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3043983 | Ray | Jul 1962 | |
3377498 | Koury et al. | Apr 1968 | |
3533827 | Rimbach | Oct 1970 | |
3586898 | Speros et al. | Jun 1971 | |
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Entry |
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d'Agostino, R. and Flumm, D., Plasma Etching of Si and SiO.sub.2 in SF.sub.6 -O.sub.2 Mixtures, J. Appl. Phys. 52(1): pp. 162-167, Jan. 1981. |