Claims
- 1. A method for preparing a rubbery composite material comprising a plastic substrate and a rubber composition bonded thereto, comprising the steps of:
- depositing a thin film of cobalt or cobalt alloy having more than 80% by weight of cobalt and selected from the group consisting of Co--Ni, Co--Cr, Co--Al, Co--Sn, and Co--Zn, having a thickness of from about 10 .ANG. to 100 .mu.m on the surface of a plastic substrate by a dry plating process selected from the group consisting of ion plating, DC and RF magnetron sputtering, bipolar sputtering and RF sputtering processes and
- holding a rubber composition in intimate contact with said cobalt or cobalt alloy thin film under heat and pressure to achieve vulcanization bonding, said rubber composition being free of an organic cobalt salt.
- 2. The method according claim 1, wherein the rubber composition contains sulfur as a vulcanization agent in an amount of 0.5 to 4 by weight to 100 parts by weight of a rubber component in the rubber composition.
- 3. The method according to claim 2, wherein the rubber composition contains sulfur in an amount of 0.5 to 3 parts by weight to 100 parts by weight of the rubber component.
- 4. The method according to claim 1, which further comprises the step of cleaning the plastic substrate surface with a glow discharge under vacuum in an argon atmosphere, prior to said depositing of a cobalt or cobalt alloy thin film.
- 5. A method for preparing a rubbery composite material comprising a plastic substrate and a rubber composition bonded thereto, comprising the steps of:
- depositing a thin film of cobalt or cobalt alloy having more than 80% by weight of cobalt and selected from the group consisting of Co--Ni, Co--Cr, Co--Al, Co--Sn, and Co--Zn, having a thickness of from about 10 .ANG. to 100 .mu.m on the surface of a plastic substrate by a dry plating process, in which said process is a vacuum deposition process and
- holding a rubber composition in intimate contact with said cobalt or cobalt alloy thin film under heat and pressure to achieve vulcanization bonding, said rubber composition being free of an organic cobalt salt.
- 6. The method according claim 5, wherein the rubber composition contains sulfur as a vulcanization agent in an amount of 0.5 to 4 by weight to 100 parts by weight of a rubber component in the rubber composition.
- 7. The method according to claim 6, wherein the rubber composition contains sulfur in an amount of 0.5 to 3 parts by weight to 100 parts by weight of the rubber component.
- 8. The method according to claim 7, which further comprises the step of cleaning the plastic substrate surface with a glow discharge under vacuum in an argon atmosphere, prior to said depositing of a cobalt or cobalt alloy thin film.
- 9. The method according to claim 1, wherein said thin film is a cobalt thin film.
- 10. The method according to claim 1, wherein said thin film is selected from the group consisting of Co--Ni, Co--Cr, Co--Al, Co--Sn, and Co--Zn.
- 11. The method according to claim 1, wherein said cobalt or cobalt alloy thin film has a thickness of from 10 .ANG. to 1 .mu.m.
- 12. The method according to claim 5, wherein said thin film is a cobalt thin film.
- 13. The method according to claim 5, wherein said thin film is selected from the group consisting of Co--Ni, Co--Cr, Co--Al, Co--Sn, and Co--Zn.
- 14. The method according to claim 5, wherein said cobalt or cobalt alloy thin film has a thickness of from 10 .ANG. to 1 .mu.m.
- 15. A method for preparing a rubbery composite material having a plastic substrate and a rubber composition bonded thereto, which comprises:
- holding a rubber composition that is free of an organic cobalt salt in intimate contact with a thin film that is carried on a plastic substrate for a sufficient time and under sufficient heat and pressure so as to achieve vulcanization bonding, wherein said thin film is cobalt or a cobalt alloy selected from the group consisting of Co--Ni, Co--Cr, Co--Al, Co--Sn, and Co--Zn, that contains at least 80% by weight of cobalt, and has been formed on said plastic substrate in a thickness of about 10 .ANG. to 1 .mu.m by a process selected from the group consisting of ion plating, DC and RF magnetron sputtering, bipolar sputtering, RF sputtering, and vacuum deposition.
Priority Claims (3)
Number |
Date |
Country |
Kind |
60-229638 |
Oct 1985 |
JPX |
|
60-229639 |
Oct 1985 |
JPX |
|
60-229640 |
Oct 1985 |
JPX |
|
Parent Case Info
This application is a continuation application under 37 CFR 1.62 of prior application Ser. No. 07/707,929, filed on May 28, 1991, which is a continuation of Ser. No. 07/382,273, filed on Jul. 20, 1989, which was a divisional of application Ser. No. 07/182,083, filed on Apr. 15, 1988, now U.S. Pat. No. 4,872,432, which is a continuation-in-part of Ser. No. 06/919,012, filed on Oct. 15, 1986, now abandoned.
US Referenced Citations (12)
Divisions (1)
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Number |
Date |
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Parent |
182083 |
Apr 1988 |
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Continuations (2)
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Number |
Date |
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Parent |
707929 |
May 1991 |
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Parent |
382273 |
Jul 1989 |
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Continuation in Parts (1)
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Number |
Date |
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Parent |
919012 |
Oct 1986 |
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