Claims
- 1. A light sensitive material comprising a support and an image-forming layer on the support, said image-forming layer comprising:
- (i) a light-absorbing organic compound;
- (ii) an ethylenically unsaturated monomeric material; and
- (iii) a photopolymerization initiator;
- wherein said light absorbing organic compound is formed by (iv) imagewise exposing to light said image forming layer containing a reducing agent, a photosensitive silver halide and an organic silver salt selected from the group consisting of silver salts of (a) aliphatic carboxylic acids, (b) aromatic carboxylic acids, (c) thiocarbonyl compounds having a mercapto group, (d) thiocarbonyl compounds having .alpha.-hydrogen and (e) amino group-containing compounds, to form a silver latent image and (v) thereafter heating said image-forming layer to initiate a redox reaction between said reducing agent and said organic silver salt, said redox reaction catalyzed by said silver latent image to thereby form said light-absorbing organic compound; and
- said light-absorbing organic compound absorbing light at wavelengths to which said polymerization initiator is sensitive, wherein the absorption peak wavelength (.lambda..sub.6) of said photopolymerization initiator is within the range .lambda..sub.3 .+-.0.8 W.sub.1/2, where .lambda..sub.3 is the absorption peak wavelength of said light absorbing organic compound and W.sub.1/2 is the half-width of a second difference spectrum F(.lambda.); and
- wherein the first difference spectrum G(.lambda.) of said light sensitive material, the light-absorption characteristics f(.lambda.) of an area of said light sensitive material imagewise exposed to light and heated and the light absorption characteristics g(.lambda.) of an area of said light sensitive material not imagewise exposed to light and heated are related as G(.lambda..sub.3)/f(800)-g(800)=k and wherein k is .gtoreq.1.5.
- 2. A light sensitive material according to claim 1, wherein, said absorption peak wavelength .lambda..sub.6 is within the range of .lambda..sub.3 .+-.0.5 W.sub.1/2.
- 3. A light sensitive material according to claim 1, wherein said reducing agent is a compound represented by the following Formula (I): ##STR6## wherein R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, asubstituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aralkyl group, an alkoxyl group, or a substituted or unsubstituted amino group; m represents an integer of 1 to 3; and A is a monovalent, divalent or trivalent group and represents a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkyl group, a substituted amino group, a divalent aralkylidene group, or a divalent alkylidene group, or a trivalent methine group.
- 4. A light sensitive material according to claim 1, wherein said reducing agent is a compound represented by the following Formula (II): ##STR7## wherein R.sup.5 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or aralkyl group; R.sup.3, R.sup.4 and R.sup.6 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an amino group, an aryl group, an aralkyl group, an alkoxyl group, a nitro group, an acyl group, or a cyano group; R.sup.7 represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group; and a.sup.1 represents a hydrogen atom, a hydroxyl group, a halogen atom, a substituted or unsubstituted alkyl group, a cycloalkyl group, an alkoxyl group, or a substituted or unsubstituted amino group.
- 5. A light sensitive material according to claim 1, wherein said reducing agent is a compound represented by the following Formula (III): ##STR8## wherein R.sup.8, R.sup.9, R.sup.10 and R.sup.11 each independently represent a substituent selected from the group consisting of a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a cycloalkyl group, an alkoxyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted amino group, a nitro group, and an acyl group; Z represents a divalent group; and a.sup.1 and a.sup.2 each represent a substituent selected from the group consisting of a hydrogen atom, a hydroxyl group, a halogen atom, a substituted or unsubstituted alkyl group, a cycloalkyl group, an alkoxyl group, and a substituted or unsubstituted amino group, provided that at least one of a.sup.1 and a.sup.2 is a hydroxyl group.
- 6. A light sensitive material according to claim 1, wherein said material further contains a heat-diffusible coloring matter.
- 7. A light sensitive material according to calim 1, comprising (i) a photosensitive layer containing at least said photosensitive silver halide, said organic silver salt and said reducing agent, and (ii) a polymerizing layer containing at least said ethylenically unsaturated monomeric material and said photopolymerization initiator.
- 8. A light sensitive material according to claim 7, wherein said polymerizing layer contains a heat-diffusible coloring matter.
- 9. A light sensitive material according to claim 1, comprising (i) a photosensitive layer containing at least said photosensitive silver halide, said organic silver salt and said reducing agent, (ii) a polymerizing layer containing at least said ethylenically unsaturated monomeric material and said photopolymerization initiator, and (iii) a coloring material layer containing at least a heat-diffusible coloring matter, which are provided in this order.
- 10. A light sensitive material according to claim 1, wherein said light sensitive material contains a coupler.
- 11. A light sensitive material according to claim 10, wherein, said absorption peak wavelength .lambda..sub.6 is within the range of .lambda..sub.3 .+-.0.5 W.sub.1/2.
- 12. A light sensitive material according to claim 1, wherein said material contains a coupler, and said reducing agent is selected from the group consisting of p-aminophenols, p-phenylenediamines, and o-aminophenols.
- 13. A light sensitive material according to claim 12, wherein said coupler is selected from the group consisting of .alpha.-acylacetamides, pyrazolones, phenols, and naphthols.
- 14. A light sensitive material according to claim 12, wherein said material contains a heat-diffusible coloring matter.
- 15. A light sensitive material according to claim 12, comprising: (i) a photosensitive layer containing at least said photosensitive silver halide, said organic silver salt, said coupler and said reducing agent, and (ii) a polymerizing layer containing at least said ethylenically unsaturated monomeric material and said photopolymerization initiator.
- 16. A light sensitive material according to claim 15, wherein said polymerizing layer contains a heat-diffusible coloring matter.
- 17. A light sensitive material according to claim 12, comprising: (i) a photosensitive layer containing at least said photosensitive silver halide, said organic silver salt, said coupler and said reducing agent, and (ii) a polymerizing layer containing at least said ethylenically unsaturated monomeric material and said photopolymerization initiator, and (iii) a coloring material layer containing at least a heat-diffusible coloring matter, which are provided in this order.
- 18. A light sensitive material according to claim 6, comprising (i) a coloring material layer containing at least said heat-diffusible coloring matter, and (ii) an image forming layer containing at least said photosensitive silver halide, said organic silver salt, said reducing agent, said ethylenically unsaturated monomeric material and said photopolymerization initiator.
Priority Claims (5)
Number |
Date |
Country |
Kind |
63-250172 |
Oct 1988 |
JPX |
|
63-250174 |
Oct 1988 |
JPX |
|
63-250176 |
Oct 1988 |
JPX |
|
1-130164 |
May 1989 |
JPX |
|
1-182033 |
Jul 1989 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 07/416,008 filed Oct. 2, 1989, now abandoned.
US Referenced Citations (18)
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EPX |
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Aug 1989 |
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Aug 1989 |
EPX |
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Aug 1989 |
EPX |
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JPX |
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Mar 1984 |
JPX |
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Mar 1984 |
JPX |
Non-Patent Literature Citations (2)
Entry |
T. H. James, "The Theory of the Photographic Process", Fourth Edition, Macmillan Publishing Co., Inc., pp. 353-361. |
Patent Abstrat of Japan, vol. 6, No. 245 (P-159) (107), Dec. 3, 1982, (JP-57-142638 (Fuji) Sep. 3, 1982). |
Continuations (1)
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Number |
Date |
Country |
Parent |
416008 |
Oct 1989 |
|