Claims
- 1. A method for preparing an optically clear fluoride glass comprising the following steps:
- Step 1--melting in an atmosphere of inert gas a water free mixture consisting essentially of an in situ oxidant consisting of a nonvolatile metal fluoride consisting of SnF.sub.4 and high purity starting materials for a fluorozirconate optical glass, wherein the amount of said SnF.sub.4 oxidant in the mixture is sufficient to substantially prevent the reduction in oxidation state of zirconium during the melting of the mixture and said SnF.sub.4 oxidant does in fact prevent said reduction during said melting , wherein
- Step 2--cooling the product of Step 1 to form an optically clear fluorozirconate fluoride glass.
- 2. A method in accordance with claim 1 wherein said SnF.sub.4 is greater than 0.05 mole percent of said mixture.
- 3. A method in accordance with claim 1 wherein said SnF.sub.4 is equal to or greater than 0.1 mole percent of said mixture.
- 4. A method in accordance with claim 1 wherein said SnF.sub.4 is about 0.1 mole percent to about 1.0 mole percent of said mixture.
- 5. A method in accordance with claim 1 wherein said SnF.sub.4 is about 1.0 mole percent of said mixture.
- 6. A method in accordance with claim 5 wherein said high purity essentially water free starting materials for a fluorozirconate optical glass consists essentially, expressed in mole percent, about 54.0 m/o of ZrF.sub.4, about 21.5 m/o BaF.sub.2, about 4.5 m/o LaF.sub.3, about 3.5 m/o AlF.sub.3, and about 15.5 m/o NaF of said mixture.
- 7. A method according to claim 1 further comprising the step before Step 1 of mixing the in situ oxidant in essentially water free form with the high purity starting materials in essentially water free form to form the mixture.
- 8. A method for preparing an optically clear fluoride glass comprising the following steps:
- Step 1--melting in an atmosphere of inert gas a water free mixture consisting essentially of an in situ oxidant consisting of a nonvolatile metal fluoride consisting of SnF.sub.4 and high purity starting materials for a fluorohafnate optical glass, wherein the amount of said SnF.sub.4 oxidant in the mixture is sufficient to substantially prevent the reduction in oxidation state of zirconium during the melting of the mixture and said SnF.sub.4 oxidant does in fact prevent said reduction during said melting, wherein the melting takes place without reactive atmosphere processing or the inclusion of NH.sub.4 F.HF in the mixture; and
- Step 2--cooling the product of Step 1 to form an optically clear fluorohafnate fluoride glass.
- 9. A method in accordance with claim 8 wherein said SnF.sub.4 is greater than 0.05 mole percent of said mixture.
- 10. A method in accordance with claim 8 wherein said SnF.sub.4 is equal to or greater than 0.1 mole percent of said mixture.
- 11. A method in accordance with claim 8 wherein said SnF.sub.4 is about 0.1 mole percent to about 1.0 mole percent of said mixture.
- 12. A method in accordance with claim 8 wherein said SnF.sub.4 is about 0.1 mole percent of said mixture.
- 13. A method in accordance with claim 12 wherein said high purity essentially water free starting materials for a fluorohafnate optical glass consists essentially, expressed in mole percent, about 54.0 m/o of ZrF.sub.4, about 21.5 m/o BaF.sub.2, about 4.5 m/o LaF.sub.3, about 3.5 m/o AlF.sub.3, and about 15.5 m/o NaF of said mixture.
- 14. A method according to claim 8 further comprising the step before Step 1 of mixing the in situ oxidant in essentially water free form with the high purity starting materials in essentially water free form to form the mixture.
Parent Case Info
This is a divisional of co-pending application Ser. No. 07/177,204 filed on Apr. 4, 1988.
US Referenced Citations (2)
Foreign Referenced Citations (4)
Number |
Date |
Country |
36373 |
Sep 1981 |
EPX |
59-03039 |
Jan 1984 |
JPX |
60-27621 |
Feb 1985 |
JPX |
60-155549 |
Aug 1985 |
JPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
177204 |
Apr 1988 |
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