Claims
- 1. An apparatus for evaluating a semiconductor film on a substrate, comprising:an irradiator for irradiating light to the semiconductor film to be evaluated; a detector for detecting the light reflected on the semiconductor film to be evaluated; a calculator for calculating an optical value of the semiconductor film to be evaluated based on data obtained through the detector; a memory for holding optical values of a plurality of semiconductor films and crystal grain sizes of the plurality of the semiconductor films corresponding to the optical values; and an evaluator for selecting a crystal grain size corresponding to the optical value of the semiconductor film to be evaluated which is calculated by the calculator referring to the correspondence in memory and determining the selected crystal grain size as a crystal grain size of the semiconductor film to be evaluated, wherein the optical value is a minimum value of the rate of change of the reflectance of the light within the predetermined wave length area.
- 2. An apparatus for evaluating a semiconductor film on a substrate, comprising:an irradiator for irradiating light to the semiconductor film to be evaluated; a detector for detecting the light reflected on the semiconductor film to be evaluated; a calculator for calculating an optical value of the semiconductor film to be evaluated based on data obtained through the detector; a memory for holding optical values of a plurality of semiconductor films and crystal grain sizes of the plurality of the semiconductor films corresponding to the optical values; and an evaluator for selecting a crystal grain size corresponding to the optical value of the semiconductor film to be evaluated which is calculated by the calculator referring to the correspondence in memory and determining the selected crystal grain size as a crystal grain size of the semiconductor film to be evaluated, wherein the reflectance is reflectance of light normally incident on the semiconductor film, and the predetermined wave length area is approximately 500 nm, in which a relationship between the wave length and the reflectance or a first order rate of change of the reflectance is unique.
- 3. An apparatus for evaluating a semiconductor film on a substrate, comprising:an irradiator for irradiating light to the semiconductor film to be evaluated; a detector for detecting the light reflected on the semiconductor film to be evaluated; a calculator for calculating an optical value of the semiconductor film to be evaluated based on data obtained through the detector, a memory for holding optical values of a plurality of semiconductor films and crystal grain sizes of the plurality of the semiconductor films corresponding to the optical values; and an evaluator for selecting a crystal grain size corresponding to the optical value of the semiconductor film to be evaluated which is calculated by the calculator referring to the correspondence in memory and determining the selected crystal grain size as a crystal grain size of the semiconductor film to be evaluated, wherein the reflectance is reflectance of light normally incident on the semiconductor film, and the optical value is a minimum value in a unique area of a curve of relationship between the wave length and first order rate of change of the reflectance, where the wave length is approximately 500 nm.
Priority Claims (2)
Number |
Date |
Country |
Kind |
9-46770 |
Feb 1997 |
JP |
|
10-37342 |
Feb 1998 |
JP |
|
Parent Case Info
This is a divisional of application Ser. No. 09/032,243 filed Feb. 27, 1998, now U.S. Pat. No. 6,218,198 which application is hereby incorporated by reference in its entirety.
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