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Robles et al., Characterization High Density Plasma Chamical Vapor Deposited a-Carbon and a-Fluorinated Carbon Films For Ultra Low Dielectric Applications, unknown.* |
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Stuardo Robles, Loreto Vasquez, Moshe Eizenberg, and Farhad Moghadam, Characterization of High Density Plasma Chemical Vapor Deposited α-Carbon and α-Fluorinated Carbon Films For Ultra Low Dielectric Applications, 8 pp., (no date). |
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Alfred Grill,“Diamondlike Carbon Materials As Low-k Dielectrics For Multilevel Interconnects in ULSI,” Abstract, 2 pp., (no date). |
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