect to the corresponding element 10 increases as the lens 61 is positioned further toward the outer perimeter of the lens group 60. For example, as shown in
More specifically, the apex A1 of the first lens 61a is positioned outward the center C1 of the first element 10a. The apex A2 of the second lens 61b is positioned outward the center C2 of the second element 10b. The second lens 61b does not exist inward of the center of the second element 10b. “Outward” is the direction from the first region 1 to the second region 2. “Inward” is the direction from the second region 2 to the first region 1. According to this configuration, the light that has passed through the second lens 61b is incident on the second element 10b along an oblique direction inclined with respect to the Z direction. The light is refracted toward the center of the second element 10b due to the difference in refractive index between the insulating layer 31 and the semiconductor region. The outer periphery of the element 10 may be a dead region where avalanche breakdown does not occur even when light is incident. As the amount of light traveling toward the center of the element 10 increases, the incident light on the light detector 100 can be easily detected as a signal. That is, the light-receiving sensitivity of the light detector 100 can be improved.
A reverse voltage is applied between the p-type semiconductor region 11 and the n+-type semiconductor region 12. For example, the element 10 functions as a P-I-N diode or an avalanche photodiode. It is favorable for the element 10 to function as an avalanche photodiode.
A charge is generated by the element 10 when light is incident on the element 10 from above. The charge flows toward the common line 51 via the n+-type semiconductor region 12 and the quenching part 40. An output current that corresponds to the incident light of the element 10 can be detected by detecting the current flowing in the common line 51.
A reverse voltage that is greater than the breakdown voltage may be applied between the p-type semiconductor region 11 and the n+-type semiconductor region 12. In other words, the element 10 may operate in a Geiger mode. By operating in the Geiger mode, a pulse signal that has a high multiplication factor (i.e., a high gain) is output. The light-receiving sensitivity of the light detector 100 can be increased thereby. The element 10 may function as a single photon avalanche diode for detecting faint light.
The quenching part 40 is provided to suppress the continuation of avalanche breakdown when avalanche breakdown occurs due to the incidence of light on the element 10. The electrical resistance of the quenching part 40 is greater than the electrical resistances of the contact plugs, the interconnect 50, the common line 51, etc. It is favorable for the electrical resistance of the quenching part 40 to be not less than 50 kΩ and not more than 6 MΩ. A voltage drop that corresponds to the electrical resistance of the quenching part 40 occurs when avalanche breakdown occurs and a current flows in the quenching part 40. The potential difference between the p-type semiconductor region 11 and the n+-type semiconductor region 12 is reduced by the voltage drop, and the avalanche breakdown stops. Thereby, the element 10 has a fast response with a short time constant; and the next light that is incident on the element 10 can be detected again.
The p-type semiconductor region 11, the n+-type semiconductor region 12, the n-type semiconductor region 23, the p+-type semiconductor region 24, the n+-type semiconductor region 25, the n+-type semiconductor region 26, the p+-type semiconductor layer 71, and the p--type semiconductor layer 72 include at least one semiconductor material selected from the group consisting of silicon, silicon carbide, gallium arsenide, and gallium nitride. For example, phosphorus, arsenic, or antimony is used as the n-type impurity when these semiconductor regions include silicon. Boron or boron fluoride is used as the p-type impurity.
The insulating part 15, the insulating layer 31, and the insulating layer 32 include insulating materials. For example, the insulating part 15, the insulating layer 31, and the insulating layer 32 include silicon oxide or silicon nitride. The quenching part 40 includes polysilicon. An n-type impurity or a p-type impurity may be added to the quenching part 40. The contact plugs and the interconnects include metal materials such as tungsten, titanium, copper, aluminum, etc.
The lens 61 includes a light-transmissive resin. It is favorable for the resin to be an acrylic resin. The acrylic resin may be a resin into which propylene glycol monomethyl ether acetate is mixed. The shape of each lens 61 can be adjusted by controlling the exposure amount at each portion in the X-Y plane in the photolithography process.
To increase the light detection efficiency of the light detector 100, it is favorable for the light that enters the light detector 100 to be easily incident on the element 10. On the other hand, other than the first region 1 that includes the element 10, the second region 2 also is included in the light detector 100. Circuit elements, etc., are located in the second region 2; and the element 10 is not located in the second region 2. Therefore, the light that enters the light detector 100 is not detected in the second region 2. To increase the light detection efficiency, it is favorable for the light that enters toward the second region 2 also to be detected.
The lens group 60 is included in the light detector 100. The lens group 60 is located on the first and second regions 1 and 2. Therefore, the light that enters toward the second region 2 can be refracted toward the first region 1. According to the first embodiment, light that is incident on the light detector 100 in a wider area can be detected by the element 10; and the light detection efficiency of the light detector 100 can be increased.
It is favorable for the length L1 in the Y-direction of the lens group 60 to be greater than the length L2 in the Y-direction of the first region 1. By setting the length L1 to be greater than the length L2, the light that is in a wider area can be refracted toward the first region 1. The light detection efficiency of the light detector 100 can be further improved.
The multiple lenses 61 that are included in the lens group 60 may be separated from each other or may be linked to each other. However, to increase the light detector efficiency, it is favorable to increase the surface area of the upper surface of each lens 61. To increase the surface area, it is favorable for the multiple lenses 61 to be linked to each other. The multiple lens groups 60 may be linked to each other.
In the light detector 100, the distance between the lens 61 and the corresponding element 10 increases as the lens 61 is positioned further toward the outer perimeter. Therefore, the light that is refracted by the lens 61 positioned at the outer perimeter is easily scattered or absorbed before being incident on the corresponding element 10. It is favorable for the light detection efficiency difference to be small between the element 10 positioned at the center of the first region 1 and the element 10 positioned at the outer perimeter. To reduce the detection efficiency difference, it is favorable for the Y-direction length to increase as the lens 61 is positioned further toward the outer perimeter of the lens group 60. For example, as shown in
As shown in
As shown in
According to the first modification, compared to the light detector 100, the refraction angle due to the lens 61 positioned at the outer perimeter of the lens group 60 can be increased. Thereby, the distance in the Z-direction between the element 10 and the lens 61 can be short. For example, the absorption or the scattering of the light by the insulating layers 31 and 32 can be suppressed, and the size in the Z-direction of the light detector 110 can be reduced.
Similarly to
As shown in
Similarly to
When an odd number of elements 10 is arranged in the Y-direction in one first region 1, the shape of the lens 61 corresponding to the element 10 at the center may be symmetric in the Y-direction. For example, the center in the Y-direction of the element 10 at the center and the apex of the corresponding lens 61 are arranged in the Z-direction. The shape of the corresponding lens 61 has planar symmetry with respect to the X-Z plane passing through the center in the Y-direction of the lens 61.
In the simulations shown in
In the light detector 130 according to the third modification as shown in
As shown in
One lens group 60 that corresponds to one first region 1 is discriminated by determining the multiple lenses 61 that refract the light toward the one first region 1.
For example, as shown in
In the light detector 130, two elements 10 are provided in each of the X-direction and the Y-direction in one first region 1. In the light detector 140 according to the fourth modification as shown in
In the light detector 140 as shown in
For example, in the light detector 140 as well, similarly to the light detector 100, a portion of the first lens 61a is positioned on the first element 10a. Another portion of the first lens 61a is positioned on the second element 10b. A portion of the second lens 61b is positioned on the second element 10b. Another portion of the second lens 61b is positioned on the second region 2. In the Y-direction, the distance between the center C2 of the second element 10b and the apex A2 of the second lens 61b is greater than the distance D1 between the center C1 of the first element 10a and the apex A2 of the first lens 61a.
As in the third and fourth modifications, the first region 1, the second region 2, and the lens group 60 may be repeatedly provided in two directions that cross each other.
In the light detector 100, as shown in
When the apex of the lens 61 and the center of the element 10 are aligned in the Z direction, the amount of light traveling toward the center of the element 10 can be increased, and the amount of light traveling toward the outer periphery of the element 10 can be decreased. The outer periphery of the element 10 may be a dead region where avalanche breakdown does not occur even when light is incident. By increasing the amount of light traveling toward the center of the element 10, the light-receiving sensitivity of the light detector 150 can be improved.
In the light detectors 100 to 150, a resistor that generates a large voltage drop is included as the quenching part 40. Conversely, in the light detector according to the sixth modification, a control circuit and a switching element are included as the quenching part. In other words, an active quenching circuit for blocking the current is included as the quenching part 40.
As shown in
One switching element SW may be provided for one element 10 as shown in
In the light detector 170 according to the seventh modification as shown in
The metal member 80 extends in the Z-direction and is surrounded with the p+-type semiconductor layer 71 and the p--type semiconductor layer 72. The insulating layer 81 is located between the p+-type semiconductor layer 71 and the metal member 80 and between the p--type semiconductor layer 72 and the metal member 80. The metal member 80 can be formed by through-silicon via (TSV) technology.
For example, one Z-direction end of the metal member 80 is electrically connected to an interconnect 82. The interconnect 82 may be electrically connected to one of the common lines 51. The other end of the metal member 80 is not covered with the p+-type semiconductor layer 71. The metal member 80 is electrically isolated from the p+-type semiconductor layers 71 and 72 by the insulating layer 81. The potential of the metal member 80 can be set to a different potential from the p+-type semiconductor layers 71 and 72.
In the light detector 180 according to the eighth modification shown in
Compared to the light detector 100, the light detector 190 according to the ninth modification shown in
As shown in
The support member 93 is located on the lens group 60 and the resin layer 90. The support member 93 is light-transmissive. The first filter layer 91 is located on the support member 93. The first filter layer 91 is positioned on the lens group 60 and the resin layer 90. The second filter layer 92 is located between the lens group 60 and the support member 93 and between the resin layer 90 and the support member 93. The thickness in the Z-direction of the support member 93 is greater than the thicknesses in the Z-direction of the resin layer 90, the first filter layer 91, and the second filter layer 92.
The resin layer 90 is provided as an adhesive that bonds the first filter layer 91, the second filter layer 92, and the support member 93 to the insulating layer 32. The resin layer 90 may include a resin that absorbs or reflects light. For example, the resin layer 90 includes an infrared-cutting agent (an IR absorber) that absorbs infrared light. The support member 93 is a glass substrate or a sapphire substrate.
The first filter layer 91 and the second filter layer 92 absorb light of a prescribed range of wavelengths. The materials of the first and second filter layers 91 and 92 can be selected as appropriate according to the wavelength to be absorbed. For example, the first filter layer 91 and the second filter layer 92 include at least one selected from the group consisting of aluminum, silver, gold, magnesium fluoride (MgF2), lanthanum fluoride (LaF3), tetrahydrofuran (ThF3 or ThF4), silicon oxide (SiO2), titanium oxide (TiO2), zirconium oxide (ZrO2), aluminum oxide (Al2O3), magnesium oxide (SiO2), germanium, and zinc selenide (ZnSe).
For example, the transmittances of the first and second filter layers 91 and 92 for light of a first range of wavelengths is greater than the transmittance for light of a second range of wavelengths. The transmittance of the resin layer 90 for the light of the first range of wavelengths is less than the transmittance for the light of the second range of wavelengths. The light that passes through the first and second filter layers 91 and 92 is absorbed or reflected by the resin layer 90. Thereby, the amount of the light incident on the second region 2 can be effectively reduced. The misoperation of the circuit elements due to the incidence of light on the second region 2 can be suppressed.
For example, the first range is greater than 850 nm and less than 1100 nm. The second range is greater than 400 nm and less than 650 nm. The transmittances of the first and second filter layers 91 and 92 for the light of the first range of wavelengths are greater than 10 times the transmittances for the light of the second range of wavelengths. The transmittance of the resin layer 90 for the light of the second range of wavelengths is greater than 10 times the transmittance for the light of the first range of wavelengths. The transmittances of the first and second filter layers 91 and 92 are not less than 10 times the transmittance of the resin layer 90 for the light of the first range of wavelengths.
In the light detectors 160 to 190 as well, similarly to the light detectors 100 to 150, the lens group 60 is located on the second region 2 in addition to the first region 1. Thereby, the light that is incident on the light detector in a wider area can be detected by the element 10.
The structures according to the modifications described above can be combined as appropriate. For example, one of the light detectors 100 to 150 or 170 to 190 may include an active quenching circuit similar to that of the light detector 160. One of the light detectors 110 to 150 may include the metal member 80 similarly to the light detector 170 or 180. One of the light detectors 110 to 150 may include the resin layer 90, the first filter layer 91, the second filter layer 92, and the support member 93 similarly to the light detector 190.
The embodiment is applicable to a long-distance subject detection system (LIDAR) or the like including a line light source and a lens. The lidar device 5001 includes a light-projecting unit T projecting laser light toward an object 411, and a light-receiving unit R (also called a light detection system) receiving the laser light from the object 411, measuring the time of the round trip of the laser light to and from the object 411, and converting the time into a distance.
In the light-projecting unit T, a light source 404 emits light. For example, the light source 404 includes a laser light oscillator and produces laser light. A drive circuit 403 drives the laser light oscillator. An optical system 405 extracts a portion of the laser light as reference light, and irradiates the rest of the laser light on the object 411 via a mirror 406. A mirror controller 402 projects the laser light onto the object 411 by controlling the mirror 406. Herein, “project” means to cause the light to strike.
In the light-receiving unit R, a reference light detector 409 detects the reference light extracted by the optical system 405. A light detector 410 receives the reflected light from the object 411. A distance measuring circuit 408 measures the distance to the object 411 based on the reference light detected by the reference light detector 409 and the reflected light detected by the light detector 410. An image recognition system 407 recognizes the object 411 based on the measurement results of the distance measuring circuit 408.
The lidar device 5001 employs light time-of-flight ranging (Time of Flight) in which the time of the round trip of the laser light to and from the object 411 is measured and converted into a distance. The lidar device 5001 is applied to an automotive drive-assist system, remote sensing, etc. Good sensitivity is obtained particularly in the near-infrared region when the light detectors of the embodiments described above are used as the light detector 410. Therefore, the lidar device 5001 is applicable to a light source of a wavelength band that is invisible to humans. For example, the lidar device 5001 can be used for obstacle detection for a mobile body.
A light source 3000 emits light 412 toward an object 600 that is the detection object. A light detector 3001 detects light 413 that passes through the object 600, is reflected by the object 600, or is diffused by the object 600.
For example, the light detector 3001 can realize highly-sensitive detection when the light detector according to the embodiment described above is used. It is favorable to provide multiple sets of the light detectors 410 and the light source 404 and to preset the arrangement relationship of the sets in the software (which is replaceable with a circuit). For example, it is favorable for the arrangement relationship of the sets of the light detector 410 and the light source 404 to be provided at uniform spacing. Thereby, an accurate three-dimensional image can be generated by the output signals of each light detector 410 complementing each other.
In the example of
Other than the vehicle illustrated in
According to embodiments described above, the light detection efficiency of the light detector can be increased.
In the specification of the application, “perpendicular” and “parallel” refer to not only strictly perpendicular and strictly parallel but also include, for example, the fluctuation due to manufacturing processes, etc. It is sufficient to be substantially perpendicular and substantially parallel.
Hereinabove, exemplary embodiments of the invention are described with reference to specific examples. However, the embodiments of the invention are not limited to these specific examples. For example, one skilled in the art may similarly practice the invention by appropriately selecting specific configurations of components included in light detectors such as elements, semiconductor regions, insulating parts, interconnects, contact plugs, lenses, etc., from known art. Such practice is included in the scope of the invention to the extent that similar effects thereto are obtained.
Further, any two or more components of the specific examples may be combined within the extent of technical feasibility and are included in the scope of the invention to the extent that the purport of the invention is included.
Moreover, all light detectors, light detection systems, lidar devices, and mobile bodies practicable by an appropriate design modification by one skilled in the art based on the light detectors, the light detection systems, the lidar devices, and the mobile bodies described above as embodiments of the invention also are within the scope of the invention to the extent that the purport of the invention is included.
Various other variations and modifications can be conceived by those skilled in the art within the spirit of the invention, and it is understood that such variations and modifications are also encompassed within the scope of the invention.
While certain embodiments have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the inventions. Indeed, the novel embodiments described herein may be embodied in a variety of other forms; furthermore, various omissions, substitutions and changes in the form of the embodiments described herein may be made without departing from the spirit of the inventions. The accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and spirit of the invention.
Number | Date | Country | Kind |
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2021-137088 | Aug 2021 | JP | national |
This application is based upon and claims the benefit of priority from Japanese Patent Application No.2021-137088, filed on Aug. 25, 2021; the entire contents of which are incorporated herein by reference.