Claims
- 1. Lithographic developing composition consisting essentially of a monomeric, organo-phosphonic acid chelating compound containing at least three methane organo-phosphonic acid groups bound to a nitrogen atom or salt thereof.
- 2. Developing compositions of claim 1 wherein the chelating compound is selected from the group of ATMPA, HDTMP, and DTPMP, and salts thereof.
- 3. Developing compositions of claim 1 wherein the chelating compound is ATMPA or a salt thereof.
- 4. Lithographic finishing composition consisting essentially of a monomeric, organo-phosphonic acid chelating compound containing at least three methane organo-phosphonic acid groups bound to a nitrogen atom or salt thereof.
- 5. Finishing composition of claim 4 wherein the chelating compound is selected from the group of ATMPA, HDTMP, and DTPMP, and salts thereof.
- 6. Finishing composition of claim 4 wherein the chelating compound is ATMPA or a salt thereof.
- 7. Fountain solution composition for lithographic printing consisting essentially of a monomeric, organo-phosphonic acid chelating compound containing at least three methane organo-phosphonic acid groups bound to a nitrogen atom or a salt thereof.
- 8. Fountain solution of claim 7 wherein the chelating compound is selected from the group of ATMPA, HDTMP, and DTPMP, and salts thereof.
- 9. Fountain solution of claim 7 wherein the chelating compound is ATMPA or a salt thereof.
- 10. Ink composition for lithographic printing consisting essentially of a monomeric, organo-phosphonic acid chelating compound containing at least three methane organo-phosphonic acid groups bound to a nitrogen atom or salt thereof.
- 11. Ink composition of claim 10 wherein the chelating compound is selected from the group of ATMPA, HDTMP, and DTPMP, and salts thereof.
- 12. Ink composition of claim 10 wherein the chelating compound is ATMPA or a salt thereof.
- 13. Correction solution composition for lithographic printing plates consisting essentially of a monomeric, organo-phosphonic acid chelating compound containing at least three methane organo-phosphonic acid groups bound to a nitrogen atom or a salt thereof.
- 14. Correction solution of claim 13 wherein the chelating compound is selected from the group of ATMPA, HDTMP, and DTPMP, and salts thereof.
- 15. Correction solution of claim 13 wherein the chelating compound is ATMPA or a salt thereof.
RELATED APPLICATION
This application is a continuation-in-part of application Ser. No. 08/577,043 filed Dec. 22, 1995, now abandoned, which is in turn a continuation-in-part application of application Ser. No. 08/454,608, filed May 31, 1995, now abandoned.
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Entry |
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Monsanto, "Dequest Phosphonates by Monsanto, An Introductory Guide". |
Continuation in Parts (2)
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Number |
Date |
Country |
Parent |
577043 |
Dec 1995 |
|
Parent |
454608 |
May 1995 |
|