Claims
- 1. An apparatus for making a lithographic printing plate according to the silver salt diffusion transfer process comprising:
- means for image-wise exposing an image; and
- means for developing a thus obtained image-wise exposed imaging element with a developing agent and silver halide solvent;
- wherein the imaging element includes, on a support in the order given, a silver halide emulsion layer and a physical development nuclei layer;
- wherein said means for image-wise exposing includes means for focusing a high intensity short time scanning exposure substantially within said silver halide emulsion layer of said imaging element.
- 2. The apparatus according to claim 1, wherein said means for focusing the scanning exposure in said silver halide emulsion layer comprises means for adjusting the position of the scanning exposure according to the support thicknesses of the imaging element.
- 3. The apparatus according to claim 2, wherein the support thickness is in a range from 4 mils to 20 mils.
- 4. The apparatus according to claim 1, wherein said apparatus for making a lithographic printing plate comprises an internal drum imagesetter and a chemical processor.
- 5. The apparatus according to claim 1, wherein said means for image-wise exposing are within an internal drum imagesetter.
- 6. The apparatus according to claim 2, wherein said means for image-wise CD exposing further comprises a high intensity short time exposure source, a support means for supporting said imaging element during exposure, optical means for focusing the high intensity short time exposure emitted by the high intensity short time exposure source onto the imaging element, and deflecting means for image-wise scanning the high intensity short time exposure across the imaging element supported by said support means.
- 7. The apparatus according to claim 6, wherein said means for focusing the high intensity short time scanning exposure substantially within said silver halide emulsion layer of said imaging element comprises means for adjusting said optical means relative to said high intensity short time exposure source and said support means.
- 8. The apparatus according to claim 7, wherein said optical means comprises a focusing lens and a weak optical element having a long focal length relative to that of said focusing lens, and wherein said means for adjusting said optical means adjusts the position of said weak optical element relative to said focusing lens to fine focus the high intensity short time scanning exposure substantially within said silver halide emulsion layer of said imaging element.
- 9. The apparatus according to claim 6, wherein said means for image-wise exposing are within an internal drum imagesetter.
- 10. The apparatus according to claim 7, wherein said means for image-wise exposing are within an internal drum imagesetter.
- 11. The apparatus according to claim 8, wherein said means for image-wise exposing are within an internal drum imagesetter.
- 12. A system for transforming a plate having an emulsion layer formed on a surface thereof to obtain a lithographic printing plate, comprising:
- an emitter configured to emit a beam of radiation; and
- a beam focussing assembly configured to focus the emitted beam of radiation within the emulsion layer.
- 13. A system according to claim 12, wherein:
- the plate has a thickness; and
- said beam focussing assembly includes an adjustable focus element disposed in a path of the emitted beam and a controller for adjusting the focus element based upon the thickness of the plate to focus the beam of radiation.
- 14. A system according to claim 13, wherein the controller precisely adjusts the adjustable focus element.
- 15. A system according to claim 13, wherein:
- said beam focussing assembly further includes a non-adjustable focus element disposed in a path of the emitted beam.
- 16. A system according to claim 15, wherein the controller coarsely adjusts the adjustable focus element.
- 17. A system according to claim 15, wherein said adjustable focus element is a weak optical element having a long focal length relative to the non-adjustable focus element.
- 18. A system according to claim 12, wherein:
- the plate has a thickness within a range of thicknesses; and
- said beam focussing assembly includes a controller for adjusting the focus element based upon the thickness of the plate to focus the beam of radiation.
- 19. A system according to claim 18, wherein the range of thicknesses is from 4 mils to 20 mils.
- 20. A system according to claim 12, wherein the emulsion layer is formed of silver halide and has a physical development nuclei layer formed on a surface thereof which is opposed to a surface of the emulsion layer disposed adjacent the plate.
- 21. A system according to claim 12, wherein the beam focussing assembly configured includes an optical element moveable along the path of the emitted beam of radiation so as to focus the emitted beam.
- 22. A system according to claim 12, further comprising:
- a control panel for inputting a thickness of the plate;
- wherein the thickness of the plate is within a defined range of thicknesses and the beam focussing assembly focusses the emitted beam of radiation responsive to said input thickness.
- 23. A system according to claim 12, wherein the beam focussing assembly automatically focusses the emitted beam of radiation based upon a thickness of the plate.
Parent Case Info
This application is a divisional of application Ser. No. 08/373,664 filed Jan. 17, 1995, U.S. Pat. No. 5,616,445.
US Referenced Citations (7)
Divisions (1)
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Number |
Date |
Country |
Parent |
373664 |
Jan 1995 |
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