J.L. Herbert and N. Saha, “Application of Silanes for Promoting Patterning Layer Adhesion in Semiconductor Manufacturing,” J. Adhesion Sci. Technol., vol. 5, No. 10 (1991), pp. 905-925. |
K.L. Mittal, “Factors, Affecting Adhesion of Lithographic Materials,” Solid State Technology, May 1979, pp. 89-97. |
M.E. Bartram, A.J. Howard, A.G. Baca, R.J. Shul, and D.J. Rieger, “A Bew Method for Promoting Photoresist Adhesion on Tungsten Films for Self-Aligned Refractory Gates on GaAs,” J. Electrochem, Soc., vol. 140, No. 10, Oct. 1993, pp. 2998-3000. |