Adams et al., "Characterization of Plasma-Deposited Silicon Dioxide," J. Electrochem. Soc.: Solid-State Science and Technology, Jul. 1981, pp. 1545-1551. |
Yokoyama et al., "Characterization of Plasma-Deposited Silicon Nitride Films", Journal Applied Physics, vol. 51, No. 10, Oct. 1981, pp. 5470-5474. |
Dun et al., "Mechanisms of Plasma-Enhanced Silicon Nitride Deposition using SiH.sub.4 /N.sub.2 Mixture," J. Electrochem Society: Solid-State Science and Technology, Jul. 1981, pp. 1555-1563. |
Keller et al., "Sputtering Process Model of Deposition Rate," IBM Journal Research Development, Vol. 21, No. 1, Jan. 1979, pp. 25-32. |
Szendro et al., "Low Pressure Deposition of Silicon Nitride . . .", Tungsram, H-1340, Budapest, Hungary, vol. 128, No. 3. |