The present invention relates to a method for forming an anodized layer, a method for manufacturing a mold, and a mold. In this specification, the “mold” includes molds that are for use in various processing methods (stamping and casting), and is sometimes referred to as a stamper. The mold can also be used for printing (including nanoprinting).
Display devices for use in TVs, cell phones, etc., and optical elements, such as camera lenses, etc., usually adopt an antireflection technique in order to reduce the surface reflection and increase the amount of light transmitted therethrough. This is because, when light is transmitted through the interface between media of different refractive indices, e.g., when light is incident on the interface between air and glass, the amount of transmitted light decreases due to, for example, Fresnel reflection, thus deteriorating the visibility.
An antireflection technique which has been receiving attention in recent years is forming over a substrate surface a very small uneven pattern in which the interval of recessed portions or raised portions is not more than the wavelength of visible light (λ=380 nm to 780 nm). See Patent Documents 1 to 4. The two-dimensional size of a raised portion of an uneven pattern which performs an antireflection function is not less than 10 nm and less than 500 nm.
This method utilizes the principles of a so-called motheye structure. The refractive index for light that is incident on the substrate is continuously changed along the depth direction of the recessed portions or raised portions, from the refractive index of a medium on which the light is incident to the refractive index of the substrate, whereby reflection of a wavelength band that is subject to antireflection is prevented.
The motheye structure is advantageous in that it is capable of performing an antireflection function with small incident angle dependence over a wide wavelength band, as well as that it is applicable to a number of materials, and that an uneven pattern can be directly formed in a substrate. As such, a high-performance antireflection film (or antireflection surface) can be provided at a low cost.
As the method for forming a motheye structure, using an anodized porous alumina layer which is obtained by means of anodization (or “anodic oxidation”) of aluminum has been receiving attention (Patent Documents 2 to 4).
Now, the anodized porous alumina layer which is obtained by means of anodization of aluminum is briefly described. Conventionally, a method for forming a porous structure by means of anodization has been receiving attention as a simple method for making nanometer-scale micropores (very small recessed portions) in the shape of a circular column in a regular arrangement. An aluminum base is immersed in an acidic electrolytic solution of sulfuric acid, oxalic acid, phosphoric acid, or the like, or an alkaline electrolytic solution, and this is used as an anode in application of a voltage, which causes oxidation and dissolution. The oxidation and the dissolution concurrently advance over a surface of the aluminum base to form an oxide film which has micropores over its surface. The micropores, which are in the shape of a circular column, are oriented vertical to the oxide film and exhibit a self-organized regularity under certain conditions (voltage, electrolyte type, temperature, etc.). Thus, this anodized porous alumina layer is expected to be applied to a wide variety of functional materials.
A porous alumina layer manufactured under specific conditions includes cells in the shape of a generally regular hexagon which are in a closest packed two-dimensional arrangement when seen in a direction perpendicular to the film surface. Each of the cells has a micropore at its center. The arrangement of the micropores is periodic. The cells are formed as a result of local dissolution and growth of a coating. The dissolution and growth of the coating concurrently advance at the bottom of the micropores which is referred to as a barrier layer. As known, the size of the cells, i.e., the interval between adjacent micropores (the distance between the centers), is approximately twice the thickness of the barrier layer, and is approximately proportional to the voltage that is applied during the anodization. It is also known that the diameter of the micropores depends on the type, concentration, temperature, etc., of the electrolytic solution but is, usually, about ⅓ of the size of the cells (the length of the longest diagonal of the cell when seen in a direction vertical to the film surface). Such micropores of the porous alumina may constitute an arrangement which has a high regularity (periodicity) under specific conditions, an arrangement with a regularity degraded to some extent depending on the conditions, or an irregular (non-periodic) arrangement.
Patent Document 2 discloses a method for producing an antireflection film (antireflection surface) with the use of a stamper which has an anodized porous alumina film over its surface.
Patent Document 3 discloses the technique of forming tapered recesses with continuously changing pore diameters by repeating anodization of aluminum and a pore diameter increasing process.
The present applicant discloses in Patent Document 4 the technique of forming an antireflection film with the use of an alumina layer in which very small recessed portions have stepped side surfaces.
As described in Patent Documents 1, 2, and 4, by providing an uneven structure (macro structure) which is greater than a motheye structure (micro structure) in addition to the motheye structure, the antireflection film (antireflection surface) can be provided with an antiglare function. The two-dimensional size of a raised portion of the uneven structure which is capable of performing the antiglare function is not less than 1 μm and less than 100 μm. The entire disclosures of Patent Documents 1, 2, and 4 are herein incorporated by reference.
Utilizing such an anodized porous aluminum film can facilitate the manufacturing of a mold which is used for formation of a motheye structure over a surface (hereinafter, “motheye mold”). In particular, as described in Patent Documents 2 and 4, when the surface of the anodized aluminum film as formed is used as a mold without any modification, a large effect of reducing the manufacturing cost is achieved. The structure of the surface of a motheye mold which is capable of forming a motheye structure is herein referred to as “inverted motheye structure”.
Patent Document 5 describes forming a plurality of recesses in a smooth surface of a aluminum plate before anodization of the aluminum plate such that the arrangement and interval of the recesses are identical with those of micropores of an alumina film formed by anodization. In this way, a porous alumina layer is formed which has regularly-arranged micropores (minute recessed portions) of a predetermined shape such that the interval and arrangement of the micropores are identical with those of the plurality of recesses formed before the anodization. Patent Document 5 also discloses that, to obtain micropores of higher straightness, verticality, and independency, it is desired that the surface of the aluminum plate has improved smoothness.
Patent Document 1: Japanese PCT National Phase Laid-Open Publication No. 2001-517319
Patent Document 2: Japanese PCT National Phase Laid-Open Publication No. 2003-531962 Patent Document 3: Japanese Laid-Open Patent Publication No. 2005-156695
Patent Document 4: WO 2006/059686
Patent Document 5: Japanese Laid-Open Patent Publication No. 10-121292
The present inventor attempted to manufacture a motheye mold using an aluminum base which has a mirror-finished surface produced by cutting (hereinafter, simply referred to as “mirror-cut surface”) but obtained only a porous alumina layer which has minute recessed portions in a nonuniform distribution. An example of the experimental result is described below.
As shown in
Thus, anodizing a surface of the aluminum base in which a mechanically damaged layer (hereinafter, simply referred to as “damaged layer”) has been formed by machining disadvantageously leads to nonuniform formation of minute recessed portions.
Forming a porous alumina layer in a machined surface is important for, for example, manufacturing of a mold in the form of a roll which is capable of uninterrupted performance of the transfer step.
The present invention was conceived for the purpose of solving the above problems. One of the major objects of the present invention is to provide an anodized layer formation method that enables formation of a porous alumina layer which has minute recessed portions uniformly distributed in a machined surface of an aluminum base. Another object of the present invention is to provide a method that enables formation of a porous alumina layer which has recessed portions uniformly distributed across the perimeter surface of a mold that is in the form of a roll.
An anodized layer formation method of the present invention includes the steps of: (a) providing an aluminum base which has a machined surface; (b) allowing passage of an electric current between the surface of the aluminum base and a counter electrode, with the surface of the aluminum base being a cathode, in water or an aqueous solution whose specific resistance value is not more than 1 MΩ·cm; and (c) after step (b), anodizing the surface of the aluminum base, thereby forming a porous alumina layer. The passage of an electric current in step (b) is sometimes referred to as “cathode electrolysis”.
Another anodized layer formation method of the present invention includes the steps of: (a) providing an aluminum base which has a machined surface; (b) forming, in the surface of the aluminum base, a minute uneven structure which has a smaller average neighboring distance than an average neighboring distance of a plurality of minute recessed portions that an intended porous alumina layer has; and (c) after step (b), anodizing the surface of the aluminum base, thereby forming a porous alumina layer which has the plurality of minute recessed portions.
In one embodiment, step (b) includes performing electrolytic polishing on the surface of the aluminum base.
In one embodiment, step (b) includes bringing the surface of the aluminum base into contact with an etchant.
In one embodiment, the machined surface is a mirror-finished surface.
In one embodiment, the aluminum base is in the form of a roll.
Still another anodized layer formation method of the present invention includes the steps of: (a) providing a base in the form of a roll; (b) depositing an aluminum layer on a perimeter surface of the base that is in the form of a roll; and (c) anodizing the surface of the aluminum layer, thereby forming a porous alumina layer which has a plurality of minute recessed portions.
An inventive method for manufacturing a mold which has an inverted motheye structure in its surface includes the step of forming a porous alumina layer according to any of the above anodized layer formation methods, the porous alumina layer having a plurality of minute recessed portions whose two-dimensional size viewed in a direction normal to the surface is not less than 10 nm and less than 500 nm.
A mold of the present invention includes: an aluminum base which has a mechanically damaged layer; and a porous alumina layer formed on the mechanically damaged layer. Particularly, the porous alumina layer has an inverted motheye structure which is preferably used in formation of an antireflection structure.
According to the present invention, a porous alumina layer which has uniformly-distributed minute recessed portions can be formed over a machined surface of an aluminum base. Also, according to the present invention, a porous alumina layer which has uniformly-distributed minute recessed portions can be formed over a perimeter surface of a base that is in the form of a roll. It is possible to manufacture a mold which has an inverted motheye structure in its surface using an anodized layer formation method of the present invention. A motheye mold of the present invention is suitably used in formation of an antireflection structure.
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Hereinafter, an anodized layer formation method, a mold manufacturing method, and a mold according to embodiments of the present invention are described with reference to the drawings. Note that the present invention is not limited to illustrated embodiments.
The present invention was conceived for solving a new problem found by the present inventor that, as previously described with reference to
As well known in the fields of metalworking, the damaged layer refers to a surface layer whose material properties are changed by working (herein, machining). The damaged layer is estimated to be formed due to irregularity or increase of lattice defects by plastic deformation, or deformation, size reduction or surface flow of crystal grains. Since the damaged layer has a residual strain (residual stress), the presence of a damaged layer and the magnitude of the residual strain can be detected by strain measurement with utilization of X-ray diffraction. In general, it is commonly known that the depth of the damaged layer formed by cutting is about 400 μm at the maximum (for example, Hidehiko TAKEYAMA, University Lectures—Cutting, p. 132, (H7), Maruzen Company, Limited).
The causes of failure to uniformly form minute recessed and raised portions in anodization of a mirror-cut surface and the mechanism by which the above problems are solved according to an anodized layer formation method of the present invention are described hereinbelow. Note that the description provided below is merely a study which is based on the fact experimentally confirmed by the present inventor and is provided as an aid for understanding the present invention. It is not intended to limit the present invention to the description provided below.
First, the mechanism of formation of a porous alumina layer by anodization of aluminum is described with reference to
When a surface of an aluminum base is anodized in an electrolytic solution with a constant voltage, the current varies as shown in
Mode I (
Mode II (
Mode III (
Mode IV (
The current profile obtained when the mirror-cut surface is anodized fell within a short period of time and, thereafter, did not substantially vary, as shown by the curve of Condition 4 in
It is estimated that the process of producing roughness in Mode II involves chemical dissolution. Although a porous alumina layer which is used as a motheye mold suitable to formation of an antireflection structure has a critical problem that sufficient roughness is not obtained in Mode II because the electrolytic solution used has relatively low chemical dissolution power, the same tendency occurs irrespective of the conditions of anodization (e.g., including the chemical dissolution power of the electrolytic solution).
The machining process described in the above example is a mirror-finishing process by means of cutting. However, the present invention is not limited to that example. The above description applies to other mirror-finishing processes, such as mirror polishing, mirror grinding, etc. The above description also applies to common machining processes to form a damaged layer.
The present invention was conceived based on the above-described knowledge that was found by the present inventor. An anodized layer formation method of an embodiment of the present invention includes the step of forming a minute uneven structure of recessed and raised portions on a machined surface such that the minute uneven structure has a smaller neighboring distance than a plurality of minute recessed portions 12 of an intended porous alumina layer (see the surface 10r1 of
An anodized layer formation method of another embodiment of the present invention includes the step of allowing passage of an electric current between a surface of an aluminum base and a counter electrode with the surface of the aluminum base being a cathode (cathode electrolysis) in water or an aqueous solution whose specific resistance value is not more than 1 MΩ·cm.
As will be described later with an inventive example, according to an anodized layer formation method of an embodiment of the present invention, a porous alumina layer which has uniformly-distributed minute recessed portions can be formed using the aluminum base 18 that includes a main base body 18b and a damaged layer 18a formed over a surface of the main base body 18b, which is the surface layer of the aluminum base 18, as shown in
According to an anodized layer formation method of an embodiment of the present invention, a porous alumina layer 10 can be formed on the damaged layer 18a of the aluminum base 18 as shown in
Therefore, by providing a base in the form of a roll as the aluminum base 18 shown in
Hereinafter, the anodized layer formation method of the embodiment of the present invention is described in more detail with reference to
a) to 2(f) are schematic cross-sectional views for illustrating the anodized layer formation method of the embodiment of the present invention.
First, as shown in
Then, as shown in
Subsequently, as described in, for example, Patent Document 4, an anodization step and an etching step are alternately repeated multiple times, whereby a porous alumina layer which has minute recessed portions can be formed such that each of the minute recessed portions has a desired cross-sectional shape. Note that, preferably, the final step of the repetition is the anodization step. For example, a porous alumina layer which is suitably used in formation of an antireflection structure can be formed as described below.
As shown in
Then, as shown in
Thereafter, the aluminum base 18 is again partially anodized such that the minute recessed portions 12 are grown in the depth direction while the thickness of the porous alumina layer 10 is increased as shown in
Thereafter, when necessary, the porous alumina layer 10 is brought into contact with an etchant of alumina to be further etched such that the diameter of the minute recessed portions 12 is further increased as shown in
The series of the above processes is preferably ended with the anodization step. When the etching step of
In this way, by repeating the above-described anodization step (
Here, the cathode electrolysis is described with reference to
The cathode electrolysis refers to passage of an electric current between a surface of an aluminum base and a counter electrode in an aqueous solution as an electrolytic solution, with the surface of the aluminum base being a cathode, as shown in
The reaction which occurs in the electrolytic solution when the cathode is made of Al is expressed by Formula (1) shown below.
2Al+6H2O→2Al(OH)3↓3H2 ↑ (1)
When an voltage is applied with the cathode made of Al, the total reaction at the cathode includes production of hydrogen and formation of an aluminum hydroxide film over the surface of the aluminum base. Hereinafter, detailed steps of the reaction are described.
At the cathode, an electron donating/receiving reaction expressed by Formula (2) shown below occurs.
Al→Al3++3e− (2)
Also, an electrolytic dissociation of water which is expressed by Formula (3) shown below occurs.
2H2OH3O++0H− (3)
Also, H3O+ in the aqueous solution receives an electron as expressed by Formula (4) shown below.
2H3O++2e−→H2↑+2H2O (4)
When the reaction of Formula (4) occurs, Formula (3) loses its equilibrium so that OH− is locally excessive near the cathode.
As a result, Formula (5) shown below loses its equilibrium so that Al in the surface of the aluminum base reduces.
Al3++3OH−Al(OH)3 (5)
When discussing the reaction velocity, it is necessary to consider the electrolyte. When the aqueous solution is an acidic electrolytic solution (the acid is expressed as HA where H means hydrogen), acid HA dissociates as expressed by Formula (6).
HA+H2OH3O++A− (6)
As a result of the reaction expressed by Formula (4) shown above, hydrogen is produced (i.e., released from the aqueous solution), so that excessive OH− in the aqueous solution and H3O+ of Formula (6) cause a reaction as expressed by Formula (7) shown below.
H3O++OH−2H2O (7)
It is inferred from Formula (2) that the velocity of Formula (5) is proportional to the current density. It is also inferred from Formula (6) and Formula (7) that the velocity of Formula (5) is inversely proportional to the concentration of the electrolytic solution.
In the acidic electrolytic solution, the aluminum hydroxide produced in Formula (5) dissolves as expressed by Formula (8) shown below.
Al(OH)3+3HAAl3++3A−+3H2O (8)
Whether or not the aluminum hydroxide remains in the form of a film depends on the balance of the reaction velocities of Formula (8) and Formula (5) and the surface temperature of the cathode (aluminum base) at the time of formation of the film.
As described above, when the surface of the aluminum base undergoes the cathode electrolysis, aluminum dissolves out from the surface of the aluminum base, so that a minute uneven structure is formed in the surface (see
The mirror-cut surface of the aluminum base which is shown in
a) shows a SEM image of a surface obtained by performing the cathode electrolysis on the mirror-cut surface of the aluminum base.
First,
Next,
As seen from the comparison of
The effect of the cathode electrolysis on the anodization is described with reference to
Under either of Conditions 1-3, the conditions for the cathode electrolysis were that the electrolytic solution was a 0.1 M oxalic aqueous solution, and the temperature of the solution was 20° C.
Condition 1: Allowing passage of a current of 4 A/dm3 for 30 seconds and then pulling the aluminum base out of the electrolytic solution. This procedure was performed 3 times.
Condition 2: Allowing passage of a current of 1.6 A/dm3 for 30 seconds and then pulling the aluminum base out of the electrolytic solution. This procedure was performed 3 times.
Condition 3: Allowing passage of a current of 1.6 A/dm3 for 30 seconds and then pulling the aluminum base out of the electrolytic solution. This procedure was performed 6 times.
The reason why the aluminum base was pulled out of the electrolytic solution such that the cathode electrolysis was separated into multiple times is to prevent bubbles generated on the surface of the aluminum base that is the cathode from inhibiting the reaction so that the progress of the cathode electrolysis would not hindered in some portions of the surface.
After the cathode electrolysis, to remove the aluminum hydroxide film formed over the surface of the aluminum base, the aluminum base was immersed in a 1 M phosphoric aqueous solution at 30° C. for 10 minutes.
Thereafter, the anodization was performed in a 0.1 M oxalic aqueous solution with a constant voltage of 60 V for 2 minutes. The current profile obtained during the anodization is shown in
In the case of Condition 4 where the cathode electrolysis was not performed, the profile does not include the phases of the above-described Mode III and Mode IV. Thus, it is inferred that generation and growth of minute recessed portions (micropores) did not occur.
In all of the cases of Conditions 1-3 where the cathode electrolysis was performed, it is seen that the profiles include the phases of four modes, Modes I, II, III and IV. Thus, it is inferred that a minute uneven structure that had a degree of roughness which may be necessary for the progress of Mode III and Mode IV was formed by the cathode electrolysis.
Comparing Condition 1 and Condition 2 between which the current density used for the cathode electrolysis is different, it is seen that the timing of transition from Mode II to Mode III is earlier in Condition 1 (4 A/dm3). This is probably because of the difference in the degree of the surface roughness (minute uneven structure) produced by the cathode electrolysis. It is therefore inferred that an uneven structure which has a smaller average neighboring distance was formed under Condition 1 where the current density is greater than under Condition 2 (1.6 A/dm3).
Comparing Condition 2 and Condition 3 between which the number of times of the cathode electrolysis is different, the current profiles are generally identical. It is thus inferred that the processes from Mode I through Mode IV progressed with generally identical velocities.
It is not the amount of the cathode electrolysis but the current density that dominantly affects the degree of roughness of the minute uneven structure which is necessary for transition from Mode II to Mode III.
As clearly seen from the descriptions provided above, it was experimentally confirmed that, even when a damaged layer is formed over the surface of the aluminum base, performing the cathode electrolysis to form a minute uneven structure over the surface enables formation of a porous alumina layer which has uniformly-distributed minute recessed portions. As a matter of course, when a damaged layer is entirely removed by performing the cathode electrolysis, a porous alumina layer which has uniformly-distributed minute recessed portions can be formed through the process from Mode I to Mode IV which have been described with reference to
The above-described effects of the cathode electrolysis may be achieved by any other method.
For example, electrolytic polishing may be performed on an aluminum base which has a damaged layer over its surface, whereby a minute uneven structure can be formed in the surface. The electrolytic polishing may be realized by any of a wide variety of known methods. Alternatively, the damaged layer can be removed by performing the electrolytic polishing for a sufficiently long period of time.
Alternatively, a minute uneven structure can be formed by bringing an aluminum base which has a damaged layer over its surface into contact with an etchant. For example, the minute uneven structure can be formed in the surface by immersing the aluminum base in a 1 M sulfuric aqueous solution for 1 minute. As a matter of course, the damaged layer can be removed by etching.
An aluminum base which has a porous alumina layer can be used as a mold without any modification. Therefore, the aluminum base preferably has sufficient rigidity. To obtain an aluminum base in the form of a roll, the aluminum base preferably has excellent processibility. From the viewpoint of rigidity and processibility, it is preferred to use an aluminum base which contains an impurity. It is particularly preferred that the content of an element whose standard electrode potential is higher than Al is not more than 10 ppm and that the content of an element whose standard electrode potential is lower than Al is not less than 0.1 mass %. It is particularly preferred to use an aluminum base which contains Mg as an impurity element. Mg is a base metal relative to Al and has a standard electrode potential of −2.36 V. The content of Mg is preferably not less than 0.1 mass % and not more than 4.0 mass % of the whole. Preferably, it is less than 1.0 mass %. If the content of Mg is less than 0.1 mass %, sufficient rigidity cannot be obtained. The solid solution limit of Mg to Al is 4.0 mass %. The content of the impurity element may be appropriately determined depending on the shape, thickness and size of the aluminum base, according to required rigidity and/or processibility. However, in general, if the content of Mg exceeds 1.0 mass %, the processibility decreases. The entire disclosures of Japanese Patent Application No. 2008-333674 and PCT/JP2009/007140 are incorporated by reference in this specification.
When manufacturing a mold in the form of a roll, it is possible to use a mold in the form of a roll which is made of a metal, such as stainless steel (SUS), or a different type of material (e.g., ceramic, glass, or plastic). When using a base in the form of a roll which is made of such a material other than aluminum, a porous alumina layer which has a plurality of minute recessed portions may be formed by depositing an aluminum layer over the perimeter surface of a base in the form of a roll and anodizing the surface of the aluminum layer. The deposition method used may be a known method, such as sputtering or electron beam deposition. The deposited aluminum layer does not have a damaged layer, so that it is not necessary to perform the cathode electrolysis or the like. An aluminum layer is obtained which is formed by deposited crystal grains of about several hundreds of nanometers so long as the surface temperature of the base is controlled to be sufficiently lower than a temperature at which aluminum exhibits solid phase flowability. Since such an aluminum layer has an uneven structure of appropriate roughness in its surface, a porous alumina layer which has uniformly-distributed minute recessed portions can readily be formed.
The present invention is used for a method for forming an anodized layer in an aluminum base or an aluminum layer, a method for manufacturing a mold, and a mold. Particularly, the present invention is preferably used for a method for manufacturing a motheye mold in the form of a roll.
Number | Date | Country | Kind |
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2009-113887 | May 2009 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP2010/057762 | 5/6/2010 | WO | 00 | 11/4/2011 |