Claims
- 1. A process for making a mask for use in a process for curing a photosensitive material, the process comprising steps of:
providing a thin transparent material of substantially uniform thickness; forming a pattern of opaque regions in the material according to a predetermined first pattern; and embossing the material according to a predetermined second pattern.
- 2. The process according to claim 1, wherein the first pattern substantially correlates with the second pattern to form a combined non-random repeating pattern.
- 3. The process according to claim 1, wherein the steps of forming the opaque regions and embossing the material are performed simultaneously.
- 4. The process according to claim 1, wherein the step of forming a pattern of opaque regions comprises applying ink to selected regions of the transparent material.
- 5. The process according to claim 4, wherein the selected regions comprise distal surfaces of the embossed areas of the material.
- 6. The process according to claim 1, wherein the step of providing a thin transparent material comprises providing a transparent film.
- 7. The process according to claim 1, wherein the step of forming a pattern of opaque regions comprises forming opaque regions having differential opacities.
- 8. The process according to claim 1, wherein the step of forming a pattern of opaque regions comprises forming opaque regions having gradient opacity gradually changing in at least one direction.
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application is a divisional application of U.S. application Ser. No. 09/695,155, filed Oct. 24, 2000.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09695155 |
Oct 2000 |
US |
Child |
10736275 |
Dec 2003 |
US |