*“Multilayer Coatings of 10X Projection Optics for Extreme Ultraviolet Lithography,” C. Montcalm, et al., Emerging Lithographic Technologies III, March 15-17, 1999 SPIE Proceedings Series, vol. 3676, pp. 710-716. |
*“Multilayer Coating of 10X Projection Optics for Extreme-Ultraviolet Lithography,”C. Montcalm et al., presented at the SPIE Conference on Microlithography —Emerging Lithographic Technologies III, at Santa Clara, California, Mar. 14-19, 1999 (12 pages). |
*“Advances in Multilayer Reflective Coatings for Extreme-Ultraviolet Lithography,” James A. Folta, et al., Emerging Lithographic Technologies III, Mar. 15-17, 1989 SPIE Proceedings Series vol. 3676 pp. 702-709. |
*“Advance in Multilayer Reflective Coatings for Extreme-Ultraviolet Lithography,” James A. Folta, et al., presented at the SPIE Conference on Microlithography —Emerging Lithographic Technologies III, at Santa Clara, California, during Mar. 14-19, 1999 (12 pages). |
*“Multilayer Reflective Coatings for Extreme-Ultraviolet Lithography,” C. Montcalm, et al., proceedings of the SPIE Conference on Microlithography —Emerging Lithographic Technologies II, at Santa Clara, California, Feb. 23-25, 1998 SPIE Proceedings Series, vol. 3331, pp. 42-51. |
*“Ni/B4C Graded Multilayers for X-ray Applications,” by Morawe, et al., (English language abstract distributed at Workshop on Nanometer-scale Methods in X-ray Technology (NSMXT), Oct. 6-9, 1997, Costa da Caparica, Portugal.). |
*“Design and Performance of Graded Multilayers as Focusing Elements for X-ray Optics,” Morawe, et al., Review of Scientific Instruments, vol. 70, No. 8 Aug. 1999, pp. 3227-3232. |