15th Annual Tegal Plasma Seminar, 1989 "Single Crystal Silicon Etching in a Tri-Electrode Etcher Using CBrF.sub.3 Chemistry", Manfred Engelhardt, Siemens AG, Corporate Research and Development and Microelectronics. |
9th International Symposium on Plasma Chemistry Pugnochiuso, Italy 1989 "Anisotropic Etching of Silicon in Magnetic Field Enhanced Plasma" V. Grewal et al, Siemens AG Corporate Research and Development, Development Laboratory for Process Technology. |
Symposium on Dry Process, of Electrochem. Soc. Proc., vol. 88-7, 1988 "Submicron Trench Etching Under High Pressure (60 Pa)", Hirofumi Uchida et al, Kyoto Research Laboratory Matsushita Electronics Corporation. |