1. Field of the Invention
The present invention relates to a method for forming a groove on a surface of a flat plate formed of a nitride semiconductor crystal.
2. Description of the Related Art
The present invention is a method for forming a groove on a surface of a flat plate formed of a nitride semiconductor crystal having an A-axis, a C-axis, and an M-axis, the method comprising:
(a) moving a disk-shaped dicing blade along a direction of the A-axis to form a first inclined surface and a second inclined surface on the surface of the flat plate, wherein
the flat plate has a principal surface;
the disk-shaped dicing blade has an edge along the circumference thereof;
the edge is in contact with the flat plate;
the following mathematical formulae (I), (II), and (III) are satisfied:
45 degrees≦θb−a≦60 degrees (I)
45 degrees≦θb+a≦60 degrees (II)
0 degrees≦|a|≦7.5 degrees (III)
where
the angle θb represents an angle formed between a surface of the edge and a radial direction of the disk-shaped dicing blade in a cross-section which includes the M-axis and the C-axis;
the angle a represents an angle formed between the principal surface and the M-axis; and
each of the first inclined surface and the second inclined surface has an arithmetical mean deviation Ra of not less than 0.046 and not more than 0.131.
The present invention provides a novel method for forming a groove composed of two smooth inclined surfaces on a surface of a flat plate formed of a nitride semiconductor crystal.
An embodiment of the present invention is described below with reference to the drawings.
As shown in
The flat plate 1 is formed of a nitride semiconductor crystal. As well known, the flat plate 1 formed of a nitride semiconductor crystal has an A-axis, an M axis and a C-axis. These three axes are perpendicular to each other. Desirably, the nitride semiconductor crystal is formed of a monocrystalline nitride semiconductor. Desirably, the flat plate 1 has a thickness of not less than 30 micrometers and not more than 1,000 micrometers.
The nitride semiconductor is represented by a chemical formula AlxGayInzN (x+y+z=1, x≧0, y>0 and z≧0). Desirably, the nitride semiconductor is formed of GaN.
The flat plate 1 has a principal plane 1a. In other words, the principal plane 1a is the surface of the flat plate 1. The referential sign P included in
As shown in
As shown in
While the edge 31 is in contact with the flat plate 1, such a dicing blade 30 is moved along the direction of the A-axis. Desirably, the rotary speed of the dicing blade 30 is not more than 5,000 rpm and 40,000 rpm. Thus, as shown in
Desirably, the dicing blade 30 has a one hundred or more times greater diameter than the depth of the groove 20.
In the present embodiment, the following mathematical formulae (I)-(III) are satisfied.
45 degrees≦θb−a≦60 degrees (I)
45 degrees≦θb+a≦60 degrees (II)
0 degrees≦|a|≦7.5 degrees (III)
For example, in a case where the angle a is 0 degrees, namely, in a case where the normal direction P of the principal surface 1a is identical to the M-axis, the angle θb is not less than 45 degrees and not more than 60 degrees. In this case, the first inclined surface 21a and the second inclined surface 21b are symmetrical with respect to the plane which includes the M-axis and the A-axis. For this reason, as demonstrated in the examples 1-2, the surface of the first inclined surface 21a is similar to the surface of the second inclined surface 21b.
For example, in a case where the angle a is 3 degrees, the angle θb is not less than 48 degrees and not more than 57 degrees.
For example, in a case where the angle a is 5 degrees, the angle θb is not less than 50 degrees and not more than 55 degrees.
For example, in a case where the angle a is 7 degrees, the angle θb is not less than 52 degrees and not more than 53 degrees.
For example, in a case where the angle a is 7.5 degrees, the angle θb is 52.5 degrees. In this case, the first inclined surface 21a is similar to the first surface 21a or the second surface 21b which appears in a case where the angles a and θb are 0 and 60 degrees respectively. The second inclined surface 21b is similar to the first surface 21a or the second surface 21b which appears in a case where the angles a and θb are 0 and 45 degrees respectively. In other words, the surfaces shown in
The first inclined surface 21a and second inclined surface 21b formed according to the present embodiment have a high smoothness. More specifically, it is desirable that arithmetical mean deviation Ra is not more than 0.131. The smoothness of the first inclined surface 21a and the second inclined surface 21b is improved with a decrease in the arithmetical mean deviation Ra.
The arithmetical mean deviation Ra is the arithmetic mean of the absolute values of distances from the mean line to the surface roughness profile. Also see Japanese Industrial Standards B 0601.
The value of Ra is represented by the following formula (IV):
where, L: Evaluation length, and f (x): Surface roughness profile.
See
The value of Ra may be measured with a surface roughness measuring apparatus. The surface roughness measuring apparatus is available from Taylor Hobson company, as trade name “CCI Lite”.
The surface roughness profile is a profile obtained by measuring the projection-and-recess shape of the surface of the object using a surface roughness measuring apparatus.
For more detail of the arithmetical mean roughness, see the following home page: http://www.ns-tool.com/technology/technology—06.html.
In case where any one of the mathematical formulae (I)-(III) is not satisfied, the smoothness of the first inclined surface 21a and the second inclined surface 21b fails to be increased, even if the dicing blade 30 is moved along the direction of the A-axis. See the comparative example 1 (
In case where the dicing blade 30 is moved along the direction other than the A-axis, for example, along the direction of the C-axis, the smoothness of the first inclined surface 21a and the second inclined surface 21b fails to be increased, even if the mathematical formulae (I)-(III) are satisfied. See the comparative examples 2-4 (
The present invention is described in greater detail with reference to the examples described below.
A GaN monocrystalline substrate 1 having a principal plane of an m-plane was prepared. This GaN monocrystalline substrate 1 had a thickness of 100 micrometers. Since the GaN monocrystalline substrate 1 had a principal plane of an m-plane, the angle a was equal to 0 degrees.
Then, a dicing blade 30 having a diameter of 2 inches was prepared. The angle θb was 60 degrees.
The prepared GaN monocrystalline substrate 1 was fixed on a Si substrate (not shown) using an electron wax. Then, the rotary shaft 32 was set so that the longitudinal of the rotary shaft 32 was parallel to the C-axis. The dicing blade 30 was brought into contact with the GaN monocrystalline substrate 1. Then, the dicing blade 30 was moved along the A-axis. Thus, as shown in
The arithmetical mean deviations Ra of the first inclined surface 21a and the second inclined surface 21a was measured with a laser microscope (product of Keyence Corporation, Model number: VK-9700). As a result, the arithmetical mean deviation Ra was 0.131.
The experiment similar to the example 1 was conducted, except that the angle θb was 45 degrees.
The experiment similar to the example 1 was conducted, except that the angle θb was 30 degrees.
The experiment similar to the example 1 was conducted, except that the dicing blade 30 was moved along the direction of the C-axis.
The experiment similar to the example 1 was conducted, except that the angle θb was 45 degrees and except that the dicing blade 30 was moved along the direction of the C-axis.
The experiment similar to the example 1 was conducted, except that the angle θb was 30 degrees and except that the dicing blade 30 was moved along the direction of the C-axis.
Table 2 shows arithmetical mean deviations Ra measured in the examples and the comparative examples.
As is clear from
On the contrary, as is clear from
As is clear from
The present invention can be used for a fabrication of a semiconductor device.
Number | Date | Country | Kind |
---|---|---|---|
2013-124363 | Jun 2013 | JP | national |
Number | Name | Date | Kind |
---|---|---|---|
8546163 | Yoshizumi et al. | Oct 2013 | B2 |
20040198056 | Suzuki | Oct 2004 | A1 |
20100181681 | Akiba et al. | Jul 2010 | A1 |
20130146928 | Inoue et al. | Jun 2013 | A1 |
Number | Date | Country |
---|---|---|
2013-038208 | Feb 2013 | JP |
2012137406 | Oct 2012 | WO |
Number | Date | Country | |
---|---|---|---|
20140370685 A1 | Dec 2014 | US |