Number | Date | Country | Kind |
---|---|---|---|
3617499 | May 1986 | DEX |
Number | Name | Date | Kind |
---|---|---|---|
3544320 | Yamada et al. | Dec 1970 | |
3660097 | Mainthia | May 1972 | |
3867147 | Teuscher | Feb 1975 | |
4259430 | Kaplan et al. | Mar 1981 | |
4289838 | Rowe et al. | Sep 1981 | |
4387151 | Bosse | Jun 1983 | |
4564580 | Ichimura et al. | Jan 1986 | |
4631245 | Pawlowski et al. | Dec 1986 | |
4659645 | Frommeld et al. | Apr 1987 | |
4749639 | Frommeld | Jul 1988 |
Number | Date | Country |
---|---|---|
565734 | Sep 1987 | AUX |
1024803 | Jan 1978 | CAX |
1172492 | Aug 1984 | CAX |
2133899A | Aug 1984 | GBX |
Entry |
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G. T. Elie et al., IBM Technical Disclosure Bulletin, "Photoresist Cross-Linked with a Thermal Free-Radical Initiator for use as an Ion Implant Mask", vol. 17, No. 1, Jun. 1974, p. 85. |
J. M. Mayone, IBM Technical Disclosure Bulletin, "Vacuum Bake Photoresist Preparation for High-Energy, High-Dose Ion Implantation", vol. 18, No. 3, Aug. 1975, pp. 788. |