Semiconductor fabrication processes, such as atomic layer deposition (ALD) processes, can involve the delivery of several different gases and gas mixtures in various quantities over several processing steps. Generally, gases are stored in tanks at a processing facility, and gas metering systems are used to deliver metered quantities of gases from the tanks to processing tools, such as chemical vapor deposition reactors, vacuum sputtering machines and plasma etchers. Typically, components such as valves, pressure regulators, mass flow controller (MFCs), and mass flow ratio control systems are included in the gas metering system or in a flow path from the gas metering system to a processing tool.
Pulse gas delivery devices have been developed to deliver a pulsed mass flow of a gas to semiconductor process tools. High-speed processes can use pulse gas delivery to manufacture advanced, 3-D integrated circuits that include through-silicon vias (TSVs) to provide die-to-die and wafer-to-wafer interconnects.
A traditional pressure based pulse gas delivery device charges a volume to a predetermined pressure through an inlet isolation valve with an outlet isolation valve closed. Then, with the inlet valve closed, the outlet valve is opened to pass gas to the process tool until the pressure of the volume drops to another predetermined level. The mass of gas that flows through the open outlet valve is, according to the ideal gas law, dependent on the difference in pressures as the valve is opened and closed, the volume, and temperature of the gas. More recently, mass flow controllers have been adapted for pulse delivery based on a feedback loop from the flow sensor. In general, an MFC includes an inlet port, an outlet port, a mass flow sensor and a proportional control valve that is adjusted to achieve a desired mass flow. Using a fast closing control valve, the flow can be pulsed.
Improvements to a pressure based pulse gas delivery system are provided. In particular, the usual on/off isolation valve downstream of the chamber is replaced with an adjustable control valve. The degree of openness of the control valve can be controlled to limit flow and enable control of the pressure based delivery during a pulse. With appropriate control, including through a feedback loop during a pulse, a prescribed dose of gas can be precisely delivered over a prescribed pulse duration.
A pulse gas delivery system comprises a chamber having a volume, a pressure sensor configured to detect a pressure of gas within the chamber, and a temperature sensor configured to detect a temperature indicative of temperature of the gas within the chamber. An upstream valve is configured to control flow of gas into the chamber. A downstream control valve is configured to control flow of the gas out of the chamber. A controller is configured to control the upstream valve and the downstream control valve to charge the chamber to an initial pressure and to thereafter control flow through the downstream control valve during the gas pulse of the gas flowing out of the chamber to control delivered dose and period of the gas pulse based on the detected pressure and temperature.
The controller may be configured to control the downstream control valve in a feedback loop to regulate the flow during the pulse based on the pressure and temperature detected during the pulse.
The controller may be further configured to calculate flow rate of the gas out of the chamber and to control the downstream control valve to regulate the flow rate of the gas out of the chamber based on the calculated flow rate and a target flow set point. The controller may be configured to calculate the flow rate Q based on the rate of pressure decay equation:
where V represents the volume of the chamber, Tstp represents standard temperature, Pstp represents standard pressure, P represents the pressure of the gas within the chamber, and T represents the temperature of the gas within the chamber.
The controller may be further configured to calculate a dose of the gas delivered out of the chamber and to control the downstream control valve to deliver a prescribed dose of gas during the gas pulse. The controller may calculate the dose of the gas delivered out of the chamber based on the volume of the chamber, the initial pressure of the gas within the chamber as detected by the pressure sensor when the pulse is started, pressure of the gas within the chamber as detected by the pressure sensor during the pulse, and temperature as detected by the temperature sensor during the pulse. The mole dose Δn(t) of the gas delivered out of the chamber at a time t during the pulse may be calculated according to the function Δn(t)=V×(Pt0−Pt)/(R×Tt) where V represents the volume of the chamber, Pt0 represents the pressure of the gas within volume when the pulse started, Pt represents the pressure of the gas within the chamber at the time t during the pulse, and Tt represents the temperature of the gas at the time t during the pulse.
The controller may be configured to adjust the flow rate during the pulse to achieve a prescribed pulse shape. The controller may be configured to adjust the downstream control valve to achieve a substantially constant flow rate during the pulse.
In a method for pulse gas delivery, an upstream valve is opened while the downstream control valve is closed to charge a chamber with a gas to an initial pressure. The upstream valve is closed when the initial pressure is reached. After the upstream valve is closed, the downstream control valve is opened to start a pulse of the gas flowing out of the chamber. The downstream control valve is controlled during the pulse of the gas flowing out of the chamber to deliver a prescribed dose over a prescribed period of the pulse.
A method of delivering pulse of fluid may comprise controlling the flow of fluid into the chamber with an inlet valve, detecting a pressure of gas within the chamber with a pressure sensor, detecting a temperature indicative of temperature of the gas within the chamber with a temperature sensor, and controlling flow of fluid through a downstream control valve during the pulse of fluid.
Pressure and temperature of the gas within the chamber may be detected and the downstream control valve controlled based on the detected pressure and temperature. The downstream control valve may be closed when the prescribed dose or prescribed period of the pulse is reached. The steps of the method may be repeated under control of a dedicated controller for a prescribed number of pulses.
Flow rate of gas out of the chamber may be measured and, during the pulse, the downstream control valve may be controlled to adjust the measured flow rate to a flow setpoint. Also during the pulse, a dose of gas delivered out of the chamber may be computed and the downstream control valve may be controlled to deliver a prescribed dose of gas during the prescribed pulse time.
During the pulse, flow rate may be adjusted to achieve the prescribed pulse shape. The downstream control valve may be adjusted during the pulse to achieve a substantially constant flow rate during the pulse.
Flow of fluid through the downstream control valve may be controlled based on feedback from the pressure and the temperature detected during the pulse. Flow rate of the gas out of the chamber may be calculated, and the downstream control valve may be controlled to regulate the flow rate of the gas out of the chamber based on the calculated flow rate and a targeted flow set point.
The method may comprise calculating a dose of the gas delivered out of the chamber and controlling the downstream control valve to deliver a prescribed dose of gas during the gas pulse.
The foregoing will be apparent from the following more particular description of example embodiments, as illustrated in the accompanying drawings in which like reference characters refer to the same parts throughout the different views. The drawings are not necessarily to scale, emphasis instead being placed upon illustrating embodiments.
A description of example embodiments follows.
Gas control systems are provided for pulse delivery of a specific mass of gas, e.g. a process gas in a semiconductor manufacturing process or chemical process.
The mass of gas may be specified as a desired number of moles of a fluid to be delivered during a pulse of fluid being delivered to a process chamber. The ‘mole’ is the unit of measurement for amount of substance in the International System of Units (SI) having a unit symbol mol. A ‘mole’ is defined as the amount or sample of a substance that contains as many constitutive particles, e.g., atoms, molecules, ions, electrons, or photons, as there are atoms in 12 grams of carbon-12 (12C), the isotope of carbon with standard atomic weight 12 by definition. This number is expressed by the Avogadro constant, which has a value of approximately 6.022140857×10{circumflex over ( )}23 mol−1. The mole is widely used as a convenient way to express amounts of reactants and products of chemical reactions. The molar volume (symbol Vm) is the volume occupied by one mole of a substance at a given temperature and pressure. It is equal to the molar mass (M) divided by the mass density (ρ).
Initially, the device 102 may be charged from a gas supply 105 to a predetermined pressure by opening upstream valve 106, while downstream valve 107 is closed, allowing a flow of gas (Qi) to enter the device to fill the chamber or volume 104 over a period of time (“Charge” period Δt=(t1−t0),
The pulse gas delivery illustrated in
Multiple channel pulse gas delivery employing flow rate determined based on a pressure drop within a delivery chamber is described in U.S. Pat. No. No. 9,348,339, issued May 24, 2016 to Ding et al., the entire contents of which are incorporated herein by reference.
The approach illustrated in
However, an advantage of pressure based mole measurement techniques is that they can be applied without knowledge of the specific gas or gas mixture being measured. The gas delivery amount, which is derived from a mass balance over the chamber volume and an application of the ideal gas law, is gas independent, relying on the three state variables of pressure (P), temperature (T), and volume (V) to characterize the behavior of the gas being measured.
Disadvantages of thermal based pulse MFCs as illustrated in
The pulse gas delivery amount for the devices in
Δn=∫t
where Δn is the delivered gas in mole, Q the measured flow rate by the flow sensor, t1 the start time of the pulse, t2 the end time of the pulse.
Pulse MFC gas delivery is further described in International Patent Publication No. WO 2012/116281 A1, entitled “System for and Method of Fast Pulse Gas Delivery” by Junhua Ding et al., the entire contents of which are incorporated herein by reference.
Improvements to the pressure based MFC of
Operation of the pulse gas delivery system of
At 702, the host controller sends parameters to configure the controller 514. Two alternative configurations are presented here. In “Time Based Delivery,” the host controller sends the following parameters to the system: the flow setpoint (Qsp), the pulse on time (Ton), the pulse off time (Toff) and/or the number of pulses (N). In “Mole Based Delivery,” the host controller sends the following parameters to the system: pulse delivery mole dose set point (Msp), pulse on time (Ton), pulse off time (Toff), and/or the number of repeat pulses (N). In this mole based delivery, assuming the pulse shape is rectangular, the targeted flow rate setpoint Qsp can be calculated from the mole dose set point (Msp) as:
Qsp=k1*Msp/Ton (2)
where k1 is a conversion constant.
Either method proceeds as follows. At 704, the downstream valve 512 is closed, and at 706 the upstream valve is opened to charge the chamber 504 to a predetermined pressure measured at 708. The upstream valve is then closed at 710. At 712, the host controller sends a trigger signal to the dedicated controller 514 to trigger the pulse gas delivery process of
At 802, the pulse-on timer in the controller 514 is reset. At 804, time to in
where Q is gas flow through the valve 512, V is the volume of the chamber 504, Tstp is a standard temperature constant, Pstp is a standard pressure constant, P is pressure measured by sensor 506, and T is temperature of the gas measured by the temperature sensor 508.
In the time based delivery method, as the pulse on time (Ton) is reached, the controller 514 closes the downstream valve 512 at 704 to finish delivery of a single pulse.
In the mole based delivery method, an additional feedback control loop is provided at 804. The gas delivery amount during the delivery pulse may be calculated using the following equation:
where Δn(t) is the moles of gas passed through the valve 512 with time, Pt0 is the initial charged pressure when the downstream valve is first opened, Pt is the final pressure when the downstream valve is closed at t1, T is the gas temperature and R is the ideal gas constant.
The system may estimate the total amount of gas to be delivered in moles when the pulse on period is reached.
The system may adjust the flow setpoint Qsp if this estimated value does not meet the mole setpoint Msp. In other words, a second feedback loop is used to adjust the flow setpoint Qsp. The first feedback control loop is always used to control the flow rate to the flow setpoint for both Time Based Delivery and Mole Based Delivery. In Mole Based Delivery, during pulse delivery, the controller 514 automatically adjusts the flow set point Qsp and thus the control valve 512 based on the feedback of the calculated number of moles delivered during the pulse in order to precisely deliver the desired number of moles within the targeted pulse-on period for each pulse. In Mole Based Delivery, the two feedback control loops can meet both the mole setpoint (Msp) and pulse on time (Ton) requirements.
The controller could also adjust the openness of the control valve 512 based on feedback of the previous pulse delivery.
At 806 and time t1, the downstream control valve 512 is closed when the pulse-on period is elapsed or the dose amount is reached. In either method, at 808 the pulse-off timer is reset. At 810, and at time t1, the upstream valve is opened to charge the volume of the chamber to a predetermined pressure. Although
The disclosed system offers several advantages. It provides precise mole delivery amounts by controlling the flow rate during the pulse delivery period. Pulse shape can be controlled. High temperature operation is allowable. Fast charging can be achieved by fully opening the upstream valve. Flow rate and delivery amounts are gas independent; thus, the ideal gas equation can be used, although non-ideal gas equations could also be used. Because the dose of the moles delivered is computed during the pulse and flow can be controlled, the initial pressure Pt0 can be less precise. The system can be used in many fast pulse delivery applications such as ALD/ALE and TSV processes.
While example embodiments have been particularly shown and described, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the scope of the embodiments encompassed by the appended claims.
Number | Name | Date | Kind |
---|---|---|---|
6119710 | Brown | Sep 2000 | A |
6247493 | Henderson | Jun 2001 | B1 |
6913031 | Nawata | Jul 2005 | B2 |
7615120 | Shajii et al. | Nov 2009 | B2 |
7628860 | Shajii et al. | Dec 2009 | B2 |
7829353 | Shajii et al. | Nov 2010 | B2 |
9557744 | Ding | Jan 2017 | B2 |
20010002581 | Nishikawa | Jun 2001 | A1 |
20040083961 | Basceri | May 2004 | A1 |
20040226507 | Carpenter | Nov 2004 | A1 |
20050223979 | Shajii et al. | Oct 2005 | A1 |
20060130744 | Clark | Jun 2006 | A1 |
20060283254 | Ding | Dec 2006 | A1 |
20070233412 | Gotoh et al. | Oct 2007 | A1 |
20080191153 | Marganski et al. | Aug 2008 | A1 |
20100167527 | Wu | Jul 2010 | A1 |
20110108126 | Monkowski et al. | May 2011 | A1 |
20110311726 | Liu et al. | Dec 2011 | A1 |
20120216888 | Ding | Aug 2012 | A1 |
20140051261 | Ota | Feb 2014 | A1 |
20140083514 | Ding | Mar 2014 | A1 |
20140190571 | Ding et al. | Jul 2014 | A1 |
20140343875 | Spyropoulos | Nov 2014 | A1 |
20200033895 | Sugita | Jan 2020 | A1 |
20200348704 | Sugita | Nov 2020 | A1 |
Number | Date | Country |
---|---|---|
10-2012-0019508 | Mar 2012 | KR |
WO2011047361 | Apr 2011 | WO |
WO2012116281 | Aug 2012 | WO |
2015112728 | Jul 2015 | WO |
Entry |
---|
PCT International Search Report and Written Opinion for International Application No. PCT/US2020/024980, entitled “Method and Apparatus for Pulse Gas Delivery,” dated Aug. 14, 2020. |
Number | Date | Country | |
---|---|---|---|
20200321225 A1 | Oct 2020 | US |