BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a sectional view of one embodiment of a thin film magnetic head including a magnetic detecting device;
FIG. 2 is a partially enlarged schematic view showing a seed layer of the magnetic detecting device shown in FIG. 1, and a distribution chart showing the Al concentration and Co concentration of the seed layer;
FIG. 3 is a sectional view of one embodiment of a thin film magnetic head including a magnetic detecting device;
FIG. 4 is a partially enlarged schematic view showing a seed layer of the magnetic detecting device shown in FIG. 3 and a distribution chart showing the Al concentration of the seed layer;
FIG. 5 is a graph showing the relationship between the film thickness of a seed layer in each specimen of a single-layer seed (NiFeCr), a two-layer seed (NiFeCr/Al), and a three-layer seed (NiFeCr/Co/Al), and the minimum resistance value (min. Rs);
FIG. 6 is a graph showing the relationship between the film thickness of a seed layer in each specimen of a single-layer seed (NiFeCr), a two-layer seed (NiFeCr/Al), and a three-layer seed (NiFeCr/Co/Al), and the resistance changing rate (ΔR/R); and
FIG. 7 is an enlarged graph showing that the resistance changing rate (ΔR/R) on the axis of ordinate of FIG. 6 is narrowed to a range of 14.5 (%) to 15.9 (%).