Claims
- 1. A light-sensitive silver halide photographic material having at least one silver halide emulsion layer containing silver halide crystal grains in which the improvement comprises at least one of said silver halide emulsion layer contains non-core/shell silver halide crystal grains which satisfy the following conditions of:
- (1) composed substantially of silver iodobromide,
- (2) having a maximum point of a silver iodide content at 67% or less of a distance from the center of the silver halide grain relative to a distance (l.sub.0) from the center of the silver halide grain to the outermost surface thereof,
- (3) having a minimum point of the silver iodide content at 58% or more of the distance form the center of the silver halide grain relative to l.sub.0,
- (4) substantially continuously reduced in the silver iodide content from the maximum point of the silver iodide content to the minimum point thereof, and
- (5) satisfies the following formula: ##EQU4## wherein l.sub.0 has the same meaning as defined above, l.sub.1 represents a distance of the maximum point of the silver iodide content from the center of the silver halide grain and l.sub.2 represents a distance of the minimum point of the silver iodide content from the center of the silver halide grain.
- 2. A light-sensitive silver halide photographic material according to claim 1, wherein the silver iodide content in the outermost surface layer of the silver halide grain is 20 mole % or less.
- 3. A light-senstive silver halide photographic material according to claim 2, wherein said silver iodide content in the outermost surface layer of the silver halide grain is 10 mole % or less.
- 4. A light-sensitive silver halide photographic material according to claim 3, wherein said silver iodide content in the outermost surface layer of the silver halide grain is 6 mole % or less.
- 5. A light-sensitive silver halide photographic material according to claim 4, wherein said silver iodide content in the outermost surface layer of said grain is 0 mole %.
- 6. A light-sensitive silver halide photographic material according to claim 1, wherein the inner structure of the silver halide grain in which the silver iodide content is substantially continuously reduced is a structure in which the silver iodide content is reduced linearly from a specific point in the inner portion toward a specific point of the surface along a curve having no maximum or minimum.
- 7. A light-sensitive silver halide photographic material according to claim 1, wherein the inner structure of the silver halide grain in which the silver iodide content is substantially continuously reduced is a structure in which the silver iodide content is reduced along a curve having one or a plural number of maximum value or minimum value.
- 8. A light-sensitive silver halide photographic material according to claim 1, wherein the maximum point of silver iodide content is present at 58% or less of the distance from the center of the silver halide grain relative to the distance from the center of the silver halide grain to the outermost surface thereof.
- 9. A light-sensitive silver halide photographic material according to claim 8, wherein the maximum point of silver iodide content is present at 46% or less.
- 10. A light-sensitive silver halide photographic material according to claim 9, wherein the maximum point of silver iodide content is present at 37% or less.
- 11. A light-sensitive silver halide photographic material according to claim 1, wherein the minimum content of silver iodide content is present at 67% or more of the distance from the center of the silver halide grain relative to the distance from the center of the silver halide grain to the outermost surface thereof.
- 12. A light-sensitive silver halide photographic material according to claim 11, wherein the minimum content of silver iodide content is present at 78% or more.
- 13. A light-sensitive silver halide photographic material according to claim 1, wherein the silver halide crystal grains satisfying the conditions (1) to (5) are contained in the silver halide emulsion layer with an amount of 10% by weight or more.
- 14. A light-sensitive silver halide photographic material according to claim 13, wherein said silver halide crystal grains are contained with an amount of 50% by weight or more.
- 15. A light-sensitive silver halide photographic material according to claim 14, wherein said silver halide crystal grains are contained with an amount of 60 to 100% by weight.
- 16. A light-sensitive silver halide photographic material according to claim 1, wherein a silver iodide content in the whole grains of the silver halide emulsion is 30 mole % or less.
- 17. A light-sensitive silver halide photographic material according to claim 16, wherein said silver iodide content in the whole grains of the silver halide emulsion is 1 to 20 mole %.
- 18. A light-sensitive silver halide photographic material according to claim 17, wherein said silver iodide content in the whole grains of the silver halide emulsion is 3 to 15 mole %.
- 19. A light-sensitive silver halide photographic material according to claim 4, wherein the maximum point of silver iodide content is present at 58% or less of the distance from the center of the silver halide grain relative to the distance from the center of the silver halide grain to the outermost surface thereof.
- 20. A light-sensitive silver halide photographic material according to claim 19, wherein the minimum content of silver iodide content is present at 67% or more of the distance from the center of the silver halide grain relative to the distance from the center of the silver halide grain to the outermost surface thereof.
- 21. A light-sensitive silver halide photographic material according to claim 20, wherein the minimum point of silver iodide content is present at 37% or less and the minimum content of silver iodide is present at 78% or more.
- 22. A light-sensitive silver halide photographic material according to claim 21, wherein the silver halide crystal grains satisfying the conditions (1) to (5) are contained in the silver halide emulsion layer with an amount of 50% by weight or more.
- 23. A light-sensitive silver halide photographic material according to claim 22, wherein a silver iodide content in the whole grains of the silver halide emulsion is 3 to 15 mole %.
- 24. A light-sensitive silver halide photographic material according to claim 19, wherein the inner structure of the silver halide grain in which the silver iodide content is substantially monotonously reduced is a structure in which the silver iodide content is reduced linearly from a specific point in the inner portion toward a specific point of the surface along a curve having no maximum or minimum.
- 25. A light-sensitive silver halide photographic material according to claim 24, wherein the minimum content of silver iodide content is present at 67% or more of the distance from the center of the silver halide grain relative to the distance from the center of the silver halide grain to the outermost surface thereof.
- 26. A light-sensitive silver halide photographic material according to claim 25, wherein said silver halide crystal grains are contained with an amount of 50% by weight or more.
- 27. A light-sensitive silver halide photographic material according to claim 26, wherein said silver iodide content in the whole grains of the silver halide emulsion is 1 to 20 mole %.
- 28. A light-sensitive silver halide photographic material according to claim 21, wherein said silver halide crystal grains are contained with an amount of 50% by weight or more.
- 29. A light-sensitive silver halide photographic material according to claim 28, wherein said silver iodide content in the whole grains of the silver halide emulsion is 3 to 15 mole %.
- 30. The light-sensitive silver halide photographic material according to claim 1, wherein silver iodide is contained substantially through the non-core/shell silver halide crystal grains.
Priority Claims (1)
Number |
Date |
Country |
Kind |
63-44751 |
Feb 1988 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 07/313,623, filed Feb. 21, 1989 (abandoned).
US Referenced Citations (7)
Foreign Referenced Citations (2)
Number |
Date |
Country |
0176325 |
Apr 1986 |
EPX |
0202784 |
Nov 1986 |
EPX |
Continuations (1)
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Number |
Date |
Country |
Parent |
313623 |
Feb 1989 |
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