Claims
- 1. A method of washing substrates, said method comprising:rotating a first pair of rollers in opposite directions; rotating a second pair of rollers in opposite directions; loading a substrate between said first pair of rollers and between said second pair of rollers, wherein said first pair of rollers presses against opposing surfaces of said substrate and said second pair of rollers also presses against said opposing surfaces of said substrate; rotating said substrate in the plane of said substrate with said first pair of rollers; and scrubbing said opposing surfaces of said substrate with said second pair of rollers.
- 2. The method of claim 1, wherein loading said substrate comprises:lifting said substrate to said first pair of rollers and to said second pair of rollers; and pulling said substrate into position between said first pair of rollers and between said second pair of rollers with the outside diameter of said substrate pressed against at least one orthogonally positioned roller, wherein the rotation of said first pair of rollers and of said second pair of rollers pulls said substrate into position.
- 3. The method of claim 2, further comprising unloading said substrate from between said first pair of rollers and between said second pair of rollers wherein unloading comprises:pushing said substrate from between said first pair of rollers and between said second pair of rollers by reversing the direction of rotation of said first pair of rollers and of said second pair of rollers; lowering said substrate from said first pair of rollers and from said second pair of rollers.
- 4. The method of claim 1, further comprising unloading said substrate from between said first pair of rollers and between said second pair of rollers by separating at least two orthogonally positioned rollers that are in contact with the outside diameter of said substrate while continuing to rotate said first pair of rollers in said opposite directions and continuing to rotate said second pair of rollers in said opposite directions.
- 5. The method of claim 1, further comprising controlling the rate of rotation of said substrate in the plane of said substrate.
- 6. The method of claim 5, wherein controlling the rate of rotation of said substrate comprises adjusting the pressure on said substrate applied by at least one of said first pair of rollers and said second pair of rollers.
- 7. The method of claim 5, wherein controlling the rate of rotation of said substrate comprises altering the rate of rotation of at least one of said first pair of rollers and said second pair of rollers.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a divisional of U.S. patent application Ser. No. 09/556,813, filed Apr. 21, 2000, now U.S. Pat. No. 6,438,781 entitled “Washer for Cleaning Substrates”.
US Referenced Citations (14)