Claims
- 1. A device for drying substrates, said device comprising an energy source configured to heat solely a stationary meniscus forming during removal of the substrates from the liquid at a transition between the moving substrate surface and the stationary liquid surface to thereby lower a surface tension of the liquid of the meniscus while the liquid in a region adjacent to the meniscus is not heated.
- 2. A device according to claim 1, wherein said energy source is a hot gas surrounding the meniscus.
- 3. A device according to claim 1, wherein said energy source is one or more source selected from the group consisting of an electromagnetic radiation source, a microwave source, a light source, and a laser.
- 4. A device according to claim 1, comprising a focusing mechanism focusing radiation on the meniscus.
Parent Case Info
This application is a continuation-in-part application of International Application PCT/EP97/01537 with an international filing date of Mar. 26, 1997.
US Referenced Citations (7)
Foreign Referenced Citations (6)
Number |
Date |
Country |
3733670 |
Oct 1987 |
DE |
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May 1989 |
EP |
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EP |
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JP |
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Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
PCT/EP97/01537 |
Mar 1997 |
US |
Child |
09/114420 |
|
US |