Method for using biomaterials as reagent for nano-patterning

Abstract

A pattern transfer method includes providing a substrate, forming a first biomaterial over the substrate, exposing the first biomaterial to a pattern writing agent in a manner consistent with a pattern to be transferred, forming a second biomaterial over the first biomaterial, wherein the second biomaterial reacts and bonds with portions of the first biomaterial not exposed to the pattern writing agent, and does not react and bond with portions of the first biomaterial exposed to the pattern writing agent.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and, together with the description, serve to explain the features, advantages, and principles of the invention.

In the drawings,

FIGS. 1A-1C illustrate a conventional e-beam process;

FIGS. 2A-2E illustrate an e-beam patterning method consistent with embodiments of the present invention;

FIGS. 3A-3B show images of patterns realized by methods consistent with embodiments of the present invention; and

FIG. 4 shows a relationship between intensities of the images of FIGS. 3A-3B and doses of an e-beam used in generating the patterns of FIGS. 3A-3B.

Claims

1. A pattern transfer method, comprising: providing a substrate;forming a first biomaterial over the substrate;exposing the first biomaterial to a pattern writing agent in a manner consistent with a pattern to be transferred; andforming a second biomaterial over the first biomaterial,wherein the second biomaterial reacts and bonds with portions of the first biomaterial not exposed to the pattern writing agent, and does not react and bond with portions of the first biomaterial exposed to the pattern writing agent.

2. The method of claim 1, wherein providing the substrate comprises providing a semiconductor wafer, glass, or sapphire.

3. The method of claim 1, wherein providing the first biomaterial comprises providing oligonucleotides including thymine nucleotides.

4. The method of claim 1, wherein exposing the first biomaterial comprises exposing the first biomaterial to an electron beam, a UV beam, an X-ray, or a beam of irradiation particles.

5. The method of claim 1, wherein providing the second biomaterial comprises providing oligonucleotides including adenine nucleotides.

6. The method of claim 1, further comprising: providing an immobilizing film on the substrate; andimmobilizing the first biomaterial to the immobilizing film.

7. The method of claim 6, wherein providing the first biomaterial comprises providing the first oligonucleotides as modified oligonucleotides which bond with the immobilizing film.

8. The method of claim 6, wherein providing the first biomaterial comprises providing the thiolated T-based ssDNA (single-stranded DNA).

9. The method of claim 1, further comprising labeling the second biomaterial.

10. The method of claim 9, wherein labeling the second biomaterial comprises dying the second biomaterial.

11. The method of claim 9, wherein labeling the second biomaterial comprises labeling the second biomaterial with nanoparticles, noble metals, or semiconductor colloidal nanoparticles such as CdSe or CdS.

12. The method of claim 9, wherein labeling the second biomaterial is performed before forming the second biomaterial over the first biomaterial.

13. The method of claim 9, wherein labeling the second biomaterial is performed after forming the second biomaterial over the first biomaterial.

14. A pattern transfer method, comprising: providing first oligonucleotides over a substrate;writing a pattern onto the first oligonucleotides; andproviding second oligonucleotides to hybridize with the first oligonucleotides.

15. The method of claim 14, wherein providing the first oligonucleotides comprises providing oligonucleotides including thymine nucleotides.

16. The method of claim 14, wherein providing the second oligonucleotides comprises providing oligonucleotides including adenine nucleotides.

17. The method of claim 14, wherein writing the pattern onto the first oligonucleotides comprises writing the pattern with an electron beam.

18. The method of claim 17, wherein the pattern has a non-uniform depth, and writing the pattern comprises writing the pattern by adjusting a dose of the electron beam.

19. The method of claim 14, further comprising: providing an immobilizing film on the substrate; andimmobilizing the first oligonucleotides to the immobilizing film.

20. The method of claim 19, wherein providing the first oligonucleotides comprises providing the first oligonucleotides as modified oligonucleotides which bond with the immobilizing film.

21. The method of claim 19, wherein providing an immobilizing film comprises sequentially providing a thin film of chromium and a thin film of gold on the substrate.

22. The method of claim 14, further comprising labeling the second oligonucleotides.

23. The method of claim 22, wherein labeling the second oligonucleotides comprises dying the second oligonucleotides.

24. The method of claim 22, wherein labeling the second oligonucleotides comprises labeling the second oligonucleotides with nanoparticles, noble metals such as gold, or semiconductor colloidal nanoparticles such as CdSe or CdS.