The present invention relates to a line-width inspection device, and more particularly to a line-width inspection device that increases compensation light sources to prevent from occurring shadows at edges of patterns under inspection and affecting image capturing.
With the development of semiconductor manufacturing process, integrated circuit elements are progressively made much smaller. Therefore, in the semiconductor manufacturing process, control of critical dimension, such as line width, line pitch, etc. of fine circuit patterns on masks or wafers, is an important key point. Generally, manufacturers use line-width inspection device to inspect critical dimensions of circuit patterns, the line-width inspection device can be used to inspect if the line width or pitch is precise without deviation.
With reference to
However, with the decrease in dimensions of semiconductors, tolerable line-width deviation in manufacturing processes is getting smaller. Therefore, the line-width inspection technology still has following problems in practical use: since the light source device 90 vertically projects on the pattern under inspection in a radial manner, such that edges of the pattern 92 under inspection may not be lighted by the light source device 90 due to a thickness, and lead to an occurrence of shadows. With reference to
Hence, it is necessary to provide a line-width inspection device to overcome the problems existing in the conventional technology.
A primary object of the invention is to provide a line-width inspection device which increases side light sources to compensate a shadow part of a pattern under inspection for insufficient illumination, so as to enhance precision of an image capturing device thereof that performs image capturing on the pattern under inspection.
To achieve the above object, the present invention provides a line-width inspection device, and the line-width inspection device comprises:
In one embodiment of the present invention, an incident direction of the at least one compensation light source device is oriented at an oblique angle with respect to the platform.
In one embodiment of the present invention, the oblique angle is ranged between 30 degrees and 60 degrees, such as 45 degrees.
In one embodiment of the present invention, the line-width inspection device comprises two compensation light source devices disposed at two sides of the main light source device, respectively.
In one embodiment of the present invention, the line-width inspection device further comprises a computer, and the computer is connected to the image capturing device to receive images captured by the image capturing device.
In one embodiment of the present invention, the at least one compensation light source device is a light-emitting diode assembly, a cold cathode fluorescent lamp or an incandescent lamp.
In one embodiment of the present invention, the pattern under inspection is a transparent electrode layer of a liquid crystal glass or a black matrix layer of a color filter.
The compensation light source device can compensate shadow parts of the pattern under inspection for insufficient illumination, especially when the compensation light source device is mounted at two sides of the main light source device, the pattern under inspection can obtain sufficient illumination, so as to further enhance precision of the image capturing device performing image capturing on the pattern under inspection.
The foregoing objects, features and advantages adopted by the present invention can be best understood by referring to the following detailed description of the preferred embodiments and the accompanying drawings. Furthermore, the directional terms described in the present invention, such as upper, lower, front, rear, left, right, inner, outer, side and etc., are only directions referring to the accompanying drawings, so that the used directional terms are used to describe and understand the present invention, but the present invention is not limited thereto.
With reference to
The platform 10 has an inspection area 11, and a surface of the platform 10 is provided for an element pattern 100 under inspection (i.e. to-be-inspected) to be disposed thereon, and the area for disposing is the so-called inspection area 11. The element pattern 100 under inspection mainly refers to related components in liquid crystal display (LCD) field, such as indium tin oxide (ITO) transparent electrode layer of a liquid crystal glass or a black matrix (BM) layer of a color filter (CF), but is not limited thereto.
The image capturing device 20 is mounted above the platform 10 and can be attached to a bracket (not illustrated in Figures) mounted on the platform 10. The image capturing device 20 is aligned with the inspection area 11 of the platform 10 and captures images of the element pattern 100 under inspection in the inspection area 11.
The main light source device 30 is mounted above the platform 10. The main light source device 30 correspondingly provides forward illumination to the inspection area 11, and an incident direction of the forward illumination is perpendicular to the surface of the platform 10. The main light source device 30 may be a light-emitting diode (LED) assembly, a cold cathode fluorescent lamp (CCFL) or an incandescent lamp.
The at least one compensation light source device 31 is mounted above the platform 10. For example, in this embodiment, the line-width inspection device has two compensation light source devices 31 that are disposed at two sides of the main light source device 30, respectively, wherein each of the compensation light source devices 31 may be a light-emitting diode (LED) assembly, a cold cathode fluorescent lamp (CCFL) or an incandescent lamp. The compensation light source devices 31 correspondingly provides compensation illumination to the inspection area 11. An incident direction of each of the compensation light source devices is oriented at an oblique angle with respect to the platform 10, and the oblique angle is ranged between 30 degrees and 60 degrees, especially 45 degrees.
The line-width inspection device further comprises a computer 40. The computer 40 is connected to the image capturing device 20 to receive images captured by the image capturing device 20.
With reference to
The line-width inspection device of the present invention uses additional illumination by adding the compensation light source device 31 to compensate the edges of the element pattern 100 that cannot be illuminated by the light source on the top. With reference to
In conclusion, comparing with the conventional line-width inspection device unable to provide full illumination to edges of a pattern under inspection and lead to occurrence of shadows and causing the image capturing precision to be affected. The line-width inspection device of the present in
The present invention has been described with a preferred embodiment thereof and it is understood that many changes and modifications to the described embodiment can be carried out without departing from the scope and the spirit of the invention that is intended to be limited only by the appended claims.
Number | Date | Country | Kind |
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201010533817.7 | Nov 2010 | CN | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/CN10/79153 | 11/26/2010 | WO | 00 | 12/14/2010 |