Generation remote from the workpiece

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CPC
H01J37/32357

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32357Generation remote from the workpiece

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods of forming thermally stable carbon film
- Patent number 12,362,181
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating device
- Patent number 12,354,838
- Issue date Jul 8, 2025
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform in situ cleaning and deposition
- Patent number 12,347,653
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 12,347,650
- Issue date Jul 1, 2025
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber for improved precursor flow
- Patent number 12,340,979
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Tien Fak Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch-type apparatus for atomic layer etching (ALE), and ALE method...
- Patent number 12,334,308
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Hanjin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma preclean system for cluster tool
- Patent number 12,334,318
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Songjae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated showerhead with thermal control for delivering radical a...
- Patent number 12,331,402
- Issue date Jun 17, 2025
- Lam Research Corporation
- Rachel E. Batzer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Etching processes and processing assemblies
- Patent number 12,322,575
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Bablu Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate
- Patent number 12,308,214
- Issue date May 20, 2025
- Tes Co., Ltd.
- Bong-Soo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped or undoped silicon carbide deposition and remote hydrogen pla...
- Patent number 12,300,488
- Issue date May 13, 2025
- Lam Research Corporation
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for low temperature selective epitaxy in a dee...
- Patent number 12,297,559
- Issue date May 13, 2025
- Applied Materials, Inc.
- Abhishek Dube
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,300,523
- Issue date May 13, 2025
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Depositing coatings on and within housings, apparatus, or tools
- Patent number 12,291,775
- Issue date May 6, 2025
- Halliburton Energy Services, Inc.
- James M. Price
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for film formation
- Patent number 12,293,900
- Issue date May 6, 2025
- Gallium Enterprises Pty Ltd.
- Satyanarayan Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reaction device
- Patent number 12,283,464
- Issue date Apr 22, 2025
- New Power Plasma Co., Ltd.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual pressure oxidation method for forming an oxide layer in a feature
- Patent number 12,272,531
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Christopher S. Olsen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple process semiconductor processing system
- Patent number 12,266,550
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma cleaning of chambers for electronics manufacturing sy...
- Patent number 12,249,494
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 12,230,479
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated control of a plasma processing system
- Patent number 12,230,476
- Issue date Feb 18, 2025
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency source for inductively coupled and capacitively cou...
- Patent number 12,217,937
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC bias in plasma process
- Patent number 12,217,936
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber to accommodate parasitic plasma fo...
- Patent number 12,205,845
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetized plasmoid injection device
- Patent number 12,198,899
- Issue date Jan 14, 2025
- Nihon University
- Tomohiko Asai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compact low angle ion beam extraction assembly and processing appar...
- Patent number 12,191,117
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor reaction chamber and atomic layer plasma etching appa...
- Patent number 12,191,114
- Issue date Jan 7, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Xingfei Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote source pulsing with advanced pulse control
- Patent number 12,183,583
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR FILM FORMATION
- Publication number 20250232958
- Publication date Jul 17, 2025
- Gallium Enterprises Pty Ltd
- Satyanarayan Barik
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHODS AND APPARATUSES FOR FILLING A GAP
- Publication number 20250226214
- Publication date Jul 10, 2025
- ASM IP HOLDING B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...
- Publication number 20250210315
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250201539
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SELECTIVE NON-PLASMA DEPOSITION OF MASK PROTECTION MATERIAL
- Publication number 20250188608
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Yu-Hao Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR TREATING SUBSTRATE USING BORON COMPOUND
- Publication number 20250174454
- Publication date May 29, 2025
- TES CO., LTD
- Hyeong-Wook MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...
- Publication number 20250174430
- Publication date May 29, 2025
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250166978
- Publication date May 22, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Oxidation-Reduction Adjustable Plasma
- Publication number 20250157800
- Publication date May 15, 2025
- Banqiu WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS CONTROL USING FLUORINE RADICAL CONCENTRATIONS
- Publication number 20250132139
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Hari Ponnekanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE HIGH-DENSITY PLASMA FOR SELECTIVE ETCH
- Publication number 20250118536
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Yi-Hsuan Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA SOURCE
- Publication number 20250118538
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Kartik RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250104975
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES
- Publication number 20250104976
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
- Publication number 20250095949
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Christopher A. Rowland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW ETCHING PROCESS CHAMBER
- Publication number 20250087467
- Publication date Mar 13, 2025
- VM Inc.
- Sang Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGETED GAS DELIVERY VIA SIDE GAS INJECTION
- Publication number 20250087506
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY ARRANGEMENT, PLASMA GENERATING DEVICE AND METHOD FOR C...
- Publication number 20250079125
- Publication date Mar 6, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Jan Peter Engelstaedter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20250079178
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Light Source
- Publication number 20250069870
- Publication date Feb 27, 2025
- Hamamatsu Photonics K. K.
- Stephen F. Horne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20250062133
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER
- Publication number 20250062106
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Danae Nicole Kay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...
- Publication number 20250052272
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Rohit Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20250046629
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION
- Publication number 20250037974
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION
- Publication number 20250029831
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Tommi Tynell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...
- Publication number 20250022696
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Xin Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250019815
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Shimon OTSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Generation remote from the workpiece

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of forming thermally stable carbon film

Plasma generating device

Uniform in situ cleaning and deposition

Substrate processing system including dual ion filter for downstrea...

Semiconductor processing chamber for improved precursor flow

Batch-type apparatus for atomic layer etching (ALE), and ALE method...

Plasma preclean system for cluster tool

Integrated showerhead with thermal control for delivering radical a...

Etching processes and processing assemblies

Method of processing substrate

Doped or undoped silicon carbide deposition and remote hydrogen pla...

Method and apparatus for low temperature selective epitaxy in a dee...

Substrate processing apparatus and method

Depositing coatings on and within housings, apparatus, or tools

Apparatus and method for film formation

Plasma reaction device

Dual pressure oxidation method for forming an oxide layer in a feature

Multiple process semiconductor processing system

Remote plasma cleaning of chambers for electronics manufacturing sy...

Plasma generating device and process executing apparatus including...

Processing chamber with multiple plasma units

Integrated control of a plasma processing system

Ion beam source, substrate process apparatus including the same, an...

Radio frequency source for inductively coupled and capacitively cou...

DC bias in plasma process

Semiconductor processing chamber to accommodate parasitic plasma fo...

Magnetized plasmoid injection device

Compact low angle ion beam extraction assembly and processing appar...

Semiconductor reaction chamber and atomic layer plasma etching appa...

Remote source pulsing with advanced pulse control

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR FILM FORMATION

METHODS AND APPARATUSES FOR FILLING A GAP

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...

MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

SELECTIVE NON-PLASMA DEPOSITION OF MASK PROTECTION MATERIAL

METHOD FOR TREATING SUBSTRATE USING BORON COMPOUND

RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

Oxidation-Reduction Adjustable Plasma

PLASMA PROCESS CONTROL USING FLUORINE RADICAL CONCENTRATIONS

MICROWAVE HIGH-DENSITY PLASMA FOR SELECTIVE ETCH

REMOTE PLASMA SOURCE

PLASMA PROCESSING APPARATUS

RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES

ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES

SHALLOW ETCHING PROCESS CHAMBER

TARGETED GAS DELIVERY VIA SIDE GAS INJECTION

POWER SUPPLY ARRANGEMENT, PLASMA GENERATING DEVICE AND METHOD FOR C...

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

Inductively Coupled Plasma Light Source

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER

MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...

ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR...

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION

PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION

APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...

FILM-FORMING METHOD AND FILM-FORMING APPARATUS