Apparatus for fluid treatment

Industry

CPC
H01L21/67017

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67017Apparatus for fluid treatment

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Load lock device
- Patent number 12,308,254
- Issue date May 20, 2025
- Canon Anelva Corporation
- Jun Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of controlling semiconductor manufacturing dev...
- Patent number 12,300,513
- Issue date May 13, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Tzu-Hsuan Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid supply unit and substrate processing apparatus incl...
- Patent number 12,300,514
- Issue date May 13, 2025
- Semes Co., Ltd.
- Seong Soo Lee
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Controlling method and substrate transport module
- Patent number 12,300,525
- Issue date May 13, 2025
- Tokyo Electron Limited
- Hiroto Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,293,939
- Issue date May 6, 2025
- Kokusai Electric Corporation
- Daigi Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of automatically setting purge mode of STB and system for ma...
- Patent number 12,293,927
- Issue date May 6, 2025
- Semes Co., Ltd.
- Young Woo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid-tight electrical connection techniques for semiconductor proc...
- Patent number 12,290,897
- Issue date May 6, 2025
- Applied Materials, Inc.
- Chad Pollard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular foreline system
- Patent number 12,288,696
- Issue date Apr 29, 2025
- Edwards Limited
- Christopher Mark Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer carrier dry cleaner
- Patent number 12,288,708
- Issue date Apr 29, 2025
- NANYA TECHNOLOGY CORPORATION
- Jih-Cheng Huang
- B08 - CLEANING
Information Patent Grant
Pressure control valve, a fluid handling structure for lithographic...
- Patent number 12,287,570
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Stef Marten Johan Janssens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas curtain device for load port
- Patent number 12,281,816
- Issue date Apr 22, 2025
- SPRINGFIELD TECHNOLOGIES & INTELLIGENCE, INC.
- Kuan-Ting Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for temperature control for a substrate
- Patent number 12,283,500
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Paul Zachary Wirth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,281,389
- Issue date Apr 22, 2025
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate transferring apparatus
- Patent number 12,283,494
- Issue date Apr 22, 2025
- RORZE SYSTEMS CORPORATION
- Seung Bae Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developing method and apparatus
- Patent number 12,276,914
- Issue date Apr 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Helei Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced temperature control for wafer carrier in plasma processing...
- Patent number 12,272,575
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Fernando M. Silveira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for use with hydrogen radicals and method of using same
- Patent number 12,272,527
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple process semiconductor processing system
- Patent number 12,266,550
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film thickness uniformity improvement using edge ring and bias elec...
- Patent number 12,266,560
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Kin Pong Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component mounting system and component mounting method
- Patent number 12,261,070
- Issue date Mar 25, 2025
- BONDTECH CO., LTD.
- Akira Yamauchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead with embedded nut
- Patent number 12,257,592
- Issue date Mar 25, 2025
- Applied Materials, Inc.
- Kenneth Brian Doering
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Filter apparatus for semiconductor device fabrication process
- Patent number 12,251,786
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chwen Yu
- B24 - GRINDING POLISHING
Information Patent Grant
Non-elastomeric, non-polymeric, non-metallic membrane valves for se...
- Patent number 12,253,190
- Issue date Mar 18, 2025
- Lam Research Corporation
- Mariusch Gregor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,249,503
- Issue date Mar 11, 2025
- Kokusai Electric Corporation
- Kiyohisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum valve for providing a symmetrical fluid flow
- Patent number 12,241,556
- Issue date Mar 4, 2025
- VAT Holding AG
- Florian Ehrne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supporting shelf module and wafer container using same
- Patent number 12,237,190
- Issue date Feb 25, 2025
- Gudeng Precision Industrial Co., Ltd.
- Ming-Chien Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vaporizer, processing apparatus and method of manufacturing semicon...
- Patent number 12,234,550
- Issue date Feb 25, 2025
- Kokusai Electric Corporation
- Gen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium film forming method and substrate processing system
- Patent number 12,227,841
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum exhaust system
- Patent number 12,228,951
- Issue date Feb 18, 2025
- Edwards Japan Limited
- Manabu Nonaka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VACUUM VALVE FOR PROVIDING A SYMMETRICAL FLUID FLOW
- Publication number 20250164020
- Publication date May 22, 2025
- VAT HOLDING AG
- Florian EHRNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY SYSTEM FOR A THERMAL PROCESSING APPARATUS
- Publication number 20250167008
- Publication date May 22, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Matthias Bauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250167009
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Kazuya TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUID FILTRATION FOR SEMICONDUCTOR PROCESSING
- Publication number 20250161840
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Chia Pao CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID MATERIAL VAPORIZATION APPARATUS AND OPERATION SETTING METHOD...
- Publication number 20250164102
- Publication date May 22, 2025
- HORIBA STEC, CO., LTD.
- Hidenori Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATION SYSTEM FOR A REMOVABLE REACTION UNIT OF AN EPITAXIAL REA...
- Publication number 20250167028
- Publication date May 22, 2025
- LPE S.p.A.
- Maurilio Meschia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF USING EXHAUST SYSTEM AND METHOD OF USING PROCESS EQUIPMENT
- Publication number 20250167014
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsien-Chang HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND DETECTING METHOD OF TRAY TILTING
- Publication number 20250167038
- Publication date May 22, 2025
- TES CO., LTD.
- Jin-Hyung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR CONTROLLING GAS FLOW OF EQUIPMENT FRONT END MODULE AND S...
- Publication number 20250157831
- Publication date May 15, 2025
- Justem Co., Ltd.
- Young Jin LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL LIQUID EXCHANGE METHOD, CHEMICAL LIQUID SUPPLY SYSTEM, AND...
- Publication number 20250153122
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- SUNGHYUN PARK
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
HIGH-PRESSURE HEAT TREATMENT APPARATUS AND GAS MONITORING MODULE US...
- Publication number 20250157834
- Publication date May 15, 2025
- HPSP Co., Ltd.
- Kun Young LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20250154654
- Publication date May 15, 2025
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-FLOW CHAMBER KITS, PROCESSING CHAMBERS, AND RELATED APPARATUS...
- Publication number 20250149350
- Publication date May 8, 2025
- Applied Materials, Inc.
- Errol Antonio C. SANCHEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GUIDED FLOW VALVE ASSEMBLY AND SYSTEM INCORPORATING SAME
- Publication number 20250146580
- Publication date May 8, 2025
- ICHOR SYSTEMS, INC.
- Stephen CARSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-FLOW METHODS, AND RELATED APPARATUS, FOR SEMICONDUCTOR MANUFA...
- Publication number 20250149349
- Publication date May 8, 2025
- Applied Materials, Inc.
- Zuoming ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TRANSFER SYSTEM AND METHOD
- Publication number 20250149352
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Kai-Chin WEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-PRESSURE WAFER PROCESSING METHOD USING DUAL HIGH-PRESSURE WAFE...
- Publication number 20250149351
- Publication date May 8, 2025
- HPSP Co., Ltd.
- Sung Kil CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING METHOD FOR SEMICONDUCTOR PROCESS AUXILIARY APPARATUS, C...
- Publication number 20250149359
- Publication date May 8, 2025
- United Microelectronics Corp.
- Chih-Chung KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS SUPPLY DEVICE AND SUBSTRATE PROCESSING SYSTEM HAVING TH...
- Publication number 20250137128
- Publication date May 1, 2025
- EUGENE TECHNOLOGY CO., LTD.
- In Soo SON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND APPARATUS FOR CONTROLLING FLUID FLOW
- Publication number 20250132170
- Publication date Apr 24, 2025
- ICHOR SYSTEMS, INC.
- Philip Ryan Barros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY ASSEMBLY AND SEMICONDUCTOR WAFER PROCESSING APPARATUS US...
- Publication number 20250132134
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Taeil Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS MIXING SYSTEM FOR SEMICONDUCTOR FABRICATION
- Publication number 20250128214
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Ming Shing LIN
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
LIQUID SUPPLY DEVICE, LIQUID SUPPLY METHOD, AND STORAGE MEDIUM
- Publication number 20250130597
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- So OSADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN STRUCTURES, PLATE APPARATUS, AND RELATED METHODS, PROCESS KITS,...
- Publication number 20250132178
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Zhepeng CONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID CONTROL VALVE, FLUID CONTROL DEVICE AND DRIVE CIRCUIT
- Publication number 20250129861
- Publication date Apr 24, 2025
- HORIBA STEC, CO., LTD.
- Hiroshi TAKAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER DEPOSITION CONFINEMENT
- Publication number 20250125129
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW MODIFICATION FIXTURE FOR AN EQUIPMENT FRONT END MODULE
- Publication number 20250118582
- Publication date Apr 10, 2025
- Entegris, Inc.
- Seong Chan Kim
- G05 - CONTROLLING REGULATING
Information Patent Application
CHAMBER KITS, PROCESSING CHAMBERS, AND METHODS FOR GAS ACTIVATION I...
- Publication number 20250118576
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Chen-Ying WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CABINET WITH REDUCED GAS EMISSIONS AND EXHAUST FLOW RATE
- Publication number 20250108418
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- B08 - CLEANING
Information Patent Application
AIRBORNE CONTAMINANT MANAGEMENT METHOD AND SYSTEM
- Publication number 20250108417
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Ming TSAO
- B08 - CLEANING

Apparatus for fluid treatment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Load lock device

Method and apparatus of controlling semiconductor manufacturing dev...

Chemical liquid supply unit and substrate processing apparatus incl...

Controlling method and substrate transport module

Method of manufacturing semiconductor device, substrate processing...

Method of automatically setting purge mode of STB and system for ma...

Fluid-tight electrical connection techniques for semiconductor proc...

Modular foreline system

Wafer carrier dry cleaner

Pressure control valve, a fluid handling structure for lithographic...

Gas curtain device for load port

Methods and systems for temperature control for a substrate

Substrate processing method and substrate processing apparatus

Substrate transferring apparatus

Developing method and apparatus

Advanced temperature control for wafer carrier in plasma processing...

Apparatus for use with hydrogen radicals and method of using same

Multiple process semiconductor processing system

Plasma processing apparatus and method for venting a processing cha...

Film thickness uniformity improvement using edge ring and bias elec...

Component mounting system and component mounting method

Showerhead with embedded nut

Filter apparatus for semiconductor device fabrication process

Non-elastomeric, non-polymeric, non-metallic membrane valves for se...

Method of manufacturing semiconductor device, substrate processing...

Vacuum valve for providing a symmetrical fluid flow

Supporting shelf module and wafer container using same

Vaporizer, processing apparatus and method of manufacturing semicon...

Ruthenium film forming method and substrate processing system

Vacuum exhaust system

Patents Applicationslast 30 patents

VACUUM VALVE FOR PROVIDING A SYMMETRICAL FLUID FLOW

GAS DELIVERY SYSTEM FOR A THERMAL PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

FLUID FILTRATION FOR SEMICONDUCTOR PROCESSING

LIQUID MATERIAL VAPORIZATION APPARATUS AND OPERATION SETTING METHOD...

AUTOMATION SYSTEM FOR A REMOVABLE REACTION UNIT OF AN EPITAXIAL REA...

METHOD OF USING EXHAUST SYSTEM AND METHOD OF USING PROCESS EQUIPMENT

SUBSTRATE PROCESSING APPARATUS AND DETECTING METHOD OF TRAY TILTING

DEVICE FOR CONTROLLING GAS FLOW OF EQUIPMENT FRONT END MODULE AND S...

CHEMICAL LIQUID EXCHANGE METHOD, CHEMICAL LIQUID SUPPLY SYSTEM, AND...

HIGH-PRESSURE HEAT TREATMENT APPARATUS AND GAS MONITORING MODULE US...

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

MULTI-FLOW CHAMBER KITS, PROCESSING CHAMBERS, AND RELATED APPARATUS...

GUIDED FLOW VALVE ASSEMBLY AND SYSTEM INCORPORATING SAME

MULTI-FLOW METHODS, AND RELATED APPARATUS, FOR SEMICONDUCTOR MANUFA...

WAFER TRANSFER SYSTEM AND METHOD

HIGH-PRESSURE WAFER PROCESSING METHOD USING DUAL HIGH-PRESSURE WAFE...

CONTROLLING METHOD FOR SEMICONDUCTOR PROCESS AUXILIARY APPARATUS, C...

PROCESS GAS SUPPLY DEVICE AND SUBSTRATE PROCESSING SYSTEM HAVING TH...

SYSTEMS AND APPARATUS FOR CONTROLLING FLUID FLOW

GAS SUPPLY ASSEMBLY AND SEMICONDUCTOR WAFER PROCESSING APPARATUS US...

GAS MIXING SYSTEM FOR SEMICONDUCTOR FABRICATION

LIQUID SUPPLY DEVICE, LIQUID SUPPLY METHOD, AND STORAGE MEDIUM

FIN STRUCTURES, PLATE APPARATUS, AND RELATED METHODS, PROCESS KITS,...

FLUID CONTROL VALVE, FLUID CONTROL DEVICE AND DRIVE CIRCUIT

PROCESSING CHAMBER DEPOSITION CONFINEMENT

FLOW MODIFICATION FIXTURE FOR AN EQUIPMENT FRONT END MODULE

CHAMBER KITS, PROCESSING CHAMBERS, AND METHODS FOR GAS ACTIVATION I...

GAS CABINET WITH REDUCED GAS EMISSIONS AND EXHAUST FLOW RATE

AIRBORNE CONTAMINANT MANAGEMENT METHOD AND SYSTEM