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5498293 | Ilardi et al. | Mar 1996 | A |
5637151 | Schulz | Jun 1997 | A |
5806126 | de Larios et al. | Sep 1998 | A |
5858109 | Hymes et al. | Jan 1999 | A |
5868863 | Hymes et al. | Feb 1999 | A |
5911835 | Lee et al. | Jun 1999 | A |
5981454 | Small | Nov 1999 | A |
6093254 | Svirchevski et al. | Jul 2000 | A |
Number | Date | Country |
---|---|---|
WO 9806127 | Dec 1998 | DE |
63-4617 | Sep 1988 | EP |
812011 | Oct 1997 | EP |
95 08510 | Jul 1995 | FR |
07166373 | Jun 1995 | JP |
WO 9713590 | Apr 1997 | WO |
WO 9946353 | Sep 1999 | WO |
Entry |
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Elbel, Wang, Sanger, Hadawi and Held, “Copper Post-CMP Brush Cleaning”, 1999 EEE Siemens AG, 81739 Munich, Germany, Cabot Corp., Aurora, IL 60504. |