Claims
- 1. A light-sensitive material consisting essentially of (1) a support having a hydrophilic surface, and (2) in order on said surface a first light-sensitive layer adjacent said support containing an O-quinone diazide compound alone or in admixture with resin, said first light-sensitive layer containing 20 to 100% by weight of the ortho-quinone diazide compound, the alkali solubility of said compound being increased upon irradiation with active rays, a non-light sensitive organic coating layer over said first light-sensitive layer, and a second light-sensitive layer containing an O-quinone diazide compound alone or in admixture with resin, said second light-sensitive layer containing 20 to 100% by weight of the orthoquinone diazide compound, the alkali solubility of said compound being increased upon irradiation with active rays, over said organic coating layer, said organic coating layer comprising a water-insoluble but organic solvent-soluble high molecular weight compound having film forming properties and further having the property that it is either permeable to an alkaline developer or is dissolved in or swelled by an alkaline developer, the thickness of each of said layers on said support ranging from about 0.1 g/m.sup. 2 to 7.0 g/m.sup.2.
- 2. The light sensitive material of claim 1, wherein said support is a metal sheet, a resin film, a paper, a resin film-paper laminate, or a glass sheet.
- 3. The light-sensitive material of claim 1, wherein said support is an aluminum sheet.
- 4. The light-sensitive material of claim 1, wherein said O-quinone diazide compound is an ester of an aromatic polyhydroxy compound and an O-quinone diazide sulfonic acid.
- 5. The light-sensitive material of claim 4, wherein said O-quinone diazide compound is 2,2'-dihydroxy-diphenyl-bis-(naphthoquinone-1,2-diaxide-5-sulfonic acid ester), 2,3,4-trioxybenzophenone-bis-(naphthoquinone-1,2-diazide-5-sulfonic acid ester), 2,7-dihydroxynaphthalene-bis-(naphthoquinone-1,2-diazide- 5-sulfonic acid ester), the ester of a phenolformaldehyde resin and naphthoquinone-1,2-diazide-5-sulfonic acid, or the naphthoquinone -1,2-diazide-5-sulfonic acid ester of the polyhydroxyphenyl obtained by the condensation of acetone and pyrogallol.
- 6. The light sensitive material of claim 1, wherein said first and second light-sensitive layer comprises said O-quinone diazide compound and an organic resin.
- 7. The light-sensitive material of claim 6 wherein said organic resin is a phenol resin, a cresol resin, a styrene/mallic anhydride copolymer or shellac.
- 8. The light sensitive material of claim 1, wherein the combined thickness of said coating layers is 7.0 g/m.sup.2 or less.
- 9. A method of forming an image comprising image-wise exposing the light-sensitive material of claim 1 and developing the exposed light-sensitive material.
Priority Claims (1)
Number |
Date |
Country |
Kind |
48-60074 |
May 1973 |
JPX |
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Parent Case Info
This is a continuation of application Ser. No. 643,726, filed Dec. 23, 1975, now abandoned, which is a division of application Ser. No. 474,465, filed May 29, 1974, now abandoned.
US Referenced Citations (12)
Divisions (1)
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Number |
Date |
Country |
Parent |
474465 |
May 1974 |
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Continuations (1)
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Number |
Date |
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Parent |
643726 |
Dec 1975 |
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