Polarisation control

Industry

CPC
G03F7/70566

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70566Polarisation control

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Assembly for collimating broadband radiation
- Patent number 12,050,409
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yongfeng Ni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system in particular for microlithography
- Patent number 11,906,753
- Issue date Feb 20, 2024
- Carl Zeiss SMT GmbH
- Johannes Kraus
- G02 - OPTICS
Information Patent Grant
Polarizer nanoimprint lithography
- Patent number 11,754,765
- Issue date Sep 12, 2023
- Moxtek, Inc.
- Bradley R. Williams
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection optical unit for microlithography and method for produci...
- Patent number 11,650,510
- Issue date May 16, 2023
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assembly for collimating broadband radiation
- Patent number 11,619,887
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Yongfeng Ni
- G02 - OPTICS
Information Patent Grant
Method and apparatus for characterizing a microlithographic mask
- Patent number 11,619,882
- Issue date Apr 4, 2023
- Carl Zeiss SMT GmbH
- Ulrich Matejka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, and article manufa...
- Patent number 11,448,969
- Issue date Sep 20, 2022
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 11,211,374
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam splitting apparatus
- Patent number 11,112,618
- Issue date Sep 7, 2021
- ASML Netherlands B.V.
- Gosse Charles De Vries
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for characterizing a microlithographic mask
- Patent number 11,112,702
- Issue date Sep 7, 2021
- Carl Zeiss SMT GmbH
- Sven Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarizer nanoimprint lithography
- Patent number 11,079,528
- Issue date Aug 3, 2021
- Moxtek, Inc.
- Bradley R. Williams
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Sensor, lithographic apparatus, and device manufacturing method
- Patent number 11,022,902
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical pulse generation for an extreme ultraviolet light source
- Patent number 10,887,975
- Issue date Jan 5, 2021
- ASML Netherlands B.V.
- Christoffel Johannes Liebenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical system for a projection exposure apparatus
- Patent number 10,871,717
- Issue date Dec 22, 2020
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and device
- Patent number 10,866,526
- Issue date Dec 15, 2020
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Light source system and polarization angle adjusting method
- Patent number 10,852,191
- Issue date Dec 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Hao Yeh
- G01 - MEASURING TESTING
Information Patent Grant
Beam transmission system, exposure device, and illumination optical...
- Patent number 10,739,686
- Issue date Aug 11, 2020
- Gigaphoton Inc.
- Akiyoshi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring a parameter of interest, inspection apparatus,...
- Patent number 10,705,430
- Issue date Jul 7, 2020
- ASML Netherlands B.V.
- Gonzalo Roberto Sanguinetti
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quarter wave light splitting
- Patent number 10,705,431
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G02 - OPTICS
Information Patent Grant
Method and device for characterizing a mask for microlithography
- Patent number 10,698,318
- Issue date Jun 30, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flexible illuminator
- Patent number 10,698,226
- Issue date Jun 30, 2020
- ASML Holding N.V.
- Parag Vinayak Kelkar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination device for optimizing polarization in an illumination...
- Patent number 10,690,317
- Issue date Jun 23, 2020
- Nikon Corporation
- Daniel Gene Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, device production...
- Patent number 10,691,026
- Issue date Jun 23, 2020
- Nikon Corporation
- Osamu Tanitsu
- G02 - OPTICS
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 10,685,950
- Issue date Jun 16, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polarization module and laser apparatus including the same
- Patent number 10,654,130
- Issue date May 19, 2020
- SAMSUNG DISPLAY CO., LTD.
- Joo Woan Cho
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of measuring, device manufacturing method, metrology apparat...
- Patent number 10,656,534
- Issue date May 19, 2020
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Optical system of a microlithographic projection exposure system or...
- Patent number 10,620,542
- Issue date Apr 14, 2020
- Carl Zeiss SMT GmbH
- Michael Carl
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus, method of measuring a structure, device manufa...
- Patent number 10,599,048
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Sergey Tarabrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical device, illumination method, and exposure meth...
- Patent number 10,591,824
- Issue date Mar 17, 2020
- Nikon Corporation
- Toru Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical assembly, exposure apparatus, and device manuf...
- Patent number 10,578,973
- Issue date Mar 3, 2020
- Nikon Corporation
- Hirohisa Tanaka
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL PULSE STRETCHER, LASER APPARATUS, AND ELECTRONIC DEVICE MAN...
- Publication number 20240291219
- Publication date Aug 29, 2024
- Gigaphoton Inc.
- Yuki TAMARU
- G02 - OPTICS
Information Patent Application
ULTRAVIOLET LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240128701
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Atsushi FUCHIMUKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLARIZER NANOIMPRINT LITHOGRAPHY
- Publication number 20230375766
- Publication date Nov 23, 2023
- MOXTEK, INC.
- Bradley R. Williams
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFA...
- Publication number 20220390853
- Publication date Dec 8, 2022
- Canon Kabushiki Kaisha
- Michio Kono
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL UNIT FOR MICROLITHOGRAPHY AND METHOD FOR PRODUCI...
- Publication number 20220107570
- Publication date Apr 7, 2022
- Carl Zeiss SMT GMBH
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20220075272
- Publication date Mar 10, 2022
- Carl Zeiss SMT GMBH
- Ulrich Matejka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarizer Nanoimprint Lithography
- Publication number 20210325589
- Publication date Oct 21, 2021
- MOXTEK, INC.
- Bradley R. Williams
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL SYSTEM IN PARTICULAR FOR MICROLITHOGRAPHY
- Publication number 20210231965
- Publication date Jul 29, 2021
- Carl Zeiss SMT GMBH
- Johannes Kraus
- G02 - OPTICS
Information Patent Application
Sensor, Lithographic Apparatus, and Device Manufacturing Method
- Publication number 20210072647
- Publication date Mar 11, 2021
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSEMBLY FOR COLLIMATING BROADBAND RADIATION
- Publication number 20210063900
- Publication date Mar 4, 2021
- ASML NETHERLANDS B.V.
- Yongfeng NI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20210063892
- Publication date Mar 4, 2021
- Carl Zeiss SMT GMBH
- Sven Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT
- Publication number 20200312835
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20200218164
- Publication date Jul 9, 2020
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
LIGHT SOURCE SYSTEM AND POLARIZATION ANGLE ADJUSTING METHOD
- Publication number 20200033194
- Publication date Jan 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jen-Hao YEH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUARTER WAVE LIGHT SPLITTING
- Publication number 20190339622
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Christopher Dennis BENCHER
- G02 - OPTICS
Information Patent Application
Polarizer Nanoimprint Lithography
- Publication number 20190317260
- Publication date Oct 17, 2019
- MOXTEK, INC.
- Bradley R. Williams
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...
- Publication number 20190285993
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarization Independent Metrology System
- Publication number 20190243254
- Publication date Aug 8, 2019
- ASML Holding N.V.
- Krishanu Shome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL ASSEMBLY, EXPOSURE DEVICE, AND DEVICE MANUFACT...
- Publication number 20190163068
- Publication date May 30, 2019
- Nikon Corporation
- Norio Miyake
- G02 - OPTICS
Information Patent Application
OPTICAL PULSE GENERATION FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20190150267
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Christoffel Johannes Liebenberg
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE PRODUCTION...
- Publication number 20190137887
- Publication date May 9, 2019
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD AND APPARATUS, AND METHOD FOR FABRICATING DEVICE WI...
- Publication number 20190137886
- Publication date May 9, 2019
- Nikon Corporation
- Takehito Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND DEVICE
- Publication number 20190094702
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT
- Publication number 20190094704
- Publication date Mar 28, 2019
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACT...
- Publication number 20190086811
- Publication date Mar 21, 2019
- Nikon Corporation
- Koji Shigematsu
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY
- Publication number 20190011839
- Publication date Jan 10, 2019
- Carl Zeiss SMT GMBH
- Holger Seitz
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING ELEMENT, ILLUMINATION OPTICAL APPARATUS, EX...
- Publication number 20180341185
- Publication date Nov 29, 2018
- Nikon Corporation
- Osamu Tanitsu
- G02 - OPTICS
Information Patent Application
POLARIZATION INDEPENDENT METROLOGY SYSTEM
- Publication number 20180299790
- Publication date Oct 18, 2018
- ASML Holding N.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...
- Publication number 20180299794
- Publication date Oct 18, 2018
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM OR...
- Publication number 20180253013
- Publication date Sep 6, 2018
- Carl Zeiss SMT GMBH
- Michael Carl
- G01 - MEASURING TESTING

Polarisation control

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Assembly for collimating broadband radiation

Optical system in particular for microlithography

Polarizer nanoimprint lithography

Projection optical unit for microlithography and method for produci...

Assembly for collimating broadband radiation

Method and apparatus for characterizing a microlithographic mask

Illumination optical system, exposure apparatus, and article manufa...

Photomask design for generating plasmonic effect

Beam splitting apparatus

Device and method for characterizing a microlithographic mask

Polarizer nanoimprint lithography

Sensor, lithographic apparatus, and device manufacturing method

Optical pulse generation for an extreme ultraviolet light source

Optical system for a projection exposure apparatus

Metrology method and device

Light source system and polarization angle adjusting method

Beam transmission system, exposure device, and illumination optical...

Method of measuring a parameter of interest, inspection apparatus,...

Quarter wave light splitting

Method and device for characterizing a mask for microlithography

Flexible illuminator

Illumination device for optimizing polarization in an illumination...

Illumination optical system, exposure apparatus, device production...

Photomask design for generating plasmonic effect

Polarization module and laser apparatus including the same

Method of measuring, device manufacturing method, metrology apparat...

Optical system of a microlithographic projection exposure system or...

Metrology apparatus, method of measuring a structure, device manufa...

Illumination optical device, illumination method, and exposure meth...

Illumination optical assembly, exposure apparatus, and device manuf...

Patents Applicationslast 30 patents

OPTICAL PULSE STRETCHER, LASER APPARATUS, AND ELECTRONIC DEVICE MAN...

ULTRAVIOLET LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

POLARIZER NANOIMPRINT LITHOGRAPHY

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFA...

PROJECTION OPTICAL UNIT FOR MICROLITHOGRAPHY AND METHOD FOR PRODUCI...

METHOD AND APPARATUS FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

Polarizer Nanoimprint Lithography

OPTICAL SYSTEM IN PARTICULAR FOR MICROLITHOGRAPHY

Sensor, Lithographic Apparatus, and Device Manufacturing Method

ASSEMBLY FOR COLLIMATING BROADBAND RADIATION

DEVICE AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT

OPTICAL SYSTEM FOR A PROJECTION EXPOSURE APPARATUS

LIGHT SOURCE SYSTEM AND POLARIZATION ANGLE ADJUSTING METHOD

QUARTER WAVE LIGHT SPLITTING

Polarizer Nanoimprint Lithography

METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...

Polarization Independent Metrology System

ILLUMINATION OPTICAL ASSEMBLY, EXPOSURE DEVICE, AND DEVICE MANUFACT...

OPTICAL PULSE GENERATION FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE PRODUCTION...

EXPOSURE METHOD AND APPARATUS, AND METHOD FOR FABRICATING DEVICE WI...

METROLOGY METHOD AND DEVICE

POLARIZATION-MODULATING OPTICAL ELEMENT

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACT...

METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY

POLARIZATION-MODULATING ELEMENT, ILLUMINATION OPTICAL APPARATUS, EX...

POLARIZATION INDEPENDENT METROLOGY SYSTEM

METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM OR...