The technical field of the invention is the characterization of an object by irradiation using a source of x-rays or gamma radiation and the formation of a spectral image from radiation transmitted by the object.
The characterization of objects by irradiation using ionizing electromagnetic radiation, for example x-ray or gamma radiation, allows the nature of the materials from which this object is composed to be estimated. It is common to form an image representative of the attenuation of the radiation by the object. This image allows a two-dimensional characterization to be carried out.
Such a characterization may be carried out for the purposes of medical diagnosis, nondestructive testing in the industrial field, or even the detection of dangerous or illicit materials, for example in walk-through security scanners, such as those found in airports, or in the inspection of luggage.
The emergence of spatially and spectrally resolved detectors has allowed the performance of these characterizations to be substantially improved. This type of detector allows a spectral image of the attenuation of the analyzed object to be formed. By spectral image, what is meant is an image in various energy channels. A spectral image comprises various pixels. With each pixel is associated a spectrum of the radiation detected by the detector. This spectrum comprises a plurality of channels, each channel being representative of one energy band. Such a spectrum may comprise tens or even hundreds of channels.
The publication Alvarez R “Near optimal energy selective x-ray imaging system performance with simple detectors”, Med. Phys. 37 (2), February 2010 describes a characterization of an object by formation of a spectrum representing an attenuation of ionizing radiation by the object. This publication describes a linear decomposition of the attenuation, in a basis composed of the attenuation of known materials. By attenuation of an object, what is meant is the attenuation, of radiation such as defined above, by the object. For example, when an object 20 to be characterized is provided, the spectral attenuation function att20 of the analysed object may be approximated by a linear combination of spectral attenuation functions of known materials mat1 and mat2 according to the following expression:
att
20
≈L
1μ1+L2μ2 (1)
where:
The spectral attenuation of the object att20 is obtained from the spectrum of the radiation detected by the detector,
S0 being a spectrum of the radiation detected by the detector in the absence of object placed between the radiation source and the detector.
From the measurement of the spectrum S, the object may be characterized by an estimation of the equivalent thicknesses L1 and L2. The advantage of this is that spectral information on the attenuation of an object is obtained in at least two energy channels, allowing the equivalent thicknesses L1 and L2 to be determined. To do so, the attenuation att20 of the object must be measured in at least two energy channels. Document EP3106864 proposes a method for estimating the equivalent thicknesses L1 and L2, this method being based on an approach of maximum-likelihood type.
By forming a spectral image of the object, i.e. a spatial distribution of spectra of the radiation attenuated by the object, it is possible to obtain equivalent thicknesses with various pixels, each pixel corresponding to one portion of the object.
The inventors desired to improve the existing methods by allowing an object to be characterized via a determination of equivalent thicknesses while requiring a lesser irradiation of the examined object.
A first subject of the invention is a method for characterizing an object, comprising the following steps:
With each pixel is associated one portion of the object, said portion being seen by the pixel, i.e. being placed in a solid angle in which the pixel sees the object. By structural parameter of the object in a pixel, what is meant is a structural parameter of that portion of the object which is associated with the pixel. Likewise, by equivalent thickness in a pixel, what is meant is the equivalent thickness of that portion of the object which is associated with the pixel.
According to one embodiment, step d) and/or step g) comprise(s), for each pixel, taking into account calibration spectra, each calibration spectrum being associated with a thickness of each basic material. Step d) and/or step g) may also comprise, for each pixel:
A calibration spectrum may be a spectrum measured or modelled by replacing the object with a calibration object, the calibration object being formed from a thickness of at least one calibration material. The method assumes recourse is made to various calibration spectra, respectively corresponding to different thicknesses of at least two different calibration materials. The calibration materials may correspond to the basic materials.
Steps d) and g) may comprise a step of changing basis, between a start basis, formed by the calibration materials, and an end basis, formed by the basic materials representative of the object, or considered to be representative of the object, so as to obtain an equivalent thickness of each material of the end basis. Thus, from equivalent thicknesses of each calibration material, forming the start basis, an equivalent thickness of each material forming the end basis is obtained. The materials forming the end basis may for example be physiological materials, for example a tissue, or a certain type of tissue, or bone. The change of basis may be established by taking into account a change of basis matrix.
Step d) may comprise:
In step e), for each pixel, the structural parameter may be a thickness of that portion of the object which is associated with the pixel.
In step e), for each pixel, the structural parameter may also represent a composition of that portion of the object which is associated with the pixel. In this case, the structural parameter, determined in each pixel, may:
Step h) may comprise a characterization of the various portions of the object respectively associated with various pixels. The characterization may comprise:
In step b), the detector may be moved with respect to the object or the object may be moved with respect to the detector. The radiation source may be moved with respect to the object or with respect to the detector.
A second subject of the invention is a device for characterizing an object, comprising:
Other advantages and features will become more clearly apparent from the following description of particular embodiments of the invention, which embodiments are given by way of nonlimiting example, and shown in the figures listed below.
The radiation source 10 is configured to emit ionizing electromagnetic radiation 12, called the incident radiation, toward the object 20, the latter being interposed between the radiation source 10 and the detector 30. The detector 30 may comprise elementary detectors 30i taking the form of pixels 30i arranged in a plane, called the detection plane P. The index i designates the coordinates of each pixel in the detection plane. The pixels may be arranged in a line but in general, they are arranged in a two-dimensional regular matrix array.
The object 20 may be a living biological tissue, for example one portion of the body of an animal or a human being. The device 1 is then a medical imaging device or a walk-through airport security detector. The object may also be an industrial part or a piece of luggage, the device then being used for the purposes of nondestructive testing or inspection. In the example that follows, the device 1 is a walk-through airport security detector, intended to detect the presence of illicit substances.
The term ionizing electromagnetic radiation designates electromagnetic radiation consisting of photons of energy higher than 1 keV, and preferably lower than 5 MeV. The energy range of the ionizing radiation may be comprised between 1 keV and 2 MeV, but it most often lies between 1 keV and 150 keV or 300 keV. The ionizing radiation may be X-ray or y radiation. Preferably, the radiation source 10 is polyenergetic, the incident radiation being emitted in an energy range generally extending over several tens or even hundred keV. It is notably a question of an x-ray tube.
The object 20 irradiated by the source 10 transmits, to the detector 30, radiation 14, called transmitted radiation, or attenuated radiation, the latter reaching the pixels 30i. Each pixel 30i is an elementary spectrometric detector comprising:
The characterizing device 1 also comprises a processing unit 40 allowing the processing operations described below to be implemented. The processing unit 40 may comprise a microprocessor and/or electronic microcontrollers.
Under the effect of the irradiation by the incident radiation 12, the object 20 transmits radiation 14, called transmitted radiation, to the detector 30. Each pixel 30i forms an energy spectrum Si of the transmitted radiation 14.
The term energy spectrum Si corresponds to a histogram of the amplitude of the signals detected in the acquisition period of the spectrum. A relationship between the amplitude A and the energy E may be obtained via an energy calibration function g such that E=g (A), according to principles known to those skilled in the art. An energy spectrum Si is therefore a vector, each term Si(k) of which represents an amount of radiation detected by the pixel 30i in an energy range Ek±δE/2, with δE being the spectral width of each channel k. k designates the rank of the channel, with 1<k≤K, K designating the number of channels of the spectrum.
Thus, whatever the embodiment, during the irradiation of the object 20, spectra are acquired in various pixels 30i, each pixel 30i corresponding to one portion 20i of the object, which portion is associated with the pixel. Thus, a spectral image of the object, each pixel of which is a spectrum of radiation transmitted by that portion 20i of the object 20 which is associated with the pixel 30i, is obtained. By that portion 20i of the object which is associated with the pixel 30i, what is meant is that portion, of the object, which is seen by the pixel, i.e. that portion which is located in a field of view of the pixel, and therefore placed in a solid angle in which the pixel 30i sees the object 20. That portion 20i of the object which is associated with a pixel 30i is generally located in alignment between the radiation source 10 and the pixel 30i.
The object 20 may be replaced by a calibration object, composed of one or more basic materials, the nature and thickness of which are known. Such a calibration object is shown in
The calibration spectra together form a calibration base. The calibration base may be completed by interpolations so as to take into account thicknesses of basic materials not available in the calibration of objects.
The main steps of a method for characterizing an object 20 will now be described with reference to
Step 100: irradiating the object. The object 20 is irradiated by the radiation source 10.
Step 110: acquiring spectra Si of the radiation transmitted by the object 30, with various pixels 30i of the detector 30. Each pixel 30i is associated with one portion 20i of the object. Two different pixels are respectively associated with two different portions of the object 20.
Step 115: grouping pixels. This step is optional. With each pixel 30i is associated a group of pixels Gj. The group of pixels Gj with which the pixel 30i is associated is formed by pixels adjacent to the pixel 30i. When the detector is a two-dimensional matrix array of pixels, it is possible to form J groups of pixels Gj. Each group of pixels for example comprises 5×5 pixels, or 10×10 pixels. The spectra Si acquired by the pixels of a given group of pixels Gj may be added, so as to form a spectrum Sj representative of the group of pixels. This operation corresponds to a binning operation. This allows a spectrum Sj having a better signal-to-noise ratio than the spectrum Si formed by each elementary pixel to be formed. In contrast, spatial resolution is degraded. At the end of this step, the spectrum Si associated with each pixel 30i of a given group of pixels Gj is replaced by the spectrum Si established for the group of pixels Gj.
Step 120: decomposing the attenuation into a basis of materials.
This step comprises a decomposition of the attenuation atti into a basis of calibration materials. As explained with reference to expression (1), this amounts to estimating, for each pixel 30i, a pair of equivalent thicknesses ({circumflex over (L)}i,1,{circumflex over (L)}i,2), such that:
att
i
≈{circumflex over (L)}
i,1μ1+{circumflex over (L)}i,2μ2 (2).
More generally, when the spectra Si are defined in K channels, K being an integer higher than or equal to 2, the attenuation may be decomposed into a number M of thicknesses, {circumflex over (L)}i,m=1 . . . {circumflex over (L)}i,m=M, called equivalent thicknesses, of M different calibration materials, with M≤K. M designates the number of calibration materials in question. The method then comprises estimating M equivalent thicknesses {circumflex over (L)}i,m with atti≈Σm=1M{circumflex over (L)}i,mμm (3) where μm, is a linear attenuation spectral function of the calibration material matm.
When a spectrum Sj is acquired with identical acquisition parameters to each calibration spectrum Scal, the equivalent thicknesses corresponding to the acquired spectrum Si may be obtained by identifying the spectrum of the calibration base closest to the acquired spectrum. By identical acquisition parameters, what is meant is: same radiation source, same detector, same acquisition duration, same distances between the radiation source and the object and between the object and the detector.
The equivalent thicknesses may be estimated using the method described in document EP3106864, and more precisely between paragraphs [0060] and [0081] of this document. If Scal(L1 . . . LM) designates a spectrum of the calibration base, obtained using a calibration object comprising respectively thicknesses L1 . . . LM of basic materials mat1 . . . matM, it is possible to define, for each spectrum Si, a likelihood function Vi such that:
ln(Vi(Si,Scal(L1. . . LM)))=(−Σk=1KScal(L1 . . . LM)+Σk=1K(Si×ln(Scal(L1 . . . LM)))) (4)
The equivalent thicknesses {circumflex over (L)}i,m=1 . . . {circumflex over (L)}i,m . . . Li,m=M corresponding to the spectrum Si measured by each pixel 30i are those maximizing the likelihood function. Thus,
{circumflex over (L)}
i,m=1
. . . {circumflex over (L)}
i,m=M=argmax(ln(Vi(Si,Scal(L1. . . LM)))) (5)
and
S0 being a spectrum of the radiation detected by the detector 30 in the absence of an object placed between the radiation source 10 and the detector 30.
According to expression (6), the attenuation atti corresponding to the spectrum Spi measured by each pixel 30i may be decomposed into a basis of calibration materials mat1 . . . matM, the attenuation being able to be likened to a sum of the linear attenuations of each material of the calibration base, weighted by the equivalent thicknesses respectively associated with each basic material.
Step 125 Changing basis.
The equivalent thicknesses established in step 120 are respectively associated with basic materials mat1 . . . matM used in the calibration, i.e. with calibration materials. The basic materials used during the calibration form a start basis. It is possible to carry out a change of basis, so that the spectrum is expressed as a function of basic materials from which the object is liable to be composed. For example, when the analyzed object is a body of an animal or an individual, the basic materials may be materials mat′1 . . . mat′M representative of physiological elements, for example bone or tissues. The equivalent thicknesses {circumflex over (L)}i,m=1 . . . {circumflex over (L)}i,m . . . {circumflex over (L)}i,m=M expressed in the start basis mat1 . . . matm . . . matM may be expressed in an end basis mat′1 . . . mat′m . . . mat′M. The change of basis is obtained via:
where {circumflex over (L)}i,m=1 . . . {circumflex over (L)}i,m=M are the equivalent thicknesses in the end basis mat′1 . . . mat′m . . . mat′M and T is a change of basis matrix, of (M,M) size.
The matrix T may be obtained knowing the linear attenuation spectral functions of each basic material. Let Y be a matrix of the linear attenuation spectral functions of the start basic materials mat1 . . . matM, and Z a matrix of the linear attenuation spectral functions of the materials of the end basis mat′1 . . . mat′M.
Y and Z are matrices of (K,M) size and T is a change of basis matrix of (M,M) size and. designates the matrix product.
The change of basis matrix T may be determined via a method of the least squares type, such that: T=Z*·Y (9) where Z* is the pseudo inverse of Z: Z*=(Zt·Z)−1·Zt (10) and where t designates the transpose operator.
From a start basis, composed of the materials polypropylene and PVC, it is possible to express the equivalent thicknesses in an end basis composed of soft tissues and bone, by implementing equation (8) and using a change of basis matrix T such that:
Step 125 is optional. The following steps may be implemented using the equivalent thicknesses in the start basis, i.e. in the basis formed by the calibration materials, or in the end basis, comprising materials different from the calibration materials, and which are more representative of the observed object.
An implementation of steps 100 to 125 has been simulated using a phantom simulating a thorax and an abdomen of an individual, into which capsules of narcotics were inserted. The simulated capsules contained pure cocaine (C17H21NO4) mixed with an adulterant (C11H12N2S). The fractions by weight of pure cocaine and of adulterant were 50% and 50%. The targeted application was the detection of the presence of narcotics carried by an individual, via an inspection of the type carried out with a walk-through airport security detector.
For each pixel 30i, the spectrum Si of the radiation 14 attenuated by the object was simulated. The spectrum Si was representative of the attenuation atti of a portion 20i of the object, which portion was associated with one pixel. Each pixel 30i was grouped with others so as to form groups of 10×10 pixels. The spectrum Si of each pixel was replaced by a sum of the spectra of the groups of pixels comprising said pixel. The attenuation atti corresponding to each spectrum Si was then decomposed using a basis of calibration materials formed from PVC and from polypropylene, so as to estimate equivalent thicknesses {circumflex over (L)}i,1,{circumflex over (L)}i,2 for each pixel 30i. A change of basis was then carried out, so as to obtain the equivalent thicknesses {circumflex over (L)}′i,1,{circumflex over (L)}′i,2 of tissue and of bone.
Step 130. Calculating a structural parameter of the object.
In this step, the equivalent thicknesses resulting from step 120 or step 125 are combined, in each pixel, so as to calculate, in each pixel 30i, a structural parameter Pi of the object. More precisely, it is a question of combining the thicknesses {circumflex over (L)}i,1 . . . {circumflex over (L)}i,m . . . {circumflex over (L)}i,M,{circumflex over (L)}′i,1 . . . {circumflex over (L)}′i,m . . . {circumflex over (L)}′i,M, determined in each pixel 30i, in order to calculate a structural parameter of that portion of the object 20i which is associated with the pixel.
The structural parameter Pi may be a dimension of the object, for example a thickness, or a composition of the object. The structural parameter Pi is a function ƒ of the thicknesses determined beforehand. Thus, Pi=ƒ({circumflex over (L)}i,1 . . . {circumflex over (L)}i,M) (11) or Pi=ƒ({circumflex over (L)}′i,1 . . . {circumflex over (L)}i,M) (11′).
In a first example, the structural parameter is a thickness of the object. In this example, the parameter Pi calculated, in each pixel 30i, is a sum of the thicknesses resulting from step 120 or 125. For example, Pi=Σm=1m=M{circumflex over (L)}i,m (12) where Pi=Σm=1m=M{circumflex over (L)}′i,m (12′). In this example, the parameter Pi is the thickness of that portion 20i of the object which is associated with the pixel 30i.
At the end of step 130, a spatial mesh of the structural parameter Pi is achieved, the latter being calculated for each pixel and for each group of pixels.
Step 140: spatially smoothing the structural parameter of the object
In this step, the structural parameter Pi of the object, determined in each pixel in step 130, undergoes spatial smoothing. The underlying idea is that the structure of the examined object does not undergo abrupt variations, and that two parameters determined respectively for two adjacent pixels, i.e. for two adjacent portions of the object, will not vary discontinuously. Such an assumption is particularly relevant when the structural parameter is the thickness of the object, the object being a part of an animal or an individual. Step 140 is a spatial smoothing of the mesh of the structural parameter Pi resulting from step 130, so as to obtain, for each pixel, a smoothed structural parameter Pi*. Such spatial smoothing may be carried out by implementing smoothing filters known to those skilled in the art, for example a Gaussian filter, a median filter or a Savitzky-Golay filter.
At the end of step 140, a spatial mesh of a smoothed structural parameter Pi is obtained, the latter being calculated for each pixel 30i, i.e. for each portion 20i of the object respectively associated with one pixel.
Step 150: decomposing a second time into a basis of materials.
This step is similar to step 120. However, whereas step 120 is implemented without a priori, step 150 is carried out using the value of the smoothed structural parameter Pi* determined in each pixel. In step 150, the equivalent thicknesses {circumflex over (L)}i,m=1|Pi* . . . {circumflex over (L)}i,m|Pi* . . . {circumflex over (L)}i,m=M|Pi* corresponding to the spectrum Si are determined, as described with reference to step 120. However, and this is an important element of the invention, the value, for each pixel 30i, of the smoothed structural parameter Pi*, is taken into account, said value relating the corresponding equivalent thicknesses {circumflex over (L)}i,m=1|Pi* . . . {circumflex over (L)}i,m|Pi* . . . {circumflex over (L)}i,m=M|Pi* to the pixel in question. The notation {circumflex over (L)}i,m|Pi* designates an equivalent thickness {circumflex over (L)}i,m knowing the smoothed structural parameter. When the structural parameter in question is the thickness of the object, the equivalent thicknesses {circumflex over (L)}i,m=1|Pi* . . . {circumflex over (L)}i,m|Pi* . . . {circumflex over (L)}i,m=M|Pi* are each estimated knowing that Σm=1m=M{circumflex over (L)}i,m=Pi*. It is therefore a question of a constrained estimation, the estimated quantities being such that ƒ({circumflex over (L)}i,1 . . . {circumflex over (L)}i,M)=Pi*.
When the equivalent thicknesses are estimated by maximizing a likelihood function, expression (5) is replaced by:
{circumflex over (L)}
i,m=1
|P
i
* . . . {circumflex over (L)}
i,m=M
|P
i*=argmax(ln(Vi(Si,Scal(L1. . . LM)))−λg(ƒ(L1. . . LM),Pi*)) (15)
where:
At the end of step 150, thicknesses {circumflex over (L)}i,m=1|Pi* . . . {circumflex over (L)}i,m=M|Pi*, which are said to be regularized by the smoothed parameter Pi* , are obtained for each pixel 30i. The regularized thicknesses are calculated for each pixel. However, unlike the prior art, because the smoothed parameter Pi* is taken into account, the regularized thicknesses take into account the structure of the object.
Step 155: changing basis.
From the equivalent thicknesses {circumflex over (L)}i,m=1|Pi* . . . {circumflex over (L)}i,m=M|Pi* in the basis of the calibration materials, it is possible to obtain equivalent thicknesses {circumflex over (L)}′i,m=1|Pi* . . . {circumflex over (L)}′i,m=M|Pi* in another basis, by applying expression (8) described with reference to step 125. This step is optional.
Step 160: characterizing the object.
From the regularized equivalent thicknesses output from step 150 or step 155, it is possible to characterize the object 20. The characterization may be carried out directly from the equivalent thicknesses {circumflex over (L)}i,m=1|Pi* . . . {circumflex over (L)}i,m=M|Pi* or {circumflex over (L)}′i,m=1|Pi* . . . {circumflex over (L)}′i,m=M|Pi*.
In the illustrated example, the characterization of the object may be established from
Thus, it is possible to characterize the object 20 directly from an image representing regularized equivalent thicknesses, i.e. the thicknesses obtained in step 150 or 155.
From the regularized equivalent thicknesses, it is possible to estimate an effective atomic number of the various portions 20i of the object 20. The effective atomic number Zeff has for example been described in document EP3084406. It is applicable to a chemical compound, and corresponds to a combination of the atomic numbers of the simple bodies from which the compound is formed, each atomic number being assigned a weighting coefficient dependent on the atomic or mass fraction of the simple body in the compound. It is possible to estimate effective atomic number from the regularized equivalent thicknesses, output from step 150 or 155, using the expression:
where:
p=3;
Zeffm is the effective atomic number of each basic material matm; and
ρm is the density of the basic material matm.
where:
p=3;
Z′effm is the effective atomic number of each basic material mat′m; and
ρ′m is the density of the basic material mat′m.
From
From
In the above examples, the structural parameter Pi determined in step 130 and smoothed in step 140 was the thickness of the analyzed object, or more precisely the thickness of the portions 20i of the object respectively associated with each pixel 30i.
In another example, the structural parameter Pi relates to the composition of the object. It may be a question of the effective atomic number Zeff,i, the latter being obtained from the regularized equivalent thicknesses using expression (16) or (16′). It may also be a question of a relative proportion of one basic material relative to all of the basic materials. For example, the parameter Pi may be a ratio of the regularized equivalent thickness {circumflex over (L)}1,i corresponding to the first basic material, to a sum of the regularized equivalent thicknesses corresponding to all of the basic materials matm. Thus,
Such a parameter may for example be used to rapidly sort objects depending on their composition. One application may be to sorting waste, depending on the presence or absence of additives, or to sorting metal parts. For example, the metal parts may be made of aluminum alloys, which it is desired to sort depending on the presence of particular alloying elements, for example depending on the presence of copper or zinc. In these applications, the presence of particular alloying elements, or additives, leads to a variation in the structural parameter, such as defined by expressions (16), (16′) or (17).
The invention allows sorting requiring low irradiation to be carried out, this limiting the duration of the inspection and allowing the rate at which sorting is carried out to be increased.
Whatever the targeted application, the invention allows an object to be characterized while requiring a lower exposure of the latter with respect to the prior art. The invention will possibly be implemented in medical applications, for example for the purpose of assisting with diagnosis, or in applications related to nondestructive testing.
Number | Date | Country | Kind |
---|---|---|---|
18 55616 | Jun 2018 | FR | national |