Number | Date | Country | Kind |
---|---|---|---|
41 32 558.3 | Sep 1991 | DEX |
Filing Document | Filing Date | Country | Kind | 102e Date | 371c Date |
---|---|---|---|---|---|
PCT/EP92/02268 | 9/30/1992 | 8/29/1994 | 8/29/1994 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO93/07639 | 4/15/1993 |
Number | Name | Date | Kind |
---|---|---|---|
4943345 | Asmussen et al. | Jul 1990 | |
5049843 | Barnes et al. | Sep 1991 | |
5111111 | Stevens | May 1992 | |
5132105 | Remo | Jul 1992 | |
5350454 | Ohkawa | Sep 1994 | |
5385624 | Amemiya | Jan 1995 | |
5389153 | Paranjpe | Feb 1995 | |
5389154 | Hiroshi | Feb 1995 |
Number | Date | Country |
---|---|---|
0415122A2 | Mar 1991 | EPX |
2716592 | Oct 1977 | DEX |
Entry |
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"Plasma Sources Based On The Propagation Of Electromagnetic Surface Waves", Journal of Physics D: Applied Physics, Jul. 14, 1991, vol. 24, No. 7, pp. 1025-1048. |
Applications Of Plasma Processes To VLSI Technology, Copr. 1985, pp. 122-157. |
"3 Schichttechnik", 9 pages. |
"Downstream Plasma Etching And Stripping", Solid State Technology/Apr. 1987, pp. 147-151. |
"CDE Series Model CDE-VIII Microwave Downstream Etching System" by Tylan/Tokuda, Specifications and System Description, Apr. 1, 1986, pp. 1-5. |