Liquid crystal display device and manufacturing method thereof

Abstract

An exemplary liquid crystal display (“LCD”) device and a manufacturing method thereof are capable of improving a drop margin of liquid crystal. The LCD device according to an exemplary embodiment of the present invention include first and second substrates that are assembled with liquid crystal disposed therebetween, an organic layer formed on one of the first and second substrates, a column spacer formed between the first and second substrates, and a buffering pattern formed in the organic layer at a region in which the column spacer and the organic layer are in contact with each other.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other aspects, features and advantages of the present invention will become more apparent from the following detailed description when taken in conjunction with the accompanying drawings in which:

FIGS. 1A and 1B are cross-sectional views illustrating an LCD device before and after pressure is applied thereon, respectively, according to an exemplary embodiment of the present invention;

FIG. 2 is a cross-sectional view illustrating an LCD device according to another exemplary embodiment of the present invention;

FIGS. 3A to 3E are top plan views illustrating various types of organic layer grooves according to an exemplary embodiment of the present invention;

FIG. 4 is a top plan view illustrating a structure of one subpixel in a TFT substrate of an LCD device according to an exemplary embodiment of the present invention;

FIG. 5 is a cross-sectional view illustrating, together with a color filter substrate, the TFT substrate taken along line V-V′ shown in FIG. 4; and

FIG. 6 is a cross-sectional view for describing a method of manufacturing the organic insulating layer shown in FIG. 5.

Claims

1. A liquid crystal display device, comprising: first and second substrates assembled with liquid crystal disposed therebetween;an organic layer formed on one of the first and second substrates;a column spacer formed between the first and second substrates; anda buffering pattern formed in the organic layer at a region in which the column spacer and the organic layer are in contact with each other.

2. The liquid crystal display device according to claim 1, wherein the buffering pattern is defined by a groove or hole formed in the organic layer.

3. The liquid crystal display device according to claim 2, further comprising an internal groove or hole formed within the buffering pattern of the organic layer.

4. The liquid crystal display device according to claim 3, wherein the internal groove or hole is independently formed within the buffering pattern or is connected to the groove or hole.

5. The liquid crystal display device according to claim 2, further comprising: a transparent conductive layer formed on the organic layer; anda hole penetrating the transparent conductive layer between the column spacer and the buffering pattern of the organic layer so that the transparent conductive layer does not exist therebetween.

6. The liquid crystal display device according to claim 5, further comprising: a thin film transistor formed between the first substrate and the organic layer;a gate line and a data line formed between the first substrate and the organic layer and connected to the thin film transistor; anda pixel electrode formed of the transparent conductive layer on the organic layer and connected to the thin film transistor through a contact hole penetrating the organic layer.

7. The liquid crystal display device according to claim 6, further comprising a shield common line formed of the transparent conductive layer on the organic layer, the shield common line overlapping at least one of the gate line and the data line.

8. The liquid crystal display device according to claim 6, further comprising an inorganic layer formed between the thin film transistor and the organic layer.

9. The liquid crystal display device according to claim 1, wherein the buffering pattern is compressed by the column spacer, and a surface of the buffering pattern contacting the column spacer is not coplanar with an uppermost surface of a remainder of the organic layer facing the second substrate.

10. A method of manufacturing a liquid crystal display device, the method comprising: providing a first substrate and second substrate;forming an organic layer on one of the first and second substrates;forming a column spacer on one of the first and second substrates;assembling the first and second substrates with liquid crystal disposed therebetween; andforming a buffering pattern in the organic layer at a region of the organic layer that is to be in contact with the column spacer.

11. The method according to claim 10, wherein a groove or hole is formed in the organic layer and defines the buffering pattern.

12. The method according to claim 11, wherein an internal groove or hole is further formed within the buffering pattern of the organic layer.

13. The method according to claim 12, wherein the internal groove or hole is independently formed within the buffering pattern or is connected to the outer groove or hole.

14. The method according to claim 11, further comprising: forming a transparent conductive layer on the organic layer; andforming a hole penetrating the transparent conductive layer between the column spacer and the buffering pattern of the organic layer so that the transparent conductive layer does not exist therebetween.

15. The method according to claim 14, further comprising: forming a thin film transistor between the first substrate and the organic layer, and a gate line and a data line that are connected to the thin film transistor;forming a contact hole penetrating the organic layer; andforming a pixel electrode made of the transparent conductive layer on the organic layer and connected to the thin film transistor through the contact hole.

16. The method according to claim 15, further comprising forming a shield common line made of the transparent conductive layer on the organic layer overlapping at least one of the gate line and the data line.

17. The method according to claim 15, further comprising forming an inorganic layer between the thin film transistor and the organic layer.

18. The method according to claim 15, wherein the contact hole and the groove of the organic layer are formed by using a diffraction exposure mask or a half-tone mask.

19. The method according to claim 16, wherein the contact hole and the groove of the organic layer are formed by using a diffraction exposure mask or a half-tone mask.

20. The method according to claim 10, further comprising compressing the buffering pattern with the column spacer, wherein a surface of the buffering pattern in a compressed state is not coplanar with an uppermost surface of a remainder of the organic layer facing the second substrate.