Number | Name | Date | Kind |
---|---|---|---|
4119688 | Hiraoka | Oct 1978 | |
4158589 | Keller et al. | Jun 1979 | |
4523971 | Cumo et al. | Jun 1985 |
Entry |
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Asch et al., Structuring a Photoresist Layer by Reactive Ion Etching, IBM Technical Disclosure Bulletin, vol. 26, No. 2, Jul. 1983, p. 685. |