Journal of the Electrochemical Society, Dec. 1978, pp. 2050-2058, Richard B. Fair, et al., "Theory and Direct Measurement of Boron Segregation in SiO.sub.2 During, Near Dry and Wet O.sub.2 Oxidation". |
Journal of the Electrochemical Society, May 1978, pp. 813-819, Dimitri A. Antoniadis, et al., "Boron in Near-Intrinsic <100> and <111> Silicon Under Inert and Oxidizing Ambients-Diffusion and Segregation". |
Journal of the Electrochemical Society, Nov. 1979, pp. 1939-1945, D. A. Antoniadis, et al., "Impurity Redistribution in SiO.sub.2 -Si During Oxidation: A Numerical Solution Including Interfacial Fluxes". |