Patent Application
20220008622
The present invention relates to a method of treatment of a metal object to provide it with bio-effective properties, and to a metal object which incorporates a bio-effective material. This can provide a reduced risk of infection when the object is in contact with a body.
Metal materials come into contact with the body in numerous situations. For example in surgery, where implants are used, these implants may be inserted into soft or hard tissue of the body. In the case of cancer treatment of the bone for example, cancerous bone tissue is removed, and a prosthetic metal implant is used to replace that part of the bone that has been removed. Implants are also used for partial or full replacement of bones in joints (e.g. hips) and also in other fields such as dentistry and maxillofacial surgery. Implants and medical devices may also be used in cases of amputation or trauma and such devices may be percutaneous or transcutaneous. Examples of such implants include: cardiac implants, including active implants such as pacemakers; cranioplasty implants; access ports; spine implants (e.g. rods, plates, screws, cages); neurostimulator devices; percutaneous and transcutaneous devices (e.g. ports); cochlear implants; acetabular cups; veterinary implants, and titanium horseshoes. Implants for the foregoing (and other) uses may be of titanium metal or titanium alloys. Titanium metal and titanium alloys are biocompatible, relatively strong and relatively light.
Further, metal comes into contact with the body in the case of jewellery. Irritation and infection can occur not only for jewellery that pierces the body but also for jewellery that sits next to the skin if the wearer has sensitive skin.
As can be seen, in both the medical and jewellery fields, the use of metal which comes into contact with body tissue runs the risk of introducing infection, or infection occurring.
WO 2010/112908 describes a way of treating a metal object so that it has biocidal properties. The object is anodised in two stages, firstly to passivate it with the formation of a surface layer, and secondly to form pits in the surface layer, the second stage of anodising being performed at a lower voltage than the first stage: for example the passivating voltage may rise to 100 V, and the second stage may use a voltage of 30 V. After anodising, the object is subjected briefly to a reverse voltage between −0.2 and −0.7 V. The metal object is then contacted with a solution containing biocidal metal ions, which become incorporated into the surface layer.
The process described in WO 2010/112908 enables a consistent level of biocidal material to be incorporated into metal objects of certain metal alloys. However, with some metal alloys, it has been found that the process requires a prolonged time to complete the anodising, or that the results are not sufficiently consistent, particularly with the more passive alloys. It would therefore be advantageous to provide a process applicable to such alloys, and which will ensure a consistent level of loading of biocidal material.
A further desirable property of surgical implants is the ability to promote integration into living tissue after implantation. This is particularly important in the case of implants which are intended to replace bone tissue, as bone implants must bear loads and so are vulnerable to damage unless they can undergo osseointegration and form a strong bond with the living bone. Similarly, implants intended for use in soft tissue which can integrate well with the surrounding soft tissue (for instance, the gingiva or soft gum tissue) are especially advantageous as they can facilitate wound healing and discourage the formation of scar tissue and thereby reduce the risk of infection.
It would therefore be advantageous to provide an implant which is capable of integration into living tissue, for example osseointegration, and which is also capable of providing a consistent and biologically acceptable (that is, safe and efficacious) level of biocidal material into the living tissue after implantation.
It is therefore desirable to provide an object having excellent biocidal and tissue integration properties. It is particularly desirable that the bio-effective material (such as a biocidal material) incorporated in such an object can easily elute into the local environment and prevent biofilm formation. It is further desirable to provide a method of producing such an object as quickly and easily as possible, and consistently across a wide range of materials.
The present inventors have found that advantageous results may be obtained by introducing a voltage cycle to the surface treatment method. Specifically, it has been found that subjecting the passivated metal object to a cyclic voltage rather than a constant voltage can reduce the time taken to form the surface layer upon the object and achieve a more consistent process. Thus according to the present invention there is provided a method of treating a metal object so as to form thereon a surface layer which is integral with the metal object, and which includes a bio-effective material, the method comprising the following steps:
(a) contacting the metal object with an anodising electrolyte, and applying an anodising voltage to the metal object to passivate the metal by forming an anodised oxide layer on the metal object;
(b) continuing the application of an anodising voltage to produce regions in the oxide layer having a higher O/M ratio, where O is the number of oxygen atoms and M is the number of valve metal atoms;
(c) producing a hydrous metal oxide in said regions in the oxide layer by electrochemical or chemical reduction in contact with an electrolyte or a solution, so the oxide layer and the hydrous metal oxide in said regions together constitute the surface layer;
(d) removing or separating the anodised metal object resulting from step (c) from the electrolyte or the solution of step (c); and
(e) contacting the anodised metal object with a solution containing a bio-effective material so as to incorporate said bio-effective material into the surface layer;
wherein during step (b) the anodising voltage is repeatedly subjected to voltage cycles, each voltage cycle comprising ramping the voltage between a lower threshold voltage and an upper threshold voltage, and then returning the voltage to the lower threshold voltage, both the lower threshold voltage and the upper threshold voltage being less than the maximum voltage applied during the passivating step (a).
In the case of metal objects having surfaces which are polished, or do not have microscale roughness, the regions having a higher O/M ratio formed during step (b) take the form of pits through the oxide layer and into the substrate, and the hydrous metal oxide produced in step (c) is produced in said pits.
The inventors have further shown that the above technique may be applied to an object with a roughened surface to produce surprisingly advantageous results. The rough surfaces which yield these advantageous results, referred to herein as “micro-rough” surfaces, may be identified by the presence of microscale protrusions, in particular surfaces which have a high density of small protrusions. It was expected that application of the above-described method of the invention, or earlier methods as described for instance in WO 2009/044203, to such surfaces would result in the adsorption of a large amount of a bio-effective material such as silver upon the surface, for instance by adsorption of bio-effective material within the surface valleys and peaks. An object treated according to said method was therefore expected to be entirely unsuitable for use as an implant, due to excessive biocide loading and a loss of surface roughness. However, it was found that this technique in fact created a surface which maintained its rough structure and yet incorporated an amount of bio-effective material that was surprisingly lower and less toxic than expected.
Moreover, the inventors surprisingly found that, rather than forming pits upon this micro-rough surface, the method resulted in formation of regions in the oxide layer having a high oxygen to metal atom ratio (i.e. a high O/M ratio, wherein O is the number of oxygen atoms and M the number of valve metal atoms) upon the protruding portions of the surface; that is, the anodisation process led to more extensive anodisation at the peaks of the roughened surface and a greater oxygen atom content at these positions. O and M denote the number of oxygen and valve metal atoms respectively in the oxide layer at the region of interest. O and M may be measured, for example, by SEM-EDX. The presence of a higher oxygen to metal atom ratio at the protruding portions of the surface compared to the non-protruding portions of the surface may be described herein in terms of the formation of oxide caps. By contrast, in the case of a polished surface, or other types of surface which are not micro-rough as defined herein, regions having a particularly high oxygen to metal atom ratio occur where dips form through the oxide layer and into the metal surface. Such regions are described herein as pits. Treated metal objects having either pits or caps have been shown to effectively elute bio-effective materials (for example silver) into the surroundings, for example into surrounding tissue.
Incorporation of bio-effective material occurs in these regions of high oxide content (that is, high O/M ratio), being pits or caps. The incorporation of bio-effective material at the outermost parts of the surface layer, for example at protrusions upon the surface, is advantageous as it is likely to be more available to deter biofilm formation and to elute into the local environment.
Thus the invention also provides a metal object having a micro-rough surface and a surface layer thereon which is integral with the metal object, wherein:
the rough surface of the metal object comprises microscale protrusions;
the integral surface layer comprises at least one oxide of the metal, and the oxygen in the surface layer is non-uniformly distributed across the surface of the metal object such that there are regions having a higher O/M ratio, where O is the number of oxygen atoms and M is the number of valve metal atoms, the regions being located on said microscale protrusions; and
a bio-effective material is incorporated into the regions having a higher O/M ratio.
The invention further provides a metal object of the invention obtainable according to the method of the invention.
The invention will now be further and more particularly described, by way of example only, with reference to the accompanying figures, in which:
The method and metal object of the invention are described in more detail below.
The method of the invention involves the application of a first static voltage to a metal object in step (a), followed by a cyclically-varying voltage in step (b). Throughout the voltage cycles, the lower threshold voltage is preferably below 25 V, while the upper threshold voltage is preferably above 35 V. However, in an aqueous electrolyte oxygen evolution will occur at a voltage which depends upon the chemical constitution of the electrolyte, so the upper threshold voltage is preferably below the voltage at which oxygen evolution occurs. For example with an aqueous phosphoric acid electrolyte oxygen evolution occurs at about 80 V, for example between 80 V and 90 V. For example the upper threshold voltage may be between 30 V and 70 V, for instance between 35 V and 70 V or between 40 V and 70 V, for example 50 V or 60 V. The lower threshold voltage may be 0 V. So in one example the voltage is repeatedly ramped up from 0 V to 60 V, and then returned to zero again.
It has been found that this repeated ramping of the voltage gives consistent results with a wide range of different alloys, in particular more passive titanium alloys or pure titanium, in particular more passive titanium alloys, and that it provides a more rapid process than can be achieved by holding the anodising voltage at any fixed value. A potential explanation is that the formation of pits is a two-step reaction, and that the two steps occur at different voltages between 10 V and 50 V, possibly between 25 V and 35 V.
While ramping the voltage, the voltage is preferably varied continuously. It may be increased at a steady rate, or a rate which varies. By way of example the voltage may be varied at a rate between 0.1 and 10 V/s or 0.1 and 20 V/s, for example between 0.1 and 15 V/s, preferably between 0.5 and 5 V/s. Suitable ramp rates would therefore be 1, 2 or 3 V/s, although the process is more rapid the lower the ramp rate. The voltage may be decreased back to the lower threshold voltage more rapidly than it is increased during the ramping of the voltage. For example the voltage may be decreased five or ten times more rapidly than it is increased.
The number of voltage cycles to which the metal object is treated may be more than 10, and may be more than 20; in some cases as many as 100, 500, or more voltage cycles may be used. Consistent results may be obtained by monitoring the total electrical charge that has passed during the application of the anodising voltages in steps (a) and (b), and/or that during the reduction step (c), and ensuring that the total electrical charge per unit area lies within a desired range.
The reduction step, step (c), as a first option, comprises applying a negative voltage to the metal object that has been anodised during steps (a) and (b), while the metal object remains in contact with the anodising electrolyte. As a second option, the metal object that has been anodised during steps (a) and (b) may be put into contact with an electrolyte solution containing a reducible soluble salt of titanium or of the substrate metal, and subjected to a negative voltage to bring about electrochemical reduction. As a third option for step (c), instead of performing electrochemical reduction, the metal object may be contacted with a chemical reducing agent, after steps (a) and (b).
After anodisation in steps (a) and (b), it is believed that the surface layer regions (e.g. pits or caps, in particular pits) contain a peroxy cationic complex of the substrate metal. This complex can be reduced electrochemically to a hydrous metal oxide of limited solubility, as in the first option for step (c) described above. This complex can similarly be reduced chemically, as in the third option for step (c). Rather than relying on this complex remaining in the regions (e.g. pits or caps, in particular pits), in the second option for step (c) an electrolyte solution is provided that contains a peroxy cationic complex, preferably a peroxytitanyl, which can be reduced electrochemically in the regions (e.g. pits or caps, in particular pits) to hydrous titania.
Instead of using an external source of electricity for electrochemical reduction, the metal object may be made negative by connecting it electrically to an electrode of a corrodible metal, such as iron or steel; this may be immersed in the same electrolyte as the metal object, or in a separate electrolyte with ionic connection through a salt bridge or an ion-selective membrane. The corrodible metal electrode corrodes preferentially, so causing electrochemical reduction at the surface of the metal object.
In the case of chemical reduction (the third option for step (c)), where again a hydrous metal oxide is produced, the chemical reducing agent may be selected from one or more of the following: sodium sulphite, ferrous salts (chloride or sulphate), sodium nitrite, potassium bromide or iodide, or sodium borohydride or hydrazine. Stannous chlorides or sulphates, chromous chlorides or sulphates, or vanadous sulphates may be used under suitable conditions, although these have the disadvantage of polyvalent residues that may adsorb on the resulting hydrous titania.
Whichever option is selected for the reduction step, step (c), it results in the formation of hydrous metal oxides that have a high surface area. The high surface area provides for enhanced absorptive capacity for the bio-effective material. The bio-effective material may be one that has a biocidal effect, for example a metal ion that exhibits the oligodynamic effect. A suitable metal ion is silver. The high surface area material produced by the reduction step, step (c), allows for increased ion exchange with materials such as silver in ionic form. Under some circumstances, depending on the electrolyte used, the hydrous metal oxide may be combined with anions such as phosphate or sulphate, and this has similar ion exchange properties.
A bio-effective material that is biocidal, such as silver (Ag), can have a broad spectrum of activity. The silver ion is known for its biocidal effectiveness, especially at low concentrations (which may be referred to as the oligodynamic effect), killing pathogens or infectious agents. In some cases its effect may instead be that of controlling or inhibiting pathogens or infectious agents that cause infection. This means that the method of the present invention can produce a biocidal treated surface that can be effective at inhibiting the formation of biofilm on said surface, whilst also creating a local zone of inhibition as the silver elutes into the surrounding areas e.g. soft tissue. It is envisaged that other bio-effective materials may instead be provided, for example stem cells or proteins might be adsorbed on the hydrous titania surface that could also release nutrients into a site in the body, which may assist in infection control, healing or enhance biocompatibility where the implant is positioned in the body. The bio-effective material might instead have bacteriostatic properties, i.e. preventing the growth of bacteria, rather than killing bacteria.
The anodising is a two stage process with step (a) comprising the initial process of passivation i.e. growing a surface oxide layer, and then step (b) involving the formation of regions in the oxide layer having a high oxygen to metal atom ratio, for example the formation of pits formed through said oxide layer into the substrate metal, or in the case of surfaces having microscale protrusions involving the formation of caps on said protrusions.
The maximum voltage applied during anodisation determines the thickness of the passive oxide layer. Lower voltages applied subsequently do not affect the thickness of the oxide layer. The maximum voltage may be as high as 2000 V, but is more typically between 80 V and 150 V, for example 100 V.
The voltage during passivation, step (a), may be applied as a voltage increasing linearly with time to a maximum, limiting value, or alternatively stepped voltages up to the maximum limit. It is also envisaged that multiple passivations may be used, where a voltage is applied repeatedly to prepare the metal surface for pitting, or for the formation of caps. These different ways of applying a voltage all come within the definition of applying an anodising voltage.
Preferably, in step (d), the metal object is rinsed to remove any electrolyte or solution remaining on the surface after the preceding steps. The rinsing may use water or any appropriate solvent. Then, in step (e), there is contact with the solution containing the bio-effective material. After step (e), the metal object may be rinsed again. The metal object, in the case of an implant, would at this stage be suitable for use, but it will be appreciated that it may then be subjected to further processing steps as commonly provided to medical devices, such as drying, packaging, further cleaning, and sterilisation; these further processing steps should be designed to not materially alter the chemical composition of the integral surface layer, and preferably would not alter the chemical composition of the integral surface layer.
The bio-effective material may be a biocidal material, for example a biocidal metal and in particular, the biocidal metal may be or may comprise silver, although other metals may be used in addition to or as alternatives to silver, for example a combination of copper and silver. Preferably, the biocidal material (e.g. metal, such as silver) is provided in the solution of step (e) in the form of ions.
As a result of the anodising and subsequent steps, the metal object has an integral surface layer formed of a hard anodised oxide layer, grown out from the surface, and regions therein having a higher oxygen to metal atom ratio (e.g. pits through this oxide layer or caps upon microscale protrusions, in particular pits) containing a hydrous metal oxide matrix that can absorb ions of the biocidal material, such as silver ions. The matrix contained within the regions of high oxygen to metal atom ratio (e.g. pits or caps, in particular pits) receiving the biocidal material may be soft and porous in comparison to the hard oxide surface, and with greater ion exchange capacity, so that the metal object combines the properties of enhanced silver ion storage capacity with the hard-wearing anodised surface. The anodised oxide layer, excluding the regions of high oxygen to metal atom ratio (e.g. pits or caps, in particular pits), can typically adsorb ˜0.3-1.0 μg/cm2 Ag ions (on a microscopic area basis); the regions of high oxide content (e.g. pits or caps, in particular pits) make it possible to achieve a significantly higher loading, for example more than 5 μg/cm2 Ag ions.
The magnitude of the negative voltage during electrochemical reduction, in step (c), is preferably maintained or regulated so as to be insufficient to cause electrolysis of the solvent. The magnitude of the negative voltage affects the absorptive capacity of the surface, as it affects the magnitude of the reducing current; the electric charge passed is directly related to the creation of the hydrous metal oxide absorber matrix, and hence to the amount of biocidal material (e.g. metal, such as silver) which can subsequently be incorporated. With some alloys it has been found that a somewhat larger negative voltage is desirable. This may be due to semiconductor properties of the surface oxide.
In particular, when treating an object formed of a titanium/niobium alloy it has been found that the optimum absorptive capacity is attained by applying a reverse voltage of about −0.8 V, whereas with pure titanium or a titanium/vanadium alloy, in particular a titanium/vanadium alloy, a voltage of −0.45 V is sufficient, when using 2.1 M aqueous phosphoric acid as the electrolyte.
Typically, the current drops during the application of the negative voltage, and the voltage is preferably applied until this current has fallen significantly, for example to less than 20% of the peak current. Typically this may take only 3 minutes or less. Indeed the current may drop to substantially zero.
The metal of the metal object may comprise titanium or may comprise another valve metal such as niobium, tantalum or zirconium, or an alloy comprising such a metal. The metal of the metal object may comprise other metals, for example the object might be of stainless steel plated or coated with a metal such as titanium or the other valve metals or their alloys. The invention also has application to metal articles that have already been anodised for example by Type I, Type II or Type III anodising. The metal of the metal object may be in the form of porous structures such as those manufactured using additive layer techniques including laser or electron-beam sintering. The invention is also applicable to fibres, hybrid metal structures comprising more than one type of metal, sintered bead structures, and other porous forms of titanium or other valve metals such as those created by plasma spraying. The method of the invention may in particular be applied to a metal implant manufactured by any means. Examples of implants include orthopaedic implants (typically cranioplastic implants or spine implants, e.g. rods, plates, screws or cages), dental implants; cardiac implants, including active implants such as pacemakers; access ports; neurostimulator devices; percutaneous and transcutaneous devices (e.g. ports); cochlear implants; acetabular cups; veterinary implants, and titanium horseshoes.
The metal object can initially be polished to provide a very smooth surface, for example a mirror smooth finish. It may instead have a machined finish. Techniques such as grit blasting or shot blasting or shot peening may also be used to prepare the surface (e.g. for subsequent application of hydroxyapatite by plasma spraying after biocidal ion loading, to stimulate localised bone attachment). Also, the surface may be roughened before treatment in accordance with the invention.
In general, application of the method of the invention to surfaces which have been prepared by these techniques leads to the formation of pits as described above. In the particular case that the surface preparation technique leads to a micro-rough surface, for instance microscale protrusions, then the method of the invention leads to the formation of caps. Acid etching is an example of a technique which provides such a surface micromorphology. The results observed on applying the method of the invention to surfaces prepared by various methods are summarised in Table 1 below.
The anodising electrolyte preferably comprises phosphoric acid as a dilute solution of a desired pH in a solvent. The solvent may comprise water. Other electrolytes such as sulphuric acid, phosphate salt solutions or acetic acid may be used. Alkaline electrolytes such as sodium hydroxide may be used also. It is preferred that these electrolytes are in a diluted form for example 2.1 M H3PO4, or 0.1 M H2SO4.
The phosphoric acid may have a concentration in a range of from 0.01 M to 5.0 M, typically from 0.1 M to 3.0 M and in particular around 2 M (an alternative electrolyte is 0.01 to 0.3 M sulphuric acid). Preferably, the pH of the acidic electrolyte should be maintained within the range of 0.5<pH<2.0—more ideally within the range 0.75<pH<1.75.
If an alkaline electrolyte is used the pH is preferably greater than 9 and more typically the pH is in the range of 10-14. The alkaline electrolyte can be a phosphate salt such as Na3PO4, or may be sodium hydroxide, e.g. 0.1 M NaOH.
In instances where other metal substrates or anodising electrolytes are used instead of phosphoric acid, sulphuric acid or acetic acid, the magnitude of the negative (i.e. reverse) voltage may need to be adjusted to provide the desired effects due to factors such as changes in pH, or even temperature.
The geometric surface area of the metal object can be determined by conventional means such as the use of standard measuring devices such as callipers, micrometers and rulers combined with a geometric model of the item being treated e.g. using Computer Aided Design (CAD), or more advanced optical methods such as laser scanning. In some contexts, for example when describing an implant, the silver loading per geometric area may be an appropriate parameter. This measurement does not however take into account microscopic surface features or surface roughness of the metal.
The ratio of microscopic to geometric area is known as the surface roughness factor (RF). This microscopic surface area is an important factor in determining and controlling how much charge should be passed during the anodisation step. The microscopic surface area can be determined, for example, by immersion of the metal object in an electrolyte, applying a gradually increasing voltage to a low voltage such as 2.5 V to form a consistent and thin oxide layer, and deducing the microscopic surface area from electrical measurements. The surface area may be deduced from the film growth current; or subsequently may be deduced by measuring the double layer capacitance and comparing this to calibrated standards under identical conditions of temperature and electrolyte concentration. (Such a process for measuring the microscopic surface area is described in WO 2012/095672.) The charge or current per microscopic surface area e.g. coulomb/cm2 or mA/cm2 is therefore typically used in the control of the anodising process. Hence the number of voltage cycles is preferably arranged to ensure a predetermined charge per unit area, based on the microscopic surface area. For different applications, the appropriate loading of bio-effective material, and so the degree of anodising, may be different. By way of example, to be sure that an implant has been sufficiently anodised, and so absorbs a sufficient level of silver ions, an anodising charge of between 0.1 and 10 C/cm2, for example between 0.3 and 5 C/cm2 should be passed, this being calculated on the basis of the microscopic surface area; this takes into account the charge passed in both steps (a) and (b). For example, a suitable anodising charge may be between 2.6 and 2.8 C/cm2, for a polished surface; but for a rough, grit-blasted surface a suitable anodising charge may be between 0.4 and 0.6 C/cm2 (on a microscopic basis).
During the passivation step (a), the current may be controlled, or alternatively the voltage may be controlled. The anodising may be performed with a limiting microscopic current density in a range of from 0.1 to 100 mA/cm2, preferably 0.1 to 50 mA/cm2, or more typically 1 to 10 mA/cm2, e.g. 5 mA/cm2 or thereabouts. Alternatively, an applied voltage linearly increasing with time, preferably at between 0.1 V/s and 10 V/s, for example at 1 V/s or 0.5 V/s, or increasing in steps, may be applied to control the passivation process. In either case the applied potential is raised to a maximum value (e.g. of 100 V). When the desired maximum voltage has been reached, the voltage is held constant, and as the passivation reaches completion the current falls to a significantly lower value. The passivation step (a) may be considered to be complete when the current has decreased to a low value.
In one aspect, the method of the invention is applied to a metal object having a micro-rough surface, i.e. having microscale protrusions. Microscale protrusions are protrusions which extend substantially perpendicularly to the surface plane. By “surface plane” is meant the mean surface plane. The mean surface plane is the average level of the surface. Protrusions may be in the form of peaks, which may be elongated or adjoined to form protruding ridges. The protruding ridges may be for example between 0.1 and 100 micrometres long. The micromorphology of the surface may be overlaid on a larger-scale structure, and may have nanostructures overlaid thereupon. Preferably these microscale features reach a fine point at their tip and thus have sharp edges when viewed on the microscale.
The micro-rough surface comprises troughs or valleys between the microscale protrusions. As used herein, the terms “trough” and “valley” indicate a region of the surface whose level is below the mean surface plane. Peaks and troughs are illustrated in
The method of the invention leads to the formation of regions in the oxide layer having a higher oxygen to metal atom ratio on the microscale protrusions of a micro-rough surface. By “on the microscale protrusions” is meant that the region of higher O/M ratio is located at the portions of the microscale surface features which extend beyond the mean surface plane away from the surface. The regions of the surface layer present on the microscale protrusions may comprise various different oxide species including hydrous oxide compounds.
The O/M ratio is the ratio of the number of oxygen atoms to the number of valve metal atoms. A valve metal is a metal which is readily passivated with oxygen. A valve metal may typically be selected from titanium, zirconium, niobium or tantalum. The metal object of the invention typically comprises at least one valve metal, or at least one alloy comprising a valve metal.
The roughness of a surface may be measured in a variety of ways, including (i) contact methods using a stylus or (ii) non-contact methods, including focus detection, confocal microscopy or interferometry. It is also possible to observe the average roughness using scanning electron microscopy (SEM). These techniques yield a variety of parameters which quantify the roughness of the surface, and which are discussed below.
The micro-rough surface can be described in terms of its average roughness, or the arithmetic mean surface roughness (RA), which is defined as the arithmetic average of the absolute values of the profile height deviations from the mean surface plane. RA is typically measured by stylus, interferometry or SEM, preferably by interferometry. The metal object having a micro-rough surface typically has an average roughness RA of from 0.5 to 10 μm, preferably from 0.5 to 5 μm, for example from 1 to 3 μm. RA is typically measured by taking the average of profile height deviations measured at intervals across a linear slice across the surface; the equivalent average taken over an area is known as SA, which is also typically measured by interferometry or SEM, preferably by interferometry.
A similar measure of surface roughness is given by the profile average (PA) which is the arithmetic average of the raw measured profile. PA is typically measured by interferometry or SEM, preferably by interferometry. Thus both PA and SA of the micro-rough surface may be for example from 0.5 to 10 μm, preferably from 0.5 to 5 μm, for example from 1 to 3 μm.
The micro-rough surface can alternatively be described in terms of the parameter Sds, or density of summits. Sds is defined in the Commission of the European Communities publication, “The development of methods for the characterisation of roughness in three dimensions”, Stout et al., Publication no. EUR15178-EN. Sds is typically measured by interferometry or SEM, preferably by interferometry. This gives the number of peaks per square millimetre at the surface. The metal object having a micro-rough surface typically has a density of summits of at least 1000, for example from 5,000 to 1,000,000 mm−2, preferably from 10,000 to 500,000 mm−2, more preferably from 15,000 to 500,000 mm−2 or from 20,000 to 500,000 mm−2. Preferably the density of summits is at least 15,000 or at least 25,000 mm−2, e.g. at least 50,000 or at least 100,000 mm−2.
The micro-rough surface can alternatively be described in terms of the parameter Ssk, or skewness of the height distribution, which is typically measured by interferometry or SEM, preferably by interferometry. A positive value of the skewness of the height distribution indicates that the surface contains distinct protrusions such as peaks, whereas a negative value indicates that the surface contains dips or valleys. The micro-rough surface preferably has a positive Ssk value.
The micro-rough surface of the metal object may alternatively be described in terms of its microscopic area. The rougher the surface, the larger its microscopic area will be compared to its geometric surface area. The geometric surface area of a metal object can be determined by conventional means such as the use of standard measuring devices such as Computer Aided Design (CAD), callipers, micrometres and rulers combined with a geometric model of the item being treated, or more advanced optical methods such as laser scanning. The microscopic surface area can be determined, for example, by immersion of the metal object in an electrolyte, and measuring the double layer capacitance and comparing this to calibrated standards under identical conditions of temperature and electrolyte concentration. The ratio of microscopic to geometric area is known as the surface roughness factor (RF) and can be used to convert one area to the other. The metal object having a micro-rough surface typically has a surface roughness factor greater than 1.5, for example from 2 to 10.
Another method which can be used to determine the surface roughness factor is known as the pre-anodisation technique. The pre-anodisation technique involves the determination of the surface roughness factor using electrical measurements made while or after the surface of the metal object is contacted with an anodising electrolyte and pre-anodised to grow a thin oxide film. In more detail, the object whose surface area is to be determined is immersed in an electrolyte and subjected to a small, linearly increasing voltage while the current is measured. The current is monitored during this procedure and the surface area may be deduced therefrom. This technique is described in detail in WO 2012/095672 A2.
Where the surface roughness factor for a micro-rough surface is measured by the pre-anodisation technique, the surface roughness factor is typically greater than 1.5, for example from 2 to 10, preferably from 3 to 6.
The pre-anodisation technique measures the surface area of the metal object prior to the creation of an integral surface layer by anodisation. It does not, therefore, directly measure the surface area of a metal object according to the invention. However, there is no significant difference between these surface areas. For example, in the case of polished surfaces, there is no statistical difference between the surface area of the metal object prior to treatment and the surface area of the metal object after treatment according to the method of the invention. It is further evident from the SEM images in
The ratio of the microscopic surface area to the geometric surface area is known as the developed surface area, Sdr, which is expressed as a percentage enlargement compared to the geometric surface area. The developed surface area is typically measured by interferometry or SEM, preferably by interferometry. The Sdr of the micro-rough surface is, for example, more than 50%, preferably from 80% to 300%, more preferably from 100% to 200%.
The following Table (Table 2) summarises typical ranges of values of the foregoing parameters in relation to surfaces prepared by various techniques.
The oxide caps of the metal objects of the invention are seen on micro-rough surfaces. Micro-rough surfaces are surfaces preferably having small, micron-sized protrusions, particularly surfaces having an RA of from 0.5 to 5 μm, for example an RA of up to 3 μm, e.g. from 1 to 3 μm. More preferably, micro-rough surfaces also have a high density of protrusions, particularly an SDS of at least 1,000 mm−2, e.g. at least, 5000 mm−2, preferably at least 10,000 mm−2, more preferably at least 15,000 or 20,000 mm−2.
The micro-rough surface as defined herein has an SDS of at least 1000 mm−2, typically at least 5,000, 10,000, 15,000 or 20,000 mm−2; an RA of 3 μm or less, e.g. from 1 to 3 μm; and an RF of 10 or less.
The microscale protrusions which appear at the surface of the micro-rough metal object may occur substantially uniformly over the surface of the object, or they may be present only in one or more portions of the object's surface. Where only one or more portions of the surface are roughened, the microscale protrusions may occur substantially uniformly across each portion.
The micromorphology of the metal object having a roughened surface may be produced by, for example, acid etching, treatment with a fluoride solution, lithography or laser pitting, preferably acid etching. In one embodiment, the micromorphology is obtained by a method other than plasma spraying. Alternatively, the metal object may be directly produced with a micro-rough surface, rather than by subsequent roughening of the surface of the object.
A variety of acids may be used in acid etching of a surface in order to roughen it. For example, hydrofluoric acid, hydrochloric acid, sulphuric acid or nitric acid, or any combination of these, may be used in acid etching. The acids preferred for use in acid etching are hydrochloric acid or sulphuric acid, or a mixture thereof. The concentration of the acid may vary up to 100%. For example, the concentration of acid may be at least 10%, 20% or 50%. Preferably, acid etching involves the use of acid in a boiling state.
The metal object may be subject to a combination of two or more roughening steps, one of which is typically an acid etching step. Typically, where multiple roughening steps are employed, the acid etching step is the final roughening step. For example, the metal object may be subject to grit blasting, sanding, or sand blasting followed by acid etching. A further advantage of an acid etching step in this case is that the acid etching step will remove any debris or grit left on the surface by the sand blasting step.
Thus in one embodiment, the method of the invention comprises an acid etching step prior to anodisation of the surface according to step (a). Preferably, the metal object is cleaned (such as in nitric acid) after the acid etching step and prior to step (a). More preferably, the metal object is cleaned (such as in nitric acid) and rinsed in deionised water after the acid etching step and prior to step (a).
If desired, the roughened surface may be conditioned after roughening, e.g. for up to several months in a solution of sodium chloride. Typically, an aqueous solution of sodium chloride or even just water is used. Typically, the conditioning process lasts up to 4 months, e.g. 2 weeks to 3 months, eg 1 to 3 months.
The surface may alternatively or additionally be subjected to various other treatment options including any one or more of lithography, laser pitting, or any combination of the foregoing. Thus in one embodiment, the surface is subject to any one of lithography or laser pitting prior to a roughening step, typically an acid etching step, whereas in another embodiment the surface is roughened by a roughening method (for example acid etching) prior to treatment by lithography and/or laser pitting.
In a further embodiment of the method of the invention, lithography may be utilised during a roughening step to enable only a portion of the metal object to be roughened prior to treatment according to the method of the invention.
When the metal object has a micro-rough surface comprising microscale protrusions, the anodising and subsequent steps create an integral surface layer which has a non-uniform composition across the surface of the metal object such that there are regions having a higher oxygen to metal atom ratio, or “caps”, located upon the microscale protrusions. That is, in the course of steps (a) to (c), the anodisation process which forms the integral surface oxide layer results in a higher oxygen to valve metal atom ratio at the protrusions than at the parts of the surface which do not extend out of the surface plane. The treated metal object having said integral surface layer is described further below.
The bio-effective material is adsorbed into the integral surface layer in step (d). Where the method of the invention is applied to a micro-rough surface, the bio-effective material is adsorbed into the regions having a high oxygen to metal atom ratio or caps at the protrusions upon the surface. That is, the bio-effective material is adsorbed to a greater extent at the regions having a high oxygen to valve metal atom ratio than elsewhere upon the surface. The location of the bio-effective material may be observed, for example, by SEM-EDX.
According to a further aspect of the invention, there is provided a metal object obtainable or obtained by the methods described above and hereinafter.
The metal object may be in the form of an implant, a medical implement or device or an item of jewellery. In particular, in the case of a medical implement or device, this could include any type of device or tool that comes into contact with the body, for example pace-makers, stents, skin staples, scalpels, trocars, pins for bones or even medical implements such as scalpels or tissue clamps which are used during surgery. Implants according to the invention can be used for many medical and surgical purposes, including full and partial hip replacements, implants useful in maxillofacial, trauma, urology, orthodontal and orthopaedic applications, arthroscopic devices, dental implants, neurological apparatus and parts (such as staples, nails and pins) used in cardiovascular and general surgery.
The metals that may be used to make the implants or jewellery according to the invention may be titanium, typically chemically pure (also referred to as commercially pure) titanium, for example, Grade 2 (ASTM F67), or a titanium alloy. One standard alloy for this purpose is titanium 90% with 6% aluminium and 4% vanadium (British Standard 7252). An alternative is titanium 87% with 6% aluminium and 7% niobium (ASTM 1295-11 or ISO 5832-11). Alternatively the metal may comprise niobium, tantalum or zirconium, or alloys of these metals. The percentages given are percentages by weight.
According to a further aspect of the invention, there is provided a metal object having a micro-rough surface and a surface layer thereon which is integral with the surface of the metal object, wherein the micro-rough surface of the metal object comprises microscale protrusions; the integral surface layer comprises at least one oxide of the metal and the oxygen in the surface layer is non-uniformly distributed across the surface of the metal object such that there are regions having a higher oxygen to metal atom ratio, the regions being located on the microscale protrusions; and a bio-effective material is incorporated into the integral surface layer.
The treated metal object according to this aspect of the invention may be in any of the forms discussed above, that is, an implant, a medical implement or device or an item of jewellery. For example, this could include any type of device or tool that comes into contact with the body such as pace-makers, stents, skin staples, scalpels, trocars, pins for bones or even medical implements such as scalpels or tissue clamps which are used during surgery. However, the micro-rough surface of the treated metal object makes it particularly suited to applications where integration with living tissue is required, such as osseointegration. Thus implants according to the invention can be used for many medical and surgical purposes, including full and partial hip replacements, implants useful in maxillofacial, trauma, urology, orthodontal and orthopaedic applications, arthroscopic devices, dental implants, neurological apparatus and parts (such as staples, nails and pins) used in cardiovascular and general surgery. Examples of preferred implants include: orthopaedic implants, typically spine implants (e.g. rods, plates, screws and cages) or cranioplasty implants; access ports; neurostimulator devices; percutaneous and transcutaneous devices; ports; cochlear implants; acetabular cups; veterinary implants; titanium horseshoes; dental implants; implants for soft tissue integration, and prosthetics such as intraosseous transcutaneous amputation prosthesis. Dental implants, cardiac implants and cranioplastic implants are particularly preferred.
Preferably, implants according to the invention or implants made according to the method of the invention are for insertion into the human body.
There is no particular limit on the shape of the metal object. Thus, it may be a hollow or solid object, or it may mimic the structure of bone, for example cancellous bone.
The metal object may comprise titanium, tantalum, zirconium, niobium, vanadium, aluminium, or alloys thereof. Among these, titanium and titanium alloys are particularly favoured. Chemically pure titanium is an example of a suitable metal, as are the alloys mentioned above (90% titanium, 6% aluminium and 4% vanadium or 87% titanium, 6% aluminium and 7% niobium). The percentages given are percentages by weight.
The treated metal object having a micro-rough surface with microscale protrusions has a micromorphology as described above in relation to the micro-rough metal object for use in the method of the invention. Thus the treated micro-rough surface typically has microscale protrusions which extend substantially perpendicularly to the surface plane. Such protrusions may be in the form of peaks, which may be elongated or adjoined to form protruding ridges. The protruding ridges may be for example between 0.1 and 100 micrometres long. The micromorphology of the surface may be overlaid on a larger-scale structure, and may have nanostructures overlaid thereupon. Preferably the microscale features have edges which appear sharp on the microscale.
As has been mentioned above, the application of the method of the invention to the metal object may cause a rounding of the peaks of the microscale protrusions, but does not substantially affect their size and has no effect on the number or density of the protrusions. In consequence, application of the method of the invention to an object having a micro-rough surface has a minimal effect on the surface roughness factor. For example, the method of the invention does not reduce the surface roughness factor by more than 10%. In particular, the method of the invention does not reduce the surface roughness of the metal object by more than 5%. Therefore the treated metal object having a micro-rough surface as described above, having a surface layer obtainable by the method of the invention, has a roughened surface which is substantially similar to the surface of the untreated metal object.
In particular, the treated micro-rough metal object typically has an average roughness (RA) of from 0.5 to 10 μm, preferably from 0.5 to 5 μm, for example from 1 to 3 μm. The metal object typically has a density of summits of at least 1000 mm−2, for example from 5,000 to 1,000,000 mm−2, preferably from 10,000 to 500,000 mm−2, more preferably from 15,000 to 500,000 mm−2 or from 20,000 to 500,000 mm−2. Preferably the density of summits is at least 15,000 or at least 25,000 mm−2, e.g. at least 50,000 or at least 100,000 mm−2. The treated micro-rough metal object preferably has a positive Ssk value.
The treated metal object having a micro-rough surface typically has a surface roughness factor greater than 1.5, for example from 2 to 10. Where the surface roughness factor is measured by the pre-anodisation technique discussed above, it is preferably from 3 to 6. The treated micro-rough metal object preferably has a developed surface area (Sdr) measured by interferometry of, for example, more than 50%, preferably from 80% to 300%, more preferably from 100% to 200%.
The microscale protrusions which appear at the surface of the treated micro-rough metal object may occur substantially uniformly over the surface of the treated object, or they may be present only in one or more portions of the treated object's surface. Where only one or more portions of the surface are roughened, the microscale protrusions may occur substantially uniformly across each portion.
The micromorphology of the micro-rough metal object is obtainable by, for example, acid etching, treatment with a fluoride solution, laser pitting or lithography, preferably by acid etching. This micromorphology is also obtainable by, for instance, a method comprising acid etching, for example a method comprising acid etching and at least one other roughening method as described above.
The treated metal object comprises an integral surface layer which comprises at least one oxide of the metal. An integral surface layer is a layer which is a part of the metal object, (rather than a separate coating applied to the metal object). Typically, the integral surface layer is an anodised layer. Further, the oxygen atoms in the surface layer are not uniformly distributed and so the surface layer comprises particular regions where the ratio of oxygen to valve metal atoms is higher than elsewhere on the surface, e.g. higher than the average oxygen to metal atom ratio in the integral surface layer. These regions are located at the peaks of the microscale protrusions such that there is a greater O/M ratio at the peaks. Thus, the surface structure comprises microscale protrusions at which the oxygen to metal atom ratio is high (and a high degree of oxidation driven by anodisation has taken place), and valleys between the protrusions where the oxygen to metal atom ratio is lower (and a lower degree of oxidation driven by anodisation has taken place). Typically, the regions of the integral surface layer which have an elevated oxygen to metal atom ratio in comparison to the average oxygen to metal atom ratio in the surface are for the most part distributed over the portions of the surface which protrude from the mean surface plane away from the surface. The occurrence of such regions is reduced, or they are even substantially not present, at those portions of the surface which are recessed into the surface below the mean surface plane.
The presence of the integral surface layer at the summits of the microscale surface protrusions means that the peaks and ridges of the surface have a rounded shape compared to those of a micro-rough metal surface without an integral surface layer. The rounded surface protrusions are visible when magnified. This may be seen in
Due to the uneven distribution of oxygen throughout the integral surface layer (typically the anodised layer), the ratio of oxygen atoms to valve metal atoms is greater at the surface protrusions than at the non-protruding portions of the roughened surface. Typically, the ratio of oxygen atoms to valve metal atoms is at least 1 in the surface layer of the metal object of the invention. The ratio of oxygen to valve metal atoms at the protrusions is typically at least 1.5, for example at least 2 or 2.5. The ratio of oxygen to valve metal atoms in the troughs between the peaks is typically from 0.5 to 2, for example from 1 to 1.5 or less than 1.5. Preferably, the ratio of oxygen to valve metal atoms is at least 2 at the protrusions and at least 1 at the troughs or non-protruding portions of the surface. More preferably, the ratio of oxygen to valve metal atoms is at least 2 at the protrusions and at least one, but less than 2, at the troughs or non-protruding portions of the rough surface.
The ratio of oxygen atoms to valve metal atoms is typically larger at the surface protrusions than at the non-protruding portions of the roughened surface. For example, the ratio of oxygen to valve metal atoms may be 50% larger than at the protrusions (i.e. in the regions having a higher oxygen to metal atom ratio in the surface layer) than at the non-protruding portions of the rough surface (i.e. in the remainder of the surface layer). Preferably the ratio of oxygen atoms to valve metal atoms is twice as large at the protrusions than at the non-protruding portions of the rough surface.
A suitable method for measuring the ratio is scanning electron microscopy with energy dispersive X-ray spectroscopy, or SEM-EDX.
The bio-effective material incorporated into the treated metal object of the present invention may for instance be a biocidal metal such as copper, ruthenium, silver, gold, platinum or palladium. However, silver is preferable as it is not particularly soluble in body fluids. Other biocidal substances may also be used, for example iodine or chlorhexidene. The adsorbed biocidal material may be any one or any combination of the above.
Where the material incorporated is silver, the silver loading at the surface is 0.1 to 100 μg/cm2 of silver. The silver loading is, for example, at least 1 to 20 or 1 to 10 μg/cm2; preferably from 3 to 10 μg/cm2 of silver.
The bio-effective material is present in the regions of the surface layer having a higher oxygen to metal atom ratio, at the protrusions upon the micro-rough surface. Typically the bio-effective material is primarily present in the said regions. In detail, the bio-effective material which is adsorbed in the integral surface layer is distributed non-uniformly throughout the surface layer such that some regions have a higher content of bio-effective material than others. The regions having a higher content of bio-effective material than average (that is, the average content of bio-effective material throughout the surface layer) coincide with the regions having a higher oxygen to metal atom ratio. Therefore the regions having a higher content of bio-effective material are located at the protruding portions of the surface. The uneven distribution of bio-effective material throughout the integral surface layer of the metal object of the invention means that the concentration of biological material is greater at the protruding portions of the surface than at the non-protruding portions (for example the troughs).
The regions of higher oxygen to metal atom ratio (O/M ratio) and hence the location of the bio-effective material are illustrated in
In one embodiment of the invention, the concentration of the bio-effective material located at the surface protrusions (that is, at the regions having a higher oxygen to metal atom ratio) is higher than that in the troughs/valleys. In another embodiment of the invention, the concentration of bio-effective material located at the surface protrusions is at least 20% greater than the concentration of bio-effective material located at the troughs of the surface (that is, the portions of the surface recessed into the object below the mean surface plane). For example, the concentration of bio-effective material located at the surface protrusions is at least 25% greater, preferably at least 30 or 40% greater, more preferably at least 50% greater than the concentration of bio-effective material located at the troughs of the surface. The location of the bio-effective material may be observed, for example, by SEM-EDX.
The treated metal object having a micro-rough surface is typically obtainable, and is preferably obtained, by the method of the invention described above. However, it may also be obtained by methods wherein the anodising voltage is not varied cyclically. An example of such a method is described in published application WO 2009/044203, the entire contents of which is incorporated by reference. For example, a metal object according to the invention may be produced by the following steps:
The process will now be described in relation to the treatment of a metal implant not comprising microscale protrusions for use in a surgical procedure. The implant is first cleaned, by an aqueous or non-aqueous process (unless it had been sufficiently cleaned during manufacture). The cleaning process may be by ultrasonic cleaning using first acetone (or other degreasing solvent) as the liquid phase, then rinsed with fresh acetone (or other solvent) and then with de-ionized water or any other suitable rinsing solution. The metal implant may then be cleaned in a 1 M aqueous solution of sodium hydroxide (or other alkaline cleaner) and then rinsed in de-ionized water. The resulting cleaned metal implant is then anodised in contact with an aqueous solution of phosphoric acid, which in this example is 2.1 M, as the anodising electrolyte. The implant, in this example, is to be anodised using a maximum voltage of 100 V, to produce a hard wearing anodised oxide layer.
As a preliminary step, the implant is first pre-anodised by linearly increasing the voltage from 0 to 1.75 V, while monitoring the current. This ensures a consistent initial oxide thickness; and from electrical measurements (for example of the film growth current during this pre-anodising step) the microscopic surface area is calculated.
The electrolyte in this case was 2.1 M aqueous phosphoric acid. During an initial step, the voltage is gradually raised to 100 V, over a period of 100 seconds (at a rate of 1 V/s), and is then held at that voltage for a further 600 s. The anodising process commenced at 0V. The anodising current results in formation of an oxide layer that is integral with the titanium alloy disc, passivating the surface. As the voltage increases, the thickness of the oxide film gradually increases, the relationship being approximately 1.4 nm/V when using this electrolyte. While the voltage is held at that level, the current falls to a low level, for example less than 0.2 mA/cm2 (microscopic area) and this drop in current indicates that passivation has been completed. Only the last 220 s of this initial step are shown in
As shown in
As shown in
After a brief pause to allow time for insertion of a reference electrode into the electrolyte, and for changing the power supply from a high-voltage supply to a potentiostat (75 s in this case), a reverse voltage of −0.8 V (as measured with respect to a Ag/AgCl standard reference electrode) is applied, and is held for 180 seconds. This negative voltage will bring about electrochemical reduction at the surface. As is evident from
The surface of the titanium alloy disc, at this stage, has a surface layer consisting of a hard oxide layer of a titanium oxide, in which are pits or pitted regions. The hard oxide layer is that formed during the initial passivating step (the first 720 s); the pits are formed during the sequence of voltage cycles (the following 2100 s); and the reverse voltage step (the final 180 s) ensures that the pits are filled with a porous and absorptive material which acts as an effective ion absorber, and which may be a form of hydrous titanium oxide which may contain anions from the electrolyte, such as phosphate, and which was formed by the electrochemical reduction. The porous material in the pits may also contain niobium from the substrate, presumably also as a hydrous oxide.
The pits typically have depths in the range 1 to 3 μm penetrating through the outer passive hard oxide layer (which is 0.14 μm thick at 100 V) into the substrate, and have typical diameters of 1 to 5 μm. The pits may occupy some 5 to 20% of the surface area, though preferably below 10%, so they do not significantly affect the hard wearing properties of the hard oxide layer.
When the anodising steps and the reduction step (as shown in
The treated titanium alloy disc may have a silver content of 0.5 to 40 μg/cm2 or more typically from 2-20 μg/cm2 (based on the geometrical surface area). However, titanium or titanium alloy metal objects treated according to the method of the invention may achieve a silver loading of from 0.1 to 100 μg/cm2. The silver loading depends upon the anodising process, as described above, and in particular the silver loading is correlated with the cumulative charge, Q, that passes during the anodising steps. The silver is present initially mainly in ionic form but may be at least partially converted to atomic clusters of metal dispersed within the hydrous titania adsorption matrix as a result of photo-reduction. Typically, ˜0.3-1 μg/cm2 (microscopic area) is adsorbed on the hard passive oxide layer, with the remainder stored within the hydrous titania-filled pits.
The anodising process typically produces a coloured surface for example as a vivid purple colour or green, because of the thickness of the transparent oxide layer. The vivid purple colour is typically produced at 100 V (or 27 V). Referring now to
Substantially the same process has also been applied to a titanium alloy disc whose surface had been grit blasted, so the surface was initially rough; this disc was of the same titanium/aluminium/niobium alloy as in the experiments described above with reference to
In this example too the electrolyte is 2.1 M aqueous phosphoric acid. As described above, the disc is first subjected to low-voltage pre-anodisation, so that the microscopic surface area is known. Anodisation is then commenced, and the voltage is gradually raised to 100 V, over a period of 100 seconds (at a rate of 1 V/s), and is then held at that voltage for a further 600 s. The anodisation process commences from 0 V. The anodising current results in formation of an oxide layer that is integral with the titanium alloy disc, passivating the surface. As the voltage increases, the thickness of the oxide film gradually increases, the relationship being approximately 1.4 nm/V with this electrolyte; and while the voltage is held at that level, the current falls to a low level, for example less than 0.1 mA/cm2 and this drop in current indicates that passivation has been completed. Only the last 220 s of this initial step are shown in
As shown in
As shown in
After a brief pause to allow time for insertion of a reference electrode into the electrolyte, and for changing the power supply from a high-voltage supply to a potentiostat (75 s in this example), a reverse voltage of −0.8 V (as measured with respect to a Ag/AgCl standard reference electrode) is applied, and is held for 180 seconds. This negative voltage will bring about electrochemical reduction at the surface. As is evident from
The surface of the titanium alloy disc, at this stage, has a surface layer consisting of a hard oxide layer comprising a titanium oxide, in which are pits or pitted regions. The hard oxide layer is that formed during the initial passivating step (the first 720 s); the pits are formed during the sequence of voltage cycles (the following 2100 s); and the reverse voltage step (the final 180 s) ensures that the pits are filled with a porous and absorptive material which acts as an effective ion absorber, and which may be a form of titanium oxide which may also contain some phosphate anions, and which is formed by the electrochemical reduction.
Although the process steps used to treat the grit-blasted titanium alloy disc (as described in relation to
The grit-blasted titanium alloy disc was then subjected to the rinsing step, and then the silver adsorption step, exactly as described above for the polished titanium alloy disc. Consequently silver ions are absorbed into the surface, in particular within the absorptive material within the pits.
By way of example, the grit-blasted alloy disc was measured as having a geometric area of 2.99 cm2, and a microscopic area of 22.93 cm2, and so a roughness factor of 7.7. By dissolving silver from the surface into 3 M nitric acid at 30-40° C., with ultrasonic agitation, the total loading of silver was ascertained. The total loading of silver was about 15 μg, so the loading is about 5.0 μg/cm2, on a geometric basis.
Tests have also been carried out to ascertain the optimum value of the reverse voltage, applied after anodisation to bring about electrochemical reduction within the pits.
Previous experiments have identified that a reverse voltage of about −0.45 V is optimum if the metal implant is of a titanium/vanadium/aluminium alloy Ti6Al4V (also known as having the empirical chemical formula Ti24VAl3). These tests investigated a range of different reverse voltages for the titanium/niobium/aluminium alloy described above. A number of polished discs of this titanium metal alloy were subjected to the process described above in relation to
As described above, after the anodisation and reverse voltage steps, each disc was rinsed and then immersed in silver nitrate solution, as described above. The loadings of silver ions were then ascertained by dissolving the silver into nitric acid (as described above in relation to the grit-blasted disc).
Referring now to
So these tests and experiments lead to the conclusion that for this titanium/niobium alloy the potential of the object during the reverse voltage step, relative to the reference electrode, should be about −0.8 V, and that it should be applied at that value initially, rather than building up to that value.
This is a significantly larger reverse voltage than is required with the titanium/vanadium alloy. The difference in behaviour is presumably due to the presence of niobium in the surface oxide (as is evident from the spectrum of
The anodising method described above has been described primarily in relation to a titanium/niobium alloy, but it will be appreciated that such an anodising method may also be applied to other titanium alloys, or pure titanium, and indeed may be applied to other valve metal alloys. For example if such an anodising process—the passivating step and then the pit-forming step—are applied to a titanium/vanadium alloy, then in the following step the reverse voltage may be lower than is appropriate for the titanium/niobium alloy. It will also be appreciated that the voltage cycles may differ from those described above, for example the voltage might be ramped up and ramped down at different rates, for example being ramped up more slowly (providing a more rapid process). The anodising method has been described in relation to titanium alloy metal discs, but can be applied to any type of item, such as implants, of these suitable metals.
The method of the invention will now be described in relation to a method of producing a treated metal object having a micro-rough surface or a smooth surface. Titanium discs are used by way of illustration.
Discs of chemically pure titanium (CpTi) were degreased in acetone, pickled in a mixture of 2% HF and 10% HNO3 and rinsed in pure water in order to prepare the surface for modification.
The discs were then grit blasted using large grits of corundum with a grain size of 250 to 500 μm. They were then etched in a boiling mixture of hydrochloric and sulphuric acids, and then cleaned in nitric acid, rinsed in ultrapure deionised water in an ultrasonic bath and then dried in a stream of nitrogen. The discs thus produced are referred to hereafter as GBA discs.
Some of these discs were further conditioned for several months in sodium chloride solution. The discs thus produced are referred to hereafter as GBA conditioned discs. Typical conditions used in this step are, for example, a 0.9% solution of sodium chloride, either in water or at a slightly acidic pH (pH 4-6).
Details of the process by which the GBA and GBA conditioned discs as used in the present examples were prepared using the methodology described in given in “Spontaneously formed nanostructures on titanium surfaces”, Wennerberg et al., Clin. Oral Impl. Res., 24, 203-209, 2013.
This paper also provides details of the micromorphology of the micro-rough surfaces of the GBA and GBA conditioned discs, and compares them to polished titanium discs. In particular, it illustrates that the micro-rough surfaces comprise features are more akin to peaks than to valleys in the surface. Furthermore, it also illustrates the surface area of the three different types of disc. The surface area of a polished titanium disc is shown to be almost identical to that of a perfectly flat plane having the same geometric shape as the disc. By contrast, the acid-etched discs both have surface areas that are more than twice as large as the area of a plane having the same geometric shape as the discs. The large surface area arises from the micro-rough structure of the acid-etched discs.
The differences between the three surfaces prior to treatment are illustrated in
All three discs were subjected to a pre-anodisation process as described in WO 2012/095672 A2, the entire contents of which is incorporated herein by reference. The process involves contacting the metal object with a 2M phosphoric acid electrolyte at 20° C. and applying a voltage by means of a potentiostat of 0V (compared to a reference electrode). After this, the voltage was linearly increased up to a maximum of 1.75 V, at a rate of 20 mV s−1. The current was recorded at 1.6 V and this value was used to determine the microscopic surface area of the object based on a relationship between oxide film growth current and area. The voltage was then held at the 1.75 V for 2 minutes to ensure that the complete surface was fully passivated.
The anodising procedure was then carried out. The titanium discs were connected to a power supply and the voltage was ramped up from 0V to a maximum of 100 V at a ramp rate of 0.5 V s−1. The voltage was then held at the maximum voltage for 10 minutes in order to produce an integral surface oxide layer. The voltage was then ramped back down to 0 V at a ramp rate of 10 V s−1.
The anodised titanium discs were then subjected to series of voltage cycles wherein the voltage was held at 0 V for 30 s, then ramped up to 36 V at a ramp rate of 2 V s−1 and held at 36 V for 30 s, then ramped back down to 0 V at a ramp rate of 10 V s−1. This was repeated for around 1 to 2 hours, depending on the disc; the exact timings are shown in Table 3 below.
The metal object was then connected to a potentiostat and a voltage of −0.45 V (compared to a reference electrode) was applied for 3 minutes. The metal object was then removed from the phosphoric acid electrolyte and rinsed with type 2 deionised water until the rinse water conductivity was less than 10 μS cm−1.
The metal object was then contacted with a 0.1 M solution of silver nitrate at 18-22° C. and a pH of around 3.5 to 3.9 for one hour. The metal object was then removed from the silver nitrate solution and rinsed with type 2 deionised water until the rinse water conductivity was less than 2.5 μS cm−1.
The results are summarised in Table 3 below.
The information in Table 3 summarises the effects of subjecting different types of surface to the process of the invention. An important difference is the location of the adsorbed silver. When the process is applied to a non-roughened surface, it causes the formation of pits approximately 1 to 5 μm in diameter. These are filled with hydrous titania and then adsorb the majority of the silver which is incorporated onto the surface. By contrast, when the process is applied to a microscale roughened (here acid etched) surface, these pits do not form. Instead the surface layer forms with particularly high oxygen atom content at the sharp edges of the surface microscale features, giving them a rounded appearance. The subsequent immersion in silver nitrate solution results in the adsorption of silver particularly on the protruding features (as measured by SEM-EDX).
The differences in surface structure between the treated titanium discs are illustrated in
By contrast, the structure produced by treatment of the smoother machine-finished disc does not mimic the structure of the underlying flat surface. Instead, the process produces localised pits which contain the majority of the adsorbed silver.
As discussed above, SEM-EDX analysis can be used to illustrate the uneven atomic composition of the surface layer across the rough surface of the metal object of the invention. SEM-EDX analysis was performed to obtain the results shown in
This data illustrates that the oxygen content of the roughened surfaces differ at the protruding and non-protruding portions of the rough surfaces. More oxygen is located at the protruding portions. On all rough surfaces examined, the O/Ti ratio is greater in the peaks than in the valleys. This is a pronounced difference, not a minor one; on the roughened surfaces, the O/Ti ratio is at least twice as great at the peaks than in the valleys. By contrast, anodisation of a metal object having a machine-finished surface leads to the presence of a larger O/Ti ratio at pits in the surface, rather than at surface protrusions. Moreover, in the case of metal objects having machine-finished surfaces, the regions of high oxygen content (the pits) have an O/Ti ratio which is larger than but not twice as large as the regions of lower oxygen content.
The data in
Very surprisingly, despite the vastly different surface structure, the silver content achieved at the surface appears to be remarkably similar on micro-rough surfaces (where the silver is primarily present at the caps) and on smooth surfaces (where the silver is largely present in pits). The silver loading values summarised in Table 3 above are remarkably similar, all being in the region of 5 μg cm−2. Such a dosage is believed to be biologically effective, as is discussed below, but sufficiently low as to be non-toxic. It is most surprising that similar dosages are achieved, regardless of the differing surface area of the surfaces tested and the differing structures into which the silver is adsorbed.
For the purposes of comparison, the method as described above was applied to a machine finished titanium surface. The outcome can be seen in
Incorporation of silver appears to be achievable twice as quickly at acid-etched surfaces than on machine-finished surfaces, which is a further advantage of using a roughened surface in the method of the invention, in addition to the advantage of being suitable for osseointegration and tissue attachment.
In use of the treated metal object it is thought that during exposure to body fluids there is a slow leaching of silver species from the anodised layer, so that the growth of microorganisms such as bacteria, yeasts or fungi in the vicinity of the metal object is inhibited. The leaching is thought to be effected by ion exchange of silver on the metal object with sodium in the body fluids that contact the metal object.
It is to be understood that references herein to silver as a biocidal metal also apply to other biocidal metals, such as copper, ruthenium, gold, platinum, palladium or mixtures thereof, either alone or in combination with other biocidal metal(s). Other biocidal substances may also be used, for example iodine or chlorhexidene.
| Number | Date | Country | Kind |
|---|---|---|---|
| 1508385.0 | May 2015 | GB | national |
| Number | Date | Country | |
|---|---|---|---|
| Parent | 15574357 | Nov 2017 | US |
| Child | 17192072 | US |
