Number | Name | Date | Kind |
---|---|---|---|
5126028 | Hurwitt et al. | Jun 1992 | A |
5131752 | Yu et al. | Jul 1992 | A |
5270222 | Moslehi | Dec 1993 | A |
5503707 | Maung et al. | Apr 1996 | A |
5622636 | Huh et al. | Apr 1997 | A |
5779927 | Lo | Jul 1998 | A |
5955139 | Iturralde | Sep 1999 | A |
Entry |
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Article entitled, “In-Situ Chemical Concentration Control for Wafer Wet Cleaning”; authors Ismail Kashkoush, Rich Novak and Eric Brause; published in the May/Jun. 1998 Journal of the IEST; pp. 24-30. |