Pol et al, "Excimer Laser-Based Lithography: A Deep Ultraviolet Wafer Stepper," SPIE vol. 633, Mar. 1986, pp. 6-16. |
Jain, "Advances in Excimer Laser Lithography," SPIE vol. 710, Mar. 1986, pp. 35-42. |
Ruckle et al, "Computerized Wavelength Stabilized 248.4 nm Excimer Laser for Stepper," SPIE vol. 922, Mar. 1988, pp. 450-453. |
Sandstrom, "Measurements of Beam Charac. Relevant to DUV MICRO. on a KrF Excimer Laser," SPIE vol. 1264, Mar. 1990, pp. 507-519. |
Cullis et al, "A Device for Laser Beam Diffusion and Homogenisation," J. Phys. E:Sci. Instrum., vol. 12, 1979. |
Taback, "Speckle Supression Apparatus," Applied Optics, vol. 28, No. 22, No. 15, 1989, p. 4947. |