Patent Application
20110003177
1. Field of Invention
The present invention relates to a method for producing a sputtering target containing boron, and more particularly to a method for producing a sputtering target containing uniformly distributed boron (B), cobalt (Co) and chromium (Cr) with.
2. Description of the Related Art
Conventional cobalt-chromium-platinum oxide (CoCrPt-oxide) composite material is used to form a recording layer in a perpendicular magnetic recording media. In industry, the recording layer is formed by sputtering. However, a sputtering target made of CoCrPt-oxide composite material contains insulating ceramic substance, so arcing and particles are easily generated during direct-current (DC) magnetron sputtering. In order to avoid the foregoing disadvantages, US Publication No. 2004/112,734 discloses that CoCrPt-oxide sputtering target has oxide phase with a dimension less than 10 μm. Furthermore, components of sputtering target disperse homogeneously, which will form a uniform recording layer.
For obtaining a magnetic recording media with high density, boron (B) is added in the CoCrPt-oxide allowing magnetic crystals to separate better. However, a conventional method comprises mixing powders of Co, Cr, Pt, B and oxides to form a mixture and sintering the mixture to obtain a sputtering target. The sputtering target has more than 20 μm of Co·Cr·B alloy phase, which results in inhomogeneous sputtering target. Therefore, arcing and particles will be generated during sputtering.
U.S. Pat. No. 6,797,137 and US Re 40100 disclose a rapid solidification, which leads to chemically homogeneous fine powders containing fine precipitates. The rapid solidification such as gas atomization is used to form Co—B powders and/or Co·Cr—B powders serving as raw materials. The raw materials are sintered to form a sputtering target with fine boride phase. However, the methods are used to produce a sputtering target without oxides and cannot be used for producing a sputtering target with oxides.
To overcome the shortcomings, the present invention provides a method for producing a sputtering target containing boron to mitigate or obviate the aforementioned.
The primary objective of the present invention is to provide a method for producing a sputtering target containing uniformly distributed boron (B), cobalt (Co) and chromium (Cr).
To achieve the objective, the method for producing a sputtering target containing B in accordance with the present invention comprises steps of providing cobalt-chromium (Co·Cr) prealloy powder, mixing Co·Cr prealloy powder and raw material powder containing boron and oxide to form a mixture, preforming the mixture to form a green compact, and sintering the green compact to obtain the sputtering target containing boron.
Because Co·Cr prealloy powder is provided, then is mixed with boron, oxide or the like, size and distribution of boride particles can be efficiently controlled. Therefore, Co, Cr, B or the like are uniformly distributed in the sputtering target.
Other objectives, advantages and novel features of the invention will become more apparent from the following detailed description when taken in conjunction with the accompanying drawings.
With reference to
Preferably, the oxide is at least one selected from the group consisting of titanium dioxide (TiO2), silicon dioxide (SiO2), titanium sesquioxide (Ti2O3), chromium oxide (Cr2O3) and tantalum oxide (Ta2O5).
Preferably, the raw material powder further comprises platinum (Pt).
The step of sintering the green compact comprises sintering the green compact at 950˜1180° C. under 300˜425 bar.
The sputtering target containing boron comprises cobalt (Co), chromium (Cr), boron (B) and oxide and has an average boride particle size of less than 10 μm.
The sputtering target containing boron consists of cobalt (Co), chromium (Cr), boron (B) and oxide and has an average boride particle size of less than 5 μm.
A thin film in accordance with the present invention is deposited using a sputtering target of the present invention described above.
A magnetic recording media in accordance with the present invention comprises the thin film of the present invention described above.
Because Co·Cr pre alloy powder is provided, then is mixed with boron, oxide or the like, size and distribution of boride particles can be efficiently controlled. Therefore, Co, Cr, B or the like are uniformly distributed in the sputtering target.
78.67 grams of Co powder (average particle size: 7 μm), 16.50 grams of Cr powder (average particle size: 20 μm), 0.81 grams of B powder (average particle size: 8 μm) and 4.02 grams of Ti2O3 powder (average particle size: 10 μm) were mixed and milled by an automatic milling machine for 30 minutes. Then, those powders were sieved with 60 meshes. The powders passing through 60 meshes were mixed homogeneously to form a mixture. The mixture was charged into a graphite mold and entered into a hydraulic press under 300 psi to form a green compact. The graphite mold with the green compact was put into a hot-pressing furnace and the green compact was sintered at 1100° C. under 362 bar for 180 minutes to obtain a sputtering target.
35.02 grams of Co powder (average particle size: 7 μm), 60.15 grams of 70 at % Co-30 at % Cr prealloy powder (average particle size: 15 μm), 0.81 grams of B powder (average particle size: 8 μm) and 4.02 grams of Ti2O3 powder (average particle size: 10 μm) were mixed and milled by an automatic milling machine for 30 minutes. Then, those powders were sieved with 60 meshes. The powders passing through 60 meshes were mixed homogeneously to form a mixture. The mixture was charged into a graphite mold and entered into a hydraulic press under 300 psi to form a green compact. The graphite mold with the green compact was put into a hot-pressing furnace and the green compact was sintered at 1100° C. under 362 bar for 180 minutes to obtain a sputtering target.
The sputtering targets of the comparative example 1 and example 1 were tested by electron probe microananlyser (EPMA).
51.35 grams of Co powder (average particle size: 7 μm), 12.23 grams of 70 at % Co-30 at % Cr prealloy powder (average particle size: 15 μm), 32.38 grams of Pt powder (average particle size: 5 μm), 0.75 grams of B powder (average particle size: 8 μm) and 3.30 grams of TiO2 powder (average particle size: 1 μm) were mixed and were milled by an automatic milling machine for 30 minutes. Then, those powders were sieved with 60 meshes. The powders passing through 60 meshes were mixed homogeneously to form a mixture. The mixture was charged into a graphite mold and entered into a hydraulic press under 300 psi to form a green compact. The graphite mold with the green compact was put into a hot-pressing furnace and the green compact was sintered at 1100° C. under 362 bar for 180 minutes to obtain a sputtering target.
The method of the present invention comprises producing a sputtering target containing boron by CoCr prealloy powder. The boride particles exist in the CoCr prealloy powder, so an average particle size is reduced from 20 μm to 10 μm. Furthermore, the sputtering target of the present invention has uniform distribution of composition.
Even though numerous characteristics and advantages of the present invention have been set forth in the foregoing description, together with details of the structure and function of the invention, the disclosure is illustrative only. Changes may be made in detail, especially in matters of shape, size and arrangement of parts within the principles of the invention to the full extent indicated by the broad general meaning of the terms in which the appended claims are expressed.
