Liquid Purge for a Vaporizer

Abstract

Disclosed herein is an apparatus for supplying a liquefied chemical gas comprising a vaporizer disposed within a fabrication plant, the vaporizer adapted to receive the liquefied chemical gas and output a vaporized chemical gas, a purge vessel connected to and in fluid communication with the vaporizer, and wherein the vaporizer is adapted to purge a volume of the liquefied chemical gas and the purge vessel is adapted to receive the volume of liquefied chemical gas. Other embodiments and methods are described herein.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

For a more detailed description of preferred embodiments of the present invention, reference will now be made to the accompanying drawings, wherein:

FIG. 1 is a schematic illustration of a system for storing, vaporizing and delivering chemical gases to an end user including a purge apparatus in accordance with all embodiment of the invention;

FIG. 2 is a schematic illustration of a portion of a vaporizer and purge apparatus in accordance with an embodiment of the invention;

FIG. 3 is a schematic illustration of a portion of a vaporizer and purge apparatus in accordance with another, embodiment of the invention;

FIG. 4 is a schematic illustration of a portion of the vaporizer and purge apparatus of FIG. 3;

FIG. 5 is a schematic illustration of a portion of a toll vessel and purge apparatus in accordance with another embodiment of the invention; and

FIG. 6 is a flow diagram for a process for purging a contaminated liquid from a vaporizer in accordance with an embodiment of the invention.

Claims

1. An apparatus for supplying a liquefied chemical gas comprising: a vaporizer disposed within a fabrication plant, the vaporizer adapted to receive the liquefied chemical gas and output a vaporized chemical gas;a purge vessel connected to and in fluid communication with the vaporizer; andwherein the vaporizer is adapted to purge a volume of the liquefied chemical gas and the purge vessel is adapted to receive the volume of liquefied chemical gas.

2. The apparatus of claim 1 wherein the volume of liquefied chemical gas is contaminated.

3. The apparatus of claim 1 wherein the purge vessel is connected to a supply inlet of the vaporizer.

4. The apparatus of claim 3 further comprising a first valve disposed between the purge vessel and the vaporizer supply inlet.

5. The apparatus of claim 4 further comprising a solenoid valve disposed between the first valve and the vaporize supply inlet.

6. The apparatus of claim 1 wherein the vaporizer further comprises a connection to a liquefied chemical gas source container separate from the purge vessel connection.

7. The apparatus of claim 1 further comprising: a vaporizer inlet and an inlet valve disposed upstream of the inlet; anda vaporizer outlet and an outlet valve disposed downstream of the outlet.

8. The apparatus of claim 7 further comprising a pressure switch disposed between the outlet and the outlet valve, the pressure switch coupled to the inlet valve.

9. The apparatus of claim 1 wherein the purge vessel is adapted to be replaced by a second purge vessel, and the purge vessel is recyclable.

10. The apparatus of claim 2 wherein the purge vessel further comprises an exhaust line adapted to exhaust the contaminated liquefied chemical gas.

11. An apparatus for purging a liquefied chemical gas from a vaporizer comprising: a vaporizer having a contaminated liquefied chemical gas and a vaporized chemical gas;a purge vessel in fluid communication with the contaminated liquefied chemical gas; andmeans for purging the contaminated liquefied chemical gas from the vaporizer to the purge vessel.

12. The apparatus of claim 11 further comprising means for allowing flow of a substantially pure liquefied chemical gas in a first direction relative to the vaporizer and flow of the contaminated liquefied chemical gas in a second direction relative to the vaporizer.

13. The apparatus of claim 12 wherein the flow means includes a solenoid valve.

14. The apparatus of claim 11 further comprising means for detecting contamination of the liquefied chemical gas.

15. The apparatus of claim 11 further comprising means for pressurizing the vaporizer above a normal flow condition.

16. An apparatus for purging a liquefied chemical gas comprising: a ton vessel disposed apart from a fabrication plant, the ton vessel including a liquefied chemical gas and a heater, the ton vessel in fluid communication with a vaporizer disposed within the fabrication plant;a purge vessel connected to and in fluid communication with the ton vessel; andwherein the ton vessel is adapted to purge a volume of the liquefied chemical gas and the purge vessel is adapted to receive the volume of liquefied chemical gas.

17. A method of purging a liquefied chemical gas comprising: supplying a liquefied chemical gas to a vaporizer disposed within a fabrication plant;vaporizing the liquefied chemical gas in the vaporizer;operating the vaporizer for a period of time; andpurging any contaminated liquefied chemical gas from the vaporizer to a purge vessel.

18. The method of claim 17 further comprising: stopping a flow of vaporized chemical gas from the vaporizer;pressurizing the contaminated liquefied chemical gas in the vaporizer; andforcing the contaminated liquefied chemical gas from the vaporizer to the purge vessel.

19. The method of claim 17 further comprising: replacing the purge vessel with a second purge vessel.

20. The method of claim 17 further comprising: exhausting the contaminated liquefied chemical gas to an external source.

21. The method of claim 17 further comprising: detecting contamination of the liquefied chemical gas.

22. The method of claim 17 wherein the purging occurs without stopping a flow of vaporized chemical gas from the vaporizer.