Patent Application
20140030860
The present invention relates to a manufacturing method of NOR flash memory, in particular to the manufacturing method of tunnel oxide of NOR flash memory.
With reference to
As the manufacturing technology of semiconductors and integrated circuits, the number of memory cells in a flash memory device becomes increasingly larger, and the size of the device is reduced continuously with the increased integrity, so that the positions of the memory units are very close to one another in the memory device, and the position of the channel region 120 is limited, or else the electrons/electron holes will be delivered unexpected to result in leakage current easily due to the error of the position of the channel region 120.
In the manufacturing method of the gate structure 110 of conventional memory devices, the process of manufacturing the tunnel oxide 111 is controlled at a high temperature above 900° C., and such high temperature condition will cause a diffusion of doping concentration in the channel region 120 and result in a defect such as a change of position of the channel region 120 or an expanded range, and this defect becomes increasingly more serious as the integrity increases. Therefore, as the channel length of the memory device decreases, the position of the channel region 120 becomes a key factor of producing a leakage current, and the leakage current of the memory device in the conventional method becomes a major issue as the integrity increases, and causes a low reliability of the device.
Therefore, it is a primary objective of the present invention to provide a NOR flash memory device with the property of a low leakage current so as to improve the reliability of data storage.
Another objective of the present invention is to maintain the doping depth and concentration in a channel region of a NOR flash memory.
To achieve the aforementioned and other objectives, the present invention provides a manufacturing method of tunnel oxide of a NOR flash memory, comprising the steps of: providing a semiconductor substrate; forming a channel region with a first doping in the semiconductor substrate; and growing the tunnel oxide on the semiconductor substrate at a temperature ranging from 650° C. to 800° C. until the tunnel oxide has a thickness falling within a range of 80 Ř100 Å.
In a preferred embodiment, the tunnel oxide is formed by a wet air oxidization process.
In a preferred embodiment, the first doping has ions which are boron ions.
Therefore, the present invention can control the temperature and the thickness of the tunnel oxide to a specific range during the manufacturing process, so that the channel region will not have a change of the doping concentration and range due to the high-temperature manufacturing process, so as to overcome the problem of the leakage current and improve the reliability of data storage.
The objects, characteristics and effects of the present invention will become apparent with the detailed description of the preferred embodiments and the illustration of related drawings as follows.
In a preferred embodiment of the present invention, the manufacturing process of tunnel oxide of a NOR flash memory gate structure is used to control the extent of diffusion of the channel region in the semiconductor substrate, so as to achieve the effect of controlling the doping concentration and range of the channel region.
With reference to
S10: Provide a semiconductor substrate, wherein the semiconductor substrate 100 is made of silicon, SiGe, silicon on insulator (SOI), silicon germanium on insulator (SGOI), or germanium on insulator (GOI).
S20: Perform an ion-implant manufacturing process to form a channel region having a first doping in the semiconductor substrate, wherein the first doping has ions which are boron ions such as boron difluoride (BF2), and the implant conditions vary with different ions used, and the implant conditions are prior arts and thus will not be described here.
S30: Form tunnel oxide in a gate structure at a specific temperature. Since the conventional manufacturing process is a manufacturing process generally performed at a high temperature over 900° C., and the high temperature may cause the diffusion of the range of the implanted channel region easily to change the originally expected size range and position of the channel region and result in the occurrence of a leakage current. Therefore, the temperature of manufacturing the tunnel oxide is controlled to a temperature ranging from 650° C. to 800° C. in this preferred embodiment of the present invention, and the thickness of the tunnel oxide grown on the semiconductor substrate within this specific range of temperature falls within a range of 80 Ř100 Å.
In a preferred embodiment, the tunnel oxide is formed by a wet air oxidization process. For example, the reaction of the wet air oxidization process is given below:
Si(s)+2H2O(g)→SiO2(s)+2H2(g) (Formula 1)
Wherein, the oxidation reaction shown in Formula 1 relates to water molecules. Although most water molecules exist in a gaseous form, yet it is common to call the process as a wet air oxidization process.
With reference to
In
In
In summation of the description above, the manufacturing process in accordance with the foregoing preferred embodiment of the present invention can provide a better leaking current resisting effect of the NOR flash memory to reduce the chance of having a punch-through leakage of non-conducted components, so as to improve the reliability of memory devices.
While the invention has been described by means of specific embodiments, numerous modifications and variations could be made thereto by those skilled in the art without departing from the scope and spirit of the invention set forth in the claims.
