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H01L21/31138

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/31138by dry-etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Manufacturing method of semiconductor structure comprising a gap an...
- Patent number 12,368,074
- Issue date Jul 22, 2025
- CHANGXI MEMORY TECHNOLOGIES, INC.
- Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,347,683
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical solution-resistant protective film forming composition con...
- Patent number 12,344,758
- Issue date Jul 1, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Power control for rf impedance matching network
- Patent number 12,334,307
- Issue date Jun 17, 2025
- ASM IP Holding B.V.
- Ronald Anthony Decker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet-dry bilayer resist dual tone exposure
- Patent number 12,327,726
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 12,320,012
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Tom E. Blomberg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Etching to reduce line wiggling
- Patent number 12,322,651
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Wei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Passivation layers with rounded corners
- Patent number 12,322,646
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Mingni Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming protective film, method for manufacturing patter...
- Patent number 12,312,487
- Issue date May 27, 2025
- JSR Corporation
- Kazunori Takanashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,313,972
- Issue date May 27, 2025
- NISSAN CHEMICAL CORPORATION
- Hiroto Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Eliminating yield impact of stochastics in lithography
- Patent number 12,315,727
- Issue date May 27, 2025
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 12,312,696
- Issue date May 27, 2025
- ASM IP Holding B.V.
- Tom E. Blomberg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods for removing etch stop layers
- Patent number 12,315,735
- Issue date May 27, 2025
- Applied Materials, Inc.
- Suketu Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and structure for source/drain contacts
- Patent number 12,300,727
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Huan Jao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of organic films
- Patent number 12,300,505
- Issue date May 13, 2025
- ASM IP Holding B.V.
- Eva E. Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,570
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,571
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Resonant filter for solid state RF impedance matching network
- Patent number 12,272,522
- Issue date Apr 8, 2025
- ASM America, Inc.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial capping layer for contact etch
- Patent number 12,266,533
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching apparatus
- Patent number 12,230,505
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Akihiro Tsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Area selective organic material removal
- Patent number 12,230,506
- Issue date Feb 18, 2025
- ASM IP Holding B.V.
- Mikko Ritala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of running an etch process in higher selectivity to mask and...
- Patent number 12,224,177
- Issue date Feb 11, 2025
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,224,183
- Issue date Feb 11, 2025
- Chipbond Technology Corporation
- Shrane-Ning Jenq
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of metal grid, thin film sensor and manufactur...
- Patent number 12,224,234
- Issue date Feb 11, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Hu Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching film and plasma processing apparatus
- Patent number 12,217,973
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC bias in plasma process
- Patent number 12,217,936
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Patterning material including silicon-containing layer and method f...
- Patent number 12,205,824
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Ping Tung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250239458
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Adhesive Film And Patterning Process
- Publication number 20250237955
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250237954
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231487
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20250226177
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING HYBRID SUBSTRATE OF SOI WAFER
- Publication number 20250226260
- Publication date Jul 10, 2025
- Shanghai Huali Integrated Circuit Corporation
- Zifang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208509
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE-FILM FORMING COMPOSITION
- Publication number 20250197558
- Publication date Jun 19, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION
- Publication number 20250201559
- Publication date Jun 19, 2025
- International Business Machines Corporation
- Dario Goldfarb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR PRETREATMENT
- Publication number 20250180989
- Publication date Jun 5, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING MATERIAL INCLUDING SILICON-CONTAINING LAYER AND METHOD F...
- Publication number 20250167000
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Szu-Ping TUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUTTING STRUCTURE, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND ME...
- Publication number 20250157923
- Publication date May 15, 2025
- NANYA TECHNOLOGY CORPORATION
- CHUN-YEN WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUTTING STRUCTURE, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND ME...
- Publication number 20250157924
- Publication date May 15, 2025
- NANYA TECHNOLOGY CORPORATION
- CHUN-YEN WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOT...
- Publication number 20250157818
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE FILM FORMING COMPOSITION
- Publication number 20250155813
- Publication date May 15, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SPACERS FOR BEOL MULTI-PATTERNING
- Publication number 20250157952
- Publication date May 15, 2025
- ASM IP HOLDING B.V.
- Debanjan Jana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ATOMIC LAYER ETCHING PROCESSES
- Publication number 20250154662
- Publication date May 15, 2025
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250151311
- Publication date May 8, 2025
- XIAMEN SAN'AN INTEGRATED CIRCUIT CO., LTD.
- Wangping WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250132203
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Song Yi BAEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING
- Publication number 20250118557
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF ORGANIC FILMS
- Publication number 20250118562
- Publication date Apr 10, 2025
- ASM IP HOLDING B.V.
- Eva E. Tois
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250095989
- Publication date Mar 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20250087498
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250087495
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Iwamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250085636
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Iwamori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE
- Publication number 20250079154
- Publication date Mar 6, 2025
- TES CO., LTD.
- Joonyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF FORMATION
- Publication number 20250069893
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu Ming HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20250069885
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20250062133
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SELF-ASSEMBLED MONOLAYER (SAM) REMOVAL
- Publication number 20240420996
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Jiajie Cen
- H01 - BASIC ELECTRIC ELEMENTS

by dry-etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Manufacturing method of semiconductor structure comprising a gap an...

Method of manufacturing a semiconductor device

Chemical solution-resistant protective film forming composition con...

Power control for rf impedance matching network

Wet-dry bilayer resist dual tone exposure

Thermal atomic layer etching processes

Etching to reduce line wiggling

Passivation layers with rounded corners

Method for forming protective film, method for manufacturing patter...

Resist underlayer film-forming composition

Eliminating yield impact of stochastics in lithography

Thermal atomic layer etching processes

Methods for removing etch stop layers

Process and structure for source/drain contacts

Deposition of organic films

Film deposition apparatus for fine pattern forming

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Resonant filter for solid state RF impedance matching network

Sacrificial capping layer for contact etch

Selective patterning with wet-dry bilayer resist

Etching apparatus

Area selective organic material removal

Method of running an etch process in higher selectivity to mask and...

Method of manufacturing semiconductor device

Manufacturing method of metal grid, thin film sensor and manufactur...

Method of etching film and plasma processing apparatus

DC bias in plasma process

Systems and methods for metastable activated radical selective stri...

Patterning material including silicon-containing layer and method f...

Patents Applicationslast 30 patents

Composition For Forming Metal-Containing Film And Patterning Process

Composition For Forming Adhesive Film And Patterning Process

Composition For Forming Metal-Containing Film And Patterning Process

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

METHOD FOR FORMING HYBRID SUBSTRATE OF SOI WAFER

Compound For Forming Metal-Containing Film, Composition For Forming...

PROTECTIVE-FILM FORMING COMPOSITION

SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION

COMPOSITION FOR PRETREATMENT

PATTERNING MATERIAL INCLUDING SILICON-CONTAINING LAYER AND METHOD F...

CUTTING STRUCTURE, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND ME...

CUTTING STRUCTURE, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND ME...

LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOT...

PROTECTIVE FILM FORMING COMPOSITION

SPACERS FOR BEOL MULTI-PATTERNING

THERMAL ATOMIC LAYER ETCHING PROCESSES

SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES

SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING

DEPOSITION OF ORGANIC FILMS

Composition For Forming Organic Film, Method For Forming Organic Fi...

TIN OXIDE MANDRELS IN PATTERNING

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE

SEMICONDUCTOR DEVICE AND METHODS OF FORMATION

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

SELECTIVE SELF-ASSEMBLED MONOLAYER (SAM) REMOVAL