Claims
- 1. Process for coating foil comprised of nickel or a nickel alloy, by sputtering a film of a metal compound onto the foil in a vacuum in the area of at least one side of the foil, whereinthe foil is treated in an argon plasma at a pressure of 10−3 to 10−2 mbar, for an adjustable time and with an adjustable rate and energy of the ions of the plasma, a chromium oxide film is sputtered on by reactive magnetron sputtering of at least one target made from chromium or a chromium-containing alloy using at least one sputtering source in an argon-oxygen mixture at a pressure of 10−3 to 10−2 mbar, the operating point being kept constant within defined limits, the foil is connected in defined thermal contact to a heat buffer during the coating, and the coating of the foil continues until a predetermined interference colour with an interference of the first or second order is reached.
- 2. Process according to claim 1, wherein medium-frequency-pulsed energy is fed to at least one sputtering source in order to effect the reactive magnetron sputtering.
- 3. Process according to claim 1, wherein the foil is moved relative to the at least one sputtering source during the coating, and in that on at least three occasions during the coating the foil is situated in the region of the particles which are sputtered using a sputtering source.
- 4. Process according to claim 3, wherein the foil is moved linearly and periodically relative to the at least one sputtering source.
- 5. Process according to claim 1, wherein the foil is connected to the heat buffer using magnetic means while the process is being carried out.
- 6. Process according to claim 1, wherein the operating point of a reactive sputtering process carried out using a sputtering source is kept constant by measuring the optical emission of the plasma in the vicinity of this sputtering source.
- 7. Process according to claim 1, wherein the operating point of a reactive sputtering process carried out using a sputtering source is kept constant by measuring an electrical characteristic of the magnetron discharge from this sputtering source.
- 8. Process according to claim 1, wherein the foil is produced by electrodeposition.
- 9. Razor foil having apertures comprising electrodeposited nickel or a nickel alloy coated on the area of at least one side with a vacuum sputtered film of a metal compound wherein the film consists of an oxide of chromium or an oxide of chromium-containing alloy, having a thickness in the range of 20-300 nm.
Priority Claims (1)
| Number |
Date |
Country |
Kind |
| 198 00 758 |
Jan 1998 |
DE |
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Parent Case Info
This application is a continuation International Application No. PCT/NL99/00013, filed on Jan. 11, 1999, and which designated the U.S.
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| Number |
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|
1888159 |
Campbell |
Aug 1932 |
A |
|
3754329 |
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Aug 1973 |
A |
|
4022947 |
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May 1977 |
A |
|
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Aug 1996 |
A |
Foreign Referenced Citations (1)
| Number |
Date |
Country |
| 44 33 863 |
Mar 1996 |
DE |
Non-Patent Literature Citations (1)
| Entry |
| Fan, J.C.C.: “Selective-Black Absorbers Using Sputtered Cement Films” International Conference on Metallurgical Coatings. San Francisco, CA, USA. Apr. 3-7, 1978. vol. 54, No. 2, pp. 139-148. |
Continuations (1)
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Number |
Date |
Country |
| Parent |
PCT/NL99/00013 |
Jan 1999 |
US |
| Child |
09/607632 |
|
US |