METHOD FOR TREATING INNER WALL SURFACE OF MICRO-VACANCY

Abstract

There is provided a method for processing an inner wall surface of a micro vacancy, capable of reliably etching and cleaning even if the hole provided to the substrate to be processed is narrow and deep. The substrate has a surface on which a processing solution is to be applied and a micro vacancy with an opening on the surface. An aspect ratio (l/r) of the micro vacancy being at least 5, or the aspect ratio being less than 5 and a ratio (V/S) of a micro vacancy volume (V) to a surface area of the opening (S) being at least 3. The substrate is arranged in a processing space. Next, the processing space is depressurized, and subsequently the processing solution is introduced into the processing space so as to process the inner wall surface of the micro vacancy.

Description

TECHNICAL FIELD

The present invention relates to a method for processing an inner wall surface of a micro vacancy.

BACKGROUND ART

The semiconductor field has heretofore made significant advances in high integration with the miniaturization of the transistor, a basic electronic active element (basic electronic element). Stagnation of exposure technology, a basic technology thereof, however, has prompted discussions on theories of limitation to high integration based on miniaturization. Further, miniaturization of the basic electronic element presents potential problems in temperature rise and electronic leakage in devices obtained from large-scale integration (LSI) device development. Recently, technological development of high integration that does not depend on miniaturization has also started. One such technology is LSI three-dimensional integration (3DI). One technology required to achieve this technology is through silicon via (TSV). A 3D integrated LSI device that uses this technology, unlike a package-level 3D integrated device that uses wire bonding technology, is expected to show dramatic improvement in electrical interconnectivity between each integrated device, and holds much promise as a highly-integrated device of the next generation.

A through-hole required in TSV is a narrow, deep hole having a depth from tens of microns to several hundred microns, and an aspect ratio of at least 10 (high aspect ratio hole). To form such a hole, adoption of a dry etching method, which has recently been adopted in the formation of half-micron to quarter-micron minute circuit patterns, and an oxygen plasma asking method for resist removal have been proposed. However, in such a dry etching method, deposited polymers caused by dry etching gas, resist, and the like occur on the hole peripheral portion to be formed, remain in the hole interior and on the peripheral portion, and cause high resistance, electrical short-circuits, and a decrease in yield. Further, wet cleaning is required to remove the remaining deposited polymers and clean the hole interior. As a result, the expectations of the wet etching and cleaning process performed to date have heightened for TSV as well.

Nevertheless, the studies and experiments of the inventors have shown conclusions such as the following, making it clear that the wet etching and cleaning of prior art are inadequate. That is, when a conventional processing solution is used in a case where a bottom portion of a high aspect ratio hole is etched and the hole interior is cleaned, the processing solution (etching solution, cleaning solution, and the like) may not enter the hole because the hole is narrow and deep. As a result, a situation in which etching and cleaning cannot be performed as expected occurs. Possible solutions include a conventionally implemented policy of resolving future problems by mixing a surfactant in the processing solution and improving the wettability of the hole inner wall.

Nevertheless, while there are proposals for improving wettability while ensuring sufficient fulfillment of the function of the processing solution to achieve such an objective, preparations of an appropriate processing solution for etching as well as cleaning have been realized. Furthermore, when the processing solution is supplied from the treated body surface to the hole, a phenomenon in which air bubbles of atmospheric gas are formed inside the hole, inhibiting entry of the processing solution in the hole, may also occur. This phenomenon has been remarkably observed in cylindrical holes.

There has been proposed a technique in which depressurization and pressurization are repeatedly performed when polycrystalline silicon for a solar battery having a plurality of complex minute holes is cleaned using ultrasonic vibration (refer to Patent Document 1). Nevertheless, because the technique disclosed in Patent Document 1 uses ultrasonic vibration, the height of the wall in a hole pattern having a high aspect ratio such as that of TSV, which serves as a target in this case, is extremely high with respect to the wall thickness of the wall surface member in which the hole is formed, resulting in the problem of the wall surface member collapsing (pattern collapse) due to the ultrasonic vibration. This problem becomes increasingly significant as the aspect ratio of the hole increases, and as the hole pattern becomes more and more minute.

CITATION LIST

Patent Literature

PTL 1 Japanese Patent Laid-Open No.2012-598

SUMMARY OF INVENTION

Technical Problem

The present invention is the result of vigorous research taking the above into consideration, and it is therefore an object of the present invention to provide a method for processing a hole inner wall surface that allows processing solution to quickly enter and fill a hole, even if the hole provided to the substrate to be processed is narrow and deep, thereby making it possible to reliably perform etching and cleaning without hole pattern collapse.

Solution to Problem

One aspect of the present invention is a method for processing an inner wall surface of a micro vacancy, includes

a step of depressurizing a depressurizable processing space in which a substrate is arranged, the substrate having a surface on which a processing solution is to be applied and a micro vacancy with an opening on the surface, an aspect ratio (l/r) of the micro vacancy being at least 5, or the aspect ratio being less than 5 and a ratio (V/S) of a micro vacancy volume (V) to a surface area of the opening (S) being at least 3; and

a step of subsequently introducing the processing solution to the depressurized processing space so as to process the inner wall surface of the micro vacancy.

Advantageous Effects of Invention

According to the present invention, the processing solution quickly enters and fills the hole, even if the hole is narrow and deep, thereby making it possible to reliably perform etching and cleaning.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a schematic explanatory view for explaining a situation in which air bubbles exist in a narrow and deep hole provided to a silicon-on-insulator (SOI) substrate, and a processing solution does not penetrate to a hole bottom portion.

FIG. 2 is a schematic configuration diagram for explaining an example of a favorable manufacturing system for embodying the present invention.

FIG. 3 is a schematic configuration diagram of a portion of a manufacturing line illustrated in FIG. 2.

FIG. 4 is a schematic explanatory view for explaining a favorable configuration of a processing (chemical) solution supply system provided in an interior of a cartridge 302.

FIG. 5 is a schematic configuration diagram of a depressurization waste solution tank 207.

FIG. 6 is a schematic configuration diagram for explaining another favorable process chamber.

FIG. 7 is a schematic top view for explaining an arrangement of a jet nozzle of nitrogen (N₂) gas provided on an inner wall surface of a process chamber 501 in FIG. 6, and a jetting direction.

FIG. 8 is a graph showing a saturated vapor pressure curve of water.

DESCRIPTION OF EMBODIMENTS

FIG. 1 is a schematic explanatory view for explaining a situation in which air bubbles exist in a narrow and deep hole provided to a silicon-on-insulator (SOI) substrate, and a processing solution does not penetrate to a hole bottom portion.

In FIG. 1, a symbol 100 denotes an SOI substrate, 101 denotes a silicon (Si) semiconductor substrate, 102 denotes a silicon oxide (SiO₂) layer, 103 denotes a Si layer (103-1, 103-2), 104 denotes a hole, 105 denotes an air bubble, 106 denotes a processing solution, 107 denotes a gas-liquid interface, 108 denotes an inside wall surface (108-1, 108-2), 109 denotes an inner bottom wall surface, and 110 denotes an opening.

Under a normal pressure atmosphere, when a processing solution is supplied to a surface of the SOI substrate 100, a situation in which the hole 104 (micro vacancy) is not adequately filled with the processing solution may occur, even if a wettability with respect to an inside wall surface of the Si layer 103 is favorable (one such example is schematically illustrated in FIG. 1). When the circumstances of the hole 104 not being filled with the processing solution are carefully observed, the air bubble 105 exists inside the hole 104. When the SOI substrate 100 is kept in a state of rest, the air bubble 105 stays inside the hole 104, blocked by the processing solution 106. When ultrasonic vibration is applied to the SOI substrate 100 under circumstances in which the air bubble 105 exists, gas-liquid exchange occurs inside the hole 104 and the hole 104 is quickly filled with the processing solution. Or, when processing solution is supplied onto the surface of the SOI substrate 100 while ultrasonic vibration is applied to the SOI substrate, air bubble formation tends to be relatively obstructed, making formation of the air bubble 105 less likely. However, when the ultrasonic vibration becomes excessive or too severe, a pattern, for example, to be formed or that has been formed, collapses, and thus adoption of ultrasonic vibration in the present invention is not preferred. Even if ultrasonic vibration were to be adopted, it is preferably performed gently in a range in which pattern collapse does not occur.

Given an opening diameter “r” of the hole 104 and a depth “l” from an opening position of the hole 104 to the inner bottom wall surface 109, a so-called aspect ratio is expressed by “l/r.” The conditions under which the air bubble 105 inside the hole 104 is formed include many parameters, such as a surface tension, a viscosity, and a composition of the processing solution, a surface smoothness of the inside wall surface 108, a wettability of the used processing solution, sizes of “r” and “l,” and the aspect ratio, making it difficult to theorize.

The inventors first formed a variety of holes in an SOI substrate of structural materials such as illustrated in FIG. 1, without limiting an inner structure of the hole 104 to a cylinder, and used ultrapure water as the processing solution to verify air bubble formation trends. The inner structure of the hole 104 was created in a variety of sizes, including a pouch shape (with a lower portion of the opening widened into a bag shape or tapered shape), a rectangular shape (with the opening in a four-cornered shape, such as a square, rectangle, or diamond), a triangular shape, a hexagonal shape, an elliptical shape, an ultra-elliptical shape, a star shape, and the like, without limitation to the cylindrical shape. As a result, given a surface area “S” and an internal volume “V” of the opening 110 of the hole 104, a susceptibility of air bubble formation was found to rapidly increase starting from near a “V/S” value of 3, regardless of shape. Further, among the various shapes, a comparison of cases where the inside wall surface of the hole 104 has a curve (such as a cylinder or an ellipse) versus a corner (such as a rectangle) showed that a curved surface is more susceptible to air bubble formation. While the cause remains in the realm of speculation, when there is a corner on the inner wall, the corner is less likely to be taken up by air bubbles because the air bubbles have a strong tendency to form in spheres, and it is thought that the solution reaches the inner bottom wall surface 109 through the corners, thereby allowing the gas-liquid exchange to more readily occur and the hole space to be filled with the solution.

Then, in place of the ultrapure water, the inventors used hydrofluoric acid and buffered hydrofluoric acid and performed etching on the SiO₂ layer 102 constituting the inner bottom wall surface 109. Results showed that the hydrofluoric acid did not relatively cause air bubble formation to an excessive degree, even near a “V/S” value of “3” (about 15 air bubbles formed in 300 holes having a “V/S” value of “3”), while the buffered hydrofluoric acid caused air bubble formation at percentage of 80% (240 air bubbles), resulting in inadequate etching. Hence, the inventors prepared a depressurizable process chamber and tried to verify the above under reduced pressure (30 Torr). As a result, etching was completed at a percentage of 100% for both the hydrofluoric acid solution (HF: 1 to 20%) and the buffered hydrofluoric acid solution (ammonium fluoride: 20%, HF: 1 to 20%). While the effect of this depressurization depends on the degree of depressurization to a certain extent, the boiling point of the processing solution is exceeded when depressurization is excessive. Depressurization performed in a range in which the boiling point is not exceeded thus offers more convenience in terms of device design, and is therefore preferred.

In the present invention, an inner space of the hole is hereinafter referred to as a “micro vacancy.” In the present invention, the value of “r” for a structure in which the micro vacancy is not a cylinder (“non-cylinder”) is found by regarding the micro vacancy at that time as a cylinder, from “S” of the non-cylinder. “l” in such a case is a depth (maximum depth) from an opening position to a deepest inner bottom wall surface position of the micro vacancy. The effect of depressurization in the present invention is remarkable when the aspect ratio (l/r) is at least 5 or when the aspect ratio is less than 5 and V/S (V: volume of micro vacancy, S: surface area of opening) is at least 3. In particular, an even more remarkable effect can be achieved when the processing solution is buffered hydrofluoric acid and the treated body is an SOI substrate.

In the present invention, when the “l/r” value is at least 5, the depressurization effect is remarkably achieved without dependency on the “V/S” value. When the “l/r” value is less than 5, the depressurization effect depends on the “V/S” value and is substantially not achieved when “V/S”<3, increasing the percentage of holes in which air bubbles remain. In the present invention, when the “l/r” value is less than 5, the “V/S” value is more preferably at least 3.5.

FIG. 2 is a schematic configuration diagram for explaining an example of a favorable manufacturing system for realizing the present invention. FIG. 3 is a schematic configuration diagram of a portion of a manufacturing line illustrated in FIG. 2. In FIGS. 2 and 3, 200 denotes a processing system, 201 denotes a depressurization process chamber, 202 denotes a treated body placement table, 202-1 denotes a rotating shaft for the treated body placement table, 203 denotes a treated body, 204 denotes an atmospheric gas supply line, 205 denotes a processing (chemical) solution supply line, 206 denotes a recovery hood, 207 denotes the depressurization waste solution tank, 208 denotes an air or N₂ supply line, 209 denotes a drainage line, 210 denotes a recovery line, 211 and 212 denote exhaust lines, 213 denotes an exhaust pump, 214 to 221 denote valves, 222 denotes a variable supply rate nozzle for the processing solution, 301 denotes a spinner, 302 denotes the cartridge, and 303 denotes an aluminum frame.

The processing system 200 comprises the depressurization process chamber 201 and the depressurization waste solution tank 207, each having an interior configured to be depressurized to a predetermined value by the exhaust pump 213. Atmospheric gas such as N₂ is supplied from the outside via the atmospheric gas supply line 204, and processing (chemical) solution is supplied via the processing solution supply line 205 to the depressurization process chamber 201, each at predetermined timings and predetermined rates. An opening/closing value that constitutes a flow rate adjustment function is provided midway on the atmospheric gas supply line 204. The treated body placement table 202 is arranged so as to be fixed to the rotating shaft 202-1 for the treated body placement table, inside the depressurization process chamber 201. The treated body 203 is arranged on the treated body placement table 202. The atmospheric gas supplied inside the depressurization process chamber 201 via the atmospheric gas supply line 204 passes through the recovery hood 206, as illustrated by an arrow A, and the processing solution supplied via the processing solution supply line 205, as illustrated by an arrow B, and each is recovered inside the depressurization waste solution tank 207 from the recovery line 210 through the recovery hood 206. The opening/closing valve 217 is provided midway on the recovery line 210.

The supply line 208 and the exhaust line 211 are coupled to the depressurization waste solution tank 207. The supply line 208 is a supply line for air or N₂. The waste solution 223 inside the depressurization waste solution tank 207 is discharged outside the depressurization waste solution tank 207 via the drainage line 209. The air or N₂ can be supplied from the supply line 208 and returned to one atmosphere pressure as necessary inside the depressurization waste solution tank 207. The opening/closing valve 215 is provided midway on the supply line 208. Further, the opening/closing valve 216 is provided midway on the drainage line 209. The depressurization process chamber 201 is depressurized via the exhaust line 212, and the waste solution tank 207 is depressurized via the exhaust line 211, each by the pump 213. The valves 218, 219 are arranged midway on the exhaust line 211, and the valves 220, 221 are arranged midway on the exhaust line 212. The valves 219, 221 are opening/closing valves that constitute a flow rate variable mechanism. The exhaust pump 213 is a pump resistant to moisture, and a diaphragm type chemical dry vacuum pump, specifically DTC-120 (made by ULVAC), for example, is preferably adopted.

The process chamber 201 and the waste solution tank 207 are attached to the frame 303 made of aluminum, for example, as illustrated in FIG. 4. The spinner 301 provided for rotating the rotating shaft 202-1 is also attached to the frame 303. The cartridge 302 that stores processing solution is connected to an upstream end of the processing (chemical) solution supply line 205.

FIG. 4 is a schematic explanatory view for explaining a favorable configuration of a processing (chemical) solution supply system provided in an interior of the cartridge 302. In FIG. 4, 400 denotes a nitrogen force-feed type processing (chemical) solution supply system, 401 denotes a canister, 402 denotes a processing solution supply line, 403 and 411 denote stop valves, 404 denotes a flow rate adjustment valve, 405 denotes a flow meter, 406 denotes a mist trap, 407 and 408 denote a nitrogen gas supply line, 409 denotes a vent (exhaust) valve, 410 denotes a flow-dividing joint, 412 denotes a regulator, 413 denotes a joint, and 414 and 415 denote quick connectors.

In the nitrogen force-feed type processing (chemical) solution supply system 400, the processing solution supply line 402 provided with a ⅜-inch line on an upstream side and a ¼-inch line on a downstream side via the joint 413, and the ¼-inch nitrogen gas supply line 407 are connected to the canister 401 via the quick connector 414 and the quick connector 415, respectively. The stop valve 403, the flow rate adjustment valve 404, and the flow meter 405 are provided midway on the processing solution supply line 402. Then, a downstream section on the stop valve 403 side of the processing solution supply line 402 is connected to the processing solution supply line 205. The vent (exhaust) valve 409 and the flow-dividing joint 410 are provided midway on the nitrogen gas supply line 407. The vent (exhaust) valve 409 is for venting the nitrogen gas inside the canister 401 and inside the nitrogen gas supply line 407 to the outside. The downstream side of the nitrogen gas supply line 407 is inserted inside the mist trap 406. The nitrogen gas is introduced inside the mist trap 406 through the regulator 412, the stop valve 411, and the nitrogen gas supply line 408. The mist trap 406 is provided for preventing back flow of the processing solution to the upstream side.

FIG. 5 is a schematic configuration diagram of the depressurization waste solution tank 207. In FIG. 5, 501 denotes a drain flange, 502 denotes a depressurization flange, 503 denotes a waste solution introduction flange, 504 denotes a gas introduction flange, 505 denotes a vacuum gauge, 506 denotes a flow meter, and 507 denotes a solution level observation window.

The drainage line 209, the exhaust line 211, the recovery line 210, and the supply line 208 are connected to the depressurization waste solution tank 207 via the drain flange 501, the depressurization flange 502, the waste solution introduction flange 503, and the flange 504, respectively. The vacuum gauge 505 measures the pressure inside the waste solution tank 207. The solution level observation window 507 comprising a waste solution transparent member is provided to an upper portion of the waste solution tank 207 for observing the level of the waste solution inside the waste solution tank 207.

FIG. 6 is a schematic configuration diagram for explaining another favorable process chamber. In FIG. 6, 600 denotes a depressurization process chamber, 601 denotes a chamber construct, 602 denotes an upper lid, 603 denotes a treated body placement stage, 604 denotes a rotating shaft, 605 denotes a magnetic fluid seal, 606 denotes a special processing (chemical) solution supply line, 607 denotes an ozonized water supply line, 608 denotes an ultrapure water supply line, 609, 610, 611, and 618 denote flow meters, 612, 613, 614, 617, 621, and 624 denote valves, 615 denotes a gas introduction line, 619 denotes a gas discharge line, 616, 620, and 623 denote flanges, 622 denotes a waste solution line, 625 denotes an observation window (625-1, 625-2), and 626 denotes a vacuum gauge.

Unlike the depressurization process chamber 201 illustrated in FIG. 2, the depressurization process chamber 600 illustrated in FIG. 6 further comprises the three supply lines of the special processing (chemical) solution supply line 606, the ozonized water supply line 607, and the ultrapure water supply line 608. Otherwise, excluding one other difference, the structure is basically no different from that of the depressurization process chamber 201. The other difference is that the gas introduction line 615 and the gas discharge line 619 are attached to the depressurization process chamber 600. The atmospheric gas inside the depressurization process chamber 600 is introduced through the gas introduction line 615. The gas introduction line 615 is attached to the depressurization process chamber 600 by the flange 616. The opening/closing valve 617 and the flow meter 618 are provided midway on the gas introduction line 615. The gas discharge line 619 is attached to the depressurization process chamber 600 by the depressurization flange 620. The opening/closing valve 621 is provided midway on the gas discharge line 619. The downstream side of the gas discharge line 619 is connected to a pump (not illustrated) similar to the exhaust pump 213. The depressurization process chamber 600 is configured by the chamber construct 601 and the upper lid 602 so that the interior is kept in a depressurized state. The two observation windows 625-1 and 625-2 for observing the interior of the chamber 600 are provided on the upper lid 602. The treated body placement stage 603 on which a treated body is arranged is provided in the interior of the depressurization process chamber 600. The rotating shaft 604 for rotating the stage 603 is fixed to the stage 603 in a removable state. The rotating shaft 604 is sealed by the magnetic fluid seal 605 and joined to the rotating shaft of the spinner arranged on the outside of the depressurization process chamber 600. The flow meter 609 and the valve 612 are provided midway on the special processing (chemical) solution supply line 606. The flow meter 610 and the valve 613 are provided midway on the ozonized water supply line 607. The flow meter 611 and the valve 614 are provided midway on the ultrapure water supply line 608. The waste solution line 622 is attached to the depressurization process chamber 600 by the flange 623 on the bottom portion of the depressurization process chamber 600. The opening/closing valve 624 is provided midway on the waste solution line 622. The vacuum gauge 626 for measuring the pressure inside the depressurization process chamber 600 is attached to a side surface of the depressurization process chamber 600.

FIG. 7 is a schematic top view for explaining an arrangement of a jet nozzle of nitrogen (N₂) gas provided on an inner wall surface of the process chamber 601 in FIG. 6, and a jetting direction. In FIG. 7, 701 denotes a gas jet inner wall tube, and 702 denotes a gas jet nozzle.

The gas jet inner wall tube 701 coupled to the gas introduction line 615 is attached to an inner wall of the depressurization process chamber 600. The gas jet nozzle 702 having a jetting direction that faces a center axis of an internal space of the depressurization process chamber 600 is provided to the gas jet inner wall tube 701 in a predetermined quantity. The jetting diameter and quantity of the gas jet nozzle 702 are designed so that a predetermined gas jetting flow rate is achieved.

In the present invention, while the gas jetting (blowing) flow rate from the gas jet nozzle 702 is determined in advance during suitable designing so that an agitation action or turbulence action does not occur inside the process chamber by the jetting of the gas to the extent possible, an optimum value is preferably more precisely determined in a gas jetting preliminary experiment. The extent of the agitation action or turbulence action by the gas jetting depends also on the gas exhaust rate and, in the present invention, is preferably 0.1 to 5.0 m/sec, more preferably 0.5 to 3.0 m/sec, and optimally around 2.0 m/sec. For example, in a case where the jet nozzle 702 having a diameter of 2 mm is provided on a semi-circular periphery in a quantity of 20 as illustrated, the N₂ gas is preferably introduced at a rate of 200 cc/min inside the depressurization process chamber 600. The rate of the N₂ gas at this time is 2.0 m/sec. In the present invention, the processing solution is preferably sufficiently degassed in advance to increase an absorbance of the gas. Furthermore, the processing solution supply line used is preferably a resin multilayer tube (made by Nichias Corporation) that suppresses oxygen permeability. While the above has described, an illustrative scenario of the present invention using N₂ gas or surrounding gas as the atmospheric gas, CO₂ gas can increase the dissolution rate into the processing solution if used and therefore is preferred in place of these gases.

FIG. 8 is a graph showing a saturated vapor pressure curve of water. The horizontal axis shows the temperature (° C.) and the vertical axis shows the pressure (Torr). In the present invention, while the process chamber interior is depressurized and then the processing solution is introduced, the degree of the depressurization preferably has an upper limit of 30 Torr to avoid the boiling of the processing solution. If processing solution is supplied onto the treated substrate surface under reduced pressure and then pressurization is performed, the volume of the air bubbles, if they remain inside the hole, is further reduced by the pressurization, making the air bubbles more readily removable from the hole, and thus such a method is preferred. For example, when the interior is pressurized from a depressurized state of 30 Torr to 760 Torr, the volume of the air bubbles becomes approximately 1/25. Accordingly, in the present invention, the preferred mode is to perform depressurization, sufficiently supply the processing solution, and subsequently perform pressurization. Furthermore, this depressurization and pressurization may repeatedly occur.

While the above has described the present invention specifically, the technology of the present invention is not limited to TSV and is also applicable to other technological fields such as microelectromechanical systems (MEMS), for example, as long as the technology requires a high-aspect ratio hole.

REFERENCE SIGNS LIST

• 100 SOI substrate
• 101 Silicon (Si) semiconductor substrate
• 102 Silicon oxide (SiO₂) layer
• 103 Si layer (103-1, 103-2)
• 104 Hole
• 105 Air bubble
• 106 Processing solution
• 107 Gas-liquid interface
• 108 Inside wall surface (108-1, 108-2)
• 109 Inner bottom wall surface
• 110 Opening
• 200 Processing system
• 201 Depressurization process chamber
• 202 Treated body placement table
• 202-1 Rotating shaft for treated body placement table
• 203 Treated body
• 204 Atmospheric gas supply line
• 205 Processing (chemical) solution supply line
• 206 Recovery hood
• 207 Depressurization waste solution tank
• 208 Air or N₂ supply line
• 209 Drainage line
• 210 Recovery line
• 211, 212 Exhaust line
• 213 Exhaust pump
• 214, 215, 216, 217, 218, 219, 220, 221 Valve
• 222 Variable supply rate nozzle for processing solution
• 301 Spinner
• 302 Cartridge
• 303 Aluminum frame
• 400 Nitrogen force-feed type processing (chemical) solution supply system
• 401 Canister
• 402 Processing solution supply line
• 403, 411 Stop valve
• 404 Flow rate adjustment valve
• 405 Flow meter
• 406 Mist trap
• 407, 408 Nitrogen gas supply line
• 409 Vent (exhaust) valve
• 410 Flow-dividing joint
• 412 Regulator
• 413 Joint
• 414, 415 Quick connector
• 501 Drain flange
• 502 Depressurization flange
• 503 Waste solution introduction flange
• 504 Gas introduction flange
• 505 Vacuum gauge
• 506 Flow meter
• 507 Solution level observation window
• 600 Depressurization process chamber
• 601 Chamber construct
• 602 Upper lid
• 603 Treated body placement stage
• 604 Rotating shaft
• 605 Magnetic fluid seal
• 606 Special processing (chemical) solution supply line
• 607 Ozonized water supply line
• 608 Ultrapure water supply line
• 609, 610, 611, 618 Flow meter
• 612, 613, 614, 617, 621, 624 Valve
• 615 Gas introduction line
• 619 Gas discharge line
• 616, 620, 623 Flange
• 622 Waste solution line
• 625 Observation window (625-1, 625-2)
• 626 Vacuum gauge
• 701 Gas jet inner wall tube
• 702 Gas jet nozzle

Claims

1. A method for processing an inner wall surface of a micro vacancy, comprising: arranging a substrate in a depressurizable processing space, the substrate comprising a surface on which a processing solution is to be applied and a micro vacancy with an opening on the surface, an aspect ratio (l/r) of the micro vacancy being at least 5, or the aspect ratio being less than 5 and a ratio (V/S) of a micro vacancy volume (V) to a surface area of the opening (S) being atdepressurizing the processing space; andintroducing the processing solution to the depressurized processing space so as to process the inner wall surface of the micro vacancy.

2. The method according claim 1, wherein the inner wall surface of the micro vacancy comprises an inner bottom wall surface, the inner bottom wall surface is formed of a material different from that of the inner wall surface of the micro vacancy except for the inner bottom wall surface, and the processing solution is used for processing the inner bottom wall surface.